公开(公告)号：US20050207874A1

公开(公告)日：2005-09-22

申请号：US10848370

申请日：2004-05-18

申请人： Klaus Michael ,  Jurgen Henrich ,  Thomas Gebele ,  Helmut Drimm

发明人： Klaus Michael ,  Jurgen Henrich ,  Thomas Gebele ,  Helmut Drimm

IPC分类号： B65G49/00 ,  B01J3/02 ,  B65G1/00 ,  B65G47/84 ,  C23C14/56

CPC分类号： C23C14/566

摘要： Plastic bottles as well as other hollow bodies are given thin functional layers by means of high vacuum coating devices. The relevant process takes place in high vacuum. The bottles to be coated as well as the coated bottles are inserted into a high vacuum chamber (20) through a sluice, which consists of carrousel drum unit. Due to the difference of pressure in the atmosphere and the high vacuum chamber, carrousel within the drum suffers a displacement or tipping, which makes the sealing of the carrousel with respect to the drum difficult. Hence the invention proposes a sluice system consisting of two sluices (23, 25) of the mentioned type, which are connected with one another by means of an intermediate vacuum chamber (22). It is thus achieved that the load due to the pressure on each drum (3) decreases, so that each sluice (23, 25) functions with lesser tendency to develop faults.

摘要翻译： 塑料瓶以及其他中空体通过高真空镀膜装置给予薄的功能层。 相关过程在高真空下进行。 待涂覆的瓶子以及涂覆的瓶子通过由转盘筒单元组成的闸门插入高真空室（20）中。 由于大气压力和高真空室的差异，鼓内的转盘具有位移或倾翻，这使得转盘相对于转鼓的密封变得困难。 因此，本发明提出了一种由上述类型的两个闸门（23,25）组成的闸门系统，它们通过中间真空室（22）相互连接。 因此，由于每个鼓（3）上的压力引起的负载减小，使得每个闸（23,25）以较小的发生故障的倾向起作用。

公开(公告)号：US20050217993A1

公开(公告)日：2005-10-06

申请号：US11093799

申请日：2005-03-30

申请人： Thomas Gebele ,  Jurgen Henrich ,  Manfred Weimann

发明人： Thomas Gebele ,  Jurgen Henrich ,  Manfred Weimann

IPC分类号： C03C17/00 ,  C23C14/35 ,  C23C14/54 ,  C23C14/56 ,  C23C16/00

CPC分类号： C23C14/566 ,  C23C14/56

摘要： A multistage lock chamber device with at least two lock chambers, a first pump set for evacuating a first lock chamber, and a second pump set for evacuating a second lock chamber. The first pump set (P1) may evacuate both the first and the second lock chamber, or both jointly. The first pump set may also be utilized as a prior pumping stand of the second pump set. Additionally, an integrated third pump set can be utilized as a pre-pumping stand for the second pump set and/or first pump set. Alternately or additionally, the device can include at least one buffer unit, whose buffer volume is being utilized to produce a sudden decline in pressure inside the lock chamber by means of pressure equalization.

摘要翻译： 一种具有至少两个锁定室的多级锁定室装置，用于抽空第一锁定室的第一泵组和用于抽空第二锁定室的第二泵组。 第一泵组（P1）可以同时排空第一和第二锁定室，或二者共同排空。 第一泵组也可以用作第二泵组的先前泵站。 此外，集成的第三泵组可以用作第二泵组和/或第一泵组的预泵站。 替代地或另外地，装置可以包括至少一个缓冲单元，其缓冲体积被利用以通过压力均衡来产生锁定室内的压力的突然下降。

公开(公告)号：US06881270B1

公开(公告)日：2005-04-19

申请号：US09710769

申请日：2000-11-09

申请人： Thomas Gebele ,  Jurgen Henrich ,  Stefan Bangert ,  Jürgen Honekamp ,  Elisabeth Budke ,  Jürgen Ulrich ,  Helmut Grimm

发明人： Thomas Gebele ,  Jurgen Henrich ,  Stefan Bangert ,  Jürgen Honekamp ,  Elisabeth Budke ,  Jürgen Ulrich ,  Helmut Grimm

IPC分类号： C23C14/24 ,  C23C14/32 ,  H01J37/32 ,  C23C16/00 ,  H05H1/02

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/32422 ,  H01J37/32532

摘要： An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably, a motion-producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to he first material component on the cathode material surface (25).

摘要翻译： 一种用于衬底（3）的等离子体辅助涂层的电极装置，其具有包括至少一种第一和第二材料组分的材料层，并且用于产生等离子体放电，更特别是电弧放电（35），具有 阳极装置（5），其在用于蒸发的阳极材料表面（13）处提供第一材料部件，以及在阴极材料表面（25）处提供第二材料部件的阴极装置（7）。 电极装置的特征在于，阴极材料表面（25）由支撑等离子体放电（35）的蒸发活性部分（27）和不支持等离子体放电的蒸发非活性部分（41）构成。 优选地，提供运动产生装置（49），用于将蒸发非活性部分（41）移动到阴极材料表面（25）上，以便减少由于第一材料成分在阴极材料表面（25）上沉积的材料 ）。

公开(公告)号：US6132562A

公开(公告)日：2000-10-17

申请号：US249444

申请日：1999-02-12

申请人： Tomas Baumecker ,  Helmut Grimm ,  Jurgen Henrich ,  Klaus Michael ,  Gert Rodling ,  Jurgen Ulrich

发明人： Tomas Baumecker ,  Helmut Grimm ,  Jurgen Henrich ,  Klaus Michael ,  Gert Rodling ,  Jurgen Ulrich

IPC分类号： B05B13/02 ,  B65G49/07 ,  C03C17/00 ,  C23C14/50 ,  C23C14/56 ,  C23C14/22 ,  B65G49/00 ,  C23C14/34

CPC分类号： C23C14/56 ,  C23C14/505

摘要： For coating substrates (17,18,20,21,22) in a vacuum-coating chamber (2) the substrates are introduced by an air lock into the coating chamber (2) and moved along a transport path in front of the coating sources (50a,b,c,d) producing a coating cloud. To this end, the substrates (17,18,20,21,22) are led past the coating sources (50a,b,c,d) by means of holding devices (24) arranged movably on a transport belt (9) during at least two successive coating phases. During the one coating phase, the substrates (17,18,20,21,22) are oriented along one transport direction T.sub.3 oriented towards the coating sources (50a,b,c,d) such that essentially the substrate bottom of the cylindrical substrate is coated. During the subsequent second coating phase, the substrates are oriented in front of the coating sources (50a,b,c,d) in a direction T.sub.4 opposite the transport direction T.sub.3, wherein the substrates (17,18,20,21,22) are oriented such that essentially the cylindrical side surface is coated. By this method, the substrates (17,18,20,21,22) are coated successively in an identical manner and independently of possible substrate positions with relation to the coating sources (50a,b,c,d) during the coating process. Bottle-shaped containers, in particular, plastic bottles are vapor-coated with a gas- or fluid-barrier layer using the method. The coating sources (50a,b,c,d) include thermal vaporizers and/or plasma cathode sputter sources.

摘要翻译： 对于在真空涂覆室（2）中的涂覆基底（17,18,20,21,22），基底通过气锁引入涂覆室（2）中并且沿着涂覆源前面的输送路径移动 （50a，b，c，d）产生涂层云。 为此，通过可移动地布置在输送带（9）上的保持装置（24）将衬底（17,18,20,21,22）引导通过涂覆源（50a，b，c，d） 至少两个连续的涂层阶段。 在一个涂层阶段期间，衬底（17,18,20,21,22）沿着朝向涂层源（50a，b，c，d）定向的一个输送方向T3定向，使得基本上圆柱形基底 被涂层。 在随后的第二涂覆阶段期间，基板在与输送方向T3相反的方向T4上定向在涂层源（50a，b，c，d）的前方，其中基板（17,18,20,21,22） 被定向为使得基本上圆柱形侧表面被涂覆。 通过这种方法，在涂覆过程中，相对于涂覆源（50a，b，c，d），基板（17,18,20,21,22）以相同的方式依次涂覆并且独立于可能的基板位置。 使用该方法，使用气体或流体阻挡层对瓶形容器，特别是塑料瓶进行蒸气涂覆。 涂层源（50a，b，c，d）包括热蒸发器和/或等离子体阴极溅射源。

公开(公告)号：US07842167B2

公开(公告)日：2010-11-30

申请号：US11498940

申请日：2006-08-03

申请人： Jurgen Henrich ,  Andreas Sauer ,  Andreas Geiss ,  Felix Brinckmann

发明人： Jurgen Henrich ,  Andreas Sauer ,  Andreas Geiss ,  Felix Brinckmann

IPC分类号： C23C14/00

CPC分类号： C23C14/3407 ,  H01J37/32568 ,  H01J37/32724 ,  H01J37/3402 ,  H01J37/3423

摘要： A sputter apparatus with a pipe cathode is arranged such that the supply of power, cooling fluid and other media to the pipe cathode takes place via flexible lines or tubes which can be wound about a receptor. If the pipe cathode completes a pendulum movement, the lines and/or tubes are wound onto the receptor or wound from it. The pendulum movement of the pipe cathode is preferably such that the pipe cathode is rotated by a certain first angle in a first direction and subsequently by a certain second angle in a second direction, the second angle differing from the first angle. Methods for operating the sputter apparatus are also disclosed.

摘要翻译： 具有管阴极的溅射装置被布置成使得向管阴极供应动力，冷却流体和其它介质通过能够缠绕在受体上的柔性管线或管发生。 如果管阴极完成摆动运动，则管线和/或管被卷绕到受体上或从其上缠绕。 管状阴极的摆动运动优选地使得管阴极在第一方向上旋转一定的第一角度，并且随后在第二方向上旋转一定的第二角度，第二角度与第一角度不同。 还公开了用于操作溅射装置的方法。

公开(公告)号：US06123494A

公开(公告)日：2000-09-26

申请号：US57973

申请日：1998-04-10

申请人： Jurgen Henrich ,  Gerd Ickes

发明人： Jurgen Henrich ,  Gerd Ickes

IPC分类号： C23C14/24 ,  B01J3/00 ,  B01J3/03 ,  C23C14/50 ,  C23C14/56 ,  H01L21/677 ,  H01L21/687 ,  B65D49/07

CPC分类号： H01L21/67742 ,  B01J3/006 ,  B01J3/03 ,  C23C14/56 ,  C23C14/566 ,  H01L21/67745 ,  H01L21/68707 ,  Y10S414/139

摘要： A processing station arranged in a vacuum chamber (2) for the coating of workpieces by a device, which loads or empties the workpieces through at least one opening set in the chamber wall (3,3',3") of the vacuum chamber(2) which can be closed off with a cover (14,14'). The loading/unloading device includes a vertically oriented shaft (42), on which a pusher part (26,26') is affixed, which primarily is movable by a lever mechanism through a push/pull connecting rod (40,40'). A gripping device (10,10';11'11') is arranged on the pusher part (26,26') for the transport of the workpieces. Through rotation of the shaft (42), the push/pull connecting rod (40,40') is radially moved between an open position (P.sub.2) of the cover (14,14') near the axle and a closed position (P.sub.1) of the cover (14,14') away from the axle. In the closed position (P.sub.2) of the cover, the gripping device projects completely into the vacuum chamber (2). For the loading of the vacuum chamber (2) with work pieces (8,8'), the pusher part (26,26') is next loaded with the workpieces (8) to be processed. Through subsequent rotation of the loaded pusher part (26,26') about the shaft (42), the pusher part (26,26') is brought in front of the opening (24) of the vacuum chamber (2). Next, the pusher part (26,26') is moved toward the opening by rotation of the shaft (42) in a radial direction, and is closed vacuum tight with the cover (14,14') connected to the pusher part (26,26').

摘要翻译： 一种设置在真空室（2）中的用于通过装置涂覆工件的处理站，该装置通过设置在真空室的室壁（3,3'，3“）中的至少一个开口装载或者清空工件 （2），其可以用盖（14,14'）封闭。 装载/卸载装置包括垂直定向的轴（42），其上固定有推动器部分（26,26'），其主要通过杠杆机构通过推/拉连杆（40,40'）移动。 夹持装置（10,10'; 11'11'）设置在推动器部分（26,26'）上用于输送工件。 通过所述轴（42）的旋转，推/拉连杆（40,40'）在靠近轴的盖（14,14'）的打开位置（P2）和关闭位置（P1）之间径向移动， （14,14'）远离轴。 在盖的关闭位置（P2）中，夹持装置完全投射到真空室（2）中。 对于用工件（8,8'）装载真空室（2），接下来将推动器部件（26,26'）加载待加工的工件（8）。 通过使装载的推动器部件（26,26'）围绕轴（42）的随后旋转，推动器部件（26,26'）被带到真空室（2）的开口（24）的前方。 接下来，推动器部件（26,26'）通过轴（42）沿径向的旋转而朝向开口移动，并且与连接到推动器部件（26）的盖（14,14'）真空密封 ，26'）。

公开(公告)号：US5849087A

公开(公告)日：1998-12-15

申请号：US886675

申请日：1997-07-01

申请人： Hermann Kloberdanz ,  Josef Hoffmann ,  Jurgen Henrich

发明人： Hermann Kloberdanz ,  Josef Hoffmann ,  Jurgen Henrich

IPC分类号： C23C14/56 ,  C23C14/00

CPC分类号： C23C14/566

摘要： In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . . ) and/or through which the substrates can be transferred in and out, where one of the substrate chambers, but at least the inward/outward transfer lock chamber (20), has as cover or a sealing flap (33), which allows direct access to the corresponding substrate chamber, and where the chamber (20) can be shifted (A, B) toward the internal cylinder (14) and pressed against the outside wall of the cylinder (14) or against the frame-like end surface of the substrate chamber (3).

摘要翻译： 在用于将薄层施加到诸如头灯反射器的基板（2,2'...）上的真空处理系统中，具有几个处理（8,9,10）和/或向内和向外转移的锁定站（20）支撑在 固定的真空室壁（16,16'，...）和可旋转地支撑的内筒（14），其被真空室壁包围并承载基板室（3-6），开口（24-27） ）设置在真空室壁（16,16'...）中，基板室（3-6）可以与基板室（3-6）对准，通过该真空室壁可以使处理剂作用在基板（2,2）上 （...）和/或可以将衬底输入和输出，其中一个衬底腔室至少内向/向外传送锁定室（20）具有盖或密封挡板（33） ），其允许直接进入相应的衬底室，并且其中腔室（20）可以朝向内部气缸（14）移动（A，B）并且被压缩的aga 将气缸（14）的外壁或衬底室（3）的框架状端面固定。

公开(公告)号：US20080086948A1

公开(公告)日：2008-04-17

申请号：US11955876

申请日：2007-12-13

申请人： Uwe Schussler ,  Stefan Bangert ,  Jurgen Henrich

发明人： Uwe Schussler ,  Stefan Bangert ,  Jurgen Henrich

IPC分类号： E05F11/02

CPC分类号： C03C17/001 ,  C03C17/002 ,  C23C14/56 ,  C23C14/566 ,  F16K1/2007 ,  F16K1/205 ,  F16K1/2085 ,  F16K1/24 ,  F16K51/02

摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.

摘要翻译： 本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保 还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是 在开放之前再次释放。

公开(公告)号：US20070144891A1

公开(公告)日：2007-06-28

申请号：US11498940

申请日：2006-08-03

申请人： Jurgen Henrich ,  Andreas Sauer ,  Andreas Geiss ,  Felix Brinckmann

发明人： Jurgen Henrich ,  Andreas Sauer ,  Andreas Geiss ,  Felix Brinckmann

IPC分类号： C23C14/00

CPC分类号： C23C14/3407 ,  H01J37/32568 ,  H01J37/32724 ,  H01J37/3402 ,  H01J37/3423

摘要： A sputter apparatus with a pipe cathode is arranged such that the supply of power, cooling fluid and other media to the pipe cathode takes place via flexible lines or tubes which can be wound about a receptor. If the pipe cathode completes a pendulum movement, the lines and/or tubes are wound onto the receptor or wound from it. The pendulum movement of the pipe cathode is preferably such that the pipe cathode is rotated by a certain first angle in a first direction and subsequently by a certain second angle in a second direction, the second angle differing from the first angle. Methods for operating the sputter apparatus are also disclosed.

摘要翻译： 具有管阴极的溅射装置被布置成使得向管阴极供应动力，冷却流体和其它介质通过能够缠绕在受体上的柔性管线或管发生。 如果管阴极完成摆动运动，则管线和/或管被卷绕到受体上或从其上缠绕。 管状阴极的摆动运动优选地使得管阴极在第一方向上旋转一定的第一角度，并且随后在第二方向上旋转一定的第二角度，第二角度与第一角度不同。 还公开了用于操作溅射装置的方法。

公开(公告)号：US5538560A

公开(公告)日：1996-07-23

申请号：US280310

申请日：1994-07-26

申请人： Jaroslav Zejda ,  Jurgen Henrich

发明人： Jaroslav Zejda ,  Jurgen Henrich

IPC分类号： C23C14/50 ,  C23C14/56 ,  C23C16/00 ,  B05C13/02 ,  B23Q1/25 ,  C23C14/00

CPC分类号： C23C14/56 ,  C23C14/566

摘要： A closed cylindrical housing defining a transport chamber has a top plate with a first opening communicating with an entry and exit chamber, and a second opening communicating with a coating chamber. A turntable rotatable about an axis in the transport chamber carries a holder to a first position below the first opening as it carries a like holder to a second position below the second opening. Each holder has thereon a container with a diameter smaller than the first opening but larger than the second opening. A first lifter raises a holder sealingly against the top plate around the first opening, the container thereon passing through the first opening to load or unload substrates. A second lifter raises the other holder so that the container thereon abuts a mask defining the second opening in order to coat a substrate in the container.

摘要翻译： 限定运输室的封闭的圆柱形壳体具有顶板，其具有与入口和出口室连通的第一开口，以及与涂覆室连通的第二开口。 在传送室中绕轴线转动的转台可将保持器运送到第一开口下方的第一位置，因为它将类似的支架运送到第二开口下方的第二位置。 每个支架上都有一个直径小于第一开口但大于第二开口的容器。 第一升降器将第一开口周围的顶板密封地抬起，其上的容器穿过第一开口以装载或卸载基板。 第二升降器升起另一个保持器，使得其上的容器抵靠限定第二开口的掩模，以便涂覆容器中的基底。