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公开(公告)号：US20110220816A1
公开(公告)日：2011-09-15
申请号：US13042755
申请日：2011-03-08
申请人： Kouji Kakizaki , Tooru Abe , Osamu Wakabayashi
发明人： Kouji Kakizaki , Tooru Abe , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H01S3/2232 , H01S3/2316 , H05G2/003
摘要： An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.
摘要翻译： 极紫外光发生装置可以包括：激光装置; 设置有用于将从激光装置输出的激光束引入其内部的入口的室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 设置在所述室中的收集器反射镜，用于收集当所述靶材料在所述腔室中被激光束照射时产生的极紫外光; 用于检测极紫外光的能量的极紫外光检测单元; 以及用于控制极紫外光的能量的能量控制单元。
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公开(公告)号：US08569722B2
公开(公告)日：2013-10-29
申请号：US13042755
申请日：2011-03-08
申请人： Kouji Kakizaki , Tooru Abe , Osamu Wakabayashi
发明人： Kouji Kakizaki , Tooru Abe , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H01S3/2232 , H01S3/2316 , H05G2/003
摘要： An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.
摘要翻译： 极紫外光发生装置可以包括：激光装置; 设置有用于将从激光装置输出的激光束引入其内部的入口的室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 设置在所述室中的收集器反射镜，用于收集当所述靶材料在所述腔室中被激光束照射时产生的极紫外光; 用于检测极紫外光的能量的极紫外光检测单元; 以及用于控制极紫外光的能量的能量控制单元。
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3.发明授权公开(公告)号：US07965756B2
公开(公告)日：2011-06-21
申请号：US12545495
申请日：2009-08-21
IPC分类号： H01S3/22
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。
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公开(公告)号：US20090232171A1
公开(公告)日：2009-09-17
申请号：US12382109
申请日：2009-03-09
申请人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。
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5.发明申请公开(公告)号：US20060239309A1
公开(公告)日：2006-10-26
申请号：US10568091
申请日：2004-08-09
申请人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tatsuya Ariga , Osamu Wakabayashi , Kouji Kakizaki
CPC分类号： G03F7/70041 , H01S3/097 , H01S3/09702 , H01S3/10007 , H01S3/104 , H01S3/1301 , H01S3/134
摘要： A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.
摘要翻译： 施加到设置在振荡激光器100的振荡高电压脉冲发生器12中的主电容器C 0的充电电压Vosc受到恒定的控制，使得振荡激光器100的脉冲能量Posc成为下限能量Es 0或 更多的是放大饱和区域。 并且，控制施加到放大激光器300的放大高压脉冲发生器32中的主电容器C 0的充电电压Vamp，将放大激光器300的脉冲能量Pamp确定为目标能量Patgt。 因此，控制两级激光器的脉冲能量以稳定脉冲能量。
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公开(公告)号：US09113540B2
公开(公告)日：2015-08-18
申请号：US13492067
申请日：2012-06-08
CPC分类号： H05G2/008 , H01S3/02 , H01S3/094026 , H01S3/10061 , H01S3/1106 , H01S3/131 , H01S3/1636 , H01S3/1643 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20150188274A1
公开(公告)日：2015-07-02
申请号：US14579698
申请日：2014-12-22
CPC分类号： H01S3/0014 , H01S3/034 , H01S3/036 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.
摘要翻译： 控制激光装置的方法可以包括：在配置成通过激励增益介质输出激光束的腔室中交换增益介质; 在交换之后，首先测量在特定气体压力和特定充电电压下在腔室中振荡的激光束的脉冲能量; 计算表示激光束的脉冲能量与腔室中的气体压力与充电电压之间的关系的近似表达式，或表示脉冲能量，气体压力和充电电压之间的相关性的表格， 压力，第一次测量中的具体充电电压和脉冲能量; 存储近似表达式或表格; 在第一次测量之后，第二次测量激光束的脉冲能量Er在腔室中振荡; 基于近似表达式或表格，计算在气体压力下的交换和第二测量中的充电电压之间直接获得的脉冲能量Eec; 使用＆Dgr; Ed = Eec-Er计算基于脉冲能量Eec和脉冲能量Er的脉冲能量的减少量＆Dgr; Ed; 并且基于脉冲能量的减少量＆Dgr; Ed计算腔室中部分气体交换的部分气体交换量Q。
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公开(公告)号：US08507883B2
公开(公告)日：2013-08-13
申请号：US12559977
申请日：2009-09-15
申请人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21G4/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
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公开(公告)号：US08497489B2
公开(公告)日：2013-07-30
申请号：US13051649
申请日：2011-03-18
IPC分类号： G01K5/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。
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公开(公告)号：US08445876B2
公开(公告)日：2013-05-21
申请号：US12603872
申请日：2009-10-22
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。
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