摘要:
A multi-section semiconductor laser diode is disclosed. The laser diode includes a complex-coupled DFB laser section that includes a complex-coupled grating and an active structure for controlling the intensity of oscillating laser light, to oscillate laser light in a single mode, and an external cavity including a phase control section and an amplifier section, the phase control section having a passive waveguide that controls a phase variation of feedback laser light, the amplification section having an active structure that controls the strength of the feedback laser light. Currents are separately provided to the three sections to generate optical pulses with tuning range of tens of GHz. Applications include the clock recovery in the 3R regeneration of the optical communication.
摘要:
A multi DFB laser diode for generating spontaneous pulses comprises first and second DFB sections each of which has a substrate including a diffraction grating, an active layer formed on the substrate, a clad layer formed on the active layer and including a refraction varying layer, and an electrode formed on the active layer; and a phase tuning section including a substrate, an active layer formed on the substrate, a clad layer formed on the active layer, and an electrode isolated from the electrode of the first and second DFB sections. The refraction varying layer in the active layer of the first DFB section has a refractive index different from that of the refraction varying layer in the active layer of the second DFB section.
摘要:
Disclosed is a high frequency optical pulse source generating stable optical pulses over a wide current range in an optical transmission system to enhance stability and reliability, the high frequency optical pulse source implementing, in one chip, a multi-section distributed feedback (DFB) laser diode with a phase control section arranged between two DFB laser diodes. By controlling the current applied to the electrode of the phase control section while applying currents to the first and second DFB sections, the present invention causes self-mode locking between the compound-cavity modes having similar threshold currents, thereby generating stable tens GHz-level optical pulses. Hence, the present invention generates optical pulses uniformly over a wide current range, thereby enhancing the stability and reliability of the element.
摘要:
Disclosed is a method for the fabrication of a spot-size converter with a lateral-tapered waveguide (or an active layer), which utilizes a mask during a lithographic process wherein the mask has a pad that can absorb strain to be occurred during forming a lateral-tapered waveguide pattern at its distal end and the lateral-tapered waveguide is fabricated by forming the distal end on the order of about 0.6 &mgr;m in width followed by forming the lateral-tapered waveguide on the order of 0.1 &mgr;m using an wet etching. Thus, it is possible to reduce a fabrication cost because it is free from a high-resolution electron beam lithography and a stepper, and hence enhance a reproducibility of the lateral-tapered waveguide because it is free from an excessive wet etching during the use of a contact exposure equipment. Further, it is possible to integrate the spot-size converter fabricated by the above with an optical device, resulting in an increased position adjustment and reproducibility of the spot-size converter, which in turn, leads to increase in yield for the optical device.
摘要:
Disclosed is a fabricating method of a GaAs substrate having a V-shaped groove in a higher density, that is a double density, the method comprising the steps of forming a Si.sub.3 N.sub.4 layer on a main surface of the GaAs substrate; patterning the Si.sub.3 N.sub.4 layer using a photo-lithography to form a patterned Si.sub.3 N.sub.4 layer having a minimum width; wet-etching the GaAs substrate using the patterned Si.sub.3 N.sub.4 layer as a mask, so as to form (111) and (100) surfaces of the GaAs substrate beneath the patterned Si.sub.3 N.sub.4 ; selectively growing a GaAs film on the GaAs substrate etched thus using the patterned Si.sub.3 N.sub.4 layer as a mask so as to form the GaAs film with two (111) facets only on a (100) surface of the GaAs substrate; and removing the Si.sub.3 N.sub.4 layer. The V-shaped grooves can be formed on a GaAs substrate utilizing a difference of growth rate caused by surface orientation of the substrate, and therefore the grooves can be formed in double density.
摘要翻译:本发明公开了一种GaAs衬底的制造方法,该GaAs衬底具有较高密度的V形沟槽,即双重密度,该方法包括以下步骤:在GaAs衬底的主表面上形成Si 3 N 4层; 使用光刻法构图Si 3 N 4层以形成具有最小宽度的图案化的Si 3 N 4层; 使用图案化的Si 3 N 4层作为掩模对GaAs衬底进行湿法蚀刻,以在图案化的Si 3 N 4之下形成GaAs衬底的(111)和(100)表面; 在GaAs衬底上选择性地生长GaAs膜,使用图案化的Si 3 N 4层作为掩模进行蚀刻,以便仅在GaAs衬底的(100)表面上形成具有两个(111)面的GaAs膜; 并去除Si3N4层。 可以使用由衬底的表面取向引起的生长速度差,在GaAs衬底上形成V形槽,因此可以以双重密度形成沟槽。
摘要:
A linear motion apparatus for moving an object in a vacuum chamber comprising an antenna or a telescoping shaft such as a fishing rod to effectively utilize space, and to avoid the need of a rear projection thereby achieving stability. The linear motion apparatus includes: a body having a space portion penetrated horizontally; a rotary handle which penetrates at a right angle to the space portion of the body thereby controlling a linear motion; locking portion which is mounted in the space portion of the body, is inserted into a shaft of the rotary handle, and used to lock the motion; a guide rod which is formed as a multistage rod, whose one end is inserted and fixed into a predetermined position of the space portion of the body; linear motion force providing portion whose one end is fixed to the rotary plate and the other end is fixed to a nose portion of the guide rod, thereby providing a linear motion force to the guide rod; and a bellows seal which surrounds a circumference of the guide rod, is shrunken or expanded according to a linear motion of the guide rod. As a result, this apparatus performs a linear motion control by a contraction and expansion under ultra high vacuum.
摘要:
A method for fabricating a compound semiconductor substrate having a quantum dot array structure includes the steps of forming a plurality of dielectric thin layer patterns on a substrate, thereby forming an exposed area of the substrate, sequentially forming buffer layers and barrier layers in a pyramid shape on the exposed area of the substrate, forming Ga droplets on the barrier layers, transforming the Ga droplets into GaAs quantum dots, performing a thermal process to the substrate, and growing the buffer layers and the barrier layers to thereby form a passivation layer capping the GaAs quantum dots.
摘要:
A crystal growth method for a compound semiconductor is capable of forming a plurality of quantum wells (formed of a barrier layer having a large energy band gap and an active layer having a small energy band gap) on the compound semiconductor substrate. After etching a V-shaped groove having a (111) surface with a predetermined angle .theta.1 with respect to the (100) surface on the GaAs semiconductor substrate, the substrate is further etched by a hydrochloric solution and a solution of H.sub.2 SO.sub.4 :H.sub.2 O.sub.2 :H.sub.2 O=20:1 to cause the V-shaped groove walls to become a non-(111) surface having a lower predetermined slope angle .theta.2. The quantum wells then grown in the bottom of the V-shaped groove will be effectively disconnected from simultaneous growths on the side walls of the groove thus giving rise to closely controlled multi-dimensional quantum well structures.
摘要翻译:化合物半导体的晶体生长方法能够在化合物半导体基板上形成多个量子阱(由具有大能带隙的势垒层和具有小能带隙的有源层形成)。 在GaAs半导体衬底上蚀刻具有相对于(100)表面的具有预定角度θ(111)的(111)表面的V形槽之后,用盐酸溶液和H 2 SO 4 :H 2 O 2: H 2 O = 20:1使V形槽壁成为具有较低预定倾斜角度θ2的非(111)表面。然后在V形槽的底部生长的量子阱将被有效地从 在槽的侧壁上同时生长,从而产生紧密控制的多维量子阱结构。