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公开(公告)号:US6083321A
公开(公告)日:2000-07-04
申请号:US893462
申请日:1997-07-11
申请人: Lawrence Lei , Son Trihn , Joel M. Huston
发明人: Lawrence Lei , Son Trihn , Joel M. Huston
IPC分类号: H01L21/302 , C23C14/34 , C23C16/448 , H01L21/00 , H01L21/205 , H01L21/3065 , C23C16/00
CPC分类号: H01L21/67196 , H01L21/67017
摘要: The present invention generally provides a gas delivery system adapted for positioning near the process chamber. More particularly, the present invention provides an apparatus for processing a substrate that includes a process chamber and a gas delivery system. The gas delivery system is in fluid communication with and is adapted to supply one or more process gases and/or carrier/purge gases to the process chamber. The gas delivery system is positioned proximal the process chamber within about two to three feet of the process chamber.
摘要翻译: 本发明通常提供适于在处理室附近定位的气体输送系统。 更具体地说,本发明提供一种用于处理包括处理室和气体输送系统的基板的设备。 气体输送系统与流体连通并且适于将一种或多种工艺气体和/或载体/净化气体供应到处理室。 气体输送系统位于处理室的近处于处理室的大约二至三英尺的范围内。
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公开(公告)号:US20090111280A1
公开(公告)日:2009-04-30
申请号:US12328466
申请日:2008-12-04
申请人: Chien-Teh Kao , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
发明人: Chien-Teh Kao , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
IPC分类号: H01L21/31
CPC分类号: H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要: A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, generating a plasma of a reactive species from a gas mixture within the processing chamber, exposing the substrate to the reactive species while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to vaporize the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.
摘要翻译: 提供了从衬底表面去除天然氧化物的方法。 在一个实施例中,该方法包括将具有氧化物层的衬底定位到处理室中,从处理室内的气体混合物产生反应物质的等离子体,将衬底暴露于反应性物质,同时在衬底上形成挥发性膜 并将衬底保持在低于65℃的温度下,将衬底加热到至少约75℃的温度以蒸发挥发性膜并去除氧化物层,并且在加热衬底之后在衬底上沉积第一层 。
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公开(公告)号:US20080268645A1
公开(公告)日:2008-10-30
申请号:US12134715
申请日:2008-06-06
申请人: CHIEN-TEH KAO , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
发明人: CHIEN-TEH KAO , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
IPC分类号: H01L21/311
CPC分类号: H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要: In one embodiment, a method for removing native oxides from a substrate surface is provided which includes supporting a substrate containing silicon oxide within a processing chamber, generating a plasma of reactive species from a gas mixture within the processing chamber, cooling the substrate to a first temperature of less than about 65° C. within the processing chamber, and directing the reactive species to the cooled substrate to react with the silicon oxide thereon while forming a film on the substrate. The film usually contains ammonium hexafluorosilicate. The method further provides positioning the substrate in close proximity to a gas distribution plate, and heating the substrate to a second temperature of about 100° C. or greater within the processing chamber to sublimate or remove the film. The gas mixture may contain ammonia, nitrogen trifluoride, and a carrier gas.
摘要翻译: 在一个实施例中,提供了从衬底表面去除天然氧化物的方法,其包括在处理室内支撑含有氧化硅的衬底,从处理室内的气体混合物产生反应物质的等离子体,将衬底冷却至第一 在处理室内温度小于约65℃,并且将反应性物质引导到冷却的基底以与其上的氧化硅反应,同时在基底上形成膜。 该膜通常含有六氟硅酸铵。 该方法进一步提供将衬底定位在紧邻气体分配板的位置,并将衬底加热至处理室内约100℃或更高的第二温度以升华或去除膜。 气体混合物可以含有氨,三氟化氮和载气。
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公开(公告)号:US20090095621A1
公开(公告)日:2009-04-16
申请号:US12257093
申请日:2008-10-23
IPC分类号: C25F7/00
CPC分类号: H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft. A gas conduit is formed through the disk-shaped body and couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body. The gas conduit in the disk-shaped body has an orientation substantially perpendicular to a centerline of the disk-shaped body.
摘要翻译: 提供了一种从衬底表面去除天然氧化物的方法和装置。 在一个方面,该装置包括支撑组件。 在一个实施例中,支撑组件包括联接到盘形主体的轴。 轴具有真空导管,传热流体导管和形成在其中的气体导管。 盘状体包括上表面,下表面和圆柱形外表面。 热电偶嵌入盘状体。 凸缘从圆柱形外表面径向向外延伸,其中盘形体的下表面包括凸缘的一侧。 液体通道形成在靠近凸缘和下表面的盘形体中。 流体通道联接到轴的传热流体导管。 在盘状体的上表面上形成有多个槽,并且通过盘状体中的孔与轴的真空管道连接。 气体导管通过盘状体形成并将轴的气体导管连接到盘形体的圆柱形外表面。 盘状体中的气体导管具有与盘状体的中心线大致垂直的取向。
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公开(公告)号:US06926774B2
公开(公告)日:2005-08-09
申请号:US09991317
申请日:2001-11-21
申请人: Ted G. Yoshidome , Joel M. Huston
发明人: Ted G. Yoshidome , Joel M. Huston
IPC分类号: C23C16/448 , C23C16/00
CPC分类号: C23C16/4481
摘要: An apparatus for controlling the flow of liquid material from a liquid material source to a process chamber is disclosed. The apparatus comprises an injector/vaporizer disposed proximate to the process chamber. The injector/vaporizer includes one or more piezoelectric grids located proximate to a vaporization chamber. The one or more piezoelectric grids function to control the flow of liquid material into the vaporization chamber. Each piezoelectric grid includes interlocking arrays of stripes attached to a frame.
摘要翻译: 公开了一种用于控制液体材料从液体材料源流向处理室的装置。 该装置包括靠近处理室设置的喷射器/蒸发器。 喷射器/蒸发器包括位于蒸发室附近的一个或多个压电栅极。 一个或多个压电栅格用于控制液体材料进入蒸发室的流动。 每个压电栅格包括连接到框架的互锁条纹阵列。
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公开(公告)号:US06179277B2
公开(公告)日:2001-01-30
申请号:US09064359
申请日:1998-02-27
申请人: Joel M. Huston , Fufa Chen
发明人: Joel M. Huston , Fufa Chen
IPC分类号: B01F304
CPC分类号: C23C16/448 , C23C16/4481
摘要: The present invention provides for improved liquid vaporizer systems and methods for their use. Vaporizer systems of the present invention are likely to be particularly useful for the vaporization of liquids having a relatively low vapor pressure, such as TDMAT. In one preferred embodiment, a liquid vaporizer system (10) includes a vaporizer unit (16) having first and second inlets (50 and 60) and an outlet (62). The vaporizer system further includes a vessel (22) having an inlet (70) and an outlet (72), whereby the vessel inlet is operably connected to the vaporizer outlet. The vessel contains a plurality of passages (78) which operably connect the vessel inlet and the vessel outlet. In this manner, liquids and/or gases flowing into the vaporizer unit through either or both of its two inlets, exit the vaporizer unit outlet and enter the vessel inlet. Liquids and/or gases pass through the plurality of passages and exit the vessel outlet. In this manner, heating vaporizer unit and vessel to desired temperatures results in the vaporization of the liquid, such as liquid TDMAT.
摘要翻译: 本发明提供改进的液体蒸发器系统及其使用方法。 本发明的蒸发器系统可能特别可用于蒸发具有较低蒸气压的液体,例如TDMAT。 在一个优选实施例中,液体蒸发器系统(10)包括具有第一和第二入口(50和60)和出口(62)的蒸发器单元(16)。 蒸发器系统还包括具有入口(70)和出口(72)的容器(22),由此容器入口可操作地连接到蒸发器出口。 容器包含可操作地连接容器入口和容器出口的多个通道(78)。 以这种方式,通过其两个入口中的一个或两个流入蒸发器单元的液体和/或气体离开蒸发器单元出口并进入容器入口。 液体和/或气体通过多个通道并离开容器出口。 以这种方式,使加热蒸发器单元和容器达到所需温度导致液体(例如液体TDMAT)的蒸发。
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公开(公告)号:US10593539B2
公开(公告)日:2020-03-17
申请号:US13457421
申请日:2012-04-26
摘要: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A flange extends radially outward from the cylindrical outer surface. A fluid channel is formed in the disk-shaped body and is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves formed in the upper surface are coupled by a hole to the vacuum conduit of the shaft. A gas conduit formed through the disk-shaped body couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body.
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公开(公告)号:US20090095334A1
公开(公告)日:2009-04-16
申请号:US12257104
申请日:2008-10-23
申请人: Joel M. Huston
发明人: Joel M. Huston
IPC分类号: B08B3/10
CPC分类号: H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要: A method and apparatus for removing native oxides from a substrate surface is provided. In one embodiment, the apparatus for removing native oxides from a substrate surface includes a showerhead assembly. One embodiment of a showerhead assembly includes a hollow cylinder, a disc and an annular mounting flange. The hollow cylinder has a top wall, a bottom wall, an inner diameter wall and an outer diameter wall. The disc has a top surface and a lower surface. The top surface is coupled to the inner diameter wall. The lower surface is coupled to the bottom wall. The disc has a plurality of apertures connecting the lower surface to the top surface. The annular mounting flange extends from the outer diameter wall of the hollow cylinder. The mounting flange has an upper surface and a lower surface. The upper surface is coplanar with the top wall of the hollow cylinder. The lower surface having an elevation above the top surface of the disc. In another embodiment, a resistive heater is embedded in the hollow cylinder proximate the disc.
摘要翻译: 提供了一种从衬底表面去除天然氧化物的方法和装置。 在一个实施例中,用于从衬底表面去除天然氧化物的装置包括喷头组件。 喷头组件的一个实施例包括中空圆柱体,圆盘和环形安装凸缘。 中空圆筒具有顶壁,底壁,内径壁和外径壁。 盘具有顶表面和下表面。 顶表面联接到内径壁。 下表面联接到底壁。 盘具有将下表面连接到顶表面的多个孔。 环形安装凸缘从中空圆筒的外径壁延伸。 安装凸缘具有上表面和下表面。 上表面与中空圆柱体的顶壁共面。 下表面在盘的顶表面上方具有高度。 在另一个实施例中,电阻加热器嵌入在靠近盘的中空圆筒中。
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公开(公告)号:US06332601B1
公开(公告)日:2001-12-25
申请号:US09721337
申请日:2000-11-22
申请人: Joel M. Huston , Fufa Chen
发明人: Joel M. Huston , Fufa Chen
IPC分类号: B01F304
CPC分类号: C23C16/448 , C23C16/4481
摘要: The present invention provides for improved liquid vaporizer systems and methods for their use. Vaporizer systems of the present invention are likely to be particularly useful for the vaporization of liquids having a relatively low vapor pressure, such as TDMAT. In one preferred embodiment, a liquid vaporizer system (10) includes a vaporizer unit (16) having first and second inlets (50 and 60) and an outlet (62). The vaporizer system further includes a vessel (22) having an inlet (70) and an outlet (72), whereby the vessel inlet is operably connected to the vaporizer outlet. The vessel contains a plurality of passages (78) which operably connect the vessel inlet and the vessel outlet. In this manner, liquids and/or gases flowing into the vaporizer unit through either or both of its two inlets, exit the vaporizer unit outlet and enter the vessel inlet. Liquids and/or gases pass through the plurality of passages and exit the vessel outlet. In this manner, heating vaporizer unit and vessel to desired temperatures results in the vaporization of the liquid, such as liquid TDMAT.
摘要翻译: 本发明提供改进的液体蒸发器系统及其使用方法。 本发明的蒸发器系统可能特别可用于蒸发具有较低蒸气压的液体,例如TDMAT。 在一个优选实施例中,液体蒸发器系统(10)包括具有第一和第二入口(50和60)和出口(62)的蒸发器单元(16)。 蒸发器系统还包括具有入口(70)和出口(72)的容器(22),由此容器入口可操作地连接到蒸发器出口。 容器包含可操作地连接容器入口和容器出口的多个通道(78)。 以这种方式,通过其两个入口中的一个或两个流入蒸发器单元的液体和/或气体离开蒸发器单元出口并进入容器入口。 液体和/或气体通过多个通道并离开容器出口。 以这种方式,使加热蒸发器单元和容器达到所需温度导致液体(例如液体TDMAT)的蒸发。
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公开(公告)号:US08343307B2
公开(公告)日:2013-01-01
申请号:US12257104
申请日:2008-10-23
申请人: Joel M. Huston
发明人: Joel M. Huston
CPC分类号: H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要: A method and apparatus for removing native oxides from a substrate surface is provided. In one embodiment, the apparatus for removing native oxides from a substrate surface includes a showerhead assembly. One embodiment of a showerhead assembly includes a hollow cylinder, a disc and an annular mounting flange. The hollow cylinder has a top wall, a bottom wall, an inner diameter wall and an outer diameter wall. The disc has a top surface and a lower surface. The top surface is coupled to the inner diameter wall. The lower surface is coupled to the bottom wall. The disc has a plurality of apertures connecting the lower surface to the top surface. The annular mounting flange extends from the outer diameter wall of the hollow cylinder. The mounting flange has an upper surface and a lower surface. The upper surface is coplanar with the top wall of the hollow cylinder. The lower surface having an elevation above the top surface of the disc. In another embodiment, a resistive heater is embedded in the hollow cylinder proximate the disc.
摘要翻译: 提供了一种从衬底表面去除天然氧化物的方法和装置。 在一个实施例中,用于从衬底表面去除天然氧化物的装置包括喷头组件。 喷头组件的一个实施例包括中空圆柱体,圆盘和环形安装凸缘。 中空圆筒具有顶壁,底壁,内径壁和外径壁。 盘具有顶表面和下表面。 顶表面联接到内径壁。 下表面联接到底壁。 盘具有将下表面连接到顶表面的多个孔。 环形安装凸缘从中空圆筒的外径壁延伸。 安装凸缘具有上表面和下表面。 上表面与中空圆柱体的顶壁共面。 下表面在盘的顶表面上方具有高度。 在另一个实施例中,电阻加热器嵌入在靠近盘的中空圆筒中。
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