公开(公告)号：US20060107693A1

公开(公告)日：2006-05-25

申请号：US10543093

申请日：2004-01-21

申请人： Martin Trommer ,  Stefan Ochs ,  Jurgen Schafer ,  Bodo Kuhn ,  Bruno Uebbing ,  Heinz Bauscher

发明人： Martin Trommer ,  Stefan Ochs ,  Jurgen Schafer ,  Bodo Kuhn ,  Bruno Uebbing ,  Heinz Bauscher

IPC分类号： C03B19/06

CPC分类号： C03C3/06 ,  C03B19/1415 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/34

摘要： The invention relates to a previously known method for producing synthetic silica glass, comprising the following steps: a gas stream containing a vaporizable initial substance, which can be converted into SiO2 by means of oxidation or flame hydrolysis, is formed; the gas stream is delivered to a reaction zone in which the initial substance is converted so as to form amorphous SiO2 particles; the amorphous SiO2 particles are deposited on a support so as to form an SiO2 layer; and the SiO2 is vitrified during or following deposition of the SiO2 particles in order to obtain the silica glass. The aim of the invention is to create an economical method for producing synthetic silica glass, which is characterized by a favorable damaging behavior towards short-wave UV radiation while being particularly suitable for producing an optical component used for transmitting high-energy ultraviolet radiation having a wavelength of 250 nm or less. Said aim is achieved by using a mixture of a monomeric silicon compound containing a singular Si atom and an oligomeric silicon compound containing several Si atoms as an initial substance, provided that the oligomeric silicon compound in the mixture contributes less than 70 percent to the total silicon content.

摘要翻译： 本发明涉及一种先前已知的合成石英玻璃生产方法，包括以下步骤：通过氧化或火焰水解将含有可汽化的初始物质的气流转化成SiO 2， 形成了; 将气流输送到其中初始物质被转化以形成无定形SiO 2颗粒的反应区; 无定形SiO 2颗粒沉积在载体上以形成SiO 2层; 并且在沉积SiO 2颗粒期间或之后，SiO 2 SiO 2被玻璃化以获得石英玻璃。 本发明的目的是创造一种经济的合成石英玻璃的制造方法，其特征在于对短波紫外线辐射具有良好的破坏作用，同时特别适用于生产用于传输高能紫外线辐射的光学部件， 波长250nm以下。 所述目的通过使用含有单数Si原子的单体硅化合物和含有多个Si原子的低聚硅化合物的混合物作为初始物质来实现，条件是混合物中的低聚硅化合物对总硅的贡献小于70％ 内容。

公开(公告)号：US07082790B2

公开(公告)日：2006-08-01

申请号：US10310279

申请日：2002-12-05

申请人： Bodo Kühn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Gero Fischer ,  Ulla Holst

发明人： Bodo Kühn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Gero Fischer ,  Ulla Holst

IPC分类号： C03B8/04

CPC分类号： C03B19/1469 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

摘要： The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, Δn, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its OH-content, minimal and maximal hydrogen contents, COH, CH2min, and CH2max, respectively, with P being the pulse number and ε being the energy density: COH [wt-ppm]=1,700×ε[mJ/cm2]0.4±50,  (2) CH2min [molecules/cm3]=1×106ε2 P,  (3) CH2max [molecules/cm3]=2×1018ε.  (4) The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses.

公开(公告)号：US07080527B2

公开(公告)日：2006-07-25

申请号：US10310349

申请日：2002-12-05

申请人： Bodo Kühn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Stephan Thomas ,  Steffen Kaiser ,  Jan Vydra

发明人： Bodo Kühn ,  Bruno Uebbing ,  Martin Trommer ,  Stefan Ochs ,  Stephan Thomas ,  Steffen Kaiser ,  Jan Vydra

IPC分类号： C03B8/04

CPC分类号： C03C4/0071 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

摘要： The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, Δn, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, CH2min, CH2max, and COH, respectively, with P being the pulse number and ε being the energy density (in mJ/cm2): CH2min [molecules/cm3]=1×106ε2P,  (2) CH2max [molecules/cm3]=2×1018ε,  (3) COH [wt-ppm]=1,700×ε[mJ/cm2]0.4±50.  (4) The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

公开(公告)号：US08245542B2

公开(公告)日：2012-08-21

申请号：US12801378

申请日：2010-06-04

申请人： Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

发明人： Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

IPC分类号： C03B37/018

CPC分类号： C03B19/01 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/04

摘要： A known method for producing synthetic quartz glass comprises the method steps: (a) forming a cylindrical SiO2 soot body having an inner portion and at least one free cylinder jacket surface surrounding the inner portion; (b) thermally drying the porous soot body; and (c) vitrifying the dried soot body with formation of the cylinder from synthetic quartz glass. Starting therefrom, to indicate a method which permits a particularly flat radial distribution in the inner portion of the cylinder, it is suggested according to the invention that the dried SiO2 soot body that is present after method step b) should be subjected to a homogenizing method prior to vitrification, the homogenizing method comprising the following steps: (I) heating the soot body to a consolidation temperature to form a sealing layer in the area of the at least one cylinder jacket, the sealing layer sealing the inner portion to the outside; (II) cooling the soot body from the consolidation temperature; and (III) annealing the soot body in the range of a homogenization temperature during a period of at least 5 hours so that the radial profile of the hydroxyl group concentration flattens in the inner portion.

摘要翻译： 用于生产合成石英玻璃的已知方法包括以下方法步骤：（a）形成具有内部部分和围绕内部部分的至少一个自由圆筒形护套表面的圆柱形SiO 2烟灰体; （b）热干燥多孔烟炱体; 和（c）通过合成石英玻璃形成圆筒来使干燥的烟灰体玻璃化。 从此开始，为了表示允许气缸内部特别平坦的径向分布的方法，根据本发明，建议在方法步骤b）之后存在的干燥的SiO 2烟炱体应经受均匀化方法 在玻璃化之前，均化方法包括以下步骤：（I）将烟灰体加热至固化温度，以在至少一个气缸套的区域中形成密封层，密封层将内部部分密封到外部; （II）从固结温度冷却烟灰体; 和（III）在均匀化温度范围内在至少5小时的时间内使烟灰体退火，使得羟基浓度的径向分布在内部变平。

公开(公告)号：US07007510B2

公开(公告)日：2006-03-07

申请号：US10731186

申请日：2003-12-09

申请人： Tetsuji Ueda ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Martin Trommer ,  Stefan Ochs

发明人： Tetsuji Ueda ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Martin Trommer ,  Stefan Ochs

IPC分类号： C03C23/00

CPC分类号： C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  Y10T428/131 ,  Y10T428/24612

摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

摘要翻译： 本发明的目的是提供一种改进的坯料，使得可以获得高均匀性的光学构件，并提供用于热处理高度均匀的合成石英坯的容器和热处理方法。 在本发明的第一方面，提供了一种特殊设计的坯件，其显示出凹形外表面。 在本发明的第二方面，提供了一种用于热处理坯料的特殊设计容器，由此将中心处的发热度设定为高于周围环境的热量。

公开(公告)号：US20110183138A1

公开(公告)日：2011-07-28

申请号：US12737468

申请日：2009-07-16

申请人： Martin Trommer ,  Stefan Ochs ,  Juergen Weber ,  Waltraud Werdecker ,  Norbert Traeger ,  Helmut Leber

发明人： Martin Trommer ,  Stefan Ochs ,  Juergen Weber ,  Waltraud Werdecker ,  Norbert Traeger ,  Helmut Leber

IPC分类号： C03B20/00 ,  C03B17/04 ,  C03B19/06 ,  C03B19/09

CPC分类号： C03B19/1095 ,  C03B17/04 ,  C03B19/095 ,  C03B19/106 ,  C03B2201/24 ,  Y02P40/57 ,  Y10T428/268 ,  Y10T428/2982

摘要： In a known method for producing quartz glass that is doped with nitrogen, an SiO2 base product is prepared in the form of SiO2 grains or in the form of a porous semi-finished product produced from the SiO2 grains and the SiO2 base product is processed into the quartz glass with the nitrogen chemically bound therein in a hot process in an atmosphere containing a reaction gas containing nitrogen. From this starting point, a method is provided for achieving nitrogen doping in quartz glass with as high a fraction of chemically bound nitrogen as possible. This object is achieved according to the invention in that a nitrogen oxide is used as the nitrogen-containing reaction gas, and that a SiO2 base product is used that in the hot process has a concentration of oxygen deficient defects of at least 2×1015 cm−3, wherein the SiO2 base product comprises SiO2 particles having an average particle size in the range of 200 nm to 300 μm (D50 value).

摘要翻译： 在制造掺杂有氮的石英玻璃的已知方法中，SiO 2基底产物以SiO 2晶粒的形式制备，或以由SiO 2晶粒生成的多孔半成品的形式制备，将SiO 2基产物加工成 在含有含氮反应气体的气氛中，在热过程中氮化学结合的石英玻璃。 从这个起点，提供了一种在石英玻璃中实现氮掺杂的方法，尽可能高的一部分化学键合的氮。 根据本发明的目的是根据本发明实现氮氧化物作为含氮反应气体，并且使用SiO 2基产物，其在热处理中具有至少2×1015cm的缺氧缺陷浓度 -3，其中SiO 2基产物包含平均粒度在200nm至300μm（D50值）范围内的SiO 2颗粒。

公开(公告)号：US20100307197A1

公开(公告)日：2010-12-09

申请号：US12801378

申请日：2010-06-04

申请人： Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

发明人： Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

IPC分类号： C03B37/018

CPC分类号： C03B19/01 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/04

摘要： A known method for producing synthetic quartz glass comprises the method steps: (a) forming a cylindrical SiO2 soot body having an inner portion and at least one free cylinder jacket surface surrounding the inner portion; (b) thermally drying the porous soot body; and (c) vitrifying the dried soot body with formation of the cylinder from synthetic quartz glass. Starting therefrom, to indicate a method which permits a particularly flat radial distribution in the inner portion of the cylinder, it is suggested according to the invention that the dried SiO2 soot body that is present after method step b) should be subjected to a homogenizing method prior to vitrification, the homogenizing method comprising the following steps: (I) heating the soot body to a consolidation temperature to form a sealing layer in the area of the at least one cylinder jacket, the sealing layer sealing the inner portion to the outside; (II) cooling the soot body from the consolidation temperature; and (III) annealing the soot body in the range of a homogenization temperature during a period of at least 5 hours so that the radial profile of the hydroxyl group concentration flattens in the inner portion.

摘要翻译： 用于生产合成石英玻璃的已知方法包括以下方法步骤：（a）形成具有内部部分和围绕内部部分的至少一个自由圆筒形护套表面的圆柱形SiO 2烟灰体; （b）热干燥多孔烟炱体; 和（c）通过合成石英玻璃形成圆筒来使干燥的烟灰体玻璃化。 从此开始，为了表示允许气缸内部特别平坦的径向分布的方法，根据本发明，建议在方法步骤b）之后存在的干燥的SiO 2烟炱体应经受均匀化方法 在玻璃化之前，均化方法包括以下步骤：（I）将烟灰体加热至固化温度，以在至少一个气缸套的区域中形成密封层，密封层将内部部分密封到外部; （II）从固结温度冷却烟灰体; 和（III）在均匀化温度范围内在至少5小时的时间内使烟灰体退火，使得羟基浓度的径向分布在内部变平。

公开(公告)号：US20100091360A1

公开(公告)日：2010-04-15

申请号：US12449790

申请日：2008-02-20

申请人： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

发明人： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

IPC分类号： G02B13/14 ,  C03C17/00 ,  G02B1/02

CPC分类号： C03B19/1453 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03C3/06 ,  C03C2201/10 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3441 ,  C03C2201/40 ,  G03F7/70958

摘要： To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.

摘要翻译： 为了提供石英玻璃的光学部件，用于在250nm以下的工作波长下用于浸没式光刻的投影物镜，该成分被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应含有1〜60重量ppm的羟基和化学键合的氮，石英玻璃的平均氢含量应在5×1015的范围内 分子/ cm至1×1017分子/ cm 3。

公开(公告)号：US20070248522A1

公开(公告)日：2007-10-25

申请号：US11788007

申请日：2007-04-18

申请人： Bodo Kuehn ,  Stefan Ochs

发明人： Bodo Kuehn ,  Stefan Ochs

IPC分类号： C01B33/00 ,  C30B29/18

CPC分类号： C04B35/14 ,  C03C10/0009 ,  C04B35/645 ,  C04B2235/6565 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/94 ,  C04B2235/95 ,  C04B2235/9661

摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for Making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.

摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的紫外线辐射的低吸收性材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm和30μm之间的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。

公开(公告)号：US07691766B2

公开(公告)日：2010-04-06

申请号：US11788007

申请日：2007-04-18

申请人： Bodo Kuehn ,  Stefan Ochs

发明人： Bodo Kuehn ,  Stefan Ochs

IPC分类号： C04B35/00 ,  C04B35/14 ,  C04B35/16 ,  C01B15/14 ,  C01B33/12

CPC分类号： C04B35/14 ,  C03C10/0009 ,  C04B35/645 ,  C04B2235/6565 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/94 ,  C04B2235/95 ,  C04B2235/9661

摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.

摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的UV辐射的吸收低的材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm至30μm的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。