公开(公告)号：US08915999B2

公开(公告)日：2014-12-23

申请号：US12446913

申请日：2007-09-26

申请人： Masahiro Okesaku ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Takaaki Matsuoka ,  Toshihisa Nozawa ,  Atsutoshi Inokuchi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Takaaki Matsuoka ,  Toshihisa Nozawa ,  Atsutoshi Inokuchi ,  Kiyotaka Ishibashi

IPC分类号： C23C16/455 ,  H01J37/32 ,  H01L21/3065

CPC分类号： H01J37/3244 ,  C23C16/45565 ,  C23C16/45568 ,  H01J37/32192 ,  H01J37/32449 ,  H01J37/32477 ,  H01J37/3255

摘要： A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.

摘要翻译： 喷淋板设置在等离子体处理装置的处理室中，等离子体激发气体释放到处理室中以产生等离子体。 具有多个直径为20μm至70μm的气体释放孔的陶瓷构件和/或具有气体连通方向上连通的最大直径不大于75μm的孔的多孔气体连通体被烧结 并且与用作等离子体激发气体的释放路径的多个垂直孔的每一个的内部一体地结合。

公开(公告)号：US20100178775A1

公开(公告)日：2010-07-15

申请号：US12446913

申请日：2007-09-26

申请人： Masahiro Okesaku ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Takaaki Matsuoka ,  Toshihisa Nozawa ,  Atsutoshi Inokuchi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Takaaki Matsuoka ,  Toshihisa Nozawa ,  Atsutoshi Inokuchi ,  Kiyotaka Ishibashi

IPC分类号： H01L21/465 ,  C23C16/00 ,  C23C16/511 ,  H01L21/469 ,  C23F1/00 ,  C23F1/08 ,  C23C16/455 ,  B28B1/44

CPC分类号： H01J37/3244 ,  C23C16/45565 ,  C23C16/45568 ,  H01J37/32192 ,  H01J37/32449 ,  H01J37/32477 ,  H01J37/3255

摘要： A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.

摘要翻译： 喷淋板设置在等离子体处理装置的处理室中，等离子体激发气体释放到处理室中以产生等离子体。 具有多个直径为20μm至70μm的气体释放孔的陶瓷构件和/或具有气体连通方向上连通的最大直径不大于75μm的孔的多孔气体连通体被烧结 并且与用作等离子体激发气体的释放路径的多个垂直孔的每一个的内部一体地结合。

公开(公告)号：US20100230387A1

公开(公告)日：2010-09-16

申请号：US12308333

申请日：2007-06-13

申请人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

IPC分类号： C23F1/08 ,  C23C16/00 ,  C23F1/00 ,  C23C16/455 ,  C23C16/511 ,  B22F3/12 ,  B28B1/00

CPC分类号： B05B1/18 ,  C23C16/45565 ,  C23C16/45568 ,  C23C16/511 ,  H01J37/3244 ,  H01J37/32449

摘要： Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate 105, which is arranged in processing chamber 102 of a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing body 114 having a pore that communicates in the gas flow direction is fixed onto longitudinal hole 112 used as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body 114, is 10 μm or lower.

摘要翻译： 可以更完全地防止等离子体的逆流等离子体的发生或等离子体激发的点火，能够提供有效的等离子体激发的喷淋板。 在布置在等离子体处理装置的处理室102中的喷淋板105中，将用于等离子体激发的气体排放到处理室中，具有气体流动方向连通的孔的多孔气体通过体114被固定在所使用的纵向孔112​​上 作为用于等离子体激发的气体的放电路径。 由与多孔气体通过体114连通的孔形成的气体流路中的窄径的孔径为10μm以下。

公开(公告)号：US20100288439A1

公开(公告)日：2010-11-18

申请号：US12675273

申请日：2008-08-21

申请人： Kiyotaka Ishibashi ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Masahiro Okesaku

发明人： Kiyotaka Ishibashi ,  Tadahiro Ohmi ,  Tetsuya Goto ,  Masahiro Okesaku

IPC分类号： H01L21/465 ,  C23C16/50 ,  C23C16/511 ,  C23C16/455 ,  H01L21/46 ,  B26F1/00

CPC分类号： C23C16/45565 ,  C23C16/50 ,  H01J37/32192 ,  H01J37/3244 ,  H01J37/32449 ,  Y10T83/0481

摘要： A disclosed top plate that is configured as a solid part and provided in an opening in a ceiling portion of a plasma process chamber whose inside is evacuatable to vacuum includes plural gas conduits formed in a horizontal direction of the top plate; and gas ejection holes that are open in a first surface of the top plate, the first surface facing the inside of the plasma process chamber and in gaseous communication with the plural gas conduits.

摘要翻译： 被构造为实心部分并且设置在内部可抽真空的等离子体处理室的顶部的开口中的公开的顶板包括在顶板的水平方向上形成的多个气体导管; 以及在顶板的第一表面中敞开的气体喷射孔，第一表面面对等离子体处理室的内部并与多个气体管道气体连通。

公开(公告)号：US20090311869A1

公开(公告)日：2009-12-17

申请号：US12374405

申请日：2007-07-18

申请人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

IPC分类号： H01L21/465 ,  C23C16/455 ,  H05H1/46 ,  B29C65/02

CPC分类号： C23C16/45565 ,  H01J37/3244

摘要： Provided is a shower plate capable of more securely preventing the occurrence of backflow of plasma and enabling efficient plasma excitation. A shower plate 106 is disposed in a processing chamber 102 of a plasma processing apparatus and is provided with a plurality of gas discharge holes 113a for discharging a plasma excitation gas to generate plasma in the processing chamber 102, wherein an aspect ratio of a length of the gas discharge hole to a hole diameter thereof (length/hole diameter) is equal to or greater than about 20. The gas discharge holes 113a are made of ceramics members 113 which are separated from the shower plate 106, and the ceramics members 113 are installed in vertical holes 105 opened in the shower plate 106.

摘要翻译： 提供一种能够更可靠地防止等离子体回流的发生并能够实现有效的等离子体激发的喷淋板。 喷淋板106设置在等离子体处理装置的处理室102中，并且设置有多个用于排出等离子体激发气体以在处理室102中产生等离子体的气体排出孔113a，其中长度 气体排出孔的孔径（长度/孔径）为大于等于20°。排气孔113a由与喷淋板106分离的陶瓷部件113构成，陶瓷部件113为 安装在在淋浴板106上打开的垂直孔105中。

公开(公告)号：US08372200B2

公开(公告)日：2013-02-12

申请号：US12308333

申请日：2007-06-13

申请人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

IPC分类号： C23C16/455 ,  C23C16/00 ,  H01L21/3065

CPC分类号： B05B1/18 ,  C23C16/45565 ,  C23C16/45568 ,  C23C16/511 ,  H01J37/3244 ,  H01J37/32449

摘要： Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate 105, which is arranged in processing chamber 102 of a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing body 114 having a pore that communicates in the gas flow direction is fixed onto longitudinal hole 112 used as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body 114, is 10 μm or lower.

摘要翻译： 可以更完全地防止等离子体的逆流等离子体的发生或等离子体激发的点火，能够提供有效的等离子体激发的喷淋板。 在布置在等离子体处理装置的处理室102中的喷淋板105中，将用于等离子体激发的气体排放到处理室中，具有气体流动方向连通的孔的多孔气体通过体114被固定在所使用的纵向孔112​​上 作为用于等离子体激发的气体的放电路径。 由与多孔气体通过体114连通的孔形成的气体流路中的窄径的孔径为10μm以下。

公开(公告)号：US20090286405A1

公开(公告)日：2009-11-19

申请号：US12304289

申请日：2007-06-13

申请人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

发明人： Masahiro Okesaku ,  Tetsuya Goto ,  Tadahiro Ohmi ,  Kiyotaka Ishibashi

IPC分类号： H01L21/3065 ,  C23C16/00 ,  H01L21/30 ,  B01J19/08

CPC分类号： H01J37/32449 ,  C23C16/455 ,  C23C16/45565 ,  C23C16/45572 ,  C23C16/511 ,  H01J37/3244

摘要： Provided is a shower plate in which there's no need for a cover plate. The shower plate 105 is disposed in a processing chamber 102 of a plasma processing apparatus, for discharging a plasma excitation gas to generate plasma in the processing chamber 102, and the shower plate 105 includes a horizontal hole 111 for introducing the plasma excitation gas into the shower plate 105 from a gas inlet port 110 of the plasma processing apparatus; and a vertical hole 112 communicating with the horizontal hole 111, wherein the shower plate 105 is formed as a single body.

摘要翻译： 提供了不需要盖板的淋浴板。 喷淋板105设置在等离子体处理装置的处理室102中，用于在处理室102中排出等离子体激发气体以产生等离子体，并且喷淋板105包括用于将等离子体激发气体引入到等离子体激发气体的水平孔111 来自等离子体处理装置的气体入口110的喷淋板105; 以及与水平孔111连通的垂直孔112，其中喷淋板105形成为单体。

公开(公告)号：US20090000742A1

公开(公告)日：2009-01-01

申请号：US11911781

申请日：2006-04-14

申请人： Masahiro Okesaku ,  Tadahiro Ohmi

发明人： Masahiro Okesaku ,  Tadahiro Ohmi

IPC分类号： H01L21/306 ,  H01L21/30 ,  C04B35/64 ,  B23P13/00

CPC分类号： B24B5/485 ,  B24B1/04 ,  C04B35/111 ,  C04B35/6455 ,  C04B2235/3206 ,  C04B2235/3225 ,  C04B2235/3229 ,  C04B2235/77 ,  C04B2235/945 ,  C23C16/45565 ,  Y10T29/49996

摘要： Disclosed is a shower plate which is formed with a large number of process-gas blowing holes having a simple structure, high machinability and high dimensional accuracy without the risk of unevenness in blowing of a process gas and outbreak of particles, while ensuring constant quality and interchangeability. Through a press forming process, a powder for a ceramic material with a low dielectric constant is formed into a disc-shaped compact having dimensions determined in consideration of a sintering shrinkage value and a machining value. A gas inlet passage 3 and a large number of blowing holes 2 for a compact stage are bored in the disc-shaped compact, and then the disc-shaped compact is sintered. Subsequently, the gas inlet passage 3 and a main hole portion 2b in each of the blowing holes are subjected to grinding to have a surface roughness of Is or less. Further, a lapping wire having a taper-shaped end is inserted into an outlet port 2a of the blowing hole 2, and reciprocatingly moved while being slidingly displaced in such a manner that a portion of the lapping wire located in the outlet port 2a is gradually increased in wire diameter, so that the outlet port 2a is lapped to have a diameter of from 0.1 mm to less than 0.3 mm, a dimensional accuracy within ±0.002 mm, and a surface roughness of 1 s or less.

摘要翻译： 公开了一种喷淋板，其形成有具有简单结构，高机械加工性和高尺寸精度的大量处理气体吹扫孔，而不会发生处理气体的吹送不均匀和颗粒物爆发的危险，同时确保恒定的质量和 互换性。 通过冲压成形工艺，将具有低介电常数的陶瓷材料粉末形成为具有考虑到烧结收缩值和加工值确定的尺寸的圆盘状压块。 在圆盘状压块中钻入气体入口通道3和大量用于紧凑级的吹气孔2，然后烧结圆盘形压块。 随后，将每个吹气孔中的气体入口通道3和主孔部分2b进行研磨以使其表面粗糙度为等于或等于等。 此外，具有锥形端的研磨线被插入到吹风孔2的出口2a中，并且以滑动位移的方式往复运动，使得位于出口2a中的研磨线的一部分逐渐 线径增加，使得出口2a被研磨成具有0.1mm至小于0.3mm的直径，±0.002mm的尺寸精度和1s或更小的表面粗糙度。

公开(公告)号：US20110287851A1

公开(公告)日：2011-11-24

申请号：US13147512

申请日：2010-02-01

申请人： Masahiro Okesaku

发明人： Masahiro Okesaku

IPC分类号： A63B69/36 ,  A63B21/00

CPC分类号： A63B21/0615 ,  A63B21/0617 ,  A63B21/08 ,  A63B21/159 ,  A63B21/4035 ,  A63B21/4047 ,  A63B21/4049 ,  A63B23/03525 ,  A63B69/365

摘要： Provided is a golf swing training apparatus suited to strengthen target muscles in various body regions necessary for golf swings, and train a proper swing form. The apparatus is designed to, when a user performs a golf swing motion while grasping a grip 24 of a golf swing mechanism 7 whose height position is adjustable depending on a body height of a user, allow the grip to be moved along an arc, and transmit the arc movement of the grip from a swing-arm holder 8 to a weight-arm holder 17 to which a weight arm 18 is fixed, through a swing-power transmission shaft 12, so as to swingingly move the weight arm 18 about an axis of the weight-arm holder 17 to allow a weight member 19 on the weight arm 18 to act as a load countering golf swing power. The apparatus has a mechanism capable of allowing the load based on the weight member fastened to the weight arm to be arbitrarily adjusted depending on individual differences in muscle strength.

摘要翻译： 提供一种高尔夫挥杆训练装置，适用于加强高尔夫挥杆所需的各种身体部位的目标肌肉，并训练适当的摆动形式。 该设备被设计成当用户执行高尔夫挥杆运动时抓住高尔夫挥杆机构7的握持部24，高尔夫挥杆机构7的高度位置可根据使用者的身高调节，允许手柄沿着弧线移动，并且 通过摆动传动轴12将把手的摆动从摆臂保持器8传递到固定有重锤臂18的重量臂保持件17，以使重锤臂18围绕 重量臂保持件17的轴线，以允许配重臂18上的配重件19作为抵抗高尔夫挥杆动力的负载。 该装置具有能够根据肌肉力量的个体差异任意调整基于固定在重锤上的重量构件的负荷的机构。

公开(公告)号：US4987930A

公开(公告)日：1991-01-29

申请号：US381709

申请日：1989-07-05

申请人： Masahiro Okesaku ,  Michito Miyahara ,  Ryosuke Ataka ,  Tooru Nakagawa

发明人： Masahiro Okesaku ,  Michito Miyahara ,  Ryosuke Ataka ,  Tooru Nakagawa

IPC分类号： D03D47/30

CPC分类号： D03D47/302 ,  Y10S239/19

摘要： An auxiliary nozzle for a loom, such as an air jet loom within a shuttleless loom, jets pressurized gas in order to prevent stall of weft inserted into warp shedding. At least a tip portion of an auxiliary nozzle body is formed of ceramics material having a very small integrally-molded surface roughness of 0.5 .mu.m or less and having characteristics of high toughness and high strength whereby occurrence of flaws in warp can be minimized and woven fabric of high quality can be obtained. Particularly, by employment of particular zirconia-type ceramics, the moldability, processing properties for drilling and wear resistance can be improved.

摘要翻译： PCT No.PCT / JP88 / 01023 Sec。 371日期：1989年7月5日 102（e）日期1989年7月5日PCT Filed 1988年10月6日PCT Pub。 公开号WO89 / 04390 日期1989年5月18日。用于织机的辅助喷嘴，例如无梭织机内的喷气织机，喷射加压气体，以防止插入经纱脱落的纬纱失速。 辅助喷嘴体的至少尖端部由陶瓷材料形成，该陶瓷材料具有非常小的0.5μm以下的整体成型表面粗糙度，并且具有高韧性和高强度的特性，从而可以使经纱中的缺陷发生最小化和编织 可以获得高质量的织物。 特别地，通过使用特定的氧化锆型陶瓷，可以提高成型性，钻孔加工性能和耐磨性。