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    Charged particle beam apparatus and automatic astigmatism adjustment method
    3.
    发明授权
    Charged particle beam apparatus and automatic astigmatism adjustment method 有权
    带电粒子束装置和自动散光调节方法

    公开(公告)号：US07348558B2

    公开(公告)日：2008-03-25

    申请号：US11404610

    申请日：2006-04-13

    申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    IPC分类号： G01N23/00

    CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

    摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

    摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

    Charged particle beam apparatus and automatic astigmatism adjustment method
    4.
    发明授权
    Charged particle beam apparatus and automatic astigmatism adjustment method 有权
    带电粒子束装置和自动散光调节方法

    公开(公告)号：US07030394B2

    公开(公告)日：2006-04-18

    申请号：US10980096

    申请日：2004-11-02

    申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    IPC分类号： G01B11/00

    CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

    摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

    摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

    Charged particle beam apparatus and automatic astigmatism adjustment method
    5.
    发明授权
    Charged particle beam apparatus and automatic astigmatism adjustment method 有权
    带电粒子束装置和自动散光调节方法

    公开(公告)号：US06825480B1

    公开(公告)日：2004-11-30

    申请号：US09603459

    申请日：2000-06-22

    申请人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    发明人： Masahiro Watanabe ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Masami Iizuka ,  Yasuhiro Gunji ,  Kouichi Hayakawa ,  Masayoshi Takeda

    IPC分类号： G01B1100

    CPC分类号： G01R31/307 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2817

    摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

    摘要翻译： 根据本发明，用于自动调整带电粒子束装置中的像散的技术。 根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点 来自相对较少数量的二维图像的单一操作。 具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。 实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

    Pattern inspection method and apparatus using electron beam
    8.
    发明授权
    Pattern inspection method and apparatus using electron beam 失效
    使用电子束的图案检查方法和装置

    公开(公告)号：US06614022B2

    公开(公告)日：2003-09-02

    申请号：US09908713

    申请日：2001-07-20

    申请人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

    发明人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

    IPC分类号： H01J37244

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2817

    摘要： In the detecting system for irradiating the electron beam and detecting the secondary electron thereof, an area of the detector is an important factor for high-speed detection. For the technique of the current electron optical system and detector, a detector of the area larger than a constant area is necessary and detection of 200 Msps or more by receiving limitation on the frequency inversely proportional to the area is substantially difficult. For example, for detection at 400 Msps under the condition that the required area is 4 mm square and the rate for 4 mm square is defined as 150 Msps, four discrete high-speed detectors of 2 mm square are arranged to amplify and then add the signals for A/D conversion. Otherwise, the secondary electron is sequentially inputted to the detector of 8 mm square with the secondary electron deflector, the secondary electron is detected at 100 Msps and arranged after the A/D conversion. In any case, the area of 4 mm square and rate of 400 Msps can be attained.

    摘要翻译： 在用于照射电子束并检测其二次电子的检测系统中，检测器的面积是高速检测的重要因素。 对于当前电子光学系统和检测器的技术，需要一个大于恒定面积的区域的检测器，并且通过接收与该区域成反比的频率的限制来检测200 Msps以上是非常困难的。例如，对于 在所需面积为4平方毫米，4平方毫米的速率定义为150 Msps的条件下，以400 Msps进行检测，放置4个离散高速2 mm的高速检测器，放大，然后将A / D转换。 否则，二次电子依次输入到具有二次电子偏转器的8mm正方形的检测器，二次电子以100Msps检测并且在A / D转换之后排列。 在任何情况下，可以获得4平方毫米的面积和400 Msps的面积。