摘要:
An active matrix liquid crystal display includes a rectangular array of picture elements driven by data and scan drivers. Each picture element includes a liquid crystal display element connected to the output of a unity gain buffer amplifier. The input of the amplifier is connected to a hold capacitor and to series connected gate transistors. The gates of the transistors are connected to a scan electrode and the transistors are connected in series between a data electrode and the input of the amplifier. The output of the amplifier is connected to the connection between the transistors.
摘要:
A thin-film transistor circuit, which is used as a driving circuit for driving pixels in an image display, is constituted of a plurality of thin-film transistors that are formed on an insulating substrate. In each thin-film transistor, a conductive electrode is placed so as to face a gate electrode with a channel region of a polycrystal silicon thin-film that forms an active layer located in between. Here, a constant voltage is applied to the conductive electrode. When threshold voltage is shifted by applying a voltage to the conductive electrode, it is possible to allow the absolute value of the threshold voltage of n-channel-type transistors and the absolute value of the threshold voltage of p-channel-type transistors to become virtually equal to each other. Moreover, it is possible to properly set the threshold voltage in accordance with factors such as the channel length of the thin-film transistors, the types of circuits that are constituted of the thin-film transistors and voltages to be applied to the thin-film transistors. Thus, it becomes possible to remarkably improve the characteristics of thin-film transistor circuits, such as operation speeds and holding characteristics.
摘要:
A group III nitride semiconductor optical device 11a has a group III nitride semiconductor substrate 13 having a main surface 13a forming a finite angle with a reference plane Sc orthogonal to a reference axis Cx extending in a c-axis direction of the group III nitride semiconductor and an active layer 17 of a quantum-well structure, disposed on the main surface 13a of the group III nitride semiconductor substrate 13, including a well layer 28 made of a group III nitride semiconductor and a plurality of barrier layers 29 made of a group III nitride semiconductor. The main surface 13a exhibits semipolarity. The active layer 17 has an oxygen content of at least 1×1017 cm−3 but not exceeding 8×1017 cm−3. The plurality of barrier layers 29 contain an n-type impurity other than oxygen by at least 1×1017 cm−3 but not exceeding 1×1019 cm−3 in an upper near-interface area 29u in contact with a lower interface 28Sd of the well layer 28 on the group III nitride semiconductor substrate side.
摘要:
Provided is a chemical sensor requiring no ion-sensitive film. Specifically provided is a chemical sensor (1) for detecting a sample base material (19) to be detected in a sample, the chemical sensor (1) including: a sensor TFT (7) of sensor TFTs (7) each of which has a glass substrate (8) and, on the glass substrate (8), a gate electrode (10), a gate oxide film (11), a silicon layer (12), a source electrode (14), and a drain electrode (15), the silicon layer (12) having a channel region (18) at an opening portion between the source electrode (14) and the drain electrode (15); and extracting signal lines PAS1 to PASn and a sensor signal amplifying and extracting circuit (24) that extract a leak current that is generated in the channel region (18).
摘要:
A plurality of pixel circuits are provided on a TFT-side substrate 11, light blocking layers 15 and light blocking layer openings 16 are provided between the pixel circuits, and optical sensors 17 are arranged at positions where the light blocking layers 15 are provided. Light blocking layers 18 are also provided at opposing portions of the opposite substrate 12, and light reflecting units 19 are provided correspondingly to the optical sensors 17. In the normal state, backlight BL that has passed through the TFT-side substrate 11 is reflected by the light reflecting unit 19 and falls on the optical sensor 17. When the front surface of the liquid crystal panel is pressed, the two substrates come close to each other, the light reflection direction in the light reflecting unit 19 changes, and the intensity of light detected by the optical sensor 17 changes. By subjecting the obtained sensor image to an image recognition process, it is possible to eliminate the effect of the external light and detect the touch position on the display screen with high accuracy.
摘要:
An electronic device, and a corresponding light emission control method for the electronic device, emit light by utilizing recombination of electrons and holes the device and method input a pulse-shaped driving signal having a duty ratio higher than or equal to 0.7 and lower than 1.0 and thereby causing light to be emitted intermittently. When an electron density is denoted by n, a hole density by p, a thermal velocity of electrons by Vth:n, a thermal velocity of holes by Vth:p, an electron capture cross section of a defect level by σn, a hole capture cross section of a defect level by σp, and a pulse width of the driving signal by W, the input driving signal has a pulse width W that satisfies W
摘要翻译:电子设备和相应的电子设备的发光控制方法通过利用电子和空穴的复合来发光,该装置和方法输入占空比高于或等于0.7且低于1.0的脉冲驱动信号 从而间歇地发光。 当电子密度由n表示时,空穴密度为p,电子的热速度为Vth:n,空穴的热速度为Vth:p,缺陷水平的电子捕获截面为&sgr; n,a 缺陷电平的孔捕获截面为&sgr; p,驱动信号的脉冲宽度为W,输入驱动信号的脉冲宽度W满足W <1 / {n·vth:n·&sgr; n· p·vth:p·&sgr; p /(n·vth:n·&sgr; n + p·vth:p·&sgr; p)}。
摘要:
In a voltage regulator, a reference voltage generating circuit generates a reference voltage. A drive transistor is connected between a first power supply terminal and an output terminal and has a control terminal. A voltage divider generates a feedback voltage which is an intermediate voltage between voltages at the output terminal and a first power supply terminal. A differential amplifier generates an error voltage in accordance with the feedback voltage of the voltage divider and the reference voltage, and transmits it to the control terminal of the drive transistor. An oscillation preventing capacitor is connected between the control of the drive transistor and the output terminal. A capacitor is connected between the first power supply terminal and the first input of the differential amplifier.
摘要:
A security administration server providing various security services in the LAN and a host server operating in connection thereto are provided. There is installed a security administration server (S) having a function for collecting various log information managed in various devices to be monitored (C) operating in the LAN, a function for generating an image by extracting information useful for security management of the LAN from collected log information and visualizing such information to a form easy for a person to use, and a function for sending the image to another monitoring device (C). Further, the security administration server (S) provides various security services in connection with a host server (H) operating in an external network.
摘要:
A method for is provided forming a thin-film transistor (TFT) on a flexible substrate. The method comprises: supplying a metal foil substrate such as titanium (Ti), Inconel alloy, stainless steel, or Kovar, having a thickness in the range of 10 to 500 microns; depositing and annealing amorphous silicon to form polycrystalline silicon; and, thermally growing a gate insulation film overlying the polycrystalline. The silicon annealing process can be conducted at a temperature greater than 700 degrees C. using a solid-phase crystallization (SPC) annealing process. Thermally growing a gate insulation film includes: forming a polycrystalline silicon layer having a thickness in the range of 10 to 100 nanometers (nm); and, thermally oxidizing the film at temperature in the range of 900 to 1150 degrees for a period of time in the range of 2 to 60 minutes. Alternately, a plasma oxide layer is deposited over a thinner thermally oxidized layer.
摘要:
A multi-pattern shadow mask, shadow mask laser annealing system, and a multi-pattern shadow mask method for laser annealing are provided. The method comprises: supplying a silicon substrate; supplying a multi-pattern shadow mask with a plurality of aperture patterns; creating substrate alignment marks; with respect to the alignment marks, laser annealing a substrate region in a plurality of aperture patterns; forming a corresponding plurality of polysilicon regions; and, forming a corresponding plurality of transistor channel regions in the plurality of polysilicon regions. Typically, the shadow mask includes a plurality of sections, with each section having at least one aperture pattern. A shadow mask section can be selected to create a corresponding aperture pattern. If the mask section includes a plurality of aperture patterns, the selection of a section creates all the corresponding aperture patterns in the selected section.