公开(公告)号：US07828504B2

公开(公告)日：2010-11-09

申请号：US11432923

申请日：2006-05-12

申请人： Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin R. LaFontaine ,  Michael R. Mitrano

发明人： Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin R. LaFontaine ,  Michael R. Mitrano

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  H01L21/67265 ,  H01L21/67294 ,  H01L21/67748

摘要： A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.

摘要翻译： 提供一种组合式加载锁定装置，其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。 用于支撑工件的支撑构件设置在腔室的内部部分内，其中平移装置可操作地联接到其上。 翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件，其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性，和/ 或其翻译。 可以基于一个或多个检测到的特性以预定方式进一步旋转工件。 在腔室的内部部分中进一步限定凹部，其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。

公开(公告)号：US20070264105A1

公开(公告)日：2007-11-15

申请号：US11432923

申请日：2006-05-12

申请人： Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin LaFontaine ,  Michael Mitrano

发明人： Michel Pharand ,  Klaus Becker ,  Klaus Petry ,  Marvin LaFontaine ,  Michael Mitrano

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  H01L21/67265 ,  H01L21/67294 ,  H01L21/67748

摘要： A combination load lock apparatus is provided, wherein a chamber is coupled to two or more valves in selective fluid communication with two or more respective volumes. A support member for supporting a workpiece is disposed within an interior portion of the chamber, wherein a translation apparatus is operably coupled thereto. The translation apparatus is operable to rotate and/or translate the workpiece on the support member about and/or along a first axis, wherein a detection apparatus associated with the chamber is operable to detect one or more characteristics of the workpiece during the rotation and/or translation thereof. The workpiece may be further rotated in a predetermined manner based on the one or more detected characteristics. A recess is further defined in the interior portion of the chamber, wherein the translation apparatus is operable to translate the workpiece into and out of the recess to reduce particulate contamination thereon.

摘要翻译： 提供一种组合式加载锁定装置，其中腔室与两个或更多个相应体积选择性流体连通的两个或更多个阀联接。 用于支撑工件的支撑构件设置在腔室的内部部分内，其中平移装置可操作地联接到其上。 翻译装置可操作以沿着第一轴线旋转和/或平移在支撑构件上的工件，其中与腔室相关联的检测装置可操作以在旋转期间检测工件的一个或多个特性，和/ 或其翻译。 可以基于一个或多个检测到的特性以预定方式进一步旋转工件。 在腔室的内部部分中进一步限定凹部，其中平移装置可操作以将工件平移到凹槽中并减少其中的颗粒污染物。

公开(公告)号：US20130020940A1

公开(公告)日：2013-01-24

申请号：US13187905

申请日：2011-07-21

申请人： Klaus Becker ,  Klaus Petry ,  Piotr Lubicki

发明人： Klaus Becker ,  Klaus Petry ,  Piotr Lubicki

IPC分类号： H01J7/44

CPC分类号： H01J37/241 ,  H01J27/022 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/0206 ,  H02H9/02

摘要： Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode and an ion source assembly. The high voltage power supply is enclosed in the pressure tank and drives the ion source assembly. The thermionic diode is comprised of an insulating tube disposed between the ion source assembly enclosure and the output of the high voltage power supply and makes use of existing ion source assembly components to limit damage to the power supply during arc failures of the ion source assembly.

摘要翻译： 公开了一种用于离子源组件的浪涌保护系统。 该系统包括与热离子二极管和离子源组件串联耦合的高压电源。 高压电源封装在压力罐中并驱动离子源组件。 热离子二极管包括设置在离子源组件外壳和高压电源的输出之间的绝缘管，并且利用现有的离子源组件部件来限制离子源组件的电弧故障期间对电源的损坏。

公开(公告)号：US08766209B2

公开(公告)日：2014-07-01

申请号：US13187905

申请日：2011-07-21

申请人： Klaus Becker ,  Klaus Petry ,  Piotr Lubicki

发明人： Klaus Becker ,  Klaus Petry ,  Piotr Lubicki

IPC分类号： H01J27/00

CPC分类号： H01J37/241 ,  H01J27/022 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/0206 ,  H02H9/02

摘要： Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode and an ion source assembly. The high voltage power supply is enclosed in the pressure tank and drives the ion source assembly. The thermionic diode is comprised of an insulating tube disposed between the ion source assembly enclosure and the output of the high voltage power supply and makes use of existing ion source assembly components to limit damage to the power supply during arc failures of the ion source assembly.

摘要翻译： 公开了一种用于离子源组件的浪涌保护系统。 该系统包括与热离子二极管和离子源组件串联耦合的高压电源。 高压电源封装在压力罐中并驱动离子源组件。 热离子二极管包括设置在离子源组件外壳和高压电源的输出之间的绝缘管，并且利用现有的离子源组件部件来限制离子源组件的电弧故障期间对电源的损坏。

公开(公告)号：US07105840B2

公开(公告)日：2006-09-12

申请号：US11049913

申请日：2005-02-03

申请人： Klaus Becker ,  Werner Baer ,  Klaus Petry

发明人： Klaus Becker ,  Werner Baer ,  Klaus Petry

IPC分类号： G21K5/10 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J27/08 ,  H01J37/3171

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面 其接收来自源的气体和通向电弧室的气体出口。 电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。 气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。

公开(公告)号：US20060169921A1

公开(公告)日：2006-08-03

申请号：US11049913

申请日：2005-02-03

申请人： Klaus Becker ,  Werner Baer ,  Klaus Petry

发明人： Klaus Becker ,  Werner Baer ,  Klaus Petry

IPC分类号： H01J37/317 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J27/08 ,  H01J37/3171

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面 其接收来自源的气体和通向电弧室的气体出口。 电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。 气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。

公开(公告)号：US20060033045A1

公开(公告)日：2006-02-16

申请号：US10917597

申请日：2004-08-13

申请人： Klaus Petry ,  Joseph Ferrara ,  Klaus Becker

发明人： Klaus Petry ,  Joseph Ferrara ,  Klaus Becker

IPC分类号： H01J37/317 ,  H01J37/20

CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J37/304 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/20242 ,  H01J2237/24528 ,  H01J2237/31703

摘要： Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.

摘要翻译： 还提出了测量系统和方法，用于在处理室中的工件位置处沿着曲线路径的多个点处测量扫描离子束。 所示的剂量测定系统包括传感器和安装设备，其支撑传感器并且选择性地将传感器定位在沿着曲线路径的多个点处，其中安装设备可以选择性地将传感器定位成朝向扫描离子束的顶点 。

公开(公告)号：US06992309B1

公开(公告)日：2006-01-31

申请号：US10917597

申请日：2004-08-13

申请人： Klaus Petry ,  Joseph Ferrara ,  Klaus Becker

发明人： Klaus Petry ,  Joseph Ferrara ,  Klaus Becker

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J37/304 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/20242 ,  H01J2237/24528 ,  H01J2237/31703

摘要： Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.

摘要翻译： 还提出了测量系统和方法，用于在处理室中的工件位置处沿着曲线路径的多个点处测量扫描离子束。 所示的剂量测定系统包括传感器和安装设备，其支撑传感器并且选择性地将传感器定位在沿着曲线路径的多个点处，其中安装设备可以选择性地将传感器定位成朝向扫描离子束的顶点 。

公开(公告)号：US08722431B2

公开(公告)日：2014-05-13

申请号：US13426785

申请日：2012-03-22

申请人： Nilay Anil Pradhan ,  Stanislav S. Todorov ,  Kurt Decker-Lucke ,  Klaus Petry ,  Benjamin Colombeau ,  Baonian Guo

发明人： Nilay Anil Pradhan ,  Stanislav S. Todorov ,  Kurt Decker-Lucke ,  Klaus Petry ,  Benjamin Colombeau ,  Baonian Guo

IPC分类号： H01L21/00

CPC分类号： H01L29/66795 ,  H01L21/26513 ,  H01L21/76243

摘要： A method of forming a FinFET device. The method may include providing a substrate having a single crystalline region, heating the substrate to a substrate temperature effective for dynamically removing implant damage during ion implantation, implanting ions into the substrate while the substrate is maintained at the substrate temperature, and patterning the single crystalline region so as to form a single crystalline fin.

摘要翻译： 一种形成FinFET器件的方法。 该方法可以包括提供具有单晶区域的衬底，将衬底加热到​​衬底温度以有效地在离子注入期间动态地去除注入损伤，在将衬底保持在衬底温度的同时将离子注入到衬底中，并且使单晶 以形成单晶翅片。

公开(公告)号：US20140061180A1

公开(公告)日：2014-03-06

申请号：US13603881

申请日：2012-09-05

申请人： Klaus Petry ,  James Carroll

发明人： Klaus Petry ,  James Carroll

IPC分类号： H02N13/00 ,  H05B1/00

CPC分类号： H05B3/0047 ,  H01L21/67115 ,  H01L21/6831 ,  H01L21/68757

摘要： An electrostatic chuck is formed using materials that are optically transparent to a range of frequencies, such as infrared radiation. The invention discloses several methods for achieving optical transparency. The chuck electrode can be formed having a mesh pattern designed with a specific open area percentage to provide adequate wafer clamping force while still allowing sufficient levels of infrared radiation to pass through. Alternatively, the chuck electrode can also be made from a transparent conductive film. A workpiece is disposed on one surface of the chuck, and a radiative heat source is positioned on the opposite side of the chuck. A reflector plate may be used to reflect the infrared radiation toward the chuck and the wafer. The spacing of the radiation sources and the shape of the reflector plate may be modified to focus more radiation on a particular portion of the workpiece if desired.

摘要翻译： 使用在诸如红外辐射的频率范围上光学透明的材料形成静电卡盘。 本发明公开了几种获得光学透明度的方法。 卡盘电极可以形成为具有以特定开口面积百分比设计的网格图案，以提供足够的晶片夹紧力，同时仍然允许足够的红外辐射通过。 或者，卡盘电极也可以由透明导电膜制成。 工件设置在卡盘的一个表面上，辐射热源位于卡盘的相对侧。 可以使用反射板来将红外辐射反射到卡盘和晶片。 如果需要，可以修改辐射源的间隔和反射板的形状以将更多的辐射聚焦在工件的特定部分上。