摘要:
Cement dispersion agents containing a graft copolymer composed of four kinds of constituent unit each having a specified structure can provide improved fluidity to cementing compositions, prevent slump loss after the kneading process and reduce the drying shrinkage of hardened concrete produced at the same time.
摘要:
Ultra high-strength hydraulic cement compositions with extremely low water-to-cement ratio of 10-30% and having high fluidity and improved capability of preventing slump loss, from which high-quality ultra high-strength hardened concrete and mortar can be obtained with superior workability, contain a binder composed of cement or a mixture of cement and a microscopic powder admixture, aggregates, water and a cement dispersion agent composed of water-soluble vinyl copolymers obtained by aqueous solution radical polymerization of five specified kinds of monomers at a ratio within a specified range The unit content of the binder is 400-1300kg/m.sup.3, the water-to-binder ratio is 10-30% and the content of cement dispersion agent is 0.1-2.0 weight parts for 100 weight parts of the binder.
摘要:
Fluidizing property is provided to a hyraulic cement composition by adding a cement dispersion agent to the composition by 0.01-2 weight % with respect to its solid cement component. The cement dispersion agent contains a water-soluble vinyl copolymer which is obtainable by copolymerization of at least first monomer shown by Formula A given below, second monomer shown by Formula B given below and third monomer shown by Formula C given below at copolymerization rate of 10-50/3-25/80-40 by weight: ##STR1## where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are H or CH.sub.3, R.sup.5 is alkyl group with 1-3 carbon atoms, M.sup.1 and M.sup.2 are alkali metal, alkali earth metal, ammonium or organic amine, and n is an integer in the range 5-25. Such a dispersion agent is produced by aqueous solution polymerization of monomers of these kinds at a weight ratio within the range given above in the presence of a radical polymerization initiating agent.
摘要:
A cement dispersion agent contains a water-soluble vinyl copolymer having numerical average molecular weight of 2000-15000 which is obtainable by copolymerization of at least three kinds of monomers shown by Formulas A, B and C given below at copolymerization ratio of 10-50/3-25/80-40 by weight: ##STR1## where R.sup.1, R.sup.2, and R.sup.3 are H or CH.sub.3, R.sup.4 is alkyl group with 1-3 carbon atoms, M.sup.1 and M.sup.2 are alkali metal, alkali earth metal, ammonium or organic amine, and n is an integer in the range 5-25. Such a dispersion agent is produced by aqueous solution polymerization of monomers of these kinds at a weight ratio within the range given above in the presence of a radical polymerization initiating agent. Fluidizing property can be provided to a hydraulic cement composition like concrete, cement paste and mortar by adding an agent of this invention by 0.01-0.2 wt % by solid cement component.
摘要:
In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.
摘要:
A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation. The phase-shifting photomask blank thus prepared is subjected to a patterning treatment to form a phase-shifting photomask.
摘要:
The present invention provides a polyimide film whose residual content of volatiles is reduced to not more than 0.45 weight % on the basis of the film, and further a polyimide film whose residual content of volatiles is reduced to not more than 0.45 weight % on the basis of the film and whose oxygen/carbon ratio in the surface layer is increased by 0.01-0.1, and manufacturing methods therefor.According to the present invention, it is possible to provide a polyimide film improved in adhesion performance in a stable and homogeneous manner, and this improvement of adhesion performance is attainable in the film-forming process, not in a separate process of after-treatment.
摘要:
A polyimide film produced by forming a film from a raw material incorporated with a finely divided inorganic powder that forms minute projections on the film surface and subsequently subjecting the film to corona discharge treatment. According to this invention, it is possible to obtain a heat-resistant polyimide film having improved adhesive properties and uniform bond strength. The film does not cause blocking when wound into a roll.
摘要:
To record data in a flash memory, upon detecting that a current destination memory block is full, a control apparatus records data in a destination memory block one block by one block, with “in-advance” data erasure of the next memory block and by determining if data erasure of the next memory block is successful. When data erasure of the next memory block fails, such memory block is designated as broken, and such memory block is excluded from a group of blocks to be used as recording destination. After determining the data erasure result of a yet-next memory block is successful, the required data is copied to the yet-next memory block. Therefore, even when one of the blocks is broken, a sequential data recording in the flash memory is performed without increasing the number of data copy operations between blocks.
摘要:
In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.