Method of producing styren polymers using high speed catalytic dispersion technology
    1.
    发明申请
    Method of producing styren polymers using high speed catalytic dispersion technology 失效
    使用高速催化分散技术生产苯乙烯聚合物的方法

    公开(公告)号:US20060247398A1

    公开(公告)日:2006-11-02

    申请号:US11396763

    申请日:2006-04-03

    IPC分类号: C08F4/44

    摘要: Provided is a method of preparing styrene polymers, the method comprising: homogeneously mixing a styrene monomer; a cocatalyst mixture of Group 13 metal-containing organic metal compound cocatalyst and an inert organic solvent; and a catalyst mixture of a metallocene catalyst and the inert organic solvent using a high speed homogenizing mixer to obtain a homogenized mixture; and providing the homogenized mixture to a reactor to initiate polymerization. In this method, catalyst is quickly dispersed among monomers using a high speed homogenizing mixer so that formation of gel, which occurs when a syndiotactic styrene polymer is produced, can be fundamentally prevented. In addition, a styrene polymer prepared using the method has high activity, good stereoregularity, and uniform molecular distribution.

    摘要翻译: 提供一种制备苯乙烯聚合物的方法,该方法包括:均匀混合苯乙烯单体; 含13族金属的有机金属化合物助催化剂和惰性有机溶剂的助催化剂混合物; 和茂金属催化剂和惰性有机溶剂的催化剂混合物,使用高速匀浆混合机得到均质混合物; 并将均匀的混合物提供到反应器以引发聚合。 在该方法中,使用高速匀浆混合器将催化剂快速分散在单体中,从而可以从根本上防止在产生间规苯乙烯聚合物时发生凝胶的形成。 此外,使用该方法制备的苯乙烯聚合物具有高活性,良好的立构规整性和均匀的分子分布。

    Temperature measuring device
    2.
    发明申请

    公开(公告)号:US20060284723A1

    公开(公告)日:2006-12-21

    申请号:US11453117

    申请日:2006-06-14

    IPC分类号: H01C3/04

    CPC分类号: G01K3/14 G01K1/14 G01K7/02

    摘要: Disclosed is a temperature measuring device. The temperature measuring device includes: a thermo-well tube; and a cable or wire type temperature measuring means which is installed in a thermo-well tube, wherein temperature measuring means has temperature detecting sensors disposed at an intermediate portion thereof, and the temperature detecting sensors can be moved axially in the thermo-well tube by applying tension to both ends of the cable or wire type temperature measuring means. The present invention also provides a reaction tube in which the temperature measuring device is disposed axially, and a reactor including at least one temperature measuring device or reaction tube as described above.

    Method for producing (meth) acrylic acid

    公开(公告)号:US20050192464A1

    公开(公告)日:2005-09-01

    申请号:US11061019

    申请日:2005-02-18

    IPC分类号: C07C51/43 C07C51/42 C07C51/48

    CPC分类号: C07C51/48 C07C57/04

    摘要: The present invention relates to a method for producing (meth)acrylic acid comprising a process of recovering (meth)acrylic acid as an aqueous (meth)acrylic acid from a (meth)acrylic acid-containing gas mixture produced by the catalytic gas phase oxidation of at least one reactant selected from the group consisting of propane, propylene, isobutylene and (meth)acrolein, and a system usable for the method. The recovery process comprises the steps of: (1) feeding the (meth)acrylic acid-containing gas mixture into a quenching tower and condensing it in the quenching tower so as to recover an aqueous (meth)acrylic acid solution from the bottom of the quenching tower, in which some of the recovered aqueous solution of (meth)acrylic acid is recycled to the top part of the quenching tower so as to condense the (meth)acrylic acid-containing gas mixture; (2) passing the uncondensed part of the (meth)acrylic acid-containing gas mixture from the quenching tower through the top of the quenching tower to an absorption column; (3) absorbing (meth)acrylic acid contained in the uncondensed part of the (meth)acrylic acid-containing gas mixture in the absorption column with a absorption solvent; (4) feeding the (meth)acrylic acid solution resulting from the absorption in the step (3) to a desorption column; and (5) separating the solvent used in the step (3) from the (meth)acrylic acid solution in the desorption column, so that the substance from which the solvent has been removed in the desorption column is fed to the quenching tower, and the separated solvent is recycled to the absorption column. The inventive method is an efficient and economic method which allows a reduction in energy consumption in subsequent purification processes by maximizing the concentration of an aqueous solution of (meth)acrylic solution recovered at the bottom of the quenching tower and minimizing the concentration of (meth)acrylic acid lost from the vent gas of the absorption column.

    LIQUID CRYSTAL DISPLAY DEVICE
    4.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
    液晶显示装置

    公开(公告)号:US20070046856A1

    公开(公告)日:2007-03-01

    申请号:US11552289

    申请日:2006-10-24

    IPC分类号: G02F1/1335

    摘要: An LCD device has scratch-resistant property without using a protection sheet and can provide enhanced brightness. The LCD device includes a light path regulating member. The member includes a first prism sheet having first prisms of which apex has a round shape. The first prism sheet concentrates light supplied from a lamp to output the concentrated light. An anti-glare polarizing plate uniformly polarizes polarized planes of the concentrated light and provides the polarized light to the lower substrate. The anti-glare polarizing plate is arranged below the lower substrate of an LCD panel, and an uppermost prism sheet of optical sheets is non-matte-treated and has round-treated apexes. In spite of the absence of the protection sheet, the scratch-resistant property of the uppermost prism sheet and the brightness of the LCD panel may be enhanced.

    摘要翻译: 液晶显示装置具有耐刮擦性能,不使用保护片,可提供更高的亮度。 LCD装置包括光路调节部件。 该构件包括具有顶点具有圆形形状的第一棱镜的第一棱镜片。 第一棱镜片集中从灯提供的光以输出集中的光。 抗眩光偏光板使聚光的偏振面均匀地偏振,并向下基板提供偏振光。 防眩光偏振板配置在LCD面板的下基板的下方,最上方的光学片棱镜片未经磨光处理,具有圆形处理的顶点。 尽管不存在保护片,但是可以提高最上面的棱镜片的耐擦伤性和LCD面板的亮度。

    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
    5.
    发明申请
    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor 审中-公开
    用于薄膜沉积的反应器和使用反应器在晶片上沉积薄膜的方法

    公开(公告)号:US20050158469A1

    公开(公告)日:2005-07-21

    申请号:US11080748

    申请日:2005-03-15

    摘要: A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top plate disposed to cover the reactor block; a shower head which is mounted on the bottom of the top plate and diffuses gas toward the wafer; and an exhaust unit which exhausts the gas from the reactor block. A first supply pipeline which supplies a first reactant gas and/or an inert gas to the wafer; a second supply pipeline which supplies a second reactant gas and/or an inert gas to the wafer; and a plasma generator which generates plasma between the wafer block and shower head are included. The shower head includes: a first supply path connected to the first supply pipeline; a plurality of first diffuse holes formed in the bottom of the shower head at a constant interval; a first main path formed parallel to the plane of the shower head and connecting the plurality of first diffuse holes and the first supply path; a second supply path connected to the second supply pipeline; a plurality of second diffuse holes formed in the bottom of the shower head at a constant interval as the plurality of the first diffuse holes; and a second main path formed parallel to the plane of the shower head at a different height from the second main path and connecting the plurality of second diffuse holes and the second supply path.

    摘要翻译: 提供了一种用于薄膜沉积的反应器和使用该反应器的薄膜沉积方法。 反应器包括:反应器块,其接收通过晶片传送狭缝转移的晶片; 晶片块,其安装在反应器块中以在其上接收晶片; 设置成覆盖反应器块的顶板; 淋浴头,其安装在顶板的底部并将气体向晶片扩散; 以及从反应器块排出气体的排气单元。 一种向晶片提供第一反应气体和/或惰性气体的第一供应管线; 第二供应管线,其向所述晶片供给第二反应气体和/或惰性气体; 并且包括在晶片块和淋浴头之间产生等离子体的等离子体发生器。 淋浴头包括:连接到第一供应管道的第一供应路径; 以恒定的间隔形成在所述淋浴喷头的底部的多个第一扩散孔; 第一主路径,其平行于所述淋浴头的平面形成,并且连接所述多个第一扩散孔和所述第一供给路径; 连接到第二供应管线的第二供应路径; 多个第二扩散孔,作为多个第一扩散孔以恒定的间隔形成在所述淋浴喷头的底部; 以及第二主路径,其与所述淋浴喷头的平面平行,与所述第二主路径不同的高度,并且连接所述多个第二扩散孔和所述第二供应路径。

    Novel rumen bacteria variants and process for preparing succinic acid employing the same
    6.
    发明申请
    Novel rumen bacteria variants and process for preparing succinic acid employing the same 有权
    新型瘤胃细菌变异体及使用其制备琥珀酸的方法

    公开(公告)号:US20070054387A1

    公开(公告)日:2007-03-08

    申请号:US10580556

    申请日:2004-05-20

    申请人: Sang Lee Sang Lee

    发明人: Sang Lee Sang Lee

    IPC分类号: C12P7/46 C12N1/20

    CPC分类号: C12P7/46 C12N1/20 C12R1/01

    摘要: The present invention relates to novel rumen bacterial mutants resulted from the disruption of a lactate dehydrogenase gene (ldhA) and a pyruvate formate-lyase gene (pfl) (which are involved in the production of lactic acid, formic acid and acetic acid) from rumen bacteria; a novel bacterial mutant (Mannheimia sp. LPK7) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl), a phosphotransacetylase gene (pta), and a acetate kinase gene (ackA); a novel bacterial mutant (Mannheimia sp. LPK4) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl) and a phosphoenolpyruvate carboxylase gene (ppc) involved in the immobilization of CO2 in a metabolic pathway of producing succinic acid; and a method for producing succinic acid, which is characterized by the culture of the above mutants in anaerobic conditions. The inventive bacterial mutants have the property of producing succinic acid at high concentration while producing little or no organic acids, as compared to the prior wild-type strains of producing various organic acids. Thus, the inventive bacterial mutants are useful as strains for the industrial production of succinic acid.

    摘要翻译: 本发明涉及由瘤胃中的乳酸脱氢酶基因(ldhA)和丙酮酸甲酸裂解酶基因(pfl)(其涉及乳酸,甲酸和乙酸的生产)的破坏而产生的新型瘤胃细菌突变体 菌; 具有乳酸脱氢酶基因(ldhA),丙酮酸甲酸裂解酶基因(pfl),磷酸转乙酰酶基因(pta)和乙酸激酶基因(ackA)的破坏的新型细菌突变体(曼氏血清型LPK7); 具有破坏乳酸脱氢酶基因(ldhA),丙酮酸甲酸裂合酶基因(pfl)和磷酸烯醇丙酮酸羧化酶基因(ppc)的新型细菌突变体(曼氏原乳杆菌LPK4)涉及将CO 2固定在生产代谢途径中 琥珀酸; 以及生产琥珀酸的方法,其特征在于在厌氧条件下培养上述突变体。 与生产各种有机酸的现有野生型菌株相比,本发明的细菌突变体具有以高浓度生产琥珀酸的同时产生很少或不含有机酸的性质。 因此,本发明的细菌突变体可用作工业生产琥珀酸的菌株。

    Shower head and method of fabricating the same
    7.
    发明申请
    Shower head and method of fabricating the same 审中-公开
    淋浴头及其制造方法

    公开(公告)号:US20060201428A1

    公开(公告)日:2006-09-14

    申请号:US11436473

    申请日:2006-05-18

    IPC分类号: C23F1/00 C23C16/00

    摘要: Provided is a shower head used in a reactor for thin film deposition, and a method of fabricating the shower head. The shower head for injecting gases onto a wafer mounted on a wafer block includes: a first supply path supplying a first reaction gas and a second supply path supplying a second reaction gas; a first main path connected to the first supply path and in the plane of the shower head, a plurality of first sub-paths diverging from the first main path in the plane of the shower head, a plurality of first diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of first diffuse paths connecting the plurality of first sub-paths to the plurality of first diffuse holes; a second main path connected to the second supply path in the plane of the shower head and not contacting the first main path, a plurality of second sub-paths diverging from the second main path in the plane of the shower head, a plurality of second diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of second diffuse paths connecting the plurality of second sub-paths and the plurality of second diffuse holes; and a sealing unit sealing open ends of the first and second main paths and open ends of the first and second sub-paths formed in the shower head.

    摘要翻译: 本发明提供一种用于薄膜沉积用反应器的淋浴喷头及其制造方法。 用于将气体喷射到安装在晶片块上的晶片上的喷头包括:供应第一反应气体的第一供应路径和供应第二反应气体的第二供应路径; 连接到第一供应路径并且在淋浴喷头的平面中的第一主路径,从喷淋头的平面中的第一主路径发散的多个第一子路径,多个第一扩散孔,其规则间隔开地形成 淋浴头的底面以及将多个第一子路径连接到多个第一扩散孔的多个第一漫射路径; 第二主路径,其连接到所述淋浴喷头的平面中的所述第二供应路径,并且不接触所述第一主路径;多个第二子路径,其从所述淋浴喷头的平面中的所述第二主路径发散;多个第二主路径, 在喷淋头的底面上规则间隔地形成的扩散孔以及连接多个第二子路径和多个第二扩散孔的多个第二漫射路径; 以及密封单元,密封形成在所述淋浴喷头中的所述第一和第二子路径的所述第一主路径和所述第二主路径的开放端部。

    Light generating unit, display device having the same, and method thereof
    8.
    发明申请
    Light generating unit, display device having the same, and method thereof 审中-公开
    发光单元,具有该发光单元的显示装置及其方法

    公开(公告)号:US20070081355A1

    公开(公告)日:2007-04-12

    申请号:US11502025

    申请日:2006-08-10

    IPC分类号: B64D47/06 F21V5/00

    摘要: A light generating unit includes a plurality of light sources generating lights with different wavelengths. Among the light sources, at least one is disposed on a horizontal surface which differs in height from horizontal surfaces on which the other light sources are disposed. A display device includes the above light generating unit and a display panel for displaying an image by using the lights generated from the light generating unit. A method of improving color uniformity in the display device includes arranging the light sources as in the light generating unit.

    摘要翻译: 光产生单元包括产生具有不同波长的光的多个光源。 在光源中,至少一个设置在与设置其他光源的水平表面不同的水平表面上。 显示装置包括上述光产生单元和用于通过使用从发光单元产生的光来显示图像的显示面板。 改善显示装置中的色彩均匀性的方法包括如光发生单元那样布置光源。

    Diamond tool with metal plate inserted therein
    9.
    发明申请
    Diamond tool with metal plate inserted therein 有权
    镶嵌有金属板的金刚石工具

    公开(公告)号:US20050249560A1

    公开(公告)日:2005-11-10

    申请号:US11118165

    申请日:2005-04-28

    IPC分类号: B23D61/00 B23D61/04 B28D1/12

    摘要: Disclosed is a diamond tool having a metal plate inserted therein. Between abrasive layers containing diamond particles is inserted a ferrous or non-ferrous metal plate having a wear resistance lower than that of the abrasive layers such that a concave groove is spontaneously formed during a cutting process, thereby reducing the contact load with a workpiece to thereby avoid vibration (wobbling) of a shank, and providing a discharge path for smoothly removing cutting chips and the cooling water. In addition, the content of abrasives and the wear resistance of bonding material are uniformly constituted so that the shrinkage rate does not need to be considered during sintering and the manufacturing process can be simplified, thereby reducing the manufacturing cost and improving the productivity therefor. Furthermore, the area of the metal plate can be controlled, thereby enabling an easy design conforming to the working conditions with a workpiece.

    摘要翻译: 公开了一种金刚石工具,其中插入有金属板。 在含有金刚石颗粒的研磨层之间插入耐磨性低于研磨层的耐磨性的铁或非铁金属板,使得在切割过程中自发形成凹槽,从而减少与工件的接触载荷 避免柄的振动(摆动),并且提供用于平滑地去除切屑和冷却水的排出路径。 此外,研磨剂的含量和接合材料的耐磨性均匀地构成,使得在烧结期间不需要考虑收缩率,并且可以简化制造过程,从而降低制造成本并提高其生产率。 此外,可以控制金属板的面积,从而能够使与工件的工作条件相一致的简单设计。

    Backlight assembly and liquid crystal display device using the same

    公开(公告)号:US20060285362A1

    公开(公告)日:2006-12-21

    申请号:US11336027

    申请日:2006-01-20

    IPC分类号: F21V7/04

    摘要: A backlight assembly and a liquid crystal display device can discharge heat from the lamp unit to the outside or effectively dissipate the heat. The backlight assembly of the present invention includes a lamp unit, a receiving member for receiving the lamp unit, a first heat dissipation member disposed below the receiving member, and a second heat dissipation for wrapping around a lateral side of the receiving member and the first heat dissipation member. The lamp unit is disposed on an area corresponding to the lateral side of the receiving member. In one embodiment, the first heat dissipation member is a flat plate made of graphite and disposed on an outer side of the bottom of the receiving member. The second heat dissipation member is metal with good thermal conductivity in close contact with the first heat dissipation member and the lateral side of the receiving member where the lamp unit is disposed. Thus, the heat discharged from the lamp unit can be distributed uniformly over the entire area of the receiving member. In addition, the lateral side of the receiving member where the lamp unit is disposed can be replaced with the second heat dissipation member.