公开(公告)号：US08512934B2

公开(公告)日：2013-08-20

申请号：US12681784

申请日：2008-09-29

申请人： Pascal Hayoz ,  Hitoshi Yamato

发明人： Pascal Hayoz ,  Hitoshi Yamato

IPC分类号： G03F7/004 ,  G03F7/031 ,  G03F7/30 ,  C07C321/28 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039

CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C07C321/28 ,  C07C381/12 ,  C09D4/00 ,  C09D11/101 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

摘要： Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如为氢，R1或COT; T表示T1或O-T2; 例如，T 1和T 2是氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 6 -C 14芳基，C 3 -C 12杂芳基，被一个或多个D，C 2 -C 20烷基取代的C 1 -C 20烷基，被一个或多个 E，被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1，R2，R3，R4，Ra，Rb和Rc为T1; D是例如R5，OR5，SR5或Q1; E例如为O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基，C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L，L1，L2，L3，L4，L5，L6，L7和L8中的至少一个不是氢; 并且（i）T1或T2中的至少一个是组Q; 或（ii）至少一个D为基团Q1; 或（iii）至少一个E为基团Q2; 适合作为光催化剂。

公开(公告)号：US20100297541A1

公开(公告)日：2010-11-25

申请号：US12681786

申请日：2008-09-29

申请人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

发明人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC分类号： G03F1/00 ,  G03F7/004 ,  G03F7/20 ,  C07D409/12 ,  C07D407/12 ,  C07C255/34 ,  C07C321/26

CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D307/64 ,  C07D333/34 ,  G03F7/0007 ,  G03F7/038

摘要： Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US20100297542A1

公开(公告)日：2010-11-25

申请号：US12681784

申请日：2008-09-29

申请人： Pascal Hayoz ,  Hitoshi Yamato

发明人： Pascal Hayoz ,  Hitoshi Yamato

IPC分类号： G03F1/00 ,  C07C321/30 ,  C07D307/68 ,  C07D333/38 ,  G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C07C321/28 ,  C07C381/12 ,  C09D4/00 ,  C09D11/101 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

摘要： Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如为氢，R1或COT; T表示T1或O-T2; 例如，T 1和T 2是氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 6 -C 14芳基，C 3 -C 12杂芳基，被一个或多个D，C 2 -C 20烷基取代的C 1 -C 20烷基，被一个或多个 E，被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1，R2，R3，R4，Ra，Rb和Rc为T1; D是例如R5，OR5，SR5或Q1; E例如为O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基，C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L，L1，L2，L3，L4，L5，L6，L7和L8中的至少一个不是氢; 并且（i）T1或T2中的至少一个是组Q; 或（ii）至少一个D为基团Q1; 或（iii）至少一个E为基团Q2; 适合作为光催化剂。

公开(公告)号：US08652752B2

公开(公告)日：2014-02-18

申请号：US12681785

申请日：2008-09-22

申请人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

发明人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C07D333/00 ,  C07D495/00

CPC分类号： C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

摘要： Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

摘要翻译： 式（I）的化合物，其中L 1，L 1，L'1，L 2，L 2，L'2，L3，L'3，L'3， '4例如是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; 例如，X，X'和X“是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20链烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基， C 18 -C 14芳基，其中R，R'或R“中的至少一个是未取代的或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US20100297540A1

公开(公告)日：2010-11-25

申请号：US12681785

申请日：2008-09-22

申请人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

发明人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC分类号： G03F1/00 ,  C07D409/14 ,  C07D407/14 ,  G03F7/004 ,  G03F7/20

CPC分类号： C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

摘要： Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

摘要翻译： 例如式（I）的化合物，其中L1，L 1，L“1，L2，L'2，L”2，L3，L'3，L“3，L4，L'4和L”4 是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; X，X'和X“例如是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基，C 5 -C 18环烷基杂芳基 C 6 -C 14芳基，条件是R，R'或R“中的至少一个为未取代或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US06770420B2

公开(公告)日：2004-08-03

申请号：US10612800

申请日：2003-07-02

申请人： Kurt Dietliker ,  Martin Kunz ,  Hitoshi Yamato ,  Christoph De Leo

发明人： Kurt Dietliker ,  Martin Kunz ,  Hitoshi Yamato ,  Christoph De Leo

IPC分类号： G03F7004

CPC分类号： C07C309/66 ,  B33Y70/00 ,  C07C309/65 ,  C07D333/22 ,  C07D333/24 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.

摘要翻译： 本发明描述了式1RO的肟烷基磺酸酯化合物的使用是R1-X基团或R2; X是直接键合，氧原子或硫原子; R 1是氢，C 1 -C 4烷基或苯基， 未取代或被选自氯，溴，C 1 -C 4烷基和C 1 -C 4烷氧基的取代基取代; R 2为氢或C 1 -C 4烷基; R 3是未被取代或被一个或多于一个卤素原子取代的直链或支链C 1 -C 12烷基;作为在碱性介质中可显影并对波长340的辐射敏感的化学放大光致抗蚀剂中的感光加成发生剂 至390纳米，并且对应于上述波长范围的相应组合的正和负光致抗蚀剂。

公开(公告)号：US06703182B1

公开(公告)日：2004-03-09

申请号：US09763016

申请日：2001-02-15

申请人： Jean-Luc Birbaum ,  Toshikage Asakura ,  Hitoshi Yamato

发明人： Jean-Luc Birbaum ,  Toshikage Asakura ,  Hitoshi Yamato

IPC分类号： G03C1492

CPC分类号： C09D11/38 ,  B33Y70/00 ,  C07C309/66 ,  C07C309/73 ,  C07C381/00 ,  C09D11/03 ,  C09D11/101 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

摘要： Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and R12 inter alia are C1-C6alkyl or phenyl; upon irradiation react as acid generating compounds and thus are suitable in photoresist applications.

摘要翻译： 其中m为式I，II或III的化合物为0或1; n为1,2或3; R 1特别是未取代或取代的苯基，或萘基，蒽基，菲基，杂芳基或C 2 -C 12烯基; 尤其是亚乙烯基，亚苯基，亚萘基，二亚苯基或氧联二苯基; R2特别是CN，C 1 -C 4卤代烷基，C 2 -C 6烷氧基羰基，苯氧基羰基或苯甲酰基; R3特别是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基，樟脑磺酰基或苯基磺酰基; R'3特别是C 2 -C 12亚烷基二磺酰基，亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; R4和R5特别是氢，卤素，C1-C8烷基，C1-C6烷氧基，C1-C4卤代烷基，CN，NO2，C2-C6烷酰基，苯甲酰基，苯基，-S-苯基，OR6，SR9，NR7R8，C2-C6烷氧基羰基或苯氧基羰基 ; R6尤其是氢，苯基或C 1 -C 12烷基; R 7和R 8尤其是氢或C 1 -C 12烷基; R9尤其是C1-C12烷基; R 10，R 11和R 12特别是C 1 -C 6烷基或苯基; 在照射时作为产生酸的化合物反应，因此适用于光刻胶应用。

公开(公告)号：US06458864B1

公开(公告)日：2002-10-01

申请号：US09701457

申请日：2000-11-27

申请人： Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

发明人： Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

IPC分类号： C08F250

CPC分类号： A61K6/083 ,  B33Y70/00 ,  C08F2/38 ,  C08F2/50 ,  C08K5/0025 ,  C09D7/45 ,  C09D7/65 ,  G03F7/031 ,  C08L53/00 ,  C08L33/00

摘要： Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.

摘要翻译： 具有式I，II，III和IV的链转移基团的化合物是1或2; Ar和Ar1特别是苯基; Ar2特别是亚苯基，这些基团是未取代的或取代的; X是直接键，-O - ， - S-或-N（R6） - ; Y尤其是氢或C 1 -C 12烷基; 当R1和R2为烷氧基时，M1为-NR3R4或-OH，或M1为Ar，或为芳氧基; R1和R2彼此独立地例如。 是C 1 -C 8烷基; R 3和R 4例如是C 1 -C 12烷基，或一起是C 3 -C 7亚烷基; R5尤其是C1-C6亚烷基或直接键; R6是例如氢; 并且Z是二价基团，条件是基团Ar，Ar 1，Ar 2，R 1，R 2，R 3，R 4，R 5或Y中的至少一个被SH基取代;适用于光化学聚合的高分子引发剂的热制备 得到嵌段共聚物。

公开(公告)号：US6004724A

公开(公告)日：1999-12-21

申请号：US104676

申请日：1998-06-25

申请人： Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

发明人： Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

IPC分类号： C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D207/44 ,  C07D213/90 ,  C07D333/34 ,  C07D333/36 ,  C07D333/44 ,  G03F7/004 ,  G03C1/725 ,  C07C249/04 ,  C07C251/32 ,  G03C1/72

CPC分类号： C07D207/44 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D213/90 ,  C07D333/44 ,  G03F7/0045 ,  Y10S430/114 ,  Y10S430/117 ,  Y10S430/12 ,  Y10S430/122

摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.

摘要翻译： 式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基， 亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

公开(公告)号：US20110171569A1

公开(公告)日：2011-07-14

申请号：US12996795

申请日：2009-06-02

申请人： Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

发明人： Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

IPC分类号： G03F7/004 ,  C07D335/08 ,  C07D339/08 ,  C07D413/02 ,  C07D285/16 ,  C07D327/08 ,  C08F228/06 ,  G03F7/20 ,  G03F1/00

CPC分类号： C07D339/08 ,  C07D327/08

摘要： Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X− is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.

摘要翻译： 式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30 - 环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3 - 烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。