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    Sulphonium salt initiators
    1.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US08512934B2

    公开(公告)日：2013-08-20

    申请号：US12681784

    申请日：2008-09-29

    Applicant: Pascal Hayoz ,  Hitoshi Yamato

    Inventor： Pascal Hayoz ,  Hitoshi Yamato

    IPC: G03F7/004 ,  G03F7/031 ,  G03F7/30 ,  C07C321/28 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039

    CPC classification number: G03F7/0045 ,  B33Y70/00 ,  C07C321/28 ,  C07C381/12 ,  C09D4/00 ,  C09D11/101 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

    Abstract translation: 式（I）化合物，其中X为单键，CRaRbO，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如为氢，R1或COT; T表示T1或O-T2; 例如，T 1和T 2是氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 6 -C 14芳基，C 3 -C 12杂芳基，被一个或多个D，C 2 -C 20烷基取代的C 1 -C 20烷基，被一个或多个 E，被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1，R2，R3，R4，Ra，Rb和Rc为T1; D是例如R5，OR5，SR5或Q1; E例如为O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基，C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L，L1，L2，L3，L4，L5，L6，L7和L8中的至少一个不是氢; 并且（i）T1或T2中的至少一个是组Q; 或（ii）至少一个D为基团Q1; 或（iii）至少一个E为基团Q2; 适合作为光催化剂。

    SULPHONIUM SALT INITIATORS
    2.
    发明申请
    SULPHONIUM SALT INITIATORS 审中-公开
    硫酸钡发射器

    公开(公告)号：US20100297541A1

    公开(公告)日：2010-11-25

    申请号：US12681786

    申请日：2008-09-29

    Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    IPC: G03F1/00 ,  G03F7/004 ,  G03F7/20 ,  C07D409/12 ,  C07D407/12 ,  C07C255/34 ,  C07C321/26

    CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07D307/64 ,  C07D333/34 ,  G03F7/0007 ,  G03F7/038

    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    Abstract translation: 式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

    SULPHONIUM SALT INITIATORS
    3.
    发明申请
    SULPHONIUM SALT INITIATORS 有权
    硫酸钡发射器

    公开(公告)号：US20100297542A1

    公开(公告)日：2010-11-25

    申请号：US12681784

    申请日：2008-09-29

    Applicant: Pascal Hayoz ,  Hitoshi Yamato

    Inventor： Pascal Hayoz ,  Hitoshi Yamato

    IPC: G03F1/00 ,  C07C321/30 ,  C07D307/68 ,  C07D333/38 ,  G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/0045 ,  B33Y70/00 ,  C07C321/28 ,  C07C381/12 ,  C09D4/00 ,  C09D11/101 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

    Abstract translation: 式（I）化合物，其中X为单键，CRaRbO，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如为氢，R1或COT; T表示T1或O-T2; 例如，T 1和T 2是氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 6 -C 14芳基，C 3 -C 12杂芳基，被一个或多个D，C 2 -C 20烷基取代的C 1 -C 20烷基，被一个或多个 E，被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1，R2，R3，R4，Ra，Rb和Rc为T1; D是例如R5，OR5，SR5或Q1; E例如为O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基，C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L，L1，L2，L3，L4，L5，L6，L7和L8中的至少一个不是氢; 并且（i）T1或T2中的至少一个是组Q; 或（ii）至少一个D为基团Q1; 或（iii）至少一个E为基团Q2; 适合作为光催化剂。

    Sulphonium salt initiators
    4.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US08652752B2

    公开(公告)日：2014-02-18

    申请号：US12681785

    申请日：2008-09-22

    Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    IPC: G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C07D333/00 ,  C07D495/00

    CPC classification number: C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

    Abstract: Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    Abstract translation: 式（I）的化合物，其中L 1，L 1，L'1，L 2，L 2，L'2，L3，L'3，L'3， '4例如是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; 例如，X，X'和X“是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20链烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基， C 18 -C 14芳基，其中R，R'或R“中的至少一个是未取代的或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

    SULPHONIUM SALT INITIATORS
    5.
    发明申请
    SULPHONIUM SALT INITIATORS 有权
    硫酸钡发射器

    公开(公告)号：US20100297540A1

    公开(公告)日：2010-11-25

    申请号：US12681785

    申请日：2008-09-22

    Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

    IPC: G03F1/00 ,  C07D409/14 ,  C07D407/14 ,  G03F7/004 ,  G03F7/20

    CPC classification number: C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

    Abstract: Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    Abstract translation: 例如式（I）的化合物，其中L1，L 1，L“1，L2，L'2，L”2，L3，L'3，L“3，L4，L'4和L”4 是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; X，X'和X“例如是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基，C 5 -C 18环烷基杂芳基 C 6 -C 14芳基，条件是R，R'或R“中的至少一个为未取代或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

    Heat-sensitive coating compositions based on resorcinyl triazine derivatives
    8.
    发明授权
    Heat-sensitive coating compositions based on resorcinyl triazine derivatives 有权
    基于间苯二酚三嗪衍生物的热敏涂料组合物

    公开(公告)号：US08865620B2

    公开(公告)日：2014-10-21

    申请号：US12529718

    申请日：2008-03-05

    Applicant: Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    Inventor： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    IPC: B41M5/333 ,  C09D5/26 ,  C08K5/3492 ,  C09D7/00

    CPC classification number: B41M5/3335 ,  B41M5/3336 ,  C08K5/3492 ,  C09D5/26 ,  C09D7/41 ,  Y10T428/24802

    Abstract: The present invention provides heat-sensitive coating compositions, which comprise a color developer of formula (1) or mixtures thereof wherein R1 can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain color developers.

    Abstract translation: 本发明提供热敏涂料组合物，其包含式（1）的显色剂或其混合物，其中R 1可以是氢，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基或SO 3 H ，R2和R3可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8，SR 9，SO 3 H或COOR 10和 R4和R5可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8或SR 9，R 6，R 7，R 8 ，R 9和R 10可以相同或不同，并且可以是氢，C 1-30 - 烷基，C 3-8 - 环烷基，C 2-10 - 烯基或芳基，其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基，C 2-10 - 烯基，苯基，卤素，OR 11，NR 12 R 13，SR 14，SO 3 H或COOR 15，芳基可以是未被取代的或被一个或多个卤素取代，C 1-10烷基，卤代C 1-10 - 烷基，C 3-8 - 环烷基C2-10 - 烯基，苯基，OR11，NR12R13，SR14，SO3H或COOR15，其中 在R 11，R 12，R 13，R 14和R 15可以相同或不同，可以是氢，C 1-10 - 烷基，C 3-8 - 环烷基或C 2-10 - 烯基，一种制备这些组合物的方法， 涂覆这些组合物的基材，用这些组合物涂布的基材，使用这些组合物制备标记的基材的方法，通过后一方法获得的标记的底物和某些显色剂。

    Process for the production of strongly adherent coatings
    10.
    发明授权
    Process for the production of strongly adherent coatings 有权
    生产强粘附涂层的方法

    公开(公告)号：US08414982B2

    公开(公告)日：2013-04-09

    申请号：US11792747

    申请日：2005-12-12

    Applicant: Pascal Hayoz ,  Stephan Ilg

    Inventor： Pascal Hayoz ,  Stephan Ilg

    IPC: C08F4/00

    CPC classification number: C07D295/185 ,  B05D3/0446 ,  B05D3/06 ,  B05D3/067 ,  B05D3/08 ,  B05D3/14 ,  B05D3/144 ,  B05D7/04 ,  C07C51/412 ,  C07C69/738 ,  C07C225/22 ,  C07C235/80 ,  C07C323/62 ,  C07F9/54 ,  C08F2/50 ,  C07C59/06

    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.

    Abstract translation: 本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法，其中在第一步骤中，a）使低温等离子体，电晕放电或火焰作用于无机或有机基底上， 在第二步中b）将一种或多种限定的光引发剂或含有至少一种烯键式不饱和基团的单体，或上述物质的溶液，悬浮液或乳液的限定的光引发剂或混合物，优选常压下施用于 无机或有机衬底，第三步骤c）使用合适的方法，将上述物质用电磁波干燥和/或照射，并且任选地在第四步骤d）中，将预处理施加到另外的涂层上。

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