公开(公告)号：US20100297541A1

公开(公告)日：2010-11-25

申请号：US12681786

申请日：2008-09-29

Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC: G03F1/00 ,  G03F7/004 ,  G03F7/20 ,  C07D409/12 ,  C07D407/12 ,  C07C255/34 ,  C07C321/26

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07D307/64 ,  C07D333/34 ,  G03F7/0007 ,  G03F7/038

Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

Abstract translation: 式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US08652752B2

公开(公告)日：2014-02-18

申请号：US12681785

申请日：2008-09-22

Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C07D333/00 ,  C07D495/00

CPC classification number: C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

Abstract: Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

Abstract translation: 式（I）的化合物，其中L 1，L 1，L'1，L 2，L 2，L'2，L3，L'3，L'3， '4例如是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; 例如，X，X'和X“是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20链烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基， C 18 -C 14芳基，其中R，R'或R“中的至少一个是未取代的或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US20100297540A1

公开(公告)日：2010-11-25

申请号：US12681785

申请日：2008-09-22

Applicant: Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

Inventor： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC: G03F1/00 ,  C07D409/14 ,  C07D407/14 ,  G03F7/004 ,  G03F7/20

CPC classification number: C07D307/83 ,  B33Y70/00 ,  C07D307/82 ,  C07D333/22 ,  C07D333/32 ,  C07D333/34 ,  C07D333/64

Abstract: Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

Abstract translation: 例如式（I）的化合物，其中L1，L 1，L“1，L2，L'2，L”2，L3，L'3，L“3，L4，L'4和L”4 是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; X，X'和X“例如是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基，C 5 -C 18环烷基杂芳基 C 6 -C 14芳基，条件是R，R'或R“中的至少一个为未取代或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US06703182B1

公开(公告)日：2004-03-09

申请号：US09763016

申请日：2001-02-15

Applicant: Jean-Luc Birbaum ,  Toshikage Asakura ,  Hitoshi Yamato

Inventor： Jean-Luc Birbaum ,  Toshikage Asakura ,  Hitoshi Yamato

IPC: G03C1492

CPC classification number: C09D11/38 ,  B33Y70/00 ,  C07C309/66 ,  C07C309/73 ,  C07C381/00 ,  C09D11/03 ,  C09D11/101 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

Abstract: Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and R12 inter alia are C1-C6alkyl or phenyl; upon irradiation react as acid generating compounds and thus are suitable in photoresist applications.

Abstract translation: 其中m为式I，II或III的化合物为0或1; n为1,2或3; R 1特别是未取代或取代的苯基，或萘基，蒽基，菲基，杂芳基或C 2 -C 12烯基; 尤其是亚乙烯基，亚苯基，亚萘基，二亚苯基或氧联二苯基; R2特别是CN，C 1 -C 4卤代烷基，C 2 -C 6烷氧基羰基，苯氧基羰基或苯甲酰基; R3特别是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基，樟脑磺酰基或苯基磺酰基; R'3特别是C 2 -C 12亚烷基二磺酰基，亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; R4和R5特别是氢，卤素，C1-C8烷基，C1-C6烷氧基，C1-C4卤代烷基，CN，NO2，C2-C6烷酰基，苯甲酰基，苯基，-S-苯基，OR6，SR9，NR7R8，C2-C6烷氧基羰基或苯氧基羰基 ; R6尤其是氢，苯基或C 1 -C 12烷基; R 7和R 8尤其是氢或C 1 -C 12烷基; R9尤其是C1-C12烷基; R 10，R 11和R 12特别是C 1 -C 6烷基或苯基; 在照射时作为产生酸的化合物反应，因此适用于光刻胶应用。

公开(公告)号：US06458864B1

公开(公告)日：2002-10-01

申请号：US09701457

申请日：2000-11-27

Applicant: Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

Inventor： Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

IPC: C08F250

CPC classification number: A61K6/083 ,  B33Y70/00 ,  C08F2/38 ,  C08F2/50 ,  C08K5/0025 ,  C09D7/45 ,  C09D7/65 ,  G03F7/031 ,  C08L53/00 ,  C08L33/00

Abstract: Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.

Abstract translation: 具有式I，II，III和IV的链转移基团的化合物是1或2; Ar和Ar1特别是苯基; Ar2特别是亚苯基，这些基团是未取代的或取代的; X是直接键，-O - ， - S-或-N（R6） - ; Y尤其是氢或C 1 -C 12烷基; 当R1和R2为烷氧基时，M1为-NR3R4或-OH，或M1为Ar，或为芳氧基; R1和R2彼此独立地例如。 是C 1 -C 8烷基; R 3和R 4例如是C 1 -C 12烷基，或一起是C 3 -C 7亚烷基; R5尤其是C1-C6亚烷基或直接键; R6是例如氢; 并且Z是二价基团，条件是基团Ar，Ar 1，Ar 2，R 1，R 2，R 3，R 4，R 5或Y中的至少一个被SH基取代;适用于光化学聚合的高分子引发剂的热制备 得到嵌段共聚物。

公开(公告)号：US6004724A

公开(公告)日：1999-12-21

申请号：US104676

申请日：1998-06-25

Applicant: Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

Inventor： Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

IPC: C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D207/44 ,  C07D213/90 ,  C07D333/34 ,  C07D333/36 ,  C07D333/44 ,  G03F7/004 ,  G03C1/725 ,  C07C249/04 ,  C07C251/32 ,  G03C1/72

CPC classification number: C07D207/44 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D213/90 ,  C07D333/44 ,  G03F7/0045 ,  Y10S430/114 ,  Y10S430/117 ,  Y10S430/12 ,  Y10S430/122

Abstract: New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.

Abstract translation: 式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基， 亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

公开(公告)号：US20110171569A1

公开(公告)日：2011-07-14

申请号：US12996795

申请日：2009-06-02

Applicant: Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

Inventor： Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

IPC: G03F7/004 ,  C07D335/08 ,  C07D339/08 ,  C07D413/02 ,  C07D285/16 ,  C07D327/08 ,  C08F228/06 ,  G03F7/20 ,  G03F1/00

CPC classification number: C07D339/08 ,  C07D327/08

Abstract: Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X− is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.

Abstract translation: 式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30 - 环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3 - 烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。

公开(公告)号：US20090042114A1

公开(公告)日：2009-02-12

申请号：US12154333

申请日：2008-05-22

Applicant: Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

Inventor： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

IPC: C07D209/82 ,  C07C317/12 ,  G03F7/004 ,  C07D335/04

CPC classification number: C07C251/48 ,  B33Y70/00 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/40 ,  C07D209/86 ,  C07D307/91 ,  C07D333/76 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

Abstract: Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.

Abstract translation: 式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-phenylene或-Ar''1-A1-Y1-A1-Ar'1,1- 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部被取代; A1是例如直接键，-O - ， - S - 或-NR 6 - ; Y1特别是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特​​别适合作为光潜酸。

公开(公告)号：US20050153244A1

公开(公告)日：2005-07-14

申请号：US10495710

申请日：2003-01-28

Applicant: Akira Matsumoto ,  Hitoshi Yamato ,  Toshikage Asakura ,  Peter Murer

Inventor： Akira Matsumoto ,  Hitoshi Yamato ,  Toshikage Asakura ,  Peter Murer

IPC: C07C301/00 ,  C07C309/67 ,  C07C309/68 ,  C07C317/04 ,  C07C317/14 ,  C07C323/66 ,  C07C381/00 ,  C07D209/48 ,  C07D209/76 ,  C07D291/00 ,  C07D333/36 ,  G02B5/20 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03C5/00

CPC classification number: G03F7/0037 ,  B33Y70/00 ,  C07C323/66 ,  C07C381/00 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/114

Abstract: Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X′ is —X1-A3-X2—; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a are phenyl or C1-C18alkyl; give high resolution with good resist profile.

公开(公告)号：US06673850B1

公开(公告)日：2004-01-06

申请号：US09959174

申请日：2001-10-18

Applicant: Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

Inventor： Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

IPC: C08F246

CPC classification number: C07D295/108 ,  B33Y70/00 ,  C07C323/54 ,  C08F2/50 ,  C08F293/005 ,  C08F295/00 ,  C08L53/00 ,  C08L53/02 ,  C09D153/00 ,  C09D153/02 ,  C09J153/00 ,  C09J153/02 ,  G03F7/031 ,  Y10S522/904

Abstract: Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.

Abstract translation: 具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。