High resolution spectral measurement device
    1.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号:US06713770B2

    公开(公告)日:2004-03-30

    申请号:US10098975

    申请日:2002-03-15

    IPC分类号: G01J314

    摘要: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    摘要翻译: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长,可以非常精确地测量激光束的带宽。 在第二实施例中,第二狭缝和光检测器由光电二极管阵列替代,并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者,激光波长可以固定在光栅光谱仪的光谱范围附近,可以扫描标准具。

    High resolution etalon-grating spectrometer

    公开(公告)号:US06538737B2

    公开(公告)日:2003-03-25

    申请号:US10003513

    申请日:2001-10-31

    IPC分类号: G01J314

    摘要: A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.