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    Method of manufacturing an optical component
    4.
    发明授权
    Method of manufacturing an optical component 有权
    制造光学部件的方法

    公开(公告)号：US07581305B2

    公开(公告)日：2009-09-01

    申请号：US10821959

    申请日：2004-04-12

    申请人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

    发明人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

    IPC分类号： G01R31/28

    CPC分类号： G03F7/706 ,  B24B13/0055 ,  G03F7/70825 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49171

    摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

    摘要翻译： 提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。 该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离 基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分 安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

    Method for measuring and manufacturing an optical element and optical apparatus
    7.
    发明申请
    Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
    光学元件和光学装置的测量和制造方法

    公开(公告)号：US20050225774A1

    公开(公告)日：2005-10-13

    申请号：US11098546

    申请日：2005-04-05

    申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

    CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

    摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

    摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

    Method and an apparatus for measuring a deviation of an optical test surface from a target shape
    8.
    发明授权
    Method and an apparatus for measuring a deviation of an optical test surface from a target shape 有权
    用于测量光学测试表面与目标形状的偏差的方法和装置

    公开(公告)号：US08269981B1

    公开(公告)日：2012-09-18

    申请号：US12414390

    申请日：2009-03-30

    申请人： Bernd Doerband ,  Frank Riepenhausen

    发明人： Bernd Doerband ,  Frank Riepenhausen

    IPC分类号： G01B11/02

    CPC分类号： G01M11/025 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B11/2441 ,  G01M11/0271 ,  G03F7/7055 ,  G03F7/706

    摘要： A method of measuring a deviation of an optical test surface from a target shape is provided. The method includes directing an incoming beam of electromagnetic radiation onto the test surface to generate a measuring beam that has interacted with the test surface, causing the ray that has interacted with the test surface to pass through an interferometer on a deviated path, performing an interferometric measurement by superimposing a reference beam with the measuring beam to determine a wave front deviation of the measuring beam from the reference beam, determining a retrace error in the wave front deviation, and correcting the measured wave front deviation by eliminating the retrace error therefrom. The differences in aberrations accumulated by the ray having traveled on the deviated path from fictitious aberrations that would have been accumulated by a ray that had traveled on an undeviated path cause the retrace error.

    摘要翻译： 提供了测量光学测试表面与目标形状的偏差的方法。 该方法包括将入射的电磁辐射束引导到测试表面上以产生与测试表面相互作用的测量光束，使得与测试表面相互作用的射线穿过偏斜路径上的干涉仪，执行干涉测量 通过用测量光束叠加参考光束来测量测量光束与参考光束的波前偏差，确定波前偏差中的回扫误差，以及通过消除测量波前偏差来校正测量的波前偏差。 由在已经在未变形路径上行进的光线积累的虚构像差的偏离路径上行进的光线所累积的像差的差异导致回扫误差。

    Method of manufacturing an optical system
    9.
    发明授权
    Method of manufacturing an optical system 有权
    制造光学系统的方法

    公开(公告)号：US07133225B1

    公开(公告)日：2006-11-07

    申请号：US10965909

    申请日：2004-10-18

    申请人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    发明人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    IPC分类号： G02B7/02 ,  G01B11/00 ,  G01N23/207

    CPC分类号： G02B7/023 ,  G02B7/1821 ,  G03F7/70258 ,  G03F7/70825

    摘要： A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

    摘要翻译： 制造光学系统的方法包括在其安装框架上组装光学元件。 安装框架设置在具有旋转轴线的旋转工作台上，并且调整安装框架使其预定的对称轴线平行于旋转轴线。 将光学元件放置在安装框架上，并执行光学元件的表面的干涉测量。 分析干涉测量以使光学元件相对于安装框架布置，使得光学元件的预定轴线平行于旋转轴线。

    Method of measuring a deviation of an optical surface from a target shape
    10.
    发明授权
    Method of measuring a deviation of an optical surface from a target shape 有权

    公开(公告)号：US08159678B2

    公开(公告)日：2012-04-17

    申请号：US13030748

    申请日：2011-02-18

    申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    IPC分类号： G01B11/02

    摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.