公开(公告)号：US20250011650A1

公开(公告)日：2025-01-09

申请号：US18750176

申请日：2024-06-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol HAM ,  Byungjoon KANG ,  Sangwan KIM ,  Sungmin KIM ,  Insun PARK ,  Gayoung SONG ,  Jungmin OH ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

Abstract: Provided are an etching composition, a method of etching a metal-containing film using the same, and a method of manufacturing a semiconductor device by using the same. The etching composition includes an oxidizing agent, an acid, and a selective etching inhibitor, wherein the oxidizing agent is metal-free, the selective etching inhibitor includes a copolymer including a first repeating unit and a second repeating unit, the first repeating unit is different from the second repeating unit, and the first repeating unit is a nitrogen-containing repeating unit.

公开(公告)号：US20180088392A1

公开(公告)日：2018-03-29

申请号：US15437899

申请日：2017-02-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byung Ha PARK ,  Myong Jong KWON ,  Nak Hyun KIM ,  Seoung Jin SEO ,  Hyunwoong CHUNG ,  Cheol HAM ,  Sung Hun HONG

IPC: G02F1/1333 ,  H01L51/00 ,  H01L51/52 ,  B32B27/06 ,  B32B7/12

CPC classification number: G02F1/133308 ,  B32B7/06 ,  B32B7/12 ,  B32B27/06 ,  B32B27/08 ,  B32B27/281 ,  B32B27/308 ,  B32B27/34 ,  B32B27/36 ,  B32B27/365 ,  B32B27/40 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/26 ,  B32B2264/102 ,  B32B2270/00 ,  B32B2274/00 ,  B32B2307/412 ,  B32B2307/51 ,  B32B2307/536 ,  B32B2307/546 ,  B32B2307/558 ,  B32B2307/732 ,  B32B2457/20 ,  B32B2457/202 ,  B32B2457/206 ,  B32B2457/208 ,  G02F1/133305 ,  G02F1/13338 ,  G02F2001/133331 ,  G02F2201/503 ,  H01L27/323 ,  H01L51/0097 ,  H01L51/5253 ,  Y10T428/10 ,  Y10T428/1036

Abstract: A window for a display device includes a polymer substrate, a first buffer layer under the polymer substrate and having an elastic modulus of about 7 megapascals to about 30 megapsacals, a first transparent adhesion layer between the polymer substrate and the first buffer layer and a protective layer on the polymer substrate, and a display device includes the same.

公开(公告)号：US20150140347A1

公开(公告)日：2015-05-21

申请号：US14456042

申请日：2014-08-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jun Cheol BAE ,  Chul BAlK ,  Pil Gu KWON ,  Moon Su SEO ,  Yeon Kyoung JUNG ,  Cheol HAM

IPC: C09D1/00 ,  C23C30/00

Abstract: A film formation composition for surface treatment of a metal object includes at least one salt selected from a hydrofluoric acid salt, a phosphate, and a nitrate, and at least one hydrogen antifoaming agent selected from a hydrogen foaming inhibitor, a hydrogen bubble adhesion inhibitor, and a base for pH adjustment, a film formed using the film formation composition, and an electronic product including the film formed using the film formation composition.

Abstract translation: 用于金属物体表面处理的成膜组合物包括选自氢氟酸盐，磷酸盐和硝酸盐中的至少一种盐，以及至少一种选自氢发泡抑制剂，氢气泡粘附抑制剂， 以及用于pH调节的基质，使用该成膜组合物形成的膜，以及包含使用该成膜组合物形成的膜的电子产品。

公开(公告)号：US20240318078A1

公开(公告)日：2024-09-26

申请号：US18586037

申请日：2024-02-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byungjoon KANG ,  Sungmin KIM ,  Minjae SUNG ,  Gayoung SONG ,  Jungmin OH ,  Hyosan LEE ,  Byoungki CHOI ,  Cheol HAM ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

CPC classification number: C09K13/06 ,  H01L21/32134

Abstract: An etching composition for a titanium-containing layer may include an oxidant, an inorganic acid, and a selective etching inhibitor. The inorganic acid may include phosphorus-based inorganic acid, chlorine-based inorganic acid, or fluorine-based inorganic acid, or any combination thereof. The selective etching inhibitor may include a polymer having a nitrogen-containing repeating unit.

公开(公告)号：US20220289767A1

公开(公告)日：2022-09-15

申请号：US17688051

申请日：2022-03-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeong Il PARK ,  Cheol HAM ,  Hyeongju KIM ,  Feifei FANG ,  Sung Young YUN ,  Youn Hee LIM ,  Hye Rim HONG

IPC: C07D517/22 ,  H01L27/30 ,  H01L51/00

Abstract: A composition for a photoelectric device includes a compound represented by Chemical Formula 1, and an image sensor and an electronic device including the same: In Chemical Formula 1, each substituent is the same as defined in the detailed description.

公开(公告)号：US20190112429A1

公开(公告)日：2019-04-18

申请号：US16157390

申请日：2018-10-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jun Cheol BAE ,  Cheol HAM ,  Deuk Kyu MOON ,  Byung Hwa SEO ,  Jae Jun LEE ,  Hyung-Soo CHO

IPC: C08G77/04 ,  H05K5/00 ,  H05K5/03 ,  C09D183/04

Abstract: A composition comprising a cation polymerizable organic compound and an organosiloxane comprising at least one silsesquioxane, wherein each silsesquioxane independently comprises an inorganic core having a SiO3/2 moiety and an organic group having a cation polymerizable functional group, wherein the organic group in the comprises a first organic group represented by Chemical Formula 1 a second organic group represented by Chemical Formula 2, R1—(CH2)n1—*   Chemical Formula 1 R2—(CH2)n2—*   Chemical Formula 2 wherein R1 and R2 are each independently the cation polymerizable functional group, n1 is an integer ranging from 1 to 3, and n2 is an integer of 4 or greater.

公开(公告)号：US20180231692A1

公开(公告)日：2018-08-16

申请号：US15815928

申请日：2017-11-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Cheol HAM ,  Jun Cheol BAE ,  Nak Hyun KIM

IPC: G02B1/14 ,  C08G77/50 ,  C08K5/54 ,  C08L83/06 ,  C08G18/63

CPC classification number: G02B1/14 ,  C08G18/635 ,  C08G77/14 ,  C08G77/50 ,  C08K5/54 ,  C08L83/06 ,  C09D183/06 ,  G02B2207/101

Abstract: A window for a display device includes a polymer substrate, a first protective layer on the polymer substrate and including a cured product of a multi-functional urethane (meth)acrylate compound having six or more (meth)acrylate groups and a second protective layer on the first protective layer and including a cured product of epoxy-containing polysilsesquioxane, wherein the second protective layer is thicker than the first protective layer, and a thickness of the first protective layer ranges from about 0.1 μm to about 10 μm and a thickness of the second protective layer ranges from about 5 μm to about 30 μm, and a method of manufacturing the same and a display device including a window for a display device.

公开(公告)号：US20250129288A1

公开(公告)日：2025-04-24

申请号：US18916329

申请日：2024-10-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol HAM ,  Byungjoon KANG ,  Giho KO ,  Sungmin KIM ,  Mihyun PARK ,  Insun PARK ,  Jinhye BAE ,  Kum Hee LEE ,  Minhyung CHO ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

Abstract: Provided are an etching composition, a method of etching a metal-containing film by using the same, and a method of manufacturing a semiconductor device by using the same. The etching composition may include an oxidizing agent, a buffer, and a selective etching inhibitor. The selective etching inhibitor may include a first compound represented by Formula 1 and a second compound different from the first compound. The second compound may include a ring. The ring may be a pyrazole group, an imidazole group, a triazole group, or a tetrazole group, or the ring may be a pyrazole group, an imidazole group, or a triazole group, each condensed with a benzene group, a pyridine group, a pyrimidine group, a pyrazine group, a pyridazine group, or any combination thereof. A description of Formula 1 is provided in the present specification.

公开(公告)号：US20240318077A1

公开(公告)日：2024-09-26

申请号：US18612457

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyuyoung HWANG ,  Byungjoon KANG ,  Daihyun KIM ,  Sungmin KIM ,  Mihyun PARK ,  Jungmin OH ,  Cheol HAM

IPC: C09K13/00 ,  H01L21/3213

CPC classification number: C09K13/00 ,  H01L21/32134

Abstract: An etching composition may include an oxidizer, an ammonium salt, an aqueous solvent, and an accelerator. A method of etching a metal-containing film may be performed using the etching composition, and a method of manufacturing a semiconductor device may be performed using the etching composition.

公开(公告)号：US20180371196A1

公开(公告)日：2018-12-27

申请号：US15779677

申请日：2016-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byung-ha PARK ,  Nak-hyun KIM ,  Yong-suk CHO ,  Cheol HAM

IPC: C08J7/04 ,  B32B27/36 ,  B32B27/28 ,  B32B27/08 ,  B32B27/18 ,  C08K3/36 ,  C08K3/22 ,  C08J5/18 ,  C09J183/04 ,  C09J5/06

Abstract: Disclosed is a cover window for protecting a display panel. The present cover window comprises: a transparent sheet through which light of the display panel passes, the transparent sheet including nano-inorganic particles; and a coating layer disposed on the transparent sheet.