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公开(公告)号：US10777412B2
公开(公告)日：2020-09-15
申请号：US15874226
申请日：2018-01-18
发明人： Dongwook Lee , Sangwon Kim , Minsu Seol , Seongjun Park , Hyeonjin Shin , Yunseong Lee , Seongjun Jeong , Alum Jung
IPC分类号： H01L21/00 , H01B1/00 , H01L21/033 , G03F7/11 , G03F7/09 , H01B1/04 , C01B32/194 , H01L21/311 , B82Y30/00 , B82Y40/00
摘要： Provided are a hardmask composition, a method of preparing the same, and a method of forming a patterned layer using the hardmask composition. The hardmask composition may include graphene quantum dots, a metal compound, and a solvent. The metal compound may be chemically bonded (e.g., covalently bonded) to the graphene quantum dots. The metal compound may include a metal oxide. The metal oxide may include at least one of zirconium (Zr) oxide, titanium (Ti) oxide, tungsten (W) oxide, or aluminum (Al) oxide. The graphene quantum dots may be bonded to the metal compound by an M—O—C bond or an M—C bond, where M is a metal element, O is oxygen, and C is carbon.
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公开(公告)号：US10681464B2
公开(公告)日：2020-06-09
申请号：US16173516
申请日：2018-10-29
发明人： Sangwon Kim , Hyeonjin Shin , Minsu Seol , Dongwook Lee
摘要： Provided are an acoustic diaphragm and an acoustic device including the same. The acoustic diaphragm may include graphene nanoparticles, and an average particle size of the graphene nanoparticles may be about 10 nm or less. The graphene nanoparticles substantially may have a particle size of about 1 nm to about 10 nm. The graphene nanoparticles may include at least one functional group selected from a hydroxyl group, a carboxyl group, a carbonyl group, an epoxy group, an amine group, and an amide group.
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公开(公告)号：US10553684B2
公开(公告)日：2020-02-04
申请号：US15825344
申请日：2017-11-29
发明人： Jaeho Lee , Hyeonjin Shin , Dongwook Lee , Seongjun Park , Kiyoung Lee , Eunkyu Lee , Sanghyun Jo , Jinseong Heo
IPC分类号： H01L31/0352 , H01L29/16 , H01L31/028 , H01L31/09 , H01L31/101 , H01L27/144 , H01L27/146 , H01L27/15 , H01L29/12 , H01L51/00 , H01L51/05 , H01L27/30
摘要： Provided are an optical sensor including graphene quantum dots and an image sensor including an optical sensing layer. The optical sensor may include a graphene quantum dot layer that includes a plurality of first graphene quantum dots bonded to a first functional group and a plurality of second graphene quantum dots bonded to a second functional group that is different from the first functional group. An absorption wavelength band of the optical sensor may be adjusted based on types of functional groups bonded to the respective graphene quantum dots and/or sizes of the graphene quantum dots.
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公开(公告)号：US10424490B2
公开(公告)日：2019-09-24
申请号：US15805848
申请日：2017-11-07
发明人： Sangwon Kim , Minsu Seol , Hyeonjin Shin , Dongwook Lee , Seongjun Jeong
IPC分类号： H01L21/308 , C09D1/00 , C08K3/04 , C08K9/04 , G03F7/20 , G03F7/32 , G03F7/40 , C09D7/62 , C09D7/40 , C01B32/15 , C01B32/152 , H01L21/02 , H01L21/033 , H01L21/311 , C01B32/184 , C01B32/156 , G03F7/09
摘要： Provided are a hardmask composition and a method of forming a fine pattern using the hardmask composition, the hardmask composition including a solvent, a 2D carbon nanostructure (and/or a derivative thereof), and a 0D carbon nanostructure (and/or a derivative thereof).
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公开(公告)号：US11222953B2
公开(公告)日：2022-01-11
申请号：US16662872
申请日：2019-10-24
发明人： Jaeho Lee , Hyeonjin Shin , Dongwook Lee , Seongjun Park , Kiyoung Lee , Eunkyu Lee , Sanghyun Jo , Jinseong Heo
IPC分类号： H01L31/0352 , H01L29/16 , H01L31/09 , H01L31/028 , H01L31/101 , H01L51/05 , H01L51/00 , H01L27/144 , H01L27/146 , H01L27/15 , H01L29/12 , H01L27/30
摘要： Provided are an optical sensor including graphene quantum dots and an image sensor including an optical sensing layer. The optical sensor may include a graphene quantum dot layer that includes a plurality of first graphene quantum dots bonded to a first functional group and a plurality of second graphene quantum dots bonded to a second functional group that is different from the first functional group. An absorption wavelength band of the optical sensor may be adjusted based on types of functional groups bonded to the respective graphene quantum dots and/or sizes of the graphene quantum dots.
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6.发明授权公开(公告)号：US10928723B2
公开(公告)日：2021-02-23
申请号：US16708969
申请日：2019-12-10
发明人： Hyeonjin Shin , Hyunjae Song , Seongjun Park , Keunwook Shin , Changseok Lee , Dongwook Lee , Minsu Seol , Sangwon Kim , Seongjun Jeong
摘要： A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane, and the pellicle membrane may include nanocrystalline graphene. The nanocrystalline graphene may have defects. The nanocrystalline graphene may include a plurality of nanoscale crystal grains, and the nanoscale crystal grains may include a two-dimensional (2D) carbon structure having an aromatic ring structure. The defects of the nanocrystalline graphene may include at least one of an sp3 carbon atom, an oxygen atom, a nitrogen atom, or a carbon vacancy.
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公开(公告)号：US10808142B2
公开(公告)日：2020-10-20
申请号：US15925034
申请日：2018-03-19
发明人： Sangwon Kim , Minsu Seol , Hyeonjin Shin , Dongwook Lee , Yunseong Lee , Seongjun Jeong , Alum Jung
IPC分类号： H01L21/027 , C09D165/00 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , H01L21/311 , C01B32/184 , G03F7/09 , C01B32/182 , C08G61/02 , B82Y40/00 , B82Y30/00
摘要： Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.
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公开(公告)号：US20200159108A1
公开(公告)日：2020-05-21
申请号：US16689221
申请日：2019-11-20
发明人： Seungwon LEE , Minsu Seol , Dongwook Lee , Hyeonjin Shin
IPC分类号： G03F1/64
摘要： A pellicle for extreme ultraviolet lithography and a method of manufacturing the pellicle for extreme ultraviolet lithography are provided. The pellicle for extreme ultraviolet lithography includes a pellicle layer having a specific (or, alternatively, predetermined) thickness, a frame on an edge area of the pellicle layer and supporting the pellicle layer, and a boron implantation layer located between the pellicle layer and the frame. The boron implantation layer is spaced by a specific (or, alternatively, predetermined) distance inward from an outer periphery of the pellicle layer.
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公开(公告)号：US10551735B2
公开(公告)日：2020-02-04
申请号：US15946087
申请日：2018-04-05
发明人： Seongjun Jeong , Hyeonjin Shin , Sangwon Kim , Seongjun Park , Minsu Seol , Dongwook Lee , Yunseong Lee , Alum Jung
摘要： A pellicle composition for a photomask, a pellicle for a photomask, the pellicle for a photomask being formed from the pellicle composition, a method of forming the pellicle, a reticle including the pellicle, and an exposure apparatus for lithography including the reticle are provided. The pellicle composition includes: at least one selected from graphene quantum dots and a graphene quantum dot precursor, the graphene quantum dots having a size of about 50 nm or less; and a solvent.
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公开(公告)号：US20200015016A1
公开(公告)日：2020-01-09
申请号：US16173516
申请日：2018-10-29
发明人： Sangwon Kim , Hyeonjin Shin , Minsu Seol , Dongwook Lee
摘要： Provided are an acoustic diaphragm and an acoustic device including the same. The acoustic diaphragm may include graphene nanoparticles, and an average particle size of the graphene nanoparticles may be about 10 nm or less. The graphene nanoparticles substantially may have a particle size of about 1 nm to about 10 nm. The graphene nanoparticles may include at least one functional group selected from a hydroxyl group, a carboxyl group, a carbonyl group, an epoxy group, an amine group, and an amide group.
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