MAINTAINING HEIGHT OF ALIGNMENT KEY IN SEMICONDUCTOR DEVICES

    公开(公告)号:US20200027842A1

    公开(公告)日:2020-01-23

    申请号:US16383816

    申请日:2019-04-15

    Abstract: A semiconductor device may include a gate electrode structure on a first region of a substrate including the first region and a second region, a capping structure covering an upper surface of the gate electrode structure, the capping structure including a capping pattern and a first etch stop pattern covering a lower surface and a sidewall of the capping pattern, an alignment key on the second region of the substrate, the alignment key including an insulating material, and a filling structure on the second region of the substrate, the filling structure covering a sidewall of the alignment key, and including a first filling pattern, a second filling pattern covering a lower surface and a sidewall of the first filling pattern and a second etch stop pattern covering a lower surface and a sidewall of the second filling pattern.

    SUPPORTING UNIT AND SUBSTRATE-TREATING APPARATUS INCLUDING THE SAME
    8.
    发明申请
    SUPPORTING UNIT AND SUBSTRATE-TREATING APPARATUS INCLUDING THE SAME 有权
    支持单元和基板处理设备,包括它们

    公开(公告)号:US20160375534A1

    公开(公告)日:2016-12-29

    申请号:US15168995

    申请日:2016-05-31

    CPC classification number: H01L21/00 H01L21/68 H01L21/68785 H01L21/68792

    Abstract: A supporting unit is provided. The supporting unit includes a body, an alignment member, at least one sensor, and a controller. The body has a top surface supporting a target object. The alignment member is disposed in the body and adjusts a position of the target object. The sensor senses the position of the target object. The controller controls the alignment member and the sensor member. The alignment member includes a magnet that adjusts the position of the target object according to an electromagnetic force; and a coil that applies the electromagnetic force to the magnet.

    Abstract translation: 提供支撑单元。 支撑单元包括主体,对准构件,至少一个传感器和控制器。 身体具有支撑目标物体的顶面。 对准构件设置在身体中并调节目标对象的位置。 传感器感测目标物体的位置。 控制器控制对准构件和传感器构件。 对准构件包括根据电磁力调节目标物体的位置的磁体; 以及向磁体施加电磁力的线圈。

    MEASURING SYSTEM AND MEASURING METHOD
    9.
    发明申请
    MEASURING SYSTEM AND MEASURING METHOD 有权
    测量系统和测量方法

    公开(公告)号:US20150338206A1

    公开(公告)日:2015-11-26

    申请号:US14667930

    申请日:2015-03-25

    CPC classification number: G01B11/14 G01B9/02016

    Abstract: Measuring systems and methods using the same may be provided. For example, the measuring system including a first reference member located at one of a first target member and a second target member, the first and second target members being configured to make a relative movement with respect to each other and the first reference member having a first length, a second reference member located at the other of the first target member and the second target member and having a second length, and a measuring unit located at a distance from the first reference member and the second reference member, the measuring unit configured to measure a relative location of one of the first reference member and the second reference member with respect to the other may be provided.

    Abstract translation: 可以提供使用其的测量系统和方法。 例如,测量系统包括位于第一目标构件和第二目标构件中的一个上的第一参考构件,第一和第二目标构件被构造成相对于彼此进行相对运动,并且第一参考构件具有 第一长度,位于第一目标构件和第二目标构件中的另一个并且具有第二长度的第二参考构件和位于距第一参考构件和第二参考构件一定距离的测量单元,该测量单元构造成 可以提供测量第一参考构件和第二参考构件之一相对于另一个的相对位置。

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