Abstract:
A substrate supporting and transferring apparatus and associated methods, the apparatus including a shuttle configured to move in a x-direction and a y-direction, the y-direction being perpendicular to the x-direction; a lower wedge block on the shuttle, the lower wedge block including a lower surface that is parallel with an upper surface of the shuttle and an upper surface that is inclined with respect to the lower surface of the lower wedge block; an upper wedge block on the lower wedge block, the upper wedge block including a lower surface that is parallel with the upper surface of the lower wedge block and an upper surface that is parallel with the upper surface of the shuttle; and a chuck on the upper wedge block, the chuck being configured to support a substrate.
Abstract:
A electronic device according to various example embodiments may include: a display, a memory storing identification information of a plurality of electronic devices, and a processor, configured to: obtain an image including a watch face, select a first electronic device matching the watch face among the plurality of electronic devices by comparing one or more characteristics of the watch face in the obtained image to the plurality of electronic devices, and display, on the display, an image including the watch face and the selected first electronic device.
Abstract:
A semiconductor device may include a gate electrode structure on a first region of a substrate including the first region and a second region, a capping structure covering an upper surface of the gate electrode structure, the capping structure including a capping pattern and a first etch stop pattern covering a lower surface and a sidewall of the capping pattern, an alignment key on the second region of the substrate, the alignment key including an insulating material, and a filling structure on the second region of the substrate, the filling structure covering a sidewall of the alignment key, and including a first filling pattern, a second filling pattern covering a lower surface and a sidewall of the first filling pattern and a second etch stop pattern covering a lower surface and a sidewall of the second filling pattern.
Abstract:
An electronic circuit includes an operator including logic gates configured to perform either one or both of encryption and decryption operations. The electronic circuit further includes a controller configured to control the operator to operate in a first mode in which each of the logic gates outputs a first logic value during a first time period of a clock signal, and operate in a second mode in which a number of first logic gates, each of which outputs the first logic value, among the logic gates, and a number of second logic gates, each of which outputs a second logic value, among the logic gates, are maintained constant during a second time period of the clock signal, in response to a control value indicating that either one or both of the encryption and decryption operations are performed.
Abstract:
A method of operating a system on chip (SoC) includes converting plain data into cipher data by using an encryption key and transmitting the cipher data directly to a memory controller which controls an operation of a non-volatile memory. The encryption key may be output by a one-time programmable (OTP) memory.
Abstract:
An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.
Abstract:
A substrate processing apparatus includes a substrate stage that supports a substrate, a follower stage disposed on a same plane as the substrate stage, a first driving unit that moves the follower stage in parallel with a first direction, and a second driving unit that moves the substrate stage in parallel with the first direction. The second driving unit includes a voice magnet member disposed on the substrate stage, and a voice coil member disposed on the follower stage and spaced apart from the voice magnet member.
Abstract:
A supporting unit is provided. The supporting unit includes a body, an alignment member, at least one sensor, and a controller. The body has a top surface supporting a target object. The alignment member is disposed in the body and adjusts a position of the target object. The sensor senses the position of the target object. The controller controls the alignment member and the sensor member. The alignment member includes a magnet that adjusts the position of the target object according to an electromagnetic force; and a coil that applies the electromagnetic force to the magnet.
Abstract:
Measuring systems and methods using the same may be provided. For example, the measuring system including a first reference member located at one of a first target member and a second target member, the first and second target members being configured to make a relative movement with respect to each other and the first reference member having a first length, a second reference member located at the other of the first target member and the second target member and having a second length, and a measuring unit located at a distance from the first reference member and the second reference member, the measuring unit configured to measure a relative location of one of the first reference member and the second reference member with respect to the other may be provided.
Abstract:
In a method of controlling an exposure apparatus, a plurality of spot beams is irradiated from an optical system onto a reference surface. Focal positions of at least some spot beams of the plurality of spot beams on Z axis perpendicular to the reference surface are obtained. A focal plane of the at least some spot beams is calculated from the focal positions. An angle of the optical system relative to the reference surface is aligned based on an angle error between the focal plane and the reference surface.