-
1.
公开(公告)号:US20170239524A1
公开(公告)日:2017-08-24
申请号:US15436613
申请日:2017-02-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kwangjo Lee , Hyunsu Kim , Jihye Son , Moonbae Song , Sanghwa Lee , Woosang Lee , Jae-Hwan Lee , Jaeyoun Jeong , Bum-Sung Cho
Abstract: An electronic device includes a housing, with a display exposed through a part of the housing. The housing includes a first motion sensor to detect movement of the housing, a wireless communication circuit, a processor, and a memory that stores instructions to be executed by a processor. The instructions include generating a wireless communication channel with an external electronic device including a second motion sensor; monitoring the movement of the housing to generate first data for a first time period; receiving second data for the first time period through the wireless communication channel; calculating, as a value for the first time period, a value, smaller than the sum of a first value based on the first data and a second value based on the second data; and displaying the calculated value through a user interface displayed on the display.
-
2.
公开(公告)号:US20250036022A1
公开(公告)日:2025-01-30
申请号:US18632558
申请日:2024-04-11
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sanghwa Woo , Wooseok Kim , Bongkeun Kim , Sanghwa Lee
IPC: G03F1/36
Abstract: Provided is an optical proximity correction (OPC) method including receiving a design layout for a target pattern to be formed on a substrate, obtaining a first OPC pattern by performing a baseline OPC on the design layout, and obtaining a second OPC pattern by curving the first OPC pattern.
-
3.
公开(公告)号:US20240318038A1
公开(公告)日:2024-09-26
申请号:US18610982
申请日:2024-03-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sanghwa Lee , Yearin Byun , Inkwon Kim
IPC: C09G1/02 , C07F5/00 , C09K3/14 , H01L21/3105 , H01L21/321
CPC classification number: C09G1/02 , C07F5/003 , C09K3/1409 , H01L21/31053 , H01L21/3212
Abstract: Provided are a method of manufacturing a chemical mechanical polishing slurry and a method of manufacturing a semiconductor device using the same. The method of manufacturing a chemical mechanical polishing slurry includes mixing a first precursor including cerium and a second precursor in an aqueous solution, forming nanoclusters including cerium by a reaction (e.g., a synthesis reaction) between the first precursor and the second precursor, and forming a chemical mechanical polishing slurry by mixing at least one of a pH adjuster, deionized water, an inhibitor, a booster, and a dispersant with the nanoclusters.
-
公开(公告)号:US20230071777A1
公开(公告)日:2023-03-09
申请号:US17739752
申请日:2022-05-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Wonjoo Im , Noyoung Chung , Sanghwa Lee
Abstract: A method of manufacturing a semiconductor chip includes designing a layout for a semiconductor chip, performing an optical proximity correction (OPC) on the layout, manufacturing a mask after performing the OPC, and manufacturing the semiconductor chip using the mask, wherein a plurality of OPC shapes corresponding to a rectangular pattern of the mask are included in the mask and at least one of the plurality of OPC shapes includes a multi-edge corner rounding OPC shape.
-
公开(公告)号:US20250093763A1
公开(公告)日:2025-03-20
申请号:US18818984
申请日:2024-08-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: Akio Misaka , Bongkeun Kim , Ran Lee , Sanghwa Lee , Wonjoo Im
Abstract: A photomask for a photolithography process includes a mask substrate, a reflective multilayer on the mask substrate, and a light absorber pattern on the reflective multilayer and having hole patterns, wherein the hole patterns include a main hole pattern for pattern transfer onto a wafer, first sub-resolution assist feature (SRAF) hole patterns arranged at regular intervals to provide honeycomb lattices in a first region centered around the main hole pattern and having a first pitch less than or equal to a diffraction limit in the photolithography process, and second SRAF hole patterns arranged at regular intervals to surround the main hole pattern and the first SRAF patterns and providing honeycomb lattices in a second region centered around the main hole pattern and surrounding the first region, the second SRAF hole patterns being arranged with a second pitch less than or equal to the diffraction limit in the photolithography process.
-
6.
公开(公告)号:US20230205963A1
公开(公告)日:2023-06-29
申请号:US17961710
申请日:2022-10-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: Akio Misaka , Noyoung Chung , Taekyum Kim , Sanghwa Lee , Woonhyuk Choi
IPC: G06F30/392 , G06F30/398
CPC classification number: G06F30/392 , G06F30/398
Abstract: A layout method of a semiconductor chip, includes designing a layout using a restriction rule such that a layout pattern having a length smaller than a first length in a first direction has to have a length smaller than a second length in a second direction, the second direction intersecting the first direction, generating a plurality of unit regions by partitioning the layout in the first direction, generating a plurality of target regions by adding a reference region to a partitioned edge of each of the plurality of unit regions, retargeting the plurality of target regions in parallel, and generating a correction layout by merging the plurality of retargeted target regions.
-
公开(公告)号:US10796803B2
公开(公告)日:2020-10-06
申请号:US15436613
申请日:2017-02-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kwangjo Lee , Hyunsu Kim , Jihye Son , Moonbae Song , Sanghwa Lee , Woosang Lee , Jae-Hwan Lee , Jaeyoun Jeong , Bum-Sung Cho
IPC: A63B24/00 , A61B5/024 , A61B5/11 , G16H50/30 , H04W4/029 , H04M1/725 , G16H40/63 , G16H20/30 , G01C22/02
Abstract: An electronic device includes a housing, with a display exposed through a part of the housing. The housing includes a first motion sensor to detect movement of the housing, a wireless communication circuit, a processor, and a memory that stores instructions to be executed by a processor. The instructions include generating a wireless communication channel with an external electronic device including a second motion sensor; monitoring the movement of the housing to generate first data for a first time period; receiving second data for the first time period through the wireless communication channel; calculating, as a value for the first time period, a value, smaller than the sum of a first value based on the first data and a second value based on the second data; and displaying the calculated value through a user interface displayed on the display.
-
-
-
-
-
-