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公开(公告)号:US20150221823A1
公开(公告)日:2015-08-06
申请号:US14513026
申请日:2014-10-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sung Won HWANG , Je Won KIM , Il Ho AHN , Soo Jeong CHOI
CPC classification number: H01L33/08 , F21K9/232 , F21S41/147 , F21S45/43 , F21S45/47 , F21V19/001 , F21Y2101/00 , F21Y2115/10 , G02B6/0073 , H01L33/007 , H01L33/16 , H01L33/24
Abstract: There is provided a semiconductor light emitting device including: a first conductivity-type semiconductor base layer; a mask layer disposed on the first conductivity-type semiconductor base layer and including a graphene layer with a plurality of openings exposing the first conductivity-type semiconductor base layer; and a plurality of light emitting nanostructures disposed on the openings and each including a first conductivity-type semiconductor core, an active layer, and a second conductivity-type semiconductor layer.
Abstract translation: 提供一种半导体发光器件,包括:第一导电型半导体基底层; 掩模层,其设置在所述第一导电型半导体基底层上并且包括具有暴露所述第一导电型半导体基底层的多个开口的石墨烯层; 以及设置在所述开口上并且各自包括第一导电型半导体芯,有源层和第二导电型半导体层的多个发光纳米结构。
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公开(公告)号:US20160300978A1
公开(公告)日:2016-10-13
申请号:US15190406
申请日:2016-06-23
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jung Sub KIM , Yeon Woo SEO , Dong Gun LEE , Byung Kyu CHUNG , Dae Myung CHUN , Soo Jeong CHOI
CPC classification number: H01L33/007 , B82Y20/00 , F21K9/232 , F21Y2115/10 , H01L33/06 , H01L33/08 , H01L33/24 , H01L33/32 , H01L33/52 , H01L2224/48091 , H01L2224/48247 , H01L2224/48257 , H01L2933/0033 , H01L2933/005 , H01L2933/0058 , H01L2924/00014
Abstract: A nanostructure semiconductor light emitting device includes: a base layer formed of a first-conductivity type nitride semiconductor material; and a plurality of light emitting nanostructures disposed on the base layer to be spaced apart from each other, wherein each of the plurality of light emitting nanostructures includes: a nanocore formed of a first conductivity-type nitride semiconductor material, an active layer disposed on a surface of the nanocore and including a quantum well which is divided into first and second regions having different indium (In) composition ratios in a thickness direction thereof; and a second conductivity-type semiconductor layer disposed on the active layer, and an In composition ratio in the first region is higher than an In composition ratio in the second region.
Abstract translation: 纳米结构半导体发光器件包括:由第一导电型氮化物半导体材料形成的基极层; 以及设置在所述基底层上以彼此间隔开的多个发光纳米结构,其中所述多个发光纳米结构中的每一个包括:由第一导电型氮化物半导体材料形成的纳米孔,设置在所述基底层上的有源层 包括纳米孔的表面,并且包括量子阱,其被划分为在其厚度方向上具有不同铟(In)组成比的第一和第二区域; 以及设置在所述有源层上的第二导电型半导体层,并且所述第一区域中的In组成比高于所述第二区域中的In组成比。
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公开(公告)号:US20160064608A1
公开(公告)日:2016-03-03
申请号:US14838322
申请日:2015-08-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Byung Kyu CHUNG , Jung Sub KIM , Soo Jeong CHOI , Yeon Woo SEO , Dong Gun LEE
CPC classification number: H01L33/24 , H01L33/06 , H01L33/08 , H01L33/12 , H01L33/18 , H01L33/32 , H01L2224/16245 , H01L2224/48091 , H01L2224/73265 , H01L2924/181 , H01L2924/00014 , H01L2924/00012
Abstract: There is provided a nanostructure semiconductor light emitting device including: a base layer formed of a first conductivity-type nitride semiconductor; and a plurality of light emitting nanostructures disposed to be spaced apart from one another on the base layer, wherein each of the plurality of light emitting nanostructures includes a nanocore formed of a first conductivity-type nitride semiconductor; a stress control layer disposed on a surface of the nanocore and including a nitride semiconductor containing indium; an active layer disposed on the stress control layer; a second conductivity-type nitride semiconductor layer disposed on the active layer; and a defect blocking layer disposed on at least a portion of the stress control layer and including a nitride semiconductor layer having a lattice constant lower than that of the stress control layer.
Abstract translation: 提供一种纳米结构半导体发光器件,包括:由第一导电型氮化物半导体形成的基极层; 以及多个发光纳米结构,其设置成在所述基底层上彼此间隔开,其中所述多个发光纳米结构中的每一个包括由第一导电型氮化物半导体形成的纳米孔; 应力控制层,设置在所述纳米孔的表面上,并且包括含有铟的氮化物半导体; 设置在应力控制层上的有源层; 设置在有源层上的第二导电型氮化物半导体层; 以及缺陷阻挡层,其设置在所述应力控制层的至少一部分上,并且包括具有低于所述应力控制层的晶格常数的晶格常数的氮化物半导体层。
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