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    Genes for synthesis of FR-008 polyketides
    8.
    发明申请
    Genes for synthesis of FR-008 polyketides 失效
    用于合成FR-008聚酮化合物的基因

    公开(公告)号：US20050089884A1

    公开(公告)日：2005-04-28

    申请号：US10819386

    申请日：2004-04-06

    申请人： Sang Lee ,  Zixin Deng ,  Shi Chen ,  Ki Jeong ,  Xiufen Zhou

    发明人： Sang Lee ,  Zixin Deng ,  Shi Chen ,  Ki Jeong ,  Xiufen Zhou

    IPC分类号： C12N15/09 ,  A61K31/335 ,  A61K31/35 ,  A61K31/7048 ,  A61P31/04 ,  C07D313/00 ,  C07D493/08 ,  C07H17/08 ,  C07H21/04 ,  C07K14/36 ,  C12N1/21 ,  C12N9/00 ,  C12N15/31 ,  C12N15/52 ,  C12P17/08 ,  C12P19/62 ,  C12Q1/68 ,  C12N9/10 ,  C12N15/74

    CPC分类号： C12P19/62 ,  C07H21/04 ,  C07K14/36 ,  C12N15/52 ,  C12P17/08

    摘要： The present invention relates to the base sequence of whole genes involved in the biosynthesis of FR-008 polyketides derived from Streptomyces sp. FR-008. This base sequence comprises genes coding for ketosynthase (KS), acyl transferase (AT), acyl carrier protein (ACP), ketoreductase (KR), dehydratase (DH) and enoyl reductase (ER) domains, and genes coding for modifier enzymes, such as ABC transporter, cytochrome P450 monooxygenase, ferredoxin, thioesterase, sugar synthetic protein, FAD-dependent monooxygenase, 4-amino-4-deoxychorismate (ADC) synthase and ADC lyase. The gene base sequence according to the present invention can be used to increase the productivity of the existing FR-008 polyketides or produce new FR-008 polyketides, through modification of its parts.

    摘要翻译： 本发明涉及参与由链霉菌属（Streptomyces sp。）生产的FR-008聚酮化合物的生物合成的全基因的碱基序列。 FR-008。 该碱基序列包括编码酮解酶（KS），酰基转移酶（AT），酰基载体蛋白（ACP），酮还原酶（KR），脱水酶（DH）和烯酰还原酶（ER）结构域的基因，以及编码修饰酶的基因， 作为ABC转运蛋白，细胞色素P450单加氧酶，铁氧还蛋白，硫酯酶，糖合成蛋白，FAD依赖性单加氧酶，4-氨基-4-脱氧激酶（ADC）合酶和ADC裂解酶。 根据本发明的基因碱基序列可用于通过改变其部分来提高现有FR-008聚酮化合物的生产率或生产新的FR-008聚酮化合物。

    LIQUID CRYSTAL DISPLAY DEVICE
    9.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
    液晶显示装置

    公开(公告)号：US20070046856A1

    公开(公告)日：2007-03-01

    申请号：US11552289

    申请日：2006-10-24

    申请人： Sang Lee ,  Jung Kang ,  Sang Lee

    发明人： Sang Lee ,  Jung Kang ,  Sang Lee

    IPC分类号： G02F1/1335

    CPC分类号： G02B6/0038 ,  G02B6/0053 ,  G02F2001/133607

    摘要： An LCD device has scratch-resistant property without using a protection sheet and can provide enhanced brightness. The LCD device includes a light path regulating member. The member includes a first prism sheet having first prisms of which apex has a round shape. The first prism sheet concentrates light supplied from a lamp to output the concentrated light. An anti-glare polarizing plate uniformly polarizes polarized planes of the concentrated light and provides the polarized light to the lower substrate. The anti-glare polarizing plate is arranged below the lower substrate of an LCD panel, and an uppermost prism sheet of optical sheets is non-matte-treated and has round-treated apexes. In spite of the absence of the protection sheet, the scratch-resistant property of the uppermost prism sheet and the brightness of the LCD panel may be enhanced.

    摘要翻译： 液晶显示装置具有耐刮擦性能，不使用保护片，可提供更高的亮度。 LCD装置包括光路调节部件。 该构件包括具有顶点具有圆形形状的第一棱镜的第一棱镜片。 第一棱镜片集中从灯提供的光以输出集中的光。 抗眩光偏光板使聚光的偏振面均匀地偏振，并向下基板提供偏振光。 防眩光偏振板配置在LCD面板的下基板的下方，最上方的光学片棱镜片未经磨光处理，具有圆形处理的顶点。 尽管不存在保护片，但是可以提高最上面的棱镜片的耐擦伤性和LCD面板的亮度。

    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
    10.
    发明申请
    Reactor for thin film deposition and method for depositing thin film on wafer using the reactor 审中-公开
    用于薄膜沉积的反应器和使用反应器在晶片上沉积薄膜的方法

    公开(公告)号：US20050158469A1

    公开(公告)日：2005-07-21

    申请号：US11080748

    申请日：2005-03-15

    申请人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

    发明人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

    IPC分类号： H01L21/20 ,  C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  C23C16/00

    CPC分类号： C23C16/45574 ,  C23C16/45527 ,  C23C16/45536 ,  C23C16/45538 ,  C23C16/45544 ,  C23C16/45565 ,  C23C16/5096

    摘要： A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top plate disposed to cover the reactor block; a shower head which is mounted on the bottom of the top plate and diffuses gas toward the wafer; and an exhaust unit which exhausts the gas from the reactor block. A first supply pipeline which supplies a first reactant gas and/or an inert gas to the wafer; a second supply pipeline which supplies a second reactant gas and/or an inert gas to the wafer; and a plasma generator which generates plasma between the wafer block and shower head are included. The shower head includes: a first supply path connected to the first supply pipeline; a plurality of first diffuse holes formed in the bottom of the shower head at a constant interval; a first main path formed parallel to the plane of the shower head and connecting the plurality of first diffuse holes and the first supply path; a second supply path connected to the second supply pipeline; a plurality of second diffuse holes formed in the bottom of the shower head at a constant interval as the plurality of the first diffuse holes; and a second main path formed parallel to the plane of the shower head at a different height from the second main path and connecting the plurality of second diffuse holes and the second supply path.

    摘要翻译： 提供了一种用于薄膜沉积的反应器和使用该反应器的薄膜沉积方法。 反应器包括：反应器块，其接收通过晶片传送狭缝转移的晶片; 晶片块，其安装在反应器块中以在其上接收晶片; 设置成覆盖反应器块的顶板; 淋浴头，其安装在顶板的底部并将气体向晶片扩散; 以及从反应器块排出气体的排气单元。 一种向晶片提供第一反应气体和/或惰性气体的第一供应管线; 第二供应管线，其向所述晶片供给第二反应气体和/或惰性气体; 并且包括在晶片块和淋浴头之间产生等离子体的等离子体发生器。 淋浴头包括：连接到第一供应管道的第一供应路径; 以恒定的间隔形成在所述淋浴喷头的底部的多个第一扩散孔; 第一主路径，其平行于所述淋浴头的平面形成，并且连接所述多个第一扩散孔和所述第一供给路径; 连接到第二供应管线的第二供应路径; 多个第二扩散孔，作为多个第一扩散孔以恒定的间隔形成在所述淋浴喷头的底部; 以及第二主路径，其与所述淋浴喷头的平面平行，与所述第二主路径不同的高度，并且连接所述多个第二扩散孔和所述第二供应路径。