公开(公告)号：US09748526B2

公开(公告)日：2017-08-29

申请号：US14004896

申请日：2012-03-09

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C14/24 ,  H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  H05B33/10

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

公开(公告)号：US09299946B2

公开(公告)日：2016-03-29

申请号：US14008535

申请日：2012-03-27

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L33/14 ,  H01L51/50 ,  H05B33/14 ,  H01L51/56 ,  H01L27/32 ,  H01L51/52

CPC分类号： H01L51/504 ,  H01L27/3213 ,  H01L27/3218 ,  H01L27/3244 ,  H01L51/5265 ,  H01L51/56 ,  H05B33/145

摘要： TFT substrate (10) includes a plurality of pixel regions each including light emitting regions of at least three colors, which light emitting regions include light emitting layers (23R(1), 23G, 23R(2), and 23B), respectively, and two adjacent ones of the light emitting regions are a combination other than a combination of (i) a light emitting region included in a light emitting layer (23G) of a color having a highest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance and (ii) a light emitting region included in a light emitting layer (23B) of a color having a lowest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance.

摘要翻译： TFT基板（10）包括分别包括至少三种颜色的发光区域的多个像素区域，该发光区域分别包括发光层（23R（1），23G，23R（2）和23B），以及 两个相邻的发光区域是除了（i）包含在发光层（23G）中的发光区域的组合之外的组合，在发光层的发光层的情况下具有最高电流效率的颜色 所述至少三种颜色的发光区域发射具有相同亮度的光，以及（ii）包含在具有最低电流效率的颜色的发光层（23B）中的发光区域，在发光层的发光层 至少三种颜色的发光区域发射具有相同亮度的光。

公开(公告)号：US09297547B2

公开(公告)日：2016-03-29

申请号：US13497701

申请日：2010-09-17

申请人： Gen Kumamoto ,  Satoshi Hashimoto

发明人： Gen Kumamoto ,  Satoshi Hashimoto

IPC分类号： F24F11/00 ,  F24F1/00 ,  F24F11/02

CPC分类号： F24F11/0078 ,  F24F1/0011 ,  F24F1/0014 ,  F24F11/30 ,  F24F11/64 ,  F24F11/65 ,  F24F11/72 ,  F24F11/79 ,  F24F11/85 ,  F24F13/1413 ,  F24F2001/0037 ,  F24F2110/10

摘要： A control device controls a swing action of flaps of an air conditioning apparatus. The flaps are swung up and down. The control device includes an operation mode determining section, a swing pattern storage area and a control command generator. The operation mode determining section determines at least an air-cooling operation mode and an air-warming operation mode that are operation modes of the air conditioning apparatus. The swing pattern storage area stores a plurality of swing patterns that include information pertaining to the swing action. The control command generator generates a control command of the air conditioning apparatus on the basis of a swing pattern corresponding to the mode determined by the operation mode determining section from among the plurality of swing patterns.

摘要翻译： 控制装置控制空调装置的襟翼的摆动动作。 襟翼上下摆动。 控制装置包括操作模式确定部，摆动模式存储区和控制指令发生器。 操作模式确定部至少确定作为空调装置的操作模式的制冷运转模式和制热运转模式。 摆动图案存储区域存储包括与摆动动作有关的信息的多个摆动图案。 控制指令发生器根据与多个摆动模式中由操作模式确定部分确定的模式相对应的摆动模式，生成空调装置的控制命令。

公开(公告)号：US09240572B2

公开(公告)日：2016-01-19

申请号：US13984799

申请日：2012-03-02

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56 ,  C23C16/455 ,  H01L51/00

CPC分类号： H01L51/56 ,  C23C14/044 ,  C23C14/12 ,  C23C14/562 ,  C23C16/45578 ,  H01L51/0011

摘要： A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.

摘要翻译： 蒸镀装置包括：蒸镀源（60），具有排出气相沉积粒子（91）的多个气相沉积源开口（61），具有多个限制开口（82）的限制单元（80） 气相沉积掩模（70），其中多个掩模开口（71）仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区（72）中。 多个气相沉积区域沿着与基板（10）的法线方向正交的第二方向和基板的移动方向排列，其中气相沉积微粒不具有非气相沉积区域（73） 夹在其间。 沿着平行于第二方向的直线上的非蒸镀区域的位置，沿着基板的移动方向的不同位置，沿蒸镀粒子的法线方向 底物。 因此，可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。

公开(公告)号：US09076989B2

公开(公告)日：2015-07-07

申请号：US13976422

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H05B33/04 ,  H05B33/10 ,  H01L21/02 ,  H01L51/00 ,  C23C14/04 ,  C23C16/04 ,  H01L27/32

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C16/042 ,  H01L21/02104 ,  H01L27/3211 ,  H01L51/0011 ,  H01L2227/323 ,  H01L2251/566 ,  H05B33/04 ,  H05B33/10

摘要： A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.

摘要翻译： 掩模膜（13）形成为在显示区域（R1）（发光区域）和密封区域中具有开口。 随后，形成具有条纹图案的发光层（8R，8G，8B）。 然后，剥离掩模膜（13），从而提供以高分辨率图案化的发光层（8R，8G，8B）。

公开(公告)号：US08673077B2

公开(公告)日：2014-03-18

申请号：US13984283

申请日：2012-03-02

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C16/00 ,  H01L21/31

CPC分类号： H01L51/5012 ,  C23C14/042 ,  C23C14/243 ,  C23C14/564 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

摘要： Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.

摘要翻译： 从至少一个气相沉积源开口（61）排出的气相沉积颗粒（91）通过限制单元（80）的多个限制开口（82）和气相沉积掩模的多个掩模开口（71） 70），并且粘附到沿着第二方向（10a）相对移动以形成涂膜的基板（10）。 限制单元包括彼此堆叠的多个板构件。 因此，可以以低成本有效地形成在大尺寸基板上抑制边缘模糊的气相沉积涂膜。

公开(公告)号：US20140004641A1

公开(公告)日：2014-01-02

申请号：US14004896

申请日：2012-03-09

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

摘要翻译： 蒸镀装置（1）进行蒸镀处理，在成膜基板（40）上形成具有规定图案的发光层（47）。 气相沉积装置包括：具有多个喷射孔（16）的喷嘴（13），当进行气相沉积处理时，构成发光层的气相沉积颗粒（17）从该注入孔喷射到成膜基底 ; 以及设置在喷嘴和成膜基板之间的多个控制板（20），并且限制从多个喷射孔喷射的气相沉积颗粒相对于成膜基板的入射角。 喷嘴包括：容器形状的喷嘴主体（14b），其在成膜基板侧的表面上具有开口（14c），和（ii）覆盖开口并分离的多个块体（15） 所述多个块中的每个具有所述多个喷射孔。 上述布置允许以高清晰度形成气相沉积膜图案。

公开(公告)号：US20130280840A1

公开(公告)日：2013-10-24

申请号：US13997173

申请日：2011-12-19

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H01L21/02

CPC分类号： C23C16/45578 ,  C23C14/24 ,  C23C14/243 ,  H01L21/02263 ,  H01L51/001 ,  H01L51/56 ,  H05B33/10

摘要： A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).

摘要翻译： 根据本发明的蒸镀装置（50）是在成膜基板（60）上形成膜的蒸镀装置，其特征在于，所述蒸镀装置具有：蒸镀源（80），具有喷射孔 ），用于将气相沉积粒子供给到气相沉积源（80）的气相沉积粒子坩埚（82）和用于改变蒸汽喷射量分布的旋转马达（86） 通过旋转气相沉积源（80）来沉积颗粒。

公开(公告)号：US20130276701A1

公开(公告)日：2013-10-24

申请号：US13976443

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L31/18

CPC分类号： C23C16/4401 ,  C12M33/00 ,  C23C14/564 ,  H01L31/186 ,  H01L51/0011

摘要： A Film (7) is provided on at least a part of a surface of each of a vapor deposition preventing plate (3) and a shutter (4) of a vacuum chamber (5) on which surface vapor deposition particles are vapor-deposited, the film (7) being provided so as to be peeled off from the each of the vapor deposition preventing plate (3) and the shutter (4), and the film being made of a material differing in at least one of a melting point, a sublimation point, solubility in a given solvent, microbial biodegradability, and photodegradability from a material of which a vapor-deposited film that is formed on the film (7) is made.

摘要翻译： 在气相沉积颗粒被蒸镀的真空室（5）的气相沉积防止板（3）和快门（4）的每一个的表面的至少一部分上提供膜（7） 薄膜（7）设置成从每个防蒸镀板（3）和活门（4）上剥离，并且该薄膜由不同于熔点， 升华点，在给定溶剂中的溶解度，微生物生物降解性和由形成在膜（7）上的气相沉积膜的材料的光降解性）。

公开(公告)号：US08293038B2

公开(公告)日：2012-10-23

申请号：US11985296

申请日：2007-11-13

申请人： Akihiko Takahashi ,  Junichi Hamada ,  Ken Kimura ,  Takashi Morohoshi ,  Yoshihito Yamada ,  Toyohiko Kakihara ,  Satoshi Hashimoto

发明人： Akihiko Takahashi ,  Junichi Hamada ,  Ken Kimura ,  Takashi Morohoshi ,  Yoshihito Yamada ,  Toyohiko Kakihara ,  Satoshi Hashimoto

IPC分类号： C22C38/00

CPC分类号： C22C38/002 ,  C21C5/005 ,  C21C7/0006 ,  C21C7/005 ,  C21D8/021 ,  C21D8/0268 ,  C21D8/0273 ,  C21D8/041 ,  C21D8/0468 ,  C21D8/0473 ,  C21D2211/005 ,  C22C38/004 ,  C22C38/28

摘要： The present invention provides a ferritic stainless steel casting and a sheet thereof excellent in deep drawability, punch stretchability and ridging resistance and a method for producing the casting and the sheet. In the present invention, a chemical composition is controlled so that the amounts of C, N, Si, Mn, P and Ti may be reduced to the utmost for securing high workability and, on the basis of the chemical composition, the roping and ridging of a steel sheet product is reduced by adding Mg, thus dispersing Mg containing oxides that accelerate the formation of nuclei for solidification and, resultantly, suppressing the development of coarse columnar crystals in a casting. The present invention is characterized in that the average composition of the Mg containing oxides dispersing in a casting satisfies the following expressions and , 17.4(Al2O3)+3.9(MgO)+0.3(MgAl2O4)+18.7(CaO)≦500   , (Al2O3)+(MgO)+(MgAl2O4)+(CaO)≧95   .

摘要翻译： 本发明提供一种铁素体不锈钢铸件及其深冲性，冲压伸缩性和抗皱性优异的片材以及铸造和片材的制造方法。 在本发明中，化学成分被控制为使得可以将C，N，Si，Mn，P和Ti的量最大限度地降低以确保高的可加工性，并且基于化学成分，卷绕和起皱 通过添加Mg来还原钢板产品，从而分散加速形成核固化的含Mg氧化物，从而抑制铸造中的粗大柱状晶体的发展。 本发明的特征在于，分散在铸件中的含Mg氧化物的平均组成满足以下表达式2和3，17.4（Al 2 O 3）+3.9（MgO）+0.3（MgAl 2 O 4）+18.7（CaO） ＆Al; 500 2，（Al 2 O 3）+（MgO）+（MgAl 2 O 4）+（CaO）≥953。