Method and apparatus for polishing workpiece
    2.
    发明授权
    Method and apparatus for polishing workpiece 失效
    抛光工件的方法和设备

    公开(公告)号:US5651724A

    公开(公告)日:1997-07-29

    申请号:US524824

    申请日:1995-09-07

    IPC分类号: B24B37/30 B24B7/00

    CPC分类号: B24B37/30

    摘要: A predetermined amount of liquid such as water is supplied to a backside surface of a workpiece such as a semiconductor wafer. Such liquid is a workpiece retaining liquid and is attached to a concave workpiece holding surface of a top ring. The workpiece is positioned between a turntable and the top ring and is polished by an abrasive cloth on the turntable while the workpiece is being pressed against the turntable by the top ring. While polishing, the workpiece is deformed toward the concave workpiece holding surface of the top ring, and a curvature of the deformed workpiece is controlled by the amount of liquid between the workpiece holding surface and the backside surface of the workpiece.

    摘要翻译: 将诸如水的预定量的液体供应到诸如半导体晶片的工件的背面。 这种液体是工件保持液体,并且附接到顶环的凹入的工件保持表面。 工件位于转盘和顶环之间,并通过研磨布在转台上抛光,同时工件被顶环压在转台上。 在抛光时,工件朝着顶环的凹入工件保持面变形,并且变形的工件的曲率由工件保持面与工件的背面之间的液体量控制。

    Polishing apparatus with swinging structures
    3.
    发明授权
    Polishing apparatus with swinging structures 失效
    具有摆动结构的抛光装置

    公开(公告)号:US5653624A

    公开(公告)日:1997-08-05

    申请号:US527422

    申请日:1995-09-13

    IPC分类号: B24B37/10 B24B5/00 B24B29/00

    CPC分类号: B24B37/105

    摘要: A compact polishing apparatus requires less operating space than a conventional polishing apparatus generally used for polishing semiconductor wafers. The present apparatus has a swing shaft to provide a swing motion to a pressing device including a top ring member. There are three ranges of swing motion, i.e. a polishing range which is a small motion range used for polishing a wafer within the confined area of a turntable, a receiving range which is a medium motion range used for loading/unloading of a wafer in an area beyond the turntable, and a standby range which is a large motion range used for moving the top ring member to a standby or rinsing position in an area beyond the turntable. Because of the swing-based arrangement of the components in the present apparatus, isolation of critical components is easily achieved, thus resulting in low maintenance costs and long service life of the present apparatus. These advantages offer significant cost savings in the management of polishing operations.

    摘要翻译: 紧凑的抛光装置比通常用于抛光半导体晶片的常规抛光装置需要较少的操作空间。 本装置具有摆动轴,以向包括顶环构件的按压装置提供摆动运动。 有三个摆动运动范围,即抛光范围,该抛光范围是用于在转台的受限区域内抛光晶片的小运动范围,作为用于将晶片加载/卸载的介质运动范围的接收范围 以及用于将顶环构件移动到转台之外的区域中的待机或冲洗位置的大的运动范围的待机范围。 由于本装置中的部件的基于摆动的布置,容易实现关键部件的隔离,因此导致本装置的维护成本低和使用寿命长。 这些优点为抛光操作的管理提供了显着的成本节约。

    Waste treatment system in a polishing apparatus
    4.
    发明授权
    Waste treatment system in a polishing apparatus 失效
    抛光装置中的废物处理系统

    公开(公告)号:US5584959A

    公开(公告)日:1996-12-17

    申请号:US291530

    申请日:1994-08-16

    摘要: A waste treatment system in a polishing apparatus treats waste gas and waste liquid discharged from the polishing apparatus. The waste treatment system comprises an exhaust duct provided in a partition wall enclosing the polishing apparatus, a scrubber connected to the exhaust duct through an exhauster for scrubbing waste gas discharged from the polishing apparatus, a waste liquid receiver provided below an abrasive cloth of the polishing apparatus for receiving waste liquid generated by a polishing operation and a waste liquid treatment apparatus connected to the waste liquid receiver for treating the waste liquid discharged from the polishing apparatus.

    摘要翻译: 抛光装置中的废物处理系统处理从抛光装置排出的废气和废液。 废物处理系统包括设置在包围抛光装置的分隔壁中的排气管道,通过用于洗涤从抛光装置排出的废气的排气器连接到排气管道的洗涤器,设置在抛光装置的研磨布下方的废液接收器 用于接收由抛光操作产生的废液的设备和连接到废液接收器的废液处理设备,用于处理从抛光设备排出的废液。

    Method for producing sanshool
    5.
    发明授权
    Method for producing sanshool 有权
    生产学校的方法

    公开(公告)号:US08871962B2

    公开(公告)日:2014-10-28

    申请号:US13988401

    申请日:2011-11-28

    申请人: Katsuyuki Aoki

    发明人: Katsuyuki Aoki

    摘要: Provided are a method for producing a sanshool, which method has a short process and exhibits high stereoselectivity, as well as an iron carbonyl complex compound that is an intermediate useful for the production method.A diene iron complex compound characterized by being represented by the following general formula (I): (in which A represents CO, P(RA)3, CN, NO, SO(RA)3, or N(RA)2; RA represents a straight chain or branched chain alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 12 carbon atoms; and one of R1 and R2 represents a hydrogen atom and the other one thereof represents a structure represented by the following formula (II)): (in which R represents a hydrogen atom, a hydroxyl group, or a methyl group).

    摘要翻译: 本发明提供了一种生产方法,该方法具有短的工艺并具有高立体选择性,以及作为制备方法有用的中间体的羰基铁配合物。 一种二烯铁络合物,其特征在于由以下通式(I)表示:(其中A表示CO,P(RA)3,CN,NO,SO(RA)3或N(RA)2) 具有1至4个碳原子的直链或支链烷基或具有6至12个碳原子的芳基; R 1和R 2之一表示氢原子,并且其中之一表示由下式(II )):(其中R表示氢原子,羟基或甲基)。

    Cathode-ray tube and method for manufacturing the same
    6.
    发明授权
    Cathode-ray tube and method for manufacturing the same 失效
    阴极射线管及其制造方法

    公开(公告)号:US06570317B1

    公开(公告)日:2003-05-27

    申请号:US09736019

    申请日:2000-12-19

    IPC分类号: H01J2910

    摘要: A cathode ray tube has, on an external surface of a face-panel, an anti-reflection film in which a layer mainly consisting of SiO2 is laminated on a transparent conductive layer that includes at least one of colored ITO and colored ATO, and a coloring matter that has a color that is a complementary color with respect to the colors of ITO and/or ATO. As the colored ITO and/or colored ATO, one that has a particle diameter of from 10 to 500 nm is employed. In addition, as the coloring matter, a dyestuff that has the maximum absorption in the wavelength range of 550 to 600 nm or the like is employed. Value of surface resistance of the anti-reflection film is preferable to be 1×106 &OHgr;/sq or less. A cathode ray tube having such an anti-reflection film can prevent effectively AEF from occurring and realize an improved contrast and comfortable body color.

    摘要翻译: 阴极射线管在面板的外表面上具有抗反射膜,其中主要由SiO 2组成的层层叠在包括彩色ITO和着色ATO中的至少一种的透明导电层上, 具有相对于ITO和/或ATO的颜色的互补色的颜色的色素。 作为着色的ITO和/或着色ATO,使用粒径为10〜500nm的ATO。 此外,作为色素,采用在550〜600nm的波长范围内具有最大吸收的染料等。 抗反射膜的表面电阻值优选为1×10 6Ω/□以下。 具有这种抗反射膜的阴极射线管可以有效地防止AEF的发生,并且实现改善的对比度和舒适的身体颜色。

    LIQUID DEVELOPING AGENT, METHOD OF PRODUCING THE SAME AND METHOD OF PRODUCING DISPLAY DEVICE
    9.
    发明申请
    LIQUID DEVELOPING AGENT, METHOD OF PRODUCING THE SAME AND METHOD OF PRODUCING DISPLAY DEVICE 审中-公开
    液体发明剂,其生产方法和制造显示装置的方法

    公开(公告)号:US20080248413A1

    公开(公告)日:2008-10-09

    申请号:US12054705

    申请日:2008-03-25

    IPC分类号: G03G9/08 G03G13/04

    摘要: On the surface of a core particle of a toner particle, a silane coupling agent treatment layer, a coating layer of thermoplastic resin microparticles applied to the core particle and a charge control agent added to the coating layer through the silane coupling agent treatment layer are provided, wherein the toner particle has a particle diameter of 1 to 10 μm, or on the surface of a core particle of a toner particle, a coating layer of thermoplastic resin microparticles and a charge control agent added to the coating layer and made of an organic compound containing at least one type of lanthanoid metal are provided, or on a ZnS type fluorescent body core particle, a coating layer of thermoplastic resin microparticles and a charge control agent added to the coating layer and including a metal compound containing the IIA metal or IIIA group metal are provided.

    摘要翻译: 在调色剂颗粒的核心颗粒的表面上,提供硅烷偶联剂处理层,施加到核心颗粒的热塑性树脂微粒涂层和通过硅烷偶联剂处理层添加到涂层中的电荷控制剂 ,其中调色剂颗粒的粒径为1-10μm,或在调色剂颗粒的核心颗粒的表面上,热塑性树脂微粒的涂层和电荷控制剂添加到涂层中并由有机 提供含有至少一种类型的镧系金属的化合物,或者在ZnS型荧光体核心颗粒上,添加到涂层中的热塑性树脂微粒和电荷控制剂的涂层,并且包含含有IIA金属或IIIA的金属化合物 提供组金属。