Memory Cell and Method of Forming a Magnetic Tunnel Junction (MTJ) of a Memory Cell
    1.
    发明申请
    Memory Cell and Method of Forming a Magnetic Tunnel Junction (MTJ) of a Memory Cell 有权
    记忆单元和存储单元的磁隧道结(MTJ)的形成方法

    公开(公告)号:US20090174015A1

    公开(公告)日:2009-07-09

    申请号:US11970557

    申请日:2008-01-08

    IPC分类号: H01L29/82 H01L21/00

    摘要: A memory including a memory cell and method for producing the memory cell are disclosed. The memory includes a substrate in a first plane. A first metal connection extending in a second plane is provided. The second plane is substantially perpendicular to the first plane. A magnetic tunnel junction (MTJ) is provided having a first layer coupled to the metal connection such that the first layer of the MTJ is oriented along the second plane.

    摘要翻译: 公开了一种包括存储单元的存储器及其制造方法。 存储器包括在第一平面中的衬底。 提供了在第二平面中延伸的第一金属连接。 第二平面基本上垂直于第一平面。 提供磁性隧道结(MTJ),其具有耦合到金属连接的第一层,使得MTJ的第一层沿着第二平面定向。

    LOW COST HIGH THROUGHPUT TSV/MICROBUMP PROBE
    2.
    发明申请
    LOW COST HIGH THROUGHPUT TSV/MICROBUMP PROBE 审中-公开
    低成本高通量TSV / MICROBUMP探头

    公开(公告)号:US20130297981A1

    公开(公告)日:2013-11-07

    申请号:US13537528

    申请日:2012-06-29

    IPC分类号: G01R31/3177

    摘要: A first apparatus, such as a die or a semiconductor package, has signal paths extending through the apparatus. The signal paths can include through vias and other components. The signal paths are operable to communicate with a second apparatus when the second apparatus is stacked with the first apparatus. The first apparatus also has pass gates. Each pass gate is configurable in response to a signal, to short a pair of the signal paths to enable substantially simultaneous testing of the signal paths. The pass gates may be configurable to isolate the signal paths during operation of the first apparatus.

    摘要翻译: 诸如裸片或半导体封装的第一装置具有延伸穿过该装置的信号路径。 信号路径可以包括通孔和其它组件。 当第二装置与第一装置堆叠时,信号路径可操作以与第二装置通信。 第一个装置也有通过门。 每个通过门可以响应于信号而配置,以缩短一对信号路径以实现信号路径的基本上同时的测试。 通过门可以被配置为在第一设备的操作期间隔离信号路径。

    Magnetic tunnel junction (MTJ) storage element and spin transfer torque magnetoresistive random access memory (STT-MRAM) cells having an MTJ
    6.
    发明授权
    Magnetic tunnel junction (MTJ) storage element and spin transfer torque magnetoresistive random access memory (STT-MRAM) cells having an MTJ 有权
    具有MTJ的磁隧道结(MTJ)存储元件和具有MTJ的自旋传递转矩磁阻随机存取存储器(STT-MRAM)

    公开(公告)号:US09368716B2

    公开(公告)日:2016-06-14

    申请号:US12363886

    申请日:2009-02-02

    摘要: A magnetic tunnel junction storage element for a spin transfer torque magnetoresistive random access memory (STT-MRAM) bit cell includes a bottom electrode layer, a pinned layer adjacent to the bottom electrode layer, a dielectric layer encapsulating a portion of the bottom electrode layer and the pinned layer, the dielectric layer including sidewalls that define a hole adjacent to a portion of the pinned layer, a tunneling barrier adjacent to the pinned layer, a free layer adjacent to the tunneling barrier, and a top electrode adjacent to the free layer, wherein a width of the bottom electrode layer and/or the pinned barrier in a first direction is greater than a width of a contact area between the pinned layer and the tunneling barrier in the first direction. Also a method of forming an STT-MRAM bit cell.

    摘要翻译: 用于自旋传递转矩磁阻随机存取存储器(STT-MRAM)位单元的磁性隧道结存储元件包括底部电极层,与底部电极层相邻的被钉扎层,封装底部电极层的一部分的电介质层和 被钉扎层,介电层包括限定与被钉扎层的一部分相邻的孔的侧壁,与被钉扎层相邻的隧道势垒,邻近隧道势垒的自由层和与自由层相邻的顶部电极, 其中所述底电极层和/或所述被钉扎的屏障在第一方向上的宽度大于所述被钉扎层和所述隧道势垒之间在所述第一方向上的接触面积的宽度。 也是形成STT-MRAM位单元的方法。

    Two mask MTJ integration for STT MRAM
    7.
    发明授权
    Two mask MTJ integration for STT MRAM 有权
    两个掩模MTJ集成为STT MRAM

    公开(公告)号:US08125040B2

    公开(公告)日:2012-02-28

    申请号:US12405461

    申请日:2009-03-17

    IPC分类号: H01L29/82

    摘要: A method for forming a magnetic tunnel junction (MTJ) for magnetic random access memory (MRAM) using two masks includes depositing over an interlevel dielectric layer containing an exposed first interconnect metallization, a first electrode, a fixed magnetization layer, a tunneling barrier layer, a free magnetization layer and a second electrode. An MTJ structure including the tunnel barrier layer, free layer and second electrode is defined above the first interconnect metallization by a first mask. A first passivation layer encapsulates the MTJ structure, leaving the second electrode exposed. A third electrode is deposited in contact with the second electrode. A second mask is used to pattern a larger structure including the third electrode, the first passivation layer, the fixed magnetization layer and the first electrode. A second dielectric passivation layer covers the etched plurality of layers, the first interlevel dielectric layer and the first interconnect metallization.

    摘要翻译: 使用两个掩模形成用于磁性随机存取存储器(MRAM)的磁性隧道结(MTJ)的方法包括在包含暴露的第一互连金属化的层间介质层上沉积,第一电极,固定磁化层,隧道势垒层, 自由磁化层和第二电极。 包括隧道势垒层,自由层和第二电极的MTJ结构通过第一掩模限定在第一互连金属化之上。 第一钝化层封装MTJ结构,留下第二电极。 沉积与第二电极接触的第三电极。 使用第二掩模来图案化包括第三电极,第一钝化层,固定磁化层和第一电极的较大结构。 第二电介质钝化层覆盖被蚀刻的多个层,第一层间介质层和第一互连金属化层。

    Magnetic Tunnel Junction (MTJ) Storage Element and Spin Transfer Torque Magnetoresistive Random Access Memory (STT-MRAM) Cells Having an MJT
    8.
    发明申请
    Magnetic Tunnel Junction (MTJ) Storage Element and Spin Transfer Torque Magnetoresistive Random Access Memory (STT-MRAM) Cells Having an MJT 有权
    具有MJT的磁隧道结(MTJ)存储元件和自旋转移扭矩磁阻随机存取存储器(STT-MRAM)

    公开(公告)号:US20100193888A1

    公开(公告)日:2010-08-05

    申请号:US12363886

    申请日:2009-02-02

    IPC分类号: H01L29/82 H01L21/00

    摘要: A magnetic tunnel junction storage element for a spin transfer torque magnetoresistive random access memory (STT-MRAM) bit cell includes a bottom electrode layer, a pinned layer adjacent to the bottom electrode layer, a dielectric layer encapsulating a portion of the bottom electrode layer and the pinned layer, the dielectric layer including sidewalls that define a hole adjacent to a portion of the pinned layer, a tunneling barrier adjacent to the pinned layer, a free layer adjacent to the tunneling barrier, and a top electrode adjacent to the free layer, wherein a width of the bottom electrode layer and/or the pinned barrier in a first direction is greater than a width of a contact area between the pinned layer and the tunneling barrier in the first direction. Also a method of forming an STT-MRAM bit cell.

    摘要翻译: 用于自旋传递转矩磁阻随机存取存储器(STT-MRAM)位单元的磁性隧道结存储元件包括底部电极层,与底部电极层相邻的被钉扎层,封装底部电极层的一部分的电介质层和 被钉扎层,介电层包括限定与被钉扎层的一部分相邻的孔的侧壁,与被钉扎层相邻的隧道势垒,邻近隧道势垒的自由层和与自由层相邻的顶部电极, 其中所述底电极层和/或所述被钉扎的屏障在第一方向上的宽度大于所述被钉扎层和所述隧道势垒之间在所述第一方向上的接触面积的宽度。 也是形成STT-MRAM位单元的方法。