摘要:
A method for iteratively decoding a block turbo code includes: receiving a signal frame formed of a product code obtained by serially concatenating block codes; forming a reliability array for signal demodulation and initializing extrinsic reliability information; performing a complexity-reduced soft decision output Viterbi decoding algorithm for all of the codewords existing on a current axis and calculating extrinsic reliability using soft decision output information output as a result of the decoding; checking whether an iterative decoding completion condition is satisfied, and outputting a decoded value and terminating an iterative decoding process when the condition is satisfied; and normalizing reliability information when the condition is not satisfied, performing reliability equalization, and repeating the decoding process for a next axis.
摘要:
Disclosed is an iterative decoding method using a soft decision output Viterbi algorithm (SOVA) for block turbo codes using product codes wherein block codes are concatenated by greater than three dimensions, which comprises: (a) a transmitter configuring a product code of greater than three dimensions and transmitting it; (b) configuring the signal transmitted by the transmitter into frames for decoding, and initializing external reliability information respectively corresponding to an axis corresponding to the product code of greater than three dimensions; and (c) sequentially iterating the soft decision output Viterbi algorithm (SOVA) decoding with respect to the respective axes.
摘要:
An implosion preventing band for a cathode ray tube includes a main band formed around an outer surface of a skirt of a face panel, and including a pair of long sides provided on opposite sides of the skirt in a direction corresponding to long sides of a screen, a pair of short sides provided on opposite sides of the skirt in a direction corresponding to short sides of a screen, and corners formed between the long sides and the short sides to interconnect the same; and degaussing coil supports formed raised from the main band on long and short sides of the main band, and each having formed one or more openings that allow passage in a direction of a width of the main band, a degaussing coil(s) being supported using the openings. A plurality of the openings is formed continuously in the degaussing coil supports in a circumferential direction of the main band.
摘要:
A ferroelectric memory device and a method for manufacturing the same is disclosed. Because a (BixLay)Ti3O12 (BLT) layer, which can be crystallized in relatively low temperature, is used in a capacitor, the electrical characteristics of the ferroelectric capacitor can be improved. The method for manufacturing ferroelectric memory device includes the steps of forming a first conductive layer for a bottom electrode on a semiconductor substrate, forming the (BixLay)Ti3O12 ferroelectric layer, wherein ‘x’ representing atomic concentration of Bi ranges from about 3.25 to about 3.35 and ‘y’ representing atomic concentration of La ranges from about 0.70 to about 0.90 and forming a second conductive layer for a top electrode on the (BixLay)Ti3O12 ferroelectric layer.
摘要翻译:公开了铁电存储器件及其制造方法。 因为可以在较低温度下结晶的(BixLay)Ti 3 O 12(BLT)层用于电容器中,因此可以提高铁电电容器的电特性。 制造铁电存储器件的方法包括以下步骤:在半导体衬底上形成用于底部电极的第一导电层,形成(BixLay)Ti 3 O 12铁电层,其中代表Bi的原子浓度的“x”范围为约3.25至约3.35 和表示La的原子浓度的“y”范围为约0.70至约0.90,并且在(BixLay)Ti 3 O 12铁电层上形成用于顶部电极的第二导电层。
摘要:
A semiconductor device for use in a memory cell includes an active matrix provided with a silicon substrate, a transistor formed on the silicon substrate, a capacitor structure formed over the transistor, a metal interconnection for electrically connecting the capacitor structure to the transistor, a barrier layer formed on top of the metal interconnection and an inter-metal dielectric (IMD) layer formed on top of the barrier layer, wherein the barrier layer is made of a material such as A12O3 or the like. The IMD layer is formed by using a plasma chemical vapor deposition (CVD) in a hydrogen rich atmosphere, wherein the barrier layer is used for preventing the capacitor structure from the hydrogen.
摘要:
A graphene-based laminate including a doped polymer layer is disclosed. The graphene-based laminate may include a substrate; a graphene layer disposed on the substrate and including at least one layer; and a doped polymer layer disposed on at least one surface of the graphene layer and including an organic dopant.
摘要:
A method for fabricating a ferroelectric capacitor in a ferroelectric memory device includes the steps of forming a first conductive layer on a semiconductor structure prepared for a formation of ferroelectric capacitor, forming a first ferroelectric layer on said first conductive layer, carrying out a rapid thermal annealing for nucleation in said ferroelectric layer, forming a second conductive layer on said ferroelectric layer, and carrying out a thermal treatment for a grain growth in said ferroelectric layer, thereby the interface characteristics are improved, reducing leakage currents and preventing a peeling phenomenon during a following etching process.
摘要:
A graphene-based laminate including a doped polymer layer is disclosed. The graphene-based laminate may include a substrate; a graphene layer disposed on the substrate and including at least one layer; and a doped polymer layer disposed on at least one surface of the graphene layer and including an organic dopant.
摘要:
A method for forming a capacitor in a semiconductor device is disclosed, in which the dielectric medium of the capacitor is a ferroelectric film or a high dielectric constant film. In the method for forming a capacitor in a semiconductor device, peeling of the lower electrode is prevented, and the etch residues (organic polymer) which have been formed when carrying out a dry etching can be effectively removed.
摘要:
A semiconductor device for use in a memory cell includes an active matrix provided with a silicon substrate, a transistor formed on the silicon substrate, a capacitor structure formed over the transistor, a metal interconnection for electrically connecting the capacitor structure to the transistor, a barrier layer formed on top of the metal interconnection and an inter-metal dielectric (IMD) layer formed on top of the barrier layer, wherein the barrier layer is made of a material such as Al2O3 or the like. The IMD layer is formed by using a plasma chemical vapor deposition (CVD) in a hydrogen rich atmosphere, wherein the barrier layer is used for preventing the capacitor structure from the hydrogen.
摘要翻译:用于存储单元的半导体器件包括:设置有硅衬底的有源矩阵,形成在硅衬底上的晶体管,形成在晶体管上的电容器结构,用于将电容器结构电连接到晶体管的金属互连, 形成在金属互连的顶部上的层,以及形成在阻挡层顶部上的金属间电介质(IMD)层,其中阻挡层由诸如Al 2 O 3的材料制成, 3等。 通过在富氢气氛中使用等离子体化学气相沉积(CVD)形成IMD层,其中阻挡层用于防止电容器结构脱离氢。