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    TUNABLE SUBWAVELENGTH RESONANT GRATING FILTER
    1.
    发明申请
    TUNABLE SUBWAVELENGTH RESONANT GRATING FILTER 有权
    TUNNABLE SUBWAVELENGTH共振光栅滤光片

    公开(公告)号：US20050237475A1

    公开(公告)日：2005-10-27

    申请号：US10674608

    申请日：2003-09-30

    申请人： Stephen Chou ,  Allan Chang ,  Hua Tan ,  Jim Wang ,  Wei Wu ,  Rich Yu

    发明人： Stephen Chou ,  Allan Chang ,  Hua Tan ,  Jim Wang ,  Wei Wu ,  Rich Yu

    IPC分类号： G02F1/13 ,  G02F1/1333 ,  G02F1/1335 ,  G02F1/139

    CPC分类号： G02F1/133553 ,  G02F1/1326 ,  G02F1/1393 ,  G02F2201/307 ,  G02F2203/055

    摘要： In accordance with the invention, a tunable subwavelength resonant grating filter comprises a liquid crystal cell having a pair of major surface walls. One wall of the cell is a coated subwavelength grating of a SRGF. The coating comprises a polymer layer to fill the grating trenches and a surfactant layer to facilitate uniform alignment of the liquid crystal material. The refractive index of the LCD material in the cell can then be electrically or thermally adjusted to tune the resonant wavelength.

    摘要翻译： 根据本发明，可调谐亚波长谐振光栅滤波器包括具有一对主表面壁的液晶单元。 电池的一个壁是SRGF的涂覆的亚波长光栅。 涂层包括填充光栅沟槽的聚合物层和表面活性剂层以促进液晶材料的均匀取向。 然后可以对电池中的LCD材料的折射率进行电或热调节以调谐谐振波长。

    Apparatus for double-sided imprint lithography
    2.
    发明授权
    Apparatus for double-sided imprint lithography 有权
    双面压印光刻设备

    公开(公告)号：US07717696B2

    公开(公告)日：2010-05-18

    申请号：US10918564

    申请日：2004-08-13

    申请人： Stephen Chou ,  Linshu Kong ,  Colby Steere ,  Mingtao (Gary) Li ,  Hua Tan ,  Lin Hu

    发明人： Stephen Chou ,  Linshu Kong ,  Colby Steere ,  Mingtao (Gary) Li ,  Hua Tan ,  Lin Hu

    IPC分类号： B29C59/00

    CPC分类号： G11B7/263 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

    摘要： Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.

    摘要翻译： 用于多孔基材的双面压印光刻的设备包括一对相应的有孔模具，用于基板和模具的组件的支撑件以及具有用于对准模具和基板的孔的径向可移动元件的对准机构。 可移动元件可以至少部分地设置在主轴中，并且可以通过锥形的驱动杆径向向外移除。 然后可以优选通过流体压力压印光刻，同时将基板的相对表面同时印刷成对准。

    Apparatus for double-sided imprint lithography
    3.
    发明申请
    Apparatus for double-sided imprint lithography 有权
    双面压印光刻设备

    公开(公告)号：US20050146078A1

    公开(公告)日：2005-07-07

    申请号：US10918564

    申请日：2004-08-13

    申请人： Stephen Chou ,  Linshu Kong ,  Colby Steere ,  Mingtao (Gary) Li ,  Hua Tan ,  Lin Hu

    发明人： Stephen Chou ,  Linshu Kong ,  Colby Steere ,  Mingtao (Gary) Li ,  Hua Tan ,  Lin Hu

    IPC分类号： B29C59/00

    CPC分类号： G11B7/263 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

    摘要： Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.

    摘要翻译： 用于多孔基材的双面压印光刻的设备包括一对相应的有孔模具，用于基板和模具的组件的支撑件以及具有用于对准模具和基板的孔的径向可移动元件的对准机构。 可移动元件可以至少部分地设置在主轴中，并且可以通过锥形的驱动杆径向向外移除。 然后可以优选通过流体压力压印光刻，同时将基板的相对表面同时印刷成对准。

    Apparatus for fluid pressure imprint lithography
    4.
    发明申请
    Apparatus for fluid pressure imprint lithography 有权
    液体压印光刻设备

    公开(公告)号：US20050145119A1

    公开(公告)日：2005-07-07

    申请号：US10926376

    申请日：2004-08-25

    申请人： Hua Tan ,  Linshu Kong ,  Mingtao Li ,  Stephen Chou

    发明人： Hua Tan ,  Linshu Kong ,  Mingtao Li ,  Stephen Chou

    IPC分类号： B31F1/07

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  Y10S438/945

    摘要： Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

    摘要翻译： 用于压印光刻的改进的设备涉及使用直接流体压力将模具压入基板支撑的膜中。 有利地，模具和/或基底具有足够的柔性以在流体压力下提供广泛的面积接触。 流体压制可以通过将模具密封在膜上并将所得的组件设置在加压室中来实现。 这种流体压制的结果是在扩大的区域上增强了分辨率和高均匀性。

    Resource estimation for a query optimization process
    6.
    发明授权
    Resource estimation for a query optimization process 有权
    查询优化过程的资源估计

    公开(公告)号：US09298771B2

    公开(公告)日：2016-03-29

    申请号：US13754596

    申请日：2013-01-30

    申请人： Anisoara Nica ,  Stephen Chou

    发明人： Anisoara Nica ,  Stephen Chou

    IPC分类号： G06F7/00 ,  G06F17/30

    CPC分类号： G06F17/30463

    摘要： Disclosed herein are system, method, and computer program product embodiments for performing resource estimation for query optimization. An embodiment operates by generating a subplan for which an optimization process may be invoked, predicting performance and resource consumption for optimizing the subplan by measuring similarity between a hypergraph of the subplan and one or more etalon queries having known performance and resource consumption properties, selecting an algorithm for optimizing the subplan from a plurality of optimization algorithms based on the performance and resource consumption properties, and generating an optimized access plan using the selected algorithm.

    摘要翻译： 这里公开了用于执行查询优化的资源估计的系统，方法和计算机程序产品实施例。 实施例通过生成可以调用优化处理的子计划来进行操作，通过测量子计划的超图与具有已知性能和资源消耗特性的一个或多个标准具查询之间的相似度来预测用于优化子计划的性能和资源消耗，选择 算法，用于基于性能和资源消耗属性从多个优化算法优化子规划，以及使用所选择的算法生成优化的访问计划。

    METHODS AND APPARATUS OF PRESSURE IMPRINT LITHOGRAPHY
    8.
    发明申请
    METHODS AND APPARATUS OF PRESSURE IMPRINT LITHOGRAPHY 有权
    压力印刷法的方法和装置

    公开(公告)号：US20080106003A1

    公开(公告)日：2008-05-08

    申请号：US11928844

    申请日：2007-10-30

    申请人： Stephen Chou

    发明人： Stephen Chou

    IPC分类号： B29C43/00 ,  B29C43/32 ,  B29C43/56

    CPC分类号： B29C43/003 ,  B29C33/62 ,  B29C43/021 ,  B29C43/36 ,  B29C43/52 ,  B29C43/56 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/025 ,  B29C2043/3211 ,  B29C2043/568 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7053

    摘要： An improved method of imprint lithography involves using fluid-induced pressure from electric or magnetic fields to press a mold onto a substrate having a moldable surface. In essence, the method comprises the steps of providing a substrate having a moldable surface, providing a mold having a molding surface and pressing the molding surface and the moldable surface together by electric or magnetic fields to imprint the molding surface onto the moldable surface. The molding surface advantageously comprises a plurality of projecting features of nanoscale extent or separation, but the molding surface can also be a smooth planar surface, as for planarization. The improved method can be practiced without mechanical presses and without sealing the region between the mold and the substrate.

    摘要翻译： 改进的压印光刻方法涉及使用来自电场或磁场的流体诱导压力将模具压到具有可模制表面的基底上。 实质上，该方法包括以下步骤：提供具有可模制表面的基底，提供具有模制表面的模具，并通过电场或磁场将成型表面和可模制表面压在一起，以将模制表面压印到可模制表面上。 模制表面有利地包括多个纳米尺度或分离的突出特征，但是成型表面也可以是平滑的平坦表面。 可以在没有机械压力机的情况下实施改进的方法，并且不密封模具和基板之间的区域。