Laser deposition process for forming an ultrafine-particle film
    2.
    发明授权
    Laser deposition process for forming an ultrafine-particle film 失效
    用于形成超微粒膜的激光沉积工艺

    公开(公告)号:US5168097A

    公开(公告)日:1992-12-01

    申请号:US662112

    申请日:1991-02-27

    IPC分类号: C23C14/28 H01L39/24

    摘要: The process for forming an ultrafine-particle film according to this invention is characterized by irradiating the surface of a target of a raw material with laser energy in a predetermined atmosphere under conditions where a plume is generated, exposing a substrate (a base material) directly to the plume generated, and thereby forming a film. The substrate is positioned in the plume at a distance, from the surface of the target of the raw material, of at least the mean free path of atoms and/or molecules of the raw material (or components thereof). By so positioning the substrate, ultrafine particles of the raw material are deposited on the substrate. The plume containing a large amount of ultrafine particles moves at a high speed; and exposure of the substrate, at the specified position relative to the target, to the plume causes strong adhesion of ultrafine particles contained in the plume to the substrate, resulting in formation of a film.

    摘要翻译: 根据本发明的形成超微粒膜的方法的特征在于,在产生羽流的条件下,在预定的气氛中用激光能照射原料的表面,直接暴露基板(基材) 到产生的羽流,从而形成膜。 衬底位于与原料靶表面一定距离的羽流中至少原子和/或原料(或其组分)的平均自由程。 通过如此定位基板,原材料的超细颗粒沉积在基板上。 含有大量超微粒子的羽流高速移动; 并且在相对于靶的指定位置处的衬底暴露于羽流引起羽状物中包含的超微粒子与衬底的强烈粘附,导致膜的形成。