公开(公告)号：US06520189B1

公开(公告)日：2003-02-18

申请号：US09398059

申请日：1999-09-17

申请人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

发明人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

IPC分类号： B08B312

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612 ,  Y10S148/017 ,  Y10S148/043 ,  Y10S148/045 ,  Y10S438/905

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

摘要翻译： 示出了用于沉积均匀膜的改进的CVD装置。 该装置包括反应室，衬底保持器和用于光CVD的多个光源或用于等离子体CVD的一对电极。 衬底保持器是由光源包围的圆柱形手推车，并且通过驱动装置绕其轴线旋转。 利用这种结构，安装在推车和周围环境上的基板可以通过等离子体的光均匀地通过待涂覆的表面来激励。

公开(公告)号：US5855970A

公开(公告)日：1999-01-05

申请号：US769115

申请日：1996-12-18

申请人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

发明人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

IPC分类号： C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/48 ,  C23C16/517 ,  C23C16/56 ,  H01L21/316 ,  H05H1/24

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/487 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

摘要翻译： 示出了用于沉积均匀膜的改进的CVD装置。 该装置包括反应室，衬底保持器和用于光CVD的多个光源或用于等离子体CVD的一对电极。 衬底保持器是由光源包围的圆柱形手推车，并且通过驱动装置绕其轴线旋转。 利用这种结构，安装在推车和周围环境上的基板可以通过等离子体的光均匀地通过待涂覆的表面来激励。

公开(公告)号：US6013338A

公开(公告)日：2000-01-11

申请号：US188382

申请日：1998-11-10

申请人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

发明人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

IPC分类号： C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/48 ,  C23C16/517 ,  C23C16/56 ,  H01L21/316 ,  H05H1/24

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612 ,  Y10S148/017 ,  Y10S148/043 ,  Y10S148/045 ,  Y10S438/905

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

公开(公告)号：US5629245A

公开(公告)日：1997-05-13

申请号：US376736

申请日：1995-01-23

申请人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

发明人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

IPC分类号： C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/48 ,  C23C16/517 ,  C23C16/56 ,  H01L21/316 ,  H01L21/20

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/487 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

摘要翻译： 示出了用于沉积均匀膜的改进的CVD装置。 该装置包括反应室，衬底保持器和用于光CVD的多个光源或用于等离子体CVD的一对电极。 衬底保持器是由光源包围的圆柱形手推车，并且通过驱动装置绕其轴线旋转。 利用这种结构，安装在推车和周围环境上的基板可以通过等离子体的光均匀地通过待涂覆的表面来激励。

公开(公告)号：US5427824A

公开(公告)日：1995-06-27

申请号：US971242

申请日：1992-09-08

申请人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

发明人： Takashi Inushima ,  Shigenori Hayashi ,  Toru Takayama ,  Masakazu Odaka ,  Naoki Hirose

IPC分类号： C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/48 ,  C23C16/517 ,  C23C16/56 ,  H01L21/316 ,  H01L21/00

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/487 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

公开(公告)号：US4950624A

公开(公告)日：1990-08-21

申请号：US194206

申请日：1988-05-16

申请人： Takashi Inuzima ,  Shigenori Hayashi ,  Toru Takayama ,  Seiichi Odaka ,  Naoki Hirose

发明人： Takashi Inuzima ,  Shigenori Hayashi ,  Toru Takayama ,  Seiichi Odaka ,  Naoki Hirose

IPC分类号： C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  C23C16/48 ,  C23C16/517 ,  C23C16/56 ,  H01L21/316

CPC分类号： H01L21/02164 ,  C23C16/0245 ,  C23C16/402 ,  C23C16/4405 ,  C23C16/482 ,  C23C16/488 ,  C23C16/517 ,  C23C16/56 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/31608 ,  H01L21/31612 ,  Y10S148/017 ,  Y10S148/043 ,  Y10S148/045 ,  Y10S438/905

摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light source for photo CVD or a pair of electrode for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light or plasma evenly throughout the surfaces to be coated.

公开(公告)号：US4943710A

公开(公告)日：1990-07-24

申请号：US211225

申请日：1988-06-22

申请人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

发明人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

IPC分类号： G06K7/10 ,  H01L27/146 ,  H01L31/105 ,  H04N5/228 ,  H04N5/369

CPC分类号： G06K7/10841 ,  H01L27/14643 ,  H01L31/1055 ,  H04N3/1581 ,  Y10S148/092

摘要： This invention relates to an image sensor and manufacturing method for the same.

摘要翻译： 本发明涉及一种图像传感器及其制造方法。

公开(公告)号：US5017502A

公开(公告)日：1991-05-21

申请号：US468069

申请日：1990-01-22

申请人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

发明人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

IPC分类号： G06K7/10 ,  H01L27/146 ,  H01L31/105 ,  H04N5/228 ,  H04N5/369

CPC分类号： G06K7/10841 ,  H01L27/14643 ,  H01L31/1055 ,  H04N3/1581 ,  Y10S148/092

摘要： Disclosed is a method for producing image sensors having a plurality of sensing elements including the formation of parallel separating grooves by laser irradiation, the filling of the grooves with an insulating film, and the subsequent provision of a groove in the insulating film in a direction diagonal to the parallel grooves for metallization.

公开(公告)号：US5043567A

公开(公告)日：1991-08-27

申请号：US525734

申请日：1990-05-21

申请人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

发明人： Mitsunori Sakama ,  Takeshi Fukada ,  Naoya Sakamoto ,  Nobumitsu Amachi ,  Shigenori Hayashi ,  Takashi Inushima

IPC分类号： G06K7/10 ,  H01L27/146 ,  H01L31/105 ,  H04N5/228 ,  H04N5/369

CPC分类号： G06K7/10841 ,  H01L27/14643 ,  H01L31/1055 ,  H04N3/1581 ,  Y10S148/092

摘要： A method of manufacturing image sensors where (a) a first conductive film of a transparent material is formed over and in contact with a transparent substrate; (b) a photosensitive semiconductor film is formed over and in contact with the film; (c) the first conductive film and the semiconductor film are patterned by laser scribing; (d) a first insulating film is formed over the above films and in contact with the first conductive film and the semiconductor film and portions thereof are removed which are not necessary to define the image sensors in the patterned semiconductor film; (e) a second conductive film is formed over the semiconductor film and the remaining portions of the first insulating film in order to make contact with the semiconductor film; (f) the second conductive film is patterned; (g) a second insulating film is formed over and in contact with the second conductive film; (h) the second insulating film is patterned; and (i) an electrode arrangement is formed for withdrawing electrical signals from the second conductive film through the patterned second insulating film, wherein the patternings of the first conductive film, the second conductive film, and the second insulating film are primarily performed by laser scribing to reduce the fabrication cost of the image sensors.

公开(公告)号：US06191492B1

公开(公告)日：2001-02-20

申请号：US08161859

申请日：1993-12-06

申请人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

发明人： Shunpei Yamazaki ,  Mitsunori Tsuchiya ,  Kazuo Urata ,  Itaru Koyama ,  Shinji Imatou ,  Shigenori Hayashi ,  Naoki Hirose ,  Mari Sasaki ,  Noriya Ishida ,  Kouhei Wada

IPC分类号： H01L2328

CPC分类号： H01L24/48 ,  H01L23/3135 ,  H01L23/49586 ,  H01L24/45 ,  H01L2224/05624 ,  H01L2224/29339 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/48624 ,  H01L2224/8592 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01007 ,  H01L2924/0101 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01045 ,  H01L2924/01047 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/05042 ,  H01L2924/00 ,  H01L2924/00012

摘要： An electronic device comprising a substrate having a frame, a metal lead and an electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film or wherein pores at the surface of the organic resin are filled within an inactive gas such as argon because of a plasma treatment of the resin surface with the inactive gas whereby impurities are prevented from entering into the organic resin through the pores.

摘要翻译： 一种电子设备，包括具有框架，金属引线和接合结构中的电子部件的基板，以及在所述基板上形成的有机树脂的模制件，其中所述有机树脂的表面设置有硬化防水或 碳质膜或其中有机树脂表面的孔被填充在惰性气体如氩气中，因为用惰性气体等离子体处理树脂表面，从而防止杂质通过孔进入有机树脂。