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    Semiconductor device
    1.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号：US07709925B2

    公开(公告)日：2010-05-04

    申请号：US11622670

    申请日：2007-01-12

    申请人： Tetsuo Takahashi ,  Tomohide Terashima

    发明人： Tetsuo Takahashi ,  Tomohide Terashima

    IPC分类号： H01L29/00 ,  H03B1/00

    CPC分类号： H01L29/7397 ,  H01L21/823878 ,  H01L29/0638 ,  H01L29/0692 ,  H01L29/407 ,  H01L29/41741

    摘要： A semiconductor device, including: a semiconductor substrate of a first conductivity type; a semiconductor layer of a second conductivity type formed on the semiconductor substrate; a trench formed in the semiconductor region; a trench diffusion layer of the first conductivity type formed along wall surfaces of the trench; and a buried conductor buried in the trench, wherein an insulation film is further disposed between the wall surfaces of the trench and the buried conductor.

    摘要翻译： 一种半导体器件，包括：第一导电类型的半导体衬底; 形成在半导体衬底上的第二导电类型的半导体层; 形成在半导体区域中的沟槽; 沿沟槽的壁表面形成的第一导电类型的沟槽扩散层; 以及埋在沟槽中的掩埋导体，其中绝缘膜进一步设置在沟槽的壁表面和掩埋导体之间。

    SEMICONDUCTOR DEVICE
    2.
    发明申请
    SEMICONDUCTOR DEVICE 失效
    半导体器件

    公开(公告)号：US20070176220A1

    公开(公告)日：2007-08-02

    申请号：US11622670

    申请日：2007-01-12

    申请人： Tetsuo Takahashi ,  Tomohide Terashima

    发明人： Tetsuo Takahashi ,  Tomohide Terashima

    IPC分类号： H01L29/94

    CPC分类号： H01L29/7397 ,  H01L21/823878 ,  H01L29/0638 ,  H01L29/0692 ,  H01L29/407 ,  H01L29/41741

    摘要： A semiconductor device, including: a semiconductor substrate of a first conductivity type; a semiconductor layer of a second conductivity type formed on the semiconductor substrate; a trench formed in the semiconductor region; a trench diffusion layer of the first conductivity type formed along wall surfaces of the trench; and a buried conductor buried in the trench, wherein an insulation film is further disposed between the wall surfaces of the trench and the buried conductor.

    摘要翻译： 一种半导体器件，包括：第一导电类型的半导体衬底; 形成在半导体衬底上的第二导电类型的半导体层; 形成在半导体区域中的沟槽; 沿沟槽的壁表面形成的第一导电类型的沟槽扩散层; 以及埋在沟槽中的掩埋导体，其中绝缘膜进一步设置在沟槽的壁表面和掩埋导体之间。

    Semiconductor device and method for fabricating the same
    4.
    发明授权
    Semiconductor device and method for fabricating the same 有权
    半导体装置及其制造方法

    公开(公告)号：US08994141B2

    公开(公告)日：2015-03-31

    申请号：US12685180

    申请日：2010-01-11

    申请人： Tetsuo Takahashi ,  Takami Otsuki

    发明人： Tetsuo Takahashi ,  Takami Otsuki

    IPC分类号： H01L29/66 ,  H01L29/40 ,  H01L29/739 ,  H01L29/78 ,  H01L29/06

    CPC分类号： H01L29/063 ,  H01L29/0615 ,  H01L29/0638 ,  H01L29/404 ,  H01L29/407 ,  H01L29/66333 ,  H01L29/7395 ,  H01L29/7811

    摘要： A semiconductor includes an N-type impurity region provided in a substrate. A P-type RESURF layer is provided at a top face of the substrate in the N-type impurity region. A P-well has an impurity concentration higher than that of the P-type RESURF layer, and makes contact with the P-type RESURF layer at the top face of the substrate in the N-type impurity region. A first high-voltage-side plate is electrically connected to the N-type impurity region, and a low-voltage-side plate is electrically connected to a P-type impurity region. A lower field plate is capable of generating a lower capacitive coupling with the substrate. An upper field plate is located at a position farther from the substrate than the lower field plate, and is capable of generating an upper capacitive coupling with the lower field plate whose capacitance is greater than the capacitance of the lower capacitive coupling.

    摘要翻译： 半导体包括设置在基板中的N型杂质区。 P型RESURF层设置在N型杂质区的衬底顶面。 P阱的杂质浓度比P型RESURF层高，与N型杂质区的衬底顶面的P型RESURF层接触。 第一高电压侧板与N型杂质区电连接，低压侧板与P型杂质区电连接。 下场板能够产生与衬底的较低的电容耦合。 上场板位于比下场板更远离衬底的位置处，并且能够产生与电容大于低容性耦合的电容的下场板的上电容耦合。

    6,12-dinaphthylchrysene derivative and organic light-emitting device using the derivative
    5.
    发明授权
    6,12-dinaphthylchrysene derivative and organic light-emitting device using the derivative 有权
    6,12-二萘基衍生物和使用该衍生物的有机发光装置

    公开(公告)号：US08790795B2

    公开(公告)日：2014-07-29

    申请号：US13480608

    申请日：2012-05-25

    申请人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    发明人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    IPC分类号： H01L51/54 ,  C07D235/18 ,  C07D498/04

    CPC分类号： H01L51/0054 ,  H01L51/0058 ,  H01L51/0072 ,  H01L51/5072 ,  H01L51/5096

    摘要： Provided are an organic compound having high heat stability suitable for use in an organic light-emitting device, and an organic light-emitting device using the organic compound. The organic light-emitting device is an organic light-emitting device, including: an anode; a cathode; and an organic compound layer disposed between the anode and the cathode, in which at least one layer of the organic compound layer has a 6,12-dinaphthylchrysene derivative represented by one of the following general formulae (1) and (2): in the formulae (1) and (2), Z represents a naphthyl group, and Q represents an electron-withdrawing substituent selected from the group consisting of the following general formulae (3) to (5): in the formula (5), R1 represents a hydrogen atom or a methyl group.

    摘要翻译： 提供了适用于有机发光装置的具有高热稳定性的有机化合物和使用该有机化合物的有机发光装置。 有机发光器件是有机发光器件，包括：阳极; 阴极 和设置在阳极和阴极之间的有机化合物层，其中至少一层有机化合物层具有由以下通式（1）和（2）之一表示的6,12-二萘基衍生物：在 式（1）和（2）中，Z表示萘基，Q表示选自下述通式（3）〜（5）的吸电子取代基：式（5）中，R 1表示 氢原子或甲基。

    6,12-DINAPHTHYLCHRYSENE DERIVATIVE AND ORGANIC LIGHT-EMITTING DEVICE USING THE DERIVATIVE
    7.
    发明申请
    6,12-DINAPHTHYLCHRYSENE DERIVATIVE AND ORGANIC LIGHT-EMITTING DEVICE USING THE DERIVATIVE 有权
    6,12-十六烷基衍生物和有机发光装置，使用衍生物

    公开(公告)号：US20120313083A1

    公开(公告)日：2012-12-13

    申请号：US13480608

    申请日：2012-05-25

    申请人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    发明人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    IPC分类号： H01L51/54 ,  C07D235/18 ,  C07D498/04

    CPC分类号： H01L51/0054 ,  H01L51/0058 ,  H01L51/0072 ,  H01L51/5072 ,  H01L51/5096

    摘要： Provided are an organic compound having high heat stability suitable for use in an organic light-emitting device, and an organic light-emitting device using the organic compound. The organic light-emitting device is an organic light-emitting device, including: an anode; a cathode; and an organic compound layer disposed between the anode and the cathode, in which at least one layer of the organic compound layer has a 6,12-dinaphthylchrysene derivative represented by one of the following general formulae (1) and (2): in the formulae (1) and (2), Z represents a naphthyl group, and Q represents an electron-withdrawing substituent selected from the group consisting of the following general formulae (3) to (5): in the formula (5), R1 represents a hydrogen atom or a methyl group.

    摘要翻译： 提供了适用于有机发光装置的具有高热稳定性的有机化合物和使用该有机化合物的有机发光装置。 有机发光器件是有机发光器件，包括：阳极; 阴极 和设置在阳极和阴极之间的有机化合物层，其中至少一层有机化合物层具有由以下通式（1）和（2）之一表示的6,12-二萘基衍生物：在 式（1）和（2）中，Z表示萘基，Q表示选自下述通式（3）〜（5）的吸电子取代基：式（5）中，R 1表示 氢原子或甲基。

    Capacity variable link apparatus and capacity variable link setting method
    8.
    发明授权
    Capacity variable link apparatus and capacity variable link setting method 失效
    容量变量链接装置和容量变量链接设置方法

    公开(公告)号：US07912087B2

    公开(公告)日：2011-03-22

    申请号：US10347339

    申请日：2003-01-21

    申请人： Yukio Tsukishima ,  Tetsuo Takahashi ,  Atsushi Watanabe ,  Yasutaka Okazaki

    发明人： Yukio Tsukishima ,  Tetsuo Takahashi ,  Atsushi Watanabe ,  Yasutaka Okazaki

    IPC分类号： H04J3/16 ,  H04J3/24 ,  H04J3/04 ,  G01R31/08

    CPC分类号： H04L47/10 ,  H04J3/1682 ,  H04L47/11 ,  H04L47/13

    摘要： A capacity variable link apparatus including a main signal system and a control signal system is provided. The main signal system includes: an upper layer signal accommodation part; a lower layer path termination part; and a signal switching part for dividing the upper layer signal to lower layer signals in a lower layer path group having a capacity that is determined according to an amount of traffic of the upper layer signal. The control system includes: a traffic amount measuring part for measuring the amount of traffic of the upper layer and for determining whether the capacity of the lower layer path group is to be increased or decreased according to the amount; and a signal switching management part for controlling the signal switching part according to the result of the determination.

    摘要翻译： 提供一种包括主信号系统和控制信号系统的容量可变链路装置。 主信号系统包括：上层信号容纳部分; 下层路径终端部分; 以及信号切换部分，用于将上层信号划分为具有根据上层信号的业务量确定的容量的下层路径组中的较低层信号。 控制系统包括：用于测量上层的业务量的流量测量部分，用于根据该量确定下层路径组的容量是否增加或减少; 以及信号切换管理部，根据判定结果控制信号切换部。

    Projection exposure apparatus and method
    9.
    发明授权
    Projection exposure apparatus and method 有权
    投影曝光装置及方法

    公开(公告)号：US06362926B1

    公开(公告)日：2002-03-26

    申请号：US09721956

    申请日：2000-11-27

    申请人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

    发明人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

    IPC分类号： G02B1700

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

    摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member(M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

    摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。