Device and method for analysis of samples using a combined sample treatment and sample carrier device
    2.
    发明申请
    Device and method for analysis of samples using a combined sample treatment and sample carrier device 审中-公开
    使用组合样品处理和样品载体装置分析样品的装置和方法

    公开(公告)号:US20060252047A1

    公开(公告)日:2006-11-09

    申请号:US10564938

    申请日:2004-07-14

    IPC分类号: C12Q1/68 G01N33/53 C12M1/34

    摘要: The invention relates to devices and methods for chemical analysis, specifically to devices for extracting molecules, e.g. biomolecules such as peptides, and/or proteins, from a mixture of molecules in a solution and performing sample treatment on the extracted molecules before presenting them to an analysis instrument. The method for analysis of samples uses a combined sample treatment and sample carrier device. Said device comprises a plate with inlets at one side connected to respective compartments situated at respective array positions for receiving samples to be treated and analysed, each compartment being in communication with an outlet enabling fluid flow through the plate. The method comprises the steps of supplying an external container with a sample; optionally, subjecting the sample to a first treatment in the external container; transferring the sample to the combined sample treatment and sample carrier device; and subjecting the sample to a second treatment exploiting fluid flow through the device, wherein a medium is trapped in the device.

    摘要翻译: 本发明涉及用于化学分析的装置和方法,具体涉及用于提取分子的装置,例如, 生物分子如肽和/或蛋白质,从溶液中的分子混合物中,并在将其提供给分析仪器之前对提取的分子进行样品处理。 样品分析方法采用组合样品处理和样品载体装置。 所述装置包括板,其一侧的入口连接到位于相应阵列位置处的相应隔室,用于接收待处理和分析的样品,每个室与允许流体流过板的出口连通。 该方法包括向外部容器提供样品的步骤; 任选地,使样品在外部容器中进行第一次处理; 将样品转移到组合的样品处理和样品载体装置; 并且对样品进行第二处理,利用流体流过该装置,其中介质被捕获在装置中。

    Flow-through sampling cell and use thereof
    9.
    发明授权
    Flow-through sampling cell and use thereof 失效
    流通采样池及其用途

    公开(公告)号:US06192768B1

    公开(公告)日:2001-02-27

    申请号:US08981236

    申请日:1998-02-25

    IPC分类号: G01N120

    摘要: A sampling cell of flow-through type and use of such a sampling cell. The sampling cell is preferably manufactured by etching of silicon wafers. It is especially useful for continuous picovolume sampling in an analytical flow. The pressure pulse generator (9) generates pulses directly into a flow channel (3). The flow channel (3) is preferably formed by a first basin (4) in a first structure (1) and a second basin (5) in a second structure (2). In a first embodiment the pressure pulse generator (9) comprises at least one piezo-ceramic disc and/or devices acting by way of magnetostrictive, electrostatical or electromechanical forces and/or devices acting by way of thermal expansion. Method of directing samples from a flow-through sampling cell by establishing a difference in electrical potential between the liquid in the flow-through sampling cell and the object to which the samples are to be directed. Use of a flow-through sampling cell for coating of surfaces, especially for achieving biospecific surfaces, for extracting samples from a continuous liquid flow, for extracting a precise sample amount by collecting a defined number of samples or for injecting samples for electrophoresis, especially capillary electrophoresis, and for electrochromatography.

    摘要翻译: 流通型采样单元和这种采样单元的使用。 采样单元优选通过蚀刻硅晶片来制造。 它对于在分析流程中连续的皮考冒泡采样是特别有用的。 压力脉冲发生器(9)直接产生脉冲流入通道(3)。 流动通道(3)优选地由第一结构(1)中的第一盆(4)和第二结构(2)中的第二盆(5)形成。 在第一实施例中,压力脉冲发生器(9)包括至少一个压电陶瓷盘和/或通过磁致伸缩,静电或机电力作用的装置和/或通过热膨胀作用的装置。 通过建立流通取样室中的液体与样品要被引导的物体之间的电位差来从流通取样池引导样品的方法。 使用流通采样池用于涂覆表面,特别是用于实现生物特异性表面,用于从连续液体流中提取样品,通过收集限定数量的样品或用于注射样品用于电泳,特别是毛细管 电泳和电色谱。

    Method of etching an opening
    10.
    发明授权
    Method of etching an opening 失效
    蚀刻开口的方法

    公开(公告)号:US06620331B1

    公开(公告)日:2003-09-16

    申请号:US09700044

    申请日:2001-01-09

    IPC分类号: C23F102

    摘要: The invention relates to a method for etching an opening, and more precisely, to etching in a silicon plate for creating a nozzle opening. According to the invention, one side of the silicon plate (1) is protected by a protective layer (2), and a recess (5) is made in the protective layer. Etching is made anisotropically through the recess so as to create a cavity (4) in the shape of a truncated pyramid of a predetermined depth in the silicon plate. The cavity is doped so as to create a doped layer (3) at the predetermined depth. The etching is then continued until the bottom surface of the cavity has passed the doped layer. Subsequently, etching is performed from the other side, while a voltage is applied to the doped layer, so as to free the nozzle opening at the other side. The invention enables an accurate control of the surface area of the nozzle opening. Through this, the amount of discharged fluid and the directional precision can be controlled very accurately.

    摘要翻译: 本发明涉及一种用于蚀刻开口的方法,更准确地说,涉及在硅板中蚀刻以形成喷嘴孔。 根据本发明,硅板(1)的一侧由保护层(2)保护,并且在保护层中形成凹部(5)。 通过凹部各向异性地进行蚀刻,以在硅板中形成具有预定深度的截顶棱锥形状的空腔(4)。 掺杂空腔以便在预定深度产生掺杂层(3)。 然后继续蚀刻直到腔的底表面已经通过掺杂层。 随后,从另一侧进行蚀刻,同时向掺杂层施加电压,以便在另一侧释放喷嘴开口。 本发明能够精确地控制喷嘴开口的表面积。 通过这种方式,可以非常精确地控制排出液量和方向精度。