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公开(公告)号：US11094568B2
公开(公告)日：2021-08-17
申请号：US15960800
申请日：2018-04-24
Applicant: TOKYO ELECTRON LIMITED
Inventor： Kenji Nakamizo , Satoshi Morita , Akinori Tanaka , Hiroshi Komiya , Mikio Nakashima , Kousuke Fukuda , Youichi Masaki , Ryoji Ando , Ikuo Sunaka
Abstract: A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.
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公开(公告)号：US10128138B2
公开(公告)日：2018-11-13
申请号：US15448882
申请日：2017-03-03
Applicant: Tokyo Electron Limited
Inventor： Katsuhiro Morikawa , Ikuo Sunaka , Seiji Nakano , Kazunori Kuratomi , Toshio Shimazu
IPC: H01L21/67 , H01L21/677
Abstract: A substrate transfer method is provided. The substrate transfer method comprises: loading the transfer container to a load port, and separating the cover body from the container main body; detecting an accommodation status of the substrate in the container main body by a detection unit; correcting, by a correction device, the accommodation status of the substrate in the container main body in which the accommodation status of the substrate detected by the detection unit is abnormal; and allowing a substrate transfer device to enter the container main body in which the accommodation status of the substrate is corrected, and unloading the substrate from the container main body.
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公开(公告)号：US09773690B2
公开(公告)日：2017-09-26
申请号：US14649673
申请日：2013-12-10
Applicant: TOKYO ELECTRON LIMITED
Inventor： Katsuhiro Morikawa , Ikuo Sunaka , Suguru Enokida
IPC: H01L21/677 , H01L21/67
CPC classification number: H01L21/67772 , H01L21/67253 , H01L21/67766 , H01L21/67769 , H01L21/67775 , H01L21/67778
Abstract: A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port. The apparatus controller further includes a determination unit that determines, after a transport container is carried into the load port, presence or absence of an abnormality in that transport container based on a parameter value associated with at least one of carrying-in or carrying-out of that transport container, and past transition data of parameter values associated with that transport container.
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公开(公告)号：US20150146498A1
公开(公告)日：2015-05-28
申请号：US14543951
申请日：2014-11-18
Applicant: Tokyo Electron Limited
Inventor： Yasuo Kiyohara , Ikuo Sunaka , Koji Tanaka , Takami Satoh , Kazuyoshi Mizumoto , Takashi Uno , Hirotaka Maruyama , Hidetomo Uemukai , Tomiyasu Maezono
CPC classification number: G05D11/132 , B01F3/088 , B01F15/0479
Abstract: A substrate processing apparatus includes a mixing tank, a first opening/closing valve, a second opening/closing valve, a first flow rate measuring unit, a second flow rate measuring unit, a control unit, and a substrate processing unit. A first liquid and a second liquid are mixed such that the second liquid is mixed in an amount more than that of the first liquid. The first and second opening/closing valves open/close a first flow path and a second flow path, respectively. The first and second flow rate measuring units measure flow rates of the first and second liquids flowing through the first and second flow paths, respectively. The control unit controls opening/closing of the first opening/closing valve and the second opening/closing valve. The substrate processing unit processes a substrate by supplying a mixed liquid of the first and second liquids to the substrate.
Abstract translation: 基板处理装置包括混合槽，第一开闭阀，第二开闭阀，第一流量测量单元，第二流量测量单元，控制单元和基板处理单元。 混合第一液体和第二液体，使得第二液体的混合量大于第一液体的量。 第一和第二打开/关闭阀分别打开/关闭第一流动路径和第二流动路径。 第一和第二流量测量单元分别测量流过第一和第二流路的第一和第二液体的流量。 控制单元控制第一打开/关闭阀和第二打开/关闭阀的打开/关闭。 基板处理单元通过将第一和第二液体的混合液体供给到基板来处理基板。
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公开(公告)号：US09696262B2
公开(公告)日：2017-07-04
申请号：US14649615
申请日：2013-12-05
Applicant: TOKYO ELECTRON LIMITED
Inventor： Katsuhiro Morikawa , Ikuo Sunaka
IPC: G01N21/88 , H01L21/673 , H01L21/67 , H01L21/677
CPC classification number: G01N21/88 , H01L21/67265 , H01L21/67326 , H01L21/67346 , H01L21/67733 , H01L21/67772 , H01L21/67775
Abstract: A substrate processing apparatus includes: a load port into which the transport container is carried; a detecting unit that detects storage condition of the substrates which are contained in the transport container, which has been carried into the load port and the lid of which has been removed; a processing unit that processes the substrates removed from the transport container having been carried into the load port; and a control unit. The control unit performs a first step that detects storage condition of the substrates, which are contained in the transport container having been carried into the load port, before the substrates are removed from the transport container to be delivered to the processing unit; a second step that detects storage condition of the substrates, which have been processed in the processing unit and returned to the original transport container, before closing the lid; and a third step that judges whether or not the transport container has an abnormality based on results of the first and second steps.
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Patent Agency Ranking
公开(公告)号：US20170178935A1
公开(公告)日：2017-06-22
申请号：US15448882
申请日：2017-03-03
Applicant: Tokyo Electron Limited
Inventor： Katsuhiro Morikawa , Ikuo Sunaka , Seiji Nakano , Kazunori Kuratomi , Toshio Shimazu
IPC: H01L21/67 , H01L21/677
CPC classification number: H01L21/67265 , B65G2201/0297 , H01L21/67772 , H01L21/67778
Abstract: A substrate transfer method is provided. The substrate transfer method comprises: loading the transfer container to a load port, and separating the cover body from the container main body; detecting an accommodation status of the substrate in the container main body by a detection unit; correcting, by a correction device, the accommodation status of the substrate in the container main body in which the accommodation status of the substrate detected by the detection unit is abnormal; and allowing a substrate transfer device to enter the container main body in which the accommodation status of the substrate is corrected, and unloading the substrate from the container main body.
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7.发明申请公开(公告)号：US20140178162A1
公开(公告)日：2014-06-26
申请号：US14135988
申请日：2013-12-20
Applicant: Tokyo Electron Limited
Inventor： Katsuhiro Morikawa , Ikuo Sunaka , Seiji Nakano , Kazunori Kuratomi , Toshio Shimazu
IPC: H01L21/677
CPC classification number: H01L21/67265 , B65G2201/0297 , H01L21/67772 , H01L21/67778
Abstract: A substrate transfer apparatus unloads a substrate from a transfer container in which a cover body airtightly closes a substrate unloading opening formed at a front surface of a container main body and multiple substrates are accommodated in the form of shelves. The substrate transfer apparatus includes a load port to which the transfer container is loaded; a detection unit configured to detect an accommodation status of the substrate in the container main body that is loaded to the load port and separated from the cover body; a substrate transfer device configured to enter the container main body and unload the substrate; and a correction device configured to correct the accommodation status of the substrate in the container main body before the substrate is unloaded from the container main body by the substrate transfer device when the detection unit detects abnormality in the accommodation status.
Abstract translation: 基板传送装置从其中盖体气密地封闭形成在容器主体的前表面的基板卸载开口的转印容器卸载基板，并且多个基板以架子的形式容纳。 基板输送装置包括装载转印容器的装载口， 检测单元，被配置为检测装载到所述负载端口并与所述盖体分离的所述容器主体中的所述基板的调节状态; 基板转印装置，被配置为进入所述容器主体并卸载所述基板; 以及校正装置，其被配置为当所述检测单元检测到所述调节状态中的异常时，通过所述基板传送装置从所述容器主体卸载所述基板之前的所述基板在所述容器主体中的调节状态。
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公开(公告)号：US11869777B2
公开(公告)日：2024-01-09
申请号：US17030488
申请日：2020-09-24
Applicant: Tokyo Electron Limited
Inventor： Fumihiro Kamimura , Masatoshi Kasahara , Teruomi Minami , Ikuo Sunaka
IPC: H01L21/67 , B08B3/04 , B08B7/00 , H01L21/02 , H01L21/687
CPC classification number: H01L21/67051 , B08B3/04 , B08B7/0014 , H01L21/02057 , H01L21/67248 , H01L21/68764
Abstract: A substrate processing method includes: increasing a temperature of a substrate by heating the substrate; after the increasing the temperature of the substrate, forming a liquid film of a pre-wetting liquid on a first surface of the substrate by supplying the pre-wetting liquid to the first surface of the substrate while heating and rotating the substrate at a first rotational speed; after the forming the liquid film, processing the first surface of the substrate with a chemical liquid by supplying the chemical liquid to the first surface of the substrate while heating and rotating the substrate at a second rotational speed that is lower than the second rotational speed; and after the processing the first surface of the substrate, decreasing the temperature of the substrate.
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公开(公告)号：US10067514B2
公开(公告)日：2018-09-04
申请号：US14543951
申请日：2014-11-18
Applicant: Tokyo Electron Limited
Inventor： Yasuo Kiyohara , Ikuo Sunaka , Koji Tanaka , Takami Satoh , Kazuyoshi Mizumoto , Takashi Uno , Hirotaka Maruyama , Hidetomo Uemukai , Tomiyasu Maezono
Abstract: A substrate processing apparatus includes a mixing tank, a first opening/closing valve, a second opening/closing valve, a first flow rate measuring unit, a second flow rate measuring unit, a control unit, and a substrate processing unit. A first liquid and a second liquid are mixed such that the second liquid is mixed in an amount more than that of the first liquid. The first and second opening/closing valves open/close a first flow path and a second flow path, respectively. The first and second flow rate measuring units measure flow rates of the first and second liquids flowing through the first and second flow paths, respectively. The control unit controls opening/closing of the first opening/closing valve and the second opening/closing valve. The substrate processing unit processes a substrate by supplying a mixed liquid of the first and second liquids to the substrate.
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公开(公告)号：US09627238B2
公开(公告)日：2017-04-18
申请号：US14135988
申请日：2013-12-20
Applicant: Tokyo Electron Limited
Inventor： Katsuhiro Morikawa , Ikuo Sunaka , Seiji Nakano , Kazunori Kuratomi , Toshio Shimazu
IPC: H01L21/68 , H01L21/67 , H01L21/677
CPC classification number: H01L21/67265 , B65G2201/0297 , H01L21/67772 , H01L21/67778
Abstract: A substrate transfer apparatus unloads a substrate from a transfer container in which a cover body airtightly closes a substrate unloading opening formed at a front surface of a container main body and multiple substrates are accommodated in the form of shelves. The substrate transfer apparatus includes a load port to which the transfer container is loaded; a detection unit configured to detect an accommodation status of the substrate in the container main body that is loaded to the load port and separated from the cover body; a substrate transfer device configured to enter the container main body and unload the substrate; and a correction device configured to correct the accommodation status of the substrate in the container main body before the substrate is unloaded from the container main body by the substrate transfer device when the detection unit detects abnormality in the accommodation status.
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