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    Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device
    3.
    发明授权
    Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device 失效
    半导体晶片，半导体晶片制造方法和电子器件

    公开(公告)号：US08716836B2

    公开(公告)日：2014-05-06

    申请号：US12811011

    申请日：2008-12-26

    申请人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata ,  Taketsugu Yamamoto ,  Kazumi Wada

    发明人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata ,  Taketsugu Yamamoto ,  Kazumi Wada

    IPC分类号： H01L21/331 ,  H01L29/737

    CPC分类号： H01L21/8258 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02546 ,  H01L21/02609 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/8252 ,  H01L29/66318

    摘要： A high-quality GaAs-type crystal thin film using an inexpensive Si wafer with good thermal release characteristics is achieved. Provided is a semiconductor wafer comprising an Si wafer; an inhibiting layer that is formed on the wafer and that inhibits crystal growth, the inhibiting layer including a covering region that covers a portion of the wafer and an open region that does not cover a portion of the wafer within the covering region; a Ge layer that is crystal-grown in the open region; and a functional layer that is crystal-grown on the Ge layer. The Ge layer may be formed by annealing with a temperature and duration that enables movement of crystal defects, and the annealing is repeated a plurality of times.

    摘要翻译： 实现了具有良好热释放特性的廉价Si晶片的高质量GaAs型晶体薄膜。 提供了包括Si晶片的半导体晶片; 所述抑制层形成在所述晶片上并且抑制晶体生长，所述抑制层包括覆盖所述晶片的一部分的覆盖区域和不覆盖所述覆盖区域内的所述晶片的一部分的开放区域; 在开放区域晶体生长的Ge层; 以及在Ge层上晶体生长的功能层。 Ge层可以通过使得能够移动晶体缺陷的温度和持续时间退火而形成，并且退火重复多次。

    SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER MANUFACTURING METHOD
    4.
    发明申请
    SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER MANUFACTURING METHOD 审中-公开
    半导体波导和半导体波形制造方法

    公开(公告)号：US20110006399A1

    公开(公告)日：2011-01-13

    申请号：US12810989

    申请日：2008-12-26

    申请人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata ,  Taketsugu Yamamoto ,  Kazumi Wada

    发明人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata ,  Taketsugu Yamamoto ,  Kazumi Wada

    IPC分类号： H01L29/12 ,  H01L21/20

    CPC分类号： H01L21/02516 ,  H01L21/02381 ,  H01L21/02433 ,  H01L21/0245 ,  H01L21/02546 ,  H01L21/0262 ,  H01L21/02639 ,  H01L29/267 ,  H01L29/7371

    摘要： A high-quality GaAs-type crystal thin film using an inexpensive Si wafer with good thermal release characteristics is achieved. Provided is a semiconductor wafer comprising a single-crystal Si wafer; an insulating layer that has an open region and that is formed on the wafer; a Ge layer that is epitaxially grown on the wafer in the open region; and a GaAs layer that is epitaxially grown on the Ge layer, wherein the Ge layer is formed by (i) placing the wafer in a CVD reaction chamber that can create an ultra-high vacuum low-pressure state, (ii) performing a first epitaxial growth at a first temperature at which raw material gas can thermally decompose, (iii) performing a second epitaxial growth at a second temperature that is higher than the first temperature, (iv) performing a first annealing, at a third temperature that is loss than a melting point of Ge, on epitaxial layers formed by the first and second epitaxial growths, and (v) performing a second annealing at a fourth temperature that is lower than the third temperature. The Ge layer may he formed by repeating the first annealing and the second annealing a plurality of times, and the insulating layer may be a silicon oxide layer.

    摘要翻译： 实现了具有良好热释放特性的廉价Si晶片的高质量GaAs型晶体薄膜。 提供了包括单晶Si晶片的半导体晶片; 绝缘层，其具有开放区域并形成在所述晶片上; 在开放区域中在晶片上外延生长的Ge层; 以及在所述Ge层上外延生长的GaAs层，其中，所述Ge层通过以下方式形成：（i）将所述晶片放置在可产生超高真空低压状态的CVD反应室中，（ii） 在原料气体可以热分解的第一温度下外延生长，（iii）在高于第一温度的第二温度下进行第二外延生长，（iv）在损失的第三温度下进行第一退火 比在第一和第二外延生长形成的外延层上的熔点高的Ge，和（v）在低于第三温度的第四温度下进行第二次退火。 可以通过重复第一退火和第二退火多次形成Ge层，并且绝缘层可以是氧化硅层。

    Sensor, semiconductor wafer, and method of producing semiconductor wafer
    5.
    发明授权
    Sensor, semiconductor wafer, and method of producing semiconductor wafer 有权
    传感器，半导体晶片和半导体晶片的制造方法

    公开(公告)号：US08835906B2

    公开(公告)日：2014-09-16

    申请号：US13310522

    申请日：2011-12-02

    申请人： Masahiko Hata ,  Tomoyuki Takada ,  Sadanori Yamanaka ,  Taro Itatani

    发明人： Masahiko Hata ,  Tomoyuki Takada ,  Sadanori Yamanaka ,  Taro Itatani

    IPC分类号： H01L31/0352 ,  H01L31/18 ,  H01L31/103 ,  H01L27/144 ,  H01L31/052 ,  H01L31/0392 ,  G01J5/02

    CPC分类号： H01L27/1446 ,  G01J5/024 ,  H01L31/0392 ,  H01L31/0543 ,  H01L31/1035 ,  H01L31/1852 ,  Y02E10/52 ,  Y02E10/544 ,  Y02P70/521

    摘要： A sensor includes: a base wafer containing silicon; a seed member provided directly or indirectly on the base wafer; and a photothermal absorber that is made of a Group 3-5 compound semiconductor lattice-matching or pseudo lattice-matching the seed member and being capable of generating a carrier upon absorbing light or heat, where the photothermal absorber outputs an electric signal in response to incident light to be introduced into the photothermal absorber or heat to be applied to the photothermal absorber. A semiconductor wafer includes: a base wafer containing silicon; a seed member provided directly or indirectly on the base wafer; and a photothermal absorber that is made of a Group 3-5 compound semiconductor lattice-matching or pseudo lattice-matching the seed member and being capable of generating a carrier upon absorbing light or heat.

    摘要翻译： 传感器包括：含有硅的基底晶片; 种子构件直接或间接地设置在基底晶片上; 以及由第3-5族化合物半导体晶格匹配或伪晶格匹配种子构件并且能够在吸收光或热时产生载体的光热吸收体，其中光热吸收体输出响应于 入射到光热吸收器中的入射光或被加到光热吸收器上的热量。 半导体晶片包括：含有硅的基底晶片; 种子构件直接或间接地设置在基底晶片上; 以及由3-5族化合物半导体晶格匹配或伪晶格匹配种子构件制成并且能够在吸收光或热时产生载体的光热吸收剂。

    Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device
    6.
    发明授权
    Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device 有权
    半导体晶片，半导体晶片制造方法和电子器件

    公开(公告)号：US08809908B2

    公开(公告)日：2014-08-19

    申请号：US12811038

    申请日：2008-12-26

    申请人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata

    发明人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata

    IPC分类号： H01L21/20

    CPC分类号： H01L21/02381 ,  H01L21/02433 ,  H01L21/0245 ,  H01L21/02463 ,  H01L21/02502 ,  H01L21/02516 ,  H01L21/02546 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/8258 ,  H01L27/0605 ,  H01L29/22 ,  H01L29/66318 ,  H01L29/737 ,  H01L29/7786

    摘要： A high-quality GaAs-type crystal thin film using an inexpensive Si wafer with good thermal release characteristics is achieved. Provided is a semiconductor wafer comprising an Si wafer; a Ge layer that is crystal-grown on the wafer and shaped as an isolated island; a buffer layer that is crystal-grown on the Ge layer and is a group 3-5 compound semiconductor layer containing P; and a functional layer that is crystal-grown on the buffer layer. The Ge layer may be shaped as an island having a size that does not exceed double a distance moved by crystal defects as a result of annealing the Ge layer at a certain temperature for a certain time. The Ge layer may be shaped as an island having a size for which stress due to a difference relative to a thermal expansion coefficient of Si, which is material of the wafer, does not cause crystal defects when the Ge layer is annealed at a certain temperature.

    摘要翻译： 实现了具有良好热释放特性的廉价Si晶片的高质量GaAs型晶体薄膜。 提供了包括Si晶片的半导体晶片; 在晶片上晶体生长并形成孤岛的Ge层; 在Ge层上晶体生长并且是含有P的3-5族化合物半导体层的缓冲层; 以及在缓冲层上晶体生长的功能层。 Ge层可以成形为岛，其尺寸不超过由晶格缺陷移动的距离的两倍，这是由于Ge层在一定温度下退火一定时间的结果。 Ge层可以成形为具有如下尺寸的岛，即当Ge层在一定温度下退火时，具有相对于作为晶片材料的Si的热膨胀系数的差的应力不会引起晶体缺陷的尺寸 。

    Semiconductor wafer including lattice matched or pseudo-lattice matched buffer and GE layers, and electronic device
    9.
    发明授权
    Semiconductor wafer including lattice matched or pseudo-lattice matched buffer and GE layers, and electronic device 失效
    包括晶格匹配或伪格匹配缓冲器和GE层的半导体晶片，以及电子器件

    公开(公告)号：US08772830B2

    公开(公告)日：2014-07-08

    申请号：US12811074

    申请日：2008-12-26

    申请人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata

    发明人： Tomoyuki Takada ,  Sadanori Yamanaka ,  Masahiko Hata

    IPC分类号： H01L29/12

    CPC分类号： H01L29/045 ,  H01L21/02381 ,  H01L21/02433 ,  H01L21/0245 ,  H01L21/02463 ,  H01L21/02516 ,  H01L21/02546 ,  H01L21/0262 ,  H01L21/02639 ,  H01L29/205 ,  H01L29/66242 ,  H01L29/7371

    摘要： A high-quality GaAs-type crystal thin film using an inexpensive Si wafer with good thermal release characteristics is achieved. Provided is a semiconductor wafer comprising an Si wafer; an inhibiting layer that is formed on the wafer and that inhibits crystal growth, the inhibiting layer including a covering region that covers a portion of the wafer and an open region that does not cover a portion of the wafer within the covering region; a Ge layer that is crystal-grown in the open region; a buffer layer that is crystal-grown on the Ge layer and is a group 3-5 compound semiconductor layer containing P; and a functional layer that is crystal-grown on the buffer layer. The Ge layer may be formed then annealing with a temperature and duration that enables movement of crystal defects.

    摘要翻译： 实现了具有良好热释放特性的廉价Si晶片的高质量GaAs型晶体薄膜。 提供了包括Si晶片的半导体晶片; 所述抑制层形成在所述晶片上并且抑制晶体生长，所述抑制层包括覆盖所述晶片的一部分的覆盖区域和不覆盖所述覆盖区域内的所述晶片的一部分的开放区域; 在开放区域晶体生长的Ge层; 在Ge层上晶体生长并且是含有P的3-5族化合物半导体层的缓冲层; 以及在缓冲层上晶体生长的功能层。 可以形成Ge层，然后以能够移动晶体缺陷的温度和持续时间进行退火。