Thin film transistor and preparation thereof
    2.
    发明授权
    Thin film transistor and preparation thereof 失效
    薄膜晶体管及其制备方法

    公开(公告)号:US5410172A

    公开(公告)日:1995-04-25

    申请号:US996887

    申请日:1992-12-23

    摘要: A thin film transistor is provided with a semiconductor layer disposed on an insulating layer region having a channel region and a plurality of main electrode regions having an impurity concentration higher than an impurity concentration of the channel region. A second insulating layer region is disposed on the semiconductor region layer, and a control electrode is disposed on the second insulating layer. An interface is defined between at least one of the main electrode regions and the channel regions through a thickness of the semiconductor layer becoming increasing remote from its side of the control electrode in the direction from the second insulating layer region toward the first insulating layer region. An original point is defined as a position of the interface immediately beneath the insulating layer region. When a layer thickness of the semiconductor region is defined as T.sub.SOI and a maximum distance of the semiconductor layer region in the direction normal to a layer thickness is defined as L.sub.UP a value, the ratio of L.sub.UP /T.sub.SOI is at least 0.35.

    摘要翻译: 薄膜晶体管设置有设置在具有沟道区域和具有高于沟道区域的杂质浓度的杂质浓度的多个主电极区域的绝缘层区域上的半导体层。 第二绝缘层区域设置在半导体区域层上,并且控制电极设置在第二绝缘层上。 通过半导体层的厚度,在从第二绝缘层区域朝向第一绝缘层区域的方向远离其控制电极的侧面,在至少一个主电极区域和沟道区域之间界定界面。 原点被定义为绝缘层区域正下方的界面的位置。 当半导体区域的层厚被定义为TSOI,并且半导体层区域在垂直于层厚度的方向上的最大距离被定义为LUP值时,LUP / TSOI的比率至少为0.35。

    Diode and semiconductor device having a controlled intrinsic or low
impurity concentration region between opposite conductivity type
semiconductor regions
    5.
    发明授权
    Diode and semiconductor device having a controlled intrinsic or low impurity concentration region between opposite conductivity type semiconductor regions 失效
    二极管和半导体器件在相对导电型半导体区域之间具有受控的本征或低杂质浓度区域

    公开(公告)号:US5616944A

    公开(公告)日:1997-04-01

    申请号:US348198

    申请日:1994-11-28

    CPC分类号: H01L27/0629 H01L29/7391

    摘要: A diode is provided comprising first and second semiconductor regions. The first semiconductor region is of one conductivity type and the second is of the opposite conductivity type. A third region is provided which is either an intrinsic semiconductor region or a low concentration region. The low concentration region has an impurity concentration lower than that of the first and second semiconductor layers. The third region is arranged to separate the first and second semiconductor regions. A control electrode region is provided over the third region through an insulative film.

    摘要翻译: 提供了包括第一和第二半导体区域的二极管。 第一半导体区域是一种导电类型,第二半导体区域具有相反的导电类型。 提供作为本征半导体区域或低浓度区域的第三区域。 低浓度区域的杂质浓度低于第一和第二半导体层的杂质浓度。 第三区域被布置成分离第一和第二半导体区域。 通过绝缘膜在第三区域上设置控制电极区域。

    Solid state imaging using a correction parameter for correcting a cross talk between adjacent pixels
    7.
    发明授权
    Solid state imaging using a correction parameter for correcting a cross talk between adjacent pixels 有权
    使用用于校正相邻像素之间的串扰的校正参数的固态成像

    公开(公告)号:US08619163B2

    公开(公告)日:2013-12-31

    申请号:US12874119

    申请日:2010-09-01

    IPC分类号: H04N5/217 H04N9/083

    CPC分类号: H04N5/359 H04N9/045 H04N9/646

    摘要: An image processing apparatus, for correcting a cross talk between adjacent pixels, includes: a memory unit for storing a correction parameter for reducing a cross talk signal leaked to an object pixel from an adjacent pixel, the correction parameter corresponding to a position of the object pixel; and a correcting unit for subtracting, based on the correction parameter stored in the memory unit, the cross talk signal from a pixel signal of the solid-state imaging apparatus correspondingly to a position of the pixel, wherein a number of the object pixel is at least two, and the at least two object pixels have different addresses in a horizontal direction, and different addresses in a vertical direction.

    摘要翻译: 一种用于校正相邻像素之间的串扰的图像处理装置,包括:存储单元,用于存储用于减少从相邻像素泄漏到对象像素的串扰信号的校正参数,对应于对象位置的校正参数 像素 以及校正单元,用于根据存储在存储单元中的校正参数,相对于像素的位置从固态成像设备的像素信号中减去串扰信号,其中对象像素的数量在 至少两个,并且所述至少两个对象像素在水平方向上具有不同的地址,并且在垂直方向上具有不同的地址。

    Method for driving a photoelectric conversion device with isolation switches arranged between signal lines and amplifiers
    8.
    发明授权
    Method for driving a photoelectric conversion device with isolation switches arranged between signal lines and amplifiers 有权
    用于驱动设置在信号线和放大器之间的隔离开关的光电转换装置的方法

    公开(公告)号:US08520108B2

    公开(公告)日:2013-08-27

    申请号:US13085575

    申请日:2011-04-13

    IPC分类号: H04N3/14 H04N5/335

    摘要: A photoelectric conversion device prevents a pseudo signal caused by the parasitic capacitance of a transfer switch from being input to an amplifier. A photoelectric conversion device (50) includes a pixel (10) which outputs a signal to a signal line (107), an amplifier which amplifies the signal supplied via the signal line (107), and an isolation switch (121) inserted between a signal line (108) and the input node of the amplifier. The pixel (10) includes a photodiode, a floating diffusion (FD), a transfer switch which transfers the charge of the photodiode to the FD, and an amplification transistor which outputs a signal to a signal line (109) in accordance with the potential of the FD. The isolation switch (121) is turned off at least in a period when a transfer pulse for controlling the transfer switch of the pixel (10) transits.

    摘要翻译: 光电转换装置防止由转印开关的寄生电容引起的伪信号被输入到放大器。 光电转换装置(50)包括向信号线(107)输出信号的像素(10),放大经由信号线(107)供给的信号的放大器和插入在信号线(107)之间的隔离开关 信号线(108)和放大器的输入节点。 像素(10)包括光电二极管,浮动扩散(FD),将光电二极管的电荷传送到FD的转移开关,以及根据电位将信号输出到信号线(109)的放大晶体管 的FD。 至少在用于控制像素(10)的转印开关的转印脉冲转移的期间,隔离开关(121)截止。

    Solid-state imaging apparatus
    9.
    发明授权
    Solid-state imaging apparatus 失效
    固态成像装置

    公开(公告)号:US08520102B2

    公开(公告)日:2013-08-27

    申请号:US13075259

    申请日:2011-03-30

    IPC分类号: H04N9/64 H04N3/14 H01L27/148

    摘要: A solid-state imaging apparatus is provided that including a plurality of amplifiers each one amplifying a signal from each one of a plurality of pixels. The amplifier including first and second field effect transistors, gate electrodes of which are connected to the same voltage node (VBL); and a first wiring connected between the voltage node and the gate electrodes of the first and second field effect transistors. The first and second field effect transistors are arranged in a direction perpendicular to a direction in which the plurality of amplifiers is arranged. Material of the first wiring has a resistivity smaller than that of the gate electrodes of the first and second field effect transistors.

    摘要翻译: 提供一种固态成像装置,其包括多个放大器,每个放大器从多个像素中的每一个放大信号。 该放大器包括第一和第二场效应晶体管,其栅电极连接到同一电压节点(VBL); 以及连接在第一和第二场效应晶体管的电压节点和栅电极之间的第一布线。 第一和第二场效应晶体管沿与多个放大器布置的方向垂直的方向排列。 第一布线的材料的电阻率小于第一和第二场效应晶体管的栅电极的电阻率。

    Solid state image pickup device and method for manufacturing solid state image pickup device
    10.
    发明授权
    Solid state image pickup device and method for manufacturing solid state image pickup device 有权
    固体摄像装置及固态摄像装置的制造方法

    公开(公告)号:US08476102B2

    公开(公告)日:2013-07-02

    申请号:US13029046

    申请日:2011-02-16

    IPC分类号: H01L21/00

    CPC分类号: H01L27/14689

    摘要: A method for manufacturing a solid state image pickup device including a first active region provided with a first conversion unit, a second active region provided with a second conversion unit, and a third active region adjoining the first and the second active regions with a field region therebetween and being provided with a pixel transistor, the method including the steps of ion-implanting first conductivity type impurity ions to form a semiconductor region serving as a potential barrier against the signal carriers at a predetermined depth in the third active region and ion-implanting second conductivity type impurity ions into the third active region with energy lower than the above-described ion-implantation energy.

    摘要翻译: 一种固态摄像装置的制造方法,其特征在于,具备设置有第一转换部的第一有源区,设置有第二转换部的第二有源区和与所述第一有源区和所述第二有源区邻接的第三有源区, 并且设置有像素晶体管,所述方法包括以下步骤:离子注入第一导电型杂质离子,以形成用作第三有源区中预定深度处的信号载流子的势垒的半导体区域和离子注入 第二导电型杂质离子进入第三有源区,能量低于上述离子注入能量。