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公开(公告)号：US20050037597A1
公开(公告)日：2005-02-17
申请号：US10403211
申请日：2003-04-01
申请人： Tue Nguyen , Tai Nguyen , Craig Bercaw
发明人： Tue Nguyen , Tai Nguyen , Craig Bercaw
IPC分类号： C23C16/44 , C23C16/455 , C23C16/48 , C23C16/515 , H01L21/00 , H01L21/20
CPC分类号： C23C16/45536 , C23C16/45561 , C23C16/481 , C23C16/515 , H01L21/67115 , H01L21/67248
摘要： Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
摘要翻译： 公开了利用处理室执行半导体处理的系统和方法; 适合重复触发的闪光灯; 以及耦合到闪光灯的控制输入以触发闪光灯的控制器。 该系统可以在晶片处理中部署与闪光灯并联的固态等离子体源。
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公开(公告)号：US20070251451A1
公开(公告)日：2007-11-01
申请号：US11739637
申请日：2007-04-24
申请人： Tue Nguyen , Tai Nguyen
发明人： Tue Nguyen , Tai Nguyen
IPC分类号： C23C16/00
CPC分类号： C23C16/56 , C23C16/34 , C23C16/45523 , C23C16/45542 , C23C16/507
摘要： A process to deposit a thin film by chemical vapor deposition includes evacuating a chamber of gases; exposing a device to a gaseous first reactant, wherein the first reactant deposits on the device to form the thin film having a plurality of monolayers in thickness; evacuating the chamber of gases; exposing the device, coated with the first reactant, to a gaseous second reactant under a plasma treatment, wherein the thin film is treated by the first reactant; and repeating the previous steps.
摘要翻译： 通过化学气相沉积沉积薄膜的方法包括抽空气体室; 将装置暴露于气态第一反应物，其中所述第一反应物沉积在所述装置上以形成具有多个单层厚度的薄膜; 排空气体室; 在等离子体处理下将涂覆有第一反应物的装置暴露于气态第二反应物，其中薄膜由第一反应物处理; 并重复前面的步骤。
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3.发明申请公开(公告)号：US20050084619A1
公开(公告)日：2005-04-21
申请号：US10963192
申请日：2004-10-12
申请人： Zhihong Zhang , Tai Nguyen , Tue Nguyen
发明人： Zhihong Zhang , Tai Nguyen , Tue Nguyen
IPC分类号： H01L21/285 , H01L21/316 , H01L21/318 , H01L21/768 , C23C16/00 , B05D3/04
CPC分类号： H01L21/76838 , H01L21/02203 , H01L21/28556 , H01L21/28568 , H01L21/3105
摘要： A method for improving the adhesion of an impermeable film on a porous low-k dielectric film in an interconnect structure is disclosed. The method provides an in-situ annealing step before the deposition of the impermeable film to release the volatile trapped molecules such as water, alcohol, HCl, and HF vapor, inside the pores of the porous low-k dielectric film. The method also provides an in-situ deposition step of the impermeable film right after the deposition of the porous low dielectric film without exposure to an atmosphere containing trappable molecules. The method further provides an in-situ deposition step of the impermeable film right after the removal a portion of the porous low-k dielectric film without exposure to an atmosphere containing trappable molecules. By the removal of all trapped molecules inside the porous low-k dielectric film, the adhesion between the deposited impermeable film and the low-k dielectric film is improved. This method is applicable to many porous low-k dielectric films such as porous hydrosilsesquioxane or porous methyl silsesquioxane, porous silica structures such as aerogel, low temperature deposited silicon carbon films, low temperature deposited Si—O—C films, and methyl doped porous silica.
摘要翻译： 公开了一种用于改善互连结构中的多孔低k电介质膜上的不渗透膜的粘附性的方法。 该方法提供在沉积不渗透膜以在多孔低k电介质膜的孔隙内释放挥发性捕获分子如水，醇，HCl和HF蒸气的原位退火步骤。 该方法还提供了在不暴露于含有可捕获分子的气氛之后立即沉积多孔低介电膜之后的不渗透膜的原位沉积步骤。 该方法进一步提供了在不暴露于含有可捕获分子的气氛之后移除多孔低k电介质膜的一部分之后的不渗透膜的原位沉积步骤。 通过去除多孔低k电介质膜内的所有被捕获的分子，提高了沉积的不可渗透膜和低k电介质膜之间的粘附性。 该方法适用于多孔低k介电膜，例如多孔氢硅倍半氧烷或多孔甲基硅倍半氧烷，多孔二氧化硅结构如气凝胶，低温沉积硅碳膜，低温沉积Si-O-C膜和甲基掺杂多孔二氧化硅。
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公开(公告)号：US20070020945A1
公开(公告)日：2007-01-25
申请号：US11443620
申请日：2006-05-31
申请人： Tue Nguyen , Tai Nguyen , Craig Bercaw
发明人： Tue Nguyen , Tai Nguyen , Craig Bercaw
IPC分类号： H01L21/31
CPC分类号： H01L21/67115 , H01J37/32009 , H01J37/32339 , H01L21/67248
摘要： Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
摘要翻译： 公开了利用处理室执行半导体处理的系统和方法; 适合重复触发的闪光灯; 以及耦合到闪光灯的控制输入以触发闪光灯的控制器。 该系统可以在晶片处理中部署与闪光灯并联的固态等离子体源。
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公开(公告)号：US20070020898A1
公开(公告)日：2007-01-25
申请号：US11443621
申请日：2006-05-31
申请人： Tue Nguyen , Tai Nguyen , Craig Bercaw
发明人： Tue Nguyen , Tai Nguyen , Craig Bercaw
IPC分类号： H01L21/28
CPC分类号： H01L21/67115 , H01J37/32009 , H01J37/32339 , H01L21/67248
摘要： Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
摘要翻译： 公开了利用处理室执行半导体处理的系统和方法; 适合重复触发的闪光灯; 以及耦合到闪光灯的控制输入以触发闪光灯的控制器。 该系统可以在晶片处理中部署与闪光灯并联的固态等离子体源。
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公开(公告)号：US20060046412A1
公开(公告)日：2006-03-02
申请号：US11138043
申请日：2005-05-26
申请人： Tue Nguyen , Tai Nguyen
发明人： Tue Nguyen , Tai Nguyen
IPC分类号： H01L21/331
CPC分类号： C23C16/44 , C23C16/54 , H01L21/67069 , H01L21/6719 , H01L21/67207 , H01L21/67748
摘要： An apparatus and method for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from a fist compartment to a second compartment by rotating the workpiece on a workpiece mover through an internal pathway. The transfer mechanism comprises two doors coupled to the workpiece mover to seal the internal pathway between the first and second compartments so that the two compartments are isolated and the workpiece can be processed sequentially and in isolation. The apparatus further comprises components to enable the processing of a workpiece. The preferred method of processing a workpiece is to deposit or adsorb a thin layer in the first compartment and then transfer by rotating the workpiece on the workpiece mover to the second compartment for further processing. The workpiece can then be transferred once again to the first compartment for further processing, and again to the second compartment, repeating the processing and transferring steps until a desired thin film is achieved.
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7.发明申请公开(公告)号：US20060040055A1
公开(公告)日：2006-02-23
申请号：US11159655
申请日：2005-06-23
申请人： Tue Nguyen , Tai Nguyen
发明人： Tue Nguyen , Tai Nguyen
IPC分类号： C23C16/00
CPC分类号： C23C16/44 , C23C16/54 , H01L21/67069 , H01L21/6719 , H01L21/67207 , H01L21/67748
摘要： An apparatus and method for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from a fist compartment to a second compartment by rotating the workpiece on a workpiece mover through an internal pathway. The transfer mechanism comprises two doors coupled to the workpiece mover to seal the internal pathway between the first and second compartments so that the two compartments are isolated and the workpiece can be processed sequentially and in isolation. The apparatus further comprises components to enable the processing of a workpiece. The preferred method of processing a workpiece is to deposit or adsorb a thin layer in the first compartment and then transfer by rotating the workpiece on the workpiece mover to the second compartment for further processing. The workpiece can then be transferred once again to the first compartment for further processing, and again to the second compartment, repeating the processing and transferring steps until a desired thin film is achieved.
摘要翻译： 用于工件的连续和隔离处理的装置和方法包括两室室和通过在工件移动件上通过内部通道旋转工件将工件从第一隔室转移到第二隔室的机构。 传送机构包括联接到工件移动器的两个门，以密封第一和第二隔室之间的内部通道，使得两个隔室被隔离，并且工件可以被顺序地和隔离地处理。 该装置还包括能够处理工件的部件。 处理工件的优选方法是在第一隔室中沉积或吸附薄层，然后通过将工件移动到工件移动器上的方式转移到第二隔室进行进一步处理。 然后可以将工件再次转移到第一隔间用于进一步处理，并且再次到达第二隔室，重复处理和转移步骤，直到达到所需的薄膜。
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公开(公告)号：US5269423A
公开(公告)日：1993-12-14
申请号：US927073
申请日：1992-08-07
申请人： Tai Nguyen
发明人： Tai Nguyen
CPC分类号： B65D33/001 , B65D83/0852
摘要： An apparatus for dispensing large thermoplastic bags utilizing a relatively compact dispensing container. The preferred embodiment of the present invention as implemented teaches a system for dispensing bags, wherein the container is configured to dispense a laterally folded bag stack, reducing the length of the container. The present invention provides a compact, manageable, and more convenient system for dispensing compact bags and the like, resulting in overall cost and time savings. The container of the present invention has formed therein a removable dispenser door, configured for providing convenient access to the bags, while encouraging communication of the bag being dispensed with the container in such a matter as to open the bag during the dispensing operation.
摘要翻译： 一种用于使用相对紧凑的分配容器分配大型热塑性袋的设备。 如实施的本发明的优选实施例教导了一种用于分配袋的系统，其中该容器构造成分配侧向折叠的袋堆叠，从而减小容器的长度。 本发明提供了一种用于分配紧凑型袋等的紧凑，可管理和更方便的系统，从而节省了总体成本和时间。 本发明的容器在其中形成有可拆卸的分配器门，其构造成用于提供方便的进入袋子，同时鼓励在分配操作期间打开袋子的情况下与被容纳的袋子的通信。
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公开(公告)号：US4694412A
公开(公告)日：1987-09-15
申请号：US782078
申请日：1985-09-30
CPC分类号： G07F7/1008 , G06F7/584 , G06F7/588 , G06Q20/341 , G07F7/082
摘要： A random number generator is described. The output of two relatively fast digitally controlled oscillators are exclusively ORed and gated by a counter which has a counting rate determined by a relatively slow digitally controlled oscillator. The ORed output is accumulated in the accumulator. During the inactive period of the ORed gate, the counter is preset to a value which is a function of the digital value stored in the accumulator. Further, during this inactive period, selected output lines of the accumulator are also exclusively ORed and gated to shift the accumulated value. The final value of the accumulator is generated as a random number and further provides a seed number for varying the frequency of the two relatively fast oscillators which then provide the foundation for the next random number.
摘要翻译： 描述了随机数生成器。 两个相对较快的数字控制振荡器的输出由具有由相对慢的数字控制振荡器确定的计数速率的计数器进行异或运算。 OR输出累加在累加器中。 在ORed门的无效期间，计数器被预设为一个值，该值是存储在累加器中的数字值的函数。 此外，在该不活动时段期间，累加器的所选择的输出线也被异或运算，以便使累加值移位。 累加器的最终值被产生为随机数，并且进一步提供用于改变两个相对快速振荡器的频率的种子数，其然后为下一个随机数提供基础。
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