LIGHT-EMITTING DEVICE
    3.
    发明申请
    LIGHT-EMITTING DEVICE 有权
    发光装置

    公开(公告)号:US20140103290A1

    公开(公告)日:2014-04-17

    申请号:US13653140

    申请日:2012-10-16

    IPC分类号: H01L33/06

    CPC分类号: H01L33/06 H01L33/32

    摘要: A light-emitting device comprises a first semiconductor layer; a second semiconductor layer; a light-emitting layer formed between the first semiconductor layer and the second semiconductor layer; a first electron blocking layer formed between the first semiconductor layer and the light-emitting layer; and a second electron blocking layer formed between the second semiconductor layer and the light-emitting layer, wherein the thickness of the second electron blocking layer is not equal to that of the first electron blocking layer, and/or the band gap energy of the second electron blocking layer is not equal to that of the first electron blocking layer.

    摘要翻译: 发光器件包括第一半导体层; 第二半导体层; 形成在所述第一半导体层和所述第二半导体层之间的发光层; 形成在第一半导体层和发光层之间的第一电子阻挡层; 以及形成在第二半导体层和发光层之间的第二电子阻挡层,其中第二电子阻挡层的厚度不等于第一电子阻挡层的厚度和/或第二电子阻挡层的带隙能量 电子阻挡层不等于第一电子阻挡层的电子阻挡层。

    LIGHT-EMITTING DIODE STRUCTURE
    4.
    发明申请
    LIGHT-EMITTING DIODE STRUCTURE 审中-公开
    发光二极管结构

    公开(公告)号:US20110175126A1

    公开(公告)日:2011-07-21

    申请号:US13008702

    申请日:2011-01-18

    IPC分类号: H01L31/0352 B82Y99/00

    摘要: A light emitting diode device is provided, which comprises a substrate comprising a first growth surface and a bottom surface opposite to the first growth surface; a dielectric layer with a plurality of openings therein formed on the first growth surface; a plurality of semiconductor nano-scaled structures formed on the substrate protruding through the openings; a layer formed on the plurality of semiconductor nano-scaled structures with a second growth surface substantially parallel with the bottom surface; a light emitting diode structure formed on the second growth surface; wherein the diameters of the openings are smaller than 250 nm, and wherein the diameters of the plurality semiconductor nano-scaled structures are larger than the diameters of the corresponding openings.

    摘要翻译: 提供了一种发光二极管器件,其包括:衬底,其包括与第一生长表面相对的第一生长表面和底表面; 在第一生长表面上形成有多个开口的电介质层; 形成在所述基板上的多个半导体纳米尺度结构,所述多个半导体纳米级结构通过所述开口突出; 形成在所述多个半导体纳米级结构上的层,其具有基本上平行于所述底表面的第二生长表面; 形成在所述第二生长表面上的发光二极管结构; 其中所述开口的直径小于250nm,并且其中所述多个半导体纳米尺度结构的直径大于相应开口的直径。

    Semiconductor light-emitting device and manufacturing method thereof
    5.
    发明申请
    Semiconductor light-emitting device and manufacturing method thereof 有权
    半导体发光器件及其制造方法

    公开(公告)号:US20070152207A1

    公开(公告)日:2007-07-05

    申请号:US11647170

    申请日:2006-12-29

    IPC分类号: H01L31/00

    CPC分类号: H01L33/06 H01L33/025

    摘要: A semiconductor light-emitting device comprises a substrate; and an active layer formed over the substrate comprising a well layer having an unintentionally-doped impurities; a first barrier layer; and a second barrier layer, wherein the well layer is disposed between the first barrier layer and the second barrier layer, the first barrier layer comprises an n-type-impurities-intentionally-doped portion near to the well layer, and an n-type-impurities-unintentionally-doped portion distant from the well layer; the second barrier layer comprises an n-type-impurities-unintentionally-doped portion near to the well layer.

    摘要翻译: 半导体发光器件包括衬底; 以及形成在所述衬底上的有源层,包括具有无意掺杂杂质的阱层; 第一阻挡层; 以及第二阻挡层,其中所述阱层设置在所述第一阻挡层和所述第二阻挡层之间,所述第一势垒层包括靠近所述阱层的n型杂质有意掺杂部分,以及n型 远离阱层的非有意掺杂部分; 第二阻挡层包括靠近阱层的n型杂质无意掺杂部分。

    Semiconductor light-emitting device and manufacturing method thereof
    6.
    发明授权
    Semiconductor light-emitting device and manufacturing method thereof 有权
    半导体发光器件及其制造方法

    公开(公告)号:US07615773B2

    公开(公告)日:2009-11-10

    申请号:US11647170

    申请日:2006-12-29

    IPC分类号: H01L29/06

    CPC分类号: H01L33/06 H01L33/025

    摘要: A semiconductor light-emitting device comprises a substrate; and an active layer formed over the substrate comprising a well layer having an unintentionally-doped impurities; a first barrier layer; and a second barrier layer, wherein the well layer is disposed between the first barrier layer and the second barrier layer, the first barrier layer comprises an n-type-impurities-intentionally-doped portion near to the well layer, and an n-type-impurities-unintentionally-doped portion distant from the well layer; the second barrier layer comprises an n-type-impurities-unintentionally-doped portion near to the well layer.

    摘要翻译: 半导体发光器件包括衬底; 以及形成在所述衬底上的有源层,包括具有无意掺杂杂质的阱层; 第一阻挡层; 以及第二阻挡层,其中所述阱层设置在所述第一阻挡层和所述第二阻挡层之间,所述第一势垒层包括靠近所述阱层的n型杂质有意掺杂部分,以及n型 远离阱层的非有意掺杂部分; 第二阻挡层包括靠近阱层的n型杂质无意掺杂部分。

    LIGHT-EMITTING DEVICE
    7.
    发明申请
    LIGHT-EMITTING DEVICE 有权
    发光装置

    公开(公告)号:US20100276724A1

    公开(公告)日:2010-11-04

    申请号:US12769744

    申请日:2010-04-29

    IPC分类号: H01L33/44 H01L21/3205

    CPC分类号: H01L33/40 H01L2933/0091

    摘要: The application illustrates a light-emitting device including a contact layer and a current spreading layer on the contact layer. A part of the contact layer is a rough structure and a part of the contact layer is a flat structure. A part of the current spreading layer is a rough structure and a part of the current spreading layer is a flat structure. The rough region of the contact layer and the rough region of the current spreading layer are substantially overlapped.

    摘要翻译: 该应用示出了在接触层上包括接触层和电流扩散层的发光器件。 接触层的一部分是粗糙结构,接触层的一部分是平坦结构。 电流扩散层的一部分是粗糙结构,并且电流扩展层的一部分是平坦结构。 接触层的粗糙区域和电流扩散层的粗糙区域基本上重叠。

    Light-emitting device
    8.
    发明授权
    Light-emitting device 有权
    发光装置

    公开(公告)号:US08362501B2

    公开(公告)日:2013-01-29

    申请号:US12769744

    申请日:2010-04-29

    IPC分类号: H01L33/22

    CPC分类号: H01L33/40 H01L2933/0091

    摘要: The application illustrates a light-emitting device including a contact layer and a current spreading layer on the contact layer. A part of the contact layer is a rough structure and a part of the contact layer is a flat structure. A part of the current spreading layer is a rough structure and a part of the current spreading layer is a flat structure. The rough region of the contact layer and the rough region of the current spreading layer are substantially overlapped.

    摘要翻译: 该应用示出了在接触层上包括接触层和电流扩散层的发光器件。 接触层的一部分是粗糙结构,并且接触层的一部分是平坦结构。 电流扩散层的一部分是粗糙结构,并且电流扩展层的一部分是平坦结构。 接触层的粗糙区域和电流扩散层的粗糙区域基本上重叠。

    Light-emitting device
    9.
    发明申请
    Light-emitting device 有权
    发光装置

    公开(公告)号:US20080308818A1

    公开(公告)日:2008-12-18

    申请号:US11808963

    申请日:2007-06-14

    IPC分类号: H01L33/00

    摘要: A light-emitting device includes an LED chip emitting a primary light, and a phosphor deposited on the LED chip for absorbing the primary light to excite a secondary light, wherein the wavelength of the primary light is shorter than 430 nm and the LED chip is driven by current density greater than 200 mA/cm2. The wavelength-converting light-emitting device has a high light efficiency and a stable color temperature, wherein LED chip is diced from a wafer made by means of a phosphor-on-chip process.

    摘要翻译: 发光装置包括发射初级光的LED芯片和沉积在LED芯片上用于吸收初级光以激发二次光的荧光体,其中初级光的波长短于430nm,LED芯片为 由电流密度大于200mA / cm2驱动。 波长转换发光装置具有高的光效率和稳定的色温,其中LED芯片由通过片上荧光体制造的晶片切割。

    Method of manufacturing a semiconductor structure and separating the semiconductor from a substrate
    10.
    发明授权
    Method of manufacturing a semiconductor structure and separating the semiconductor from a substrate 有权
    制造半导体结构并将半导体与衬底分离的方法

    公开(公告)号:US08664087B2

    公开(公告)日:2014-03-04

    申请号:US13310342

    申请日:2011-12-02

    IPC分类号: H01L21/30 H01L21/46

    摘要: A method of manufacturing a semiconductor structure is disclosed, which includes providing a substrate comprising a bottom surface and a growth surface opposite to the bottom surface; forming a buffer layer comprising a first surface which is not a C-plane substantially parallel with the bottom surface on the growth surface; forming a semiconductor structure on the buffer layer; forming at least one cavity in the buffer layer; extending the cavity along a main extending direction; separating the substrate and the semiconductor structure; wherein the main extending direction is substantially not parallel with the normal direction of the first surface.

    摘要翻译: 公开了一种制造半导体结构的方法,其包括提供包括底表面和与底表面相对的生长表面的基底; 形成缓冲层,所述缓冲层包括第一表面,所述第一表面不是与生长表面上的底表面基本平行的C平面; 在缓冲层上形成半导体结构; 在所述缓冲层中形成至少一个空腔; 沿着主延伸方向延伸空腔; 分离衬底和半导体结构; 其中所述主延伸方向基本上不与所述第一表面的法线方向平行。