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公开(公告)号：US6022622A
公开(公告)日：2000-02-08
申请号：US923638
申请日：1997-09-04
CPC分类号： B26B19/3846 , B26B19/38 , B26B19/3853 , B26B21/60 , C23C16/0272 , C23C16/26 , C23C28/321 , C23C28/343 , Y10T428/30 , Y10T428/31678
摘要： A hard carbon film-coated substrate is disclosed which has between a substrate and a hard carbon film an interlayer principally comprised of at least one selected from the group consisting of Al, Cr, Sn, Co and B, oxides, nitrides and carbides thereof.
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2.发明授权
公开(公告)号：US5691010A
公开(公告)日：1997-11-25
申请号：US324783
申请日：1994-10-18
IPC分类号： C23C16/26 , C23C16/513 , C23C16/517 , H01J37/32 , B05D3/06 , H05H1/48
CPC分类号： H01J37/32055 , C23C16/26 , C23C16/513 , C23C16/517 , H01J37/32706 , H01J2237/332
摘要： A method of forming a diamond-like carbon film on a substrate arranged in a vacuum chamber includes the steps of generating an arc-discharge plasma current in the vacuum chamber, supplying a reaction gas containing carbon atoms, such as CH.sub.4 gas for example, into the arc-discharge plasma current, applying a high-frequency voltage to the substrate so that a self-bias developed in the substrate is not more than -200 V, and forming a diamond-like carbon film from the reaction gas on the substrate that is supplied with the high-frequency voltage.
摘要翻译： 在布置在真空室中的基板上形成类金刚石碳膜的方法包括以下步骤：在真空室中产生电弧放电等离子体电流，将例如CH 4气体的碳原子反应气体供给到 电弧放电等离子体电流，向衬底施加高频电压，使得在衬底中显影的自偏压不大于-200V，并从衬底上的反应气体形成类金刚石碳膜， 被提供高频电压。
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3.发明授权
公开(公告)号：US6071103A
公开(公告)日：2000-06-06
申请号：US895999
申请日：1997-07-17
申请人： Hitoshi Hirano , Keiichi Kuramoto , Yoichi Domoto , Naoto Tojo
发明人： Hitoshi Hirano , Keiichi Kuramoto , Yoichi Domoto , Naoto Tojo
IPC分类号： F04C29/00 , C23C16/26 , C23C16/27 , C23C16/50 , C23C16/511 , F01C21/08 , F04C18/356 , B32B9/00
CPC分类号： F01C21/0809 , Y10T428/12458 , Y10T428/12625 , Y10T428/30
摘要： A member is disclosed which includes a hard carbon film provided through an interlayer or directly on a main body such as a vane. A mixed layer is formed within the main body or interlayer adjacent to an outer surface of the main body or interlayer. The mixed layer contains carbon and a constituent element of either the main body or the interlayer. The mixed layer has a carbon content gradient in its thickness direction so that a carbon content in a thickness portion thereof closer to an outer surface of the mixed layer is higher than in a thickness portion thereof remoter from the outer surface of the mixed layer.
摘要翻译： 公开了一种构件，其包括通过中间层或直接设置在诸如叶片的主体上的硬碳膜。 在与本体或中间层的外表面相邻的主体或中间层内形成混合层。 混合层含有碳和主体或中间层的构成元素。 混合层在其厚度方向上具有碳含量梯度，使得其与混合层的外表面更接近的厚度部分中的碳含量比从混合层的外表面偏离的厚度部分的碳含量高。
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公开(公告)号：US5901021A
公开(公告)日：1999-05-04
申请号：US649180
申请日：1996-05-17
CPC分类号： G11B5/3106
摘要： A thin-film magnetic head includes an upper protective layer, a lower protective layer, and a head forming layer which is provided between the upper and lower protective layers, and the head forming layer further includes a recording head forming layer, a reproducing head forming layer, and a separation layer which is provided between the recording and reproducing head forming layers, while any one of the upper protective layer, the lower protective layer and the separation layer is formed by a diamond-like carbon coating.
摘要翻译： 薄膜磁头包括设置在上保护层和下保护层之间的上保护层，下保护层和头形成层，头形成层还包括记录头形成层，再现头形成层 并且设置在记录和再现头形成层之间的分离层，而上保护层，下保护层和分离层中的任一个由金刚石状碳涂层形成。
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公开(公告)号：US5864452A
公开(公告)日：1999-01-26
申请号：US831835
申请日：1997-04-02
CPC分类号： G11B5/6005 , G11B5/3106
摘要： A thin-film magnetic head which is adapted to be relatively moved on a magnetic recording medium for writing and/or reading information to and/or from the magnetic recording medium includes a carbon film of not more than 200 .ANG. in thickness covering a slider surface of the thin-film magnetic head adapted to face the magnetic recording medium, and an intermediate layer formed in the form of island between the carbon film and the slider surface of the thin-film magnetic head.
摘要翻译： 适于在用于向磁记录介质写入和/或读取信息的磁记录介质上相对移动的薄膜磁头包括不超过200的碳膜，其覆盖滑块表面 的薄膜磁头，以及在碳膜和薄膜磁头的滑块表面之间以岛状形成的中间层。
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公开(公告)号：US5695832A
公开(公告)日：1997-12-09
申请号：US464545
申请日：1995-06-05
IPC分类号： C23C14/00 , C23C16/02 , C23C16/26 , C23C16/458 , C23C16/511 , H01J37/32 , B05D3/06 , C23C16/00
CPC分类号： H01J37/32192 , C23C14/0021 , C23C16/0272 , C23C16/029 , C23C16/26 , C23C16/4588 , C23C16/511 , H01J37/32706 , H01J37/32733 , H01J2237/3321 , Y10T428/265 , Y10T428/30 , Y10T428/31678
摘要： A method for forming the coated substrate includes a first step of forming the intermediate layer on the substrate in a vacuum chamber, and a second step of forming the hard carbon film on the intermediate layer within the same vacuum chamber. The first step may involve evaporation or sputtering of material atoms for the intermediate layer, either with or without plasma generation, or directly forming a plasma from a gas containing the material atoms. The second step may involve forming a plasma from a gas that contains carbon. Another method involves generating a plasma, applying a high frequency voltage to the substrate so as to generate a self-bias of not more than -20 V, and supplying a reaction gas that contains carbon.
摘要翻译： 形成涂布基板的方法包括在真空室中在基板上形成中间层的第一步骤，以及在相同真空室内的中间层上形成硬碳膜的第二步骤。 第一步可能涉及中间层的材料原子的蒸发或溅射，无论是否产生等离子体，或者是从含有材料原子的气体直接形成等离子体。 第二步可能涉及从含有碳的气体形成等离子体。 另一种方法包括产生等离子体，向衬底施加高频电压，以产生不大于-20V的自偏压，以及提供含有碳的反应气体。
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公开(公告)号：US5626963A
公开(公告)日：1997-05-06
申请号：US259480
申请日：1994-06-14
IPC分类号： C23C14/00 , C23C16/02 , C23C16/26 , C23C16/458 , C23C16/511 , H01J37/32
CPC分类号： H01J37/32192 , C23C14/0021 , C23C16/0272 , C23C16/029 , C23C16/26 , C23C16/4588 , C23C16/511 , H01J37/32706 , H01J37/32733 , H01J2237/3321 , Y10T428/265 , Y10T428/30 , Y10T428/31678
摘要： A hard-carbon-film-coated substrate includes in stacked sequence a substrate, an intermediate layer, and a hard carbon film. The substrate consists of a metal or an alloy mainly composed of Ni or Al, or stainless steel. The intermediate layer is mainly composed of Ru, Si, Ge or carbon, or is a mixed layer including Ru, Si, or Ge mixed with at least one of carbon, nitrogen or oxygen, with a composition gradient across its thickness. An apparatus for forming the coated substrate especially includes means for forming the intermediate layer and means for forming the hard carbon film in the same vacuum chamber.
摘要翻译： 硬碳膜涂布基板以堆叠顺序包括基板，中间层和硬碳膜。 基体由主要由Ni或Al或不锈钢构成的金属或合金组成。 中间层主要由Ru，Si，Ge或碳组成，或者是包含与碳，氮或氧中的至少一种混合的Ru，Si或Ge的混合层，其厚度为组成梯度。 用于形成涂覆基材的装置特别包括用于形成中间层的装置和用于在同一真空室中形成硬碳膜的装置。
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公开(公告)号：US06528115B1
公开(公告)日：2003-03-04
申请号：US09502531
申请日：2000-02-10
申请人： Hitoshi Hirano , Yoichi Domoto , Keiichi Kuramoto
发明人： Hitoshi Hirano , Yoichi Domoto , Keiichi Kuramoto
IPC分类号： C23C1626
CPC分类号： C23C16/26 , C23C16/029 , Y10T428/24942 , Y10T428/30
摘要： A hard carbon thin film formed on a substrate has a graded structure in which a ratio of sp2 to sp3 carbon-carbon bonding in the thin film decreases in its thickness direction from a thin film/substrate interface toward a surface of the thin film. A method of forming the thin film involves varying the film-forming ion species over time to produce the composition gradient or structural gradient in the thickness direction of the thin film.
摘要翻译： 形成在基板上的硬碳薄膜具有其中薄膜中的sp2至sp3碳 - 碳键的比例从薄膜/基板界面朝向薄膜表面的厚度方向上减小的渐变结构。 形成薄膜的方法包括随时间改变成膜离子种类以产生薄膜厚度方向上的组成梯度或结构梯度。
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公开(公告)号：US5920143A
公开(公告)日：1999-07-06
申请号：US893091
申请日：1997-07-15
申请人： Hisaki Tarui , Keiichi Kuramoto , Hitoshi Hirano , Yoichi Domoto
发明人： Hisaki Tarui , Keiichi Kuramoto , Hitoshi Hirano , Yoichi Domoto
CPC分类号： H03H9/02582
摘要： A surface acoustic wave device is disclosed which includes a piezoelectric substrate upon which a surface wave propagation film, which is comprised of a diamond-like carbon or aluminum nitride film, is provided.
摘要翻译： 公开了一种表面声波装置，其包括压电基板，在其上提供由类金刚石碳或氮化铝膜构成的表面波传播膜。
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10.发明授权
公开(公告)号：US5458928A
公开(公告)日：1995-10-17
申请号：US70726
申请日：1993-06-02
CPC分类号： C23C16/006 , C23C14/0015 , C23C14/0021 , C23C14/0676
摘要： The disclosed method of forming a high-function material film such as a ZrN thin film on a substrate in a vacuum chamber allows the color tone and uniformity of the film to be controlled. Gaseous nitrogen and gaseous oxygen, or nitrogen ions and oxygen ions, are supplied to the substrate while hard material atoms such as Zr atoms are emitted from an evaporation source toward the substrate. A supply partial pressure of the gaseous oxygen is set at a value within a range from about 10.sup.-5 Torr to about 10.sup.-4 Torr.
摘要翻译： 公开的在真空室中的基板上形成诸如ZrN薄膜的高功能材料膜的方法允许控制色调和均匀性。 将气态氮和气态氧，或氮离子和氧离子供应到衬底，同时将诸如Zr原子的硬材料原子从蒸发源朝向衬底发射。 气态氧的供给分压设定在约10 -5 Torr至约10 -4 Torr的范围内的值。
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