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公开(公告)号：US4755685A
公开(公告)日：1988-07-05
申请号：US919461
申请日：1986-10-16
申请人： Yoshimi Kawanami , Tohru Ishitani , Kaoru Umemura , Hifumi Tamura
发明人： Yoshimi Kawanami , Tohru Ishitani , Kaoru Umemura , Hifumi Tamura
IPC分类号： H01J37/147 , H01J37/04 , H01J37/05 , H01J37/30 , H01J37/317
CPC分类号： H01J37/05 , H01J37/04 , H01J37/3007
摘要： In an ion micro beam apparatus which consists of an ion source, a beam focusing system which accelerates, focuses, mass-separates and deflects the ions emitted from said ion source, and a specimen plate for finely moving the specimen, the improvement comprising a mass separator which is constituted by: at least two stages of focusing lenses in said beam focusing system; four stages of E.times.B deflectors arranged between the two stages of lenses, each of said E.times.B deflectors being comprised of a pair of electrodes and a pair of magnetic pole pieces to generate an electric field and a magnetic field in the directions perpendicular to an ion optical axis, wherein among the four stages of E.times.B deflectors, the electric fields and magnetic fields generated by the E.times.B deflectors of the second and third stages as counted from the side of the ion source are set to be in parallel with, but opposite to, the electric field and magnetic field generated by the E.times.B deflector of the first stage, and the electric field and magnetic field of the E.times.B deflector of the fourth stage are set to be in parallel with, and in the same directions as, the electric field and magnetic field generated by the E.times.B deflector of the first stage; and a mass separating aperture which is located between the E.times.B deflector of the second stage and the E.times.B deflector of the third stage as counted from the side of the ion source, to mass-separate the ions.
摘要翻译： 在由离子源组成的离子微束装置中，对从所述离子源发射的离子进行加速，聚焦，质量分离和偏转的束聚焦系统和用于使样品微调的样品板，其改进包括质量 分离器，其由以下部分构成：在所述束聚焦系统中的至少两级的聚焦透镜; 布置在两级透镜之间的四级ExB偏转器，每个所述ExB偏转器由一对电极和一对磁极片组成，以在垂直于离子光轴的方向上产生电场和磁场 其中，在ExB偏转器的四个阶段中，从离子源侧计数的由第二和第三级的ExB偏转器产生的电场和磁场被设置为与电离器平行但相反 由第一级的ExB偏转器产生的场和磁场，以及第四级的ExB偏转器的电场和磁场被设置为与电场和磁场平行且与其相同的方向 由第一级的ExB导流板产生; 以及从离子源侧计数的位于第二级的ExB偏转器与第三级的ExB偏转器之间的质量分离孔，用于质量分离离子。
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公开(公告)号：US4733134A
公开(公告)日：1988-03-22
申请号：US865976
申请日：1986-05-22
申请人： Hifumi Tamura , Tohru Ishitani , Kaoru Umemura , Yoshimi Kawanami
发明人： Hifumi Tamura , Tohru Ishitani , Kaoru Umemura , Yoshimi Kawanami
摘要： A liquid metal ion source is disclosed, wherein it comprises an ion emitter tip, ion source material holder means holding ion source material for supplying liquid metal ion source material to said ion emitter tip, ion extracting means for extracting ions from said ion emitter tip, when a voltage is applied between the ion extracting means and the ion emitter tip, the pulsing means for pulsing the relative voltage applied between the ion extracting means and the ion emitter tip. A DC voltage corresponding to the threshold voltage V.sub.th for ion beam extraction is applied between the ion emitter tip and the extracting electrode, what permits to extract an ion beam having a high current density by superposing a pulsed voltage on the DC voltage.
摘要翻译： 公开了一种液体金属离子源，其中包括离子发射极尖端，离子源材料保持器装置，其保持用于将液体金属离子源材料供应至所述离子发射极尖端的离子源材料，用于从所述离子发射极尖端提取离子的离子提取装置， 当在离子提取装置和离子发射极尖端之间施加电压时，脉冲装置用于脉冲施加在离子提取装置和离子发射器尖端之间的相对电压。 在离子束尖端与提取电极之间施加与离子束提取的阈值电压Vth对应的DC电压，通过在DC电压上叠加脉冲电压，允许提取具有高电流密度的离子束。
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公开(公告)号：US4774414A
公开(公告)日：1988-09-27
申请号：US086093
申请日：1987-08-12
申请人： Kaoru Umemura , Tohru Ishitani , Toshiyuki Aida , Hifumi Tamura
发明人： Kaoru Umemura , Tohru Ishitani , Toshiyuki Aida , Hifumi Tamura
CPC分类号： H01J27/26
摘要： This invention relates to a liquid metal ion source which melts a source material and extracts ions. Stable extraction of ions of at least one element selected from among As, P and B for a long period of time can be attained by using as a source material an alloy having a composition represented by the formula L.sub.X R.sub.Y M.sub.A wherein X, Y and A each stands for atomic percentage; L at least one element selected from among Pt, Pd and Ag; R at least one element selected from among As, P and B; M at least one element selected from among Ge, Si and Sb; 5
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公开(公告)号：US4710632A
公开(公告)日：1987-12-01
申请号：US733632
申请日：1985-05-13
IPC分类号： H01J37/12 , H01J37/304 , H01J37/317 , H01J37/04 , H01J37/10
CPC分类号： H01J37/304
摘要： The invention is concerned with a power supply for the lens for fine adjustment among the beam-focusing lenses in an ion microbeam apparatus, and is concerned with the control thereof. In this ion microbeam apparatus, the power supply is provided for the lens for fine adjustment in addition to the power supply for the lens for rough adjustment. The power supply is served with a potential that so controls the beam as to have an optimum diameter, responsive to the signals from the ion beam detector and from the beam deflector means.
摘要翻译： 本发明涉及用于离子微束装置中的束聚焦透镜之间用于微调的透镜的电源，并涉及其控制。 在该离子微束装置中，除了用于粗调的透镜的电源之外，还提供用于微调的透镜的电源。 电源具有这样的电位，即，响应于来自离子束检测器和光束偏转器装置的信号，控制光束具有最佳直径。
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公开(公告)号：US4624833A
公开(公告)日：1986-11-25
申请号：US674771
申请日：1984-11-26
申请人： Kaoru Umemura , Tohru Ishitani , Toshiyuki Aida , Hifumi Tamura
发明人： Kaoru Umemura , Tohru Ishitani , Toshiyuki Aida , Hifumi Tamura
摘要： A liquid metal ion source for emitting P ions, wherein a Cu alloy which contains at most 25 at. % of P and if necessary, further contains Ag, C or Si, and/or B is melted and fed to an emitter tip so as to generate an ion beam under a high electric field.
摘要翻译： 一种用于发射P离子的液体金属离子源，其中包含至多25原子的Cu合金。 P的百分数，如果需要，还含有Ag，C或Si，和/或B被熔化并供给到发射极尖端，以便在高电场下产生离子束。
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公开(公告)号：US4697086A
公开(公告)日：1987-09-29
申请号：US732759
申请日：1985-04-24
申请人： Tohru Ishitani , Hifumi Tamura , Kaoru Umemura
发明人： Tohru Ishitani , Hifumi Tamura , Kaoru Umemura
IPC分类号： H01J37/05 , H01J37/317 , H01J37/20
CPC分类号： H01J37/05 , H01J37/3171 , H01J37/3172
摘要： An apparatus for implanting an ion microbeam consists of an ion source; a beam-focusing system which accelerates ions emitted from the ion source, focuses the ions, separates the ions by mass, and deflects the ions; and a sample plate which minutely moves a sample. A Wien filter in which a uniform electric field intersects a uniform magnetic field at right angles is used to separate the ions by mass in the beam-focusing system. A linear optical axis is bent in the Wien filter so that the axis of the ion beam emitted from the ion source intersects the axis of an ion beam implanted into the sample.
摘要翻译： PCT No.PCT / JP84 / 00372 Sec。 371日期：1985年4月24日 102（e）日期1985年4月24日PCT提交1984年7月20日PCT公布。 第WO85 / 01389号公报 日期：1985年3月28日。用于植入离子微束的装置由离子源组成; 加速从离子源发射的离子的束聚焦系统，聚焦离子，质量分离离子并使离子偏转; 以及使样品微小移动的样品板。 使用其中均匀电场与正交的均匀磁场相交的维恩滤波器在束聚焦系统中分离质量的离子。 线性光轴在维恩滤波器中弯曲，使得从离子源发射的离子束的轴与注入到样品中的离子束的轴相交。
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公开(公告)号：US4680507A
公开(公告)日：1987-07-14
申请号：US669796
申请日：1984-11-09
申请人： Kaoru Uemura , Tohru Ishitani , Hifumi Tamura
发明人： Kaoru Uemura , Tohru Ishitani , Hifumi Tamura
摘要： A liquid metal ion source has a reservoir which holds a source material to-be-ionized in a melted state; an emitter which emits from its tip, ions of the melted source material fed from the reservoir; and an extracting electrode which applies a high electric field to the tip of the emitter, thereby to extract the ions from the tip of the emitter. The liquid metal ion source further comprises tank means for storing the source material to be fed to the reservoir, transfer means for transferring the source material from the tank means to the reservoir, and a vacuum chamber for holding the constituents in a vacuum state.
摘要翻译： 液态金属离子源具有储存器，其将待熔化的源材料保持在原状态; 从其尖端发射的发射体，从储存器供给的熔融源材料的离子; 以及向发射极的顶端施加高电场的提取电极，从而从发射极的顶端取出离子。 液体金属离子源还包括储存装置，用于存储要供给到储存器的源材料，用于将源材料从罐装置传送到储存器的转印装置，以及用于将成分保持在真空状态的真空室。
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公开(公告)号：US4479060A
公开(公告)日：1984-10-23
申请号：US454027
申请日：1982-12-28
申请人： Hifumi Tamura , Tohru Ishitani , Akira Shimase
发明人： Hifumi Tamura , Tohru Ishitani , Akira Shimase
IPC分类号： H01J37/073 , G01Q30/20 , H01J37/08 , H01J37/10 , H01J37/12 , H01J37/252 , H01J3/14 , G01N23/04 , G01N23/225
CPC分类号： H01J37/10 , H01J37/252
摘要： An apparatus according to the present invention for irradiating a specimen with charged particle beams comprises a single charged particle generating source from which the charged particle beams formed of electrons and negative ions, respectively, can be simultaneously derived; a specimen holder on which the specimen is placed; and charged particle irradiation means which is interposed between the charged particle generating source and the specimen holder in order to focus the charged particle beams and to irradiate the surface of the specimen with the focused beams, and which includes at least one magnetic lens and at least one electrostatic lens that are individually disposed.
摘要翻译： 根据本发明的用于用带电粒子束照射样本的装置包括单个带电粒子发生源，可以同时衍生由电子和负离子形成的带电粒子束; 放置样品的样品架; 以及带电粒子照射装置，其被插入在带电粒子发生源和样本保持器之间，以便聚焦带电粒子束并用聚焦束照射样本的表面，并且至少包括至少一个磁性透镜 一个静电透镜单独设置。
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公开(公告)号：US4438371A
公开(公告)日：1984-03-20
申请号：US377417
申请日：1982-05-12
IPC分类号： H01J27/26 , H01J37/073 , H01J37/08 , H01J7/24
CPC分类号： H01J37/073 , H01J2237/0807
摘要： A source of charged particles beam which can be used either as an electron source or an ion source and has a tip formed of carbide, nitride or di-boride of at least one of elements Ti, Zr, Hf, V, Nb and Ta or formed of hexa-boride of at least one of rare earth metal elements of atomic number 57 to 70.
摘要翻译： 带电粒子束源，其可以用作电子源或离子源，并且具有由元素Ti，Zr，Hf，V，Nb和Ta中的至少一种的碳化物，氮化物或二硼化物形成的尖端，或 由至少一种原子数为57至70的稀土金属元素的六硼化物形成。
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公开(公告)号：US4560907A
公开(公告)日：1985-12-24
申请号：US505721
申请日：1983-06-20
申请人： Hifumi Tamura , Hiroshi Okano , Tohru Ishitani , Akira Shimase
发明人： Hifumi Tamura , Hiroshi Okano , Tohru Ishitani , Akira Shimase
CPC分类号： H01J27/26
摘要： An ion source apparatus of surface ionization type comprises an emitter tip in the form of a round rod having a sharp-pointed end, an ion source material holder for holding the emitter tip coaxially within a crucible made of a material of a high melting point, the crucible having an opening formed in a bottom wall thereof through which the sharp-pointed end of the emitter tip extends outwardly, the ion source material is being filled in the crucible so as to enclose the outer periphery of the sharp-pointed end of the emitter tip, a filament for emitting electrons with which the emitter tip is bombarded from below, a heating power supply for the filament, an ion beam extracting electrode disposed between the emitter tip and the filament and maintained at a potential of a substantially the level as that of the filament, and an accelerating voltage power supply for applying a high voltage between the ion beam extracting electrode and the emitter tip to accelerate the electrons and ion beam.
摘要翻译： 表面电离型的离子源装置包括具有尖锐端的圆棒形式的发射极尖端，用于将发射极尖端同轴地保持在由高熔点材料制成的坩埚内的离子源材料保持器， 所述坩埚具有形成在其底壁中的开口，所述发射极尖端的尖锐尖端通过所述开口向外延伸，所述离子源材料被填充在所述坩埚中，以便包围所述坩埚的所述尖端的外周 发射极尖端，用于发射发射极尖端从下方被轰击的电子的灯丝，用于灯丝的加热电源，设置在发射极尖端和灯丝之间的离子束提取电极，并保持在基本上等级的电位 以及用于在离子束提取电极和发射极尖端之间施加高电压的加速电压电源，以加速电子和离子束 m。
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