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公开(公告)号：US4710632A
公开(公告)日：1987-12-01
申请号：US733632
申请日：1985-05-13
IPC分类号： H01J37/12 , H01J37/304 , H01J37/317 , H01J37/04 , H01J37/10
CPC分类号： H01J37/304
摘要： The invention is concerned with a power supply for the lens for fine adjustment among the beam-focusing lenses in an ion microbeam apparatus, and is concerned with the control thereof. In this ion microbeam apparatus, the power supply is provided for the lens for fine adjustment in addition to the power supply for the lens for rough adjustment. The power supply is served with a potential that so controls the beam as to have an optimum diameter, responsive to the signals from the ion beam detector and from the beam deflector means.
摘要翻译： 本发明涉及用于离子微束装置中的束聚焦透镜之间用于微调的透镜的电源，并涉及其控制。 在该离子微束装置中，除了用于粗调的透镜的电源之外，还提供用于微调的透镜的电源。 电源具有这样的电位，即，响应于来自离子束检测器和光束偏转器装置的信号，控制光束具有最佳直径。
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公开(公告)号：US4755685A
公开(公告)日：1988-07-05
申请号：US919461
申请日：1986-10-16
申请人： Yoshimi Kawanami , Tohru Ishitani , Kaoru Umemura , Hifumi Tamura
发明人： Yoshimi Kawanami , Tohru Ishitani , Kaoru Umemura , Hifumi Tamura
IPC分类号： H01J37/147 , H01J37/04 , H01J37/05 , H01J37/30 , H01J37/317
CPC分类号： H01J37/05 , H01J37/04 , H01J37/3007
摘要： In an ion micro beam apparatus which consists of an ion source, a beam focusing system which accelerates, focuses, mass-separates and deflects the ions emitted from said ion source, and a specimen plate for finely moving the specimen, the improvement comprising a mass separator which is constituted by: at least two stages of focusing lenses in said beam focusing system; four stages of E.times.B deflectors arranged between the two stages of lenses, each of said E.times.B deflectors being comprised of a pair of electrodes and a pair of magnetic pole pieces to generate an electric field and a magnetic field in the directions perpendicular to an ion optical axis, wherein among the four stages of E.times.B deflectors, the electric fields and magnetic fields generated by the E.times.B deflectors of the second and third stages as counted from the side of the ion source are set to be in parallel with, but opposite to, the electric field and magnetic field generated by the E.times.B deflector of the first stage, and the electric field and magnetic field of the E.times.B deflector of the fourth stage are set to be in parallel with, and in the same directions as, the electric field and magnetic field generated by the E.times.B deflector of the first stage; and a mass separating aperture which is located between the E.times.B deflector of the second stage and the E.times.B deflector of the third stage as counted from the side of the ion source, to mass-separate the ions.
摘要翻译： 在由离子源组成的离子微束装置中，对从所述离子源发射的离子进行加速，聚焦，质量分离和偏转的束聚焦系统和用于使样品微调的样品板，其改进包括质量 分离器，其由以下部分构成：在所述束聚焦系统中的至少两级的聚焦透镜; 布置在两级透镜之间的四级ExB偏转器，每个所述ExB偏转器由一对电极和一对磁极片组成，以在垂直于离子光轴的方向上产生电场和磁场 其中，在ExB偏转器的四个阶段中，从离子源侧计数的由第二和第三级的ExB偏转器产生的电场和磁场被设置为与电离器平行但相反 由第一级的ExB偏转器产生的场和磁场，以及第四级的ExB偏转器的电场和磁场被设置为与电场和磁场平行且与其相同的方向 由第一级的ExB导流板产生; 以及从离子源侧计数的位于第二级的ExB偏转器与第三级的ExB偏转器之间的质量分离孔，用于质量分离离子。
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公开(公告)号：US4733134A
公开(公告)日：1988-03-22
申请号：US865976
申请日：1986-05-22
申请人： Hifumi Tamura , Tohru Ishitani , Kaoru Umemura , Yoshimi Kawanami
发明人： Hifumi Tamura , Tohru Ishitani , Kaoru Umemura , Yoshimi Kawanami
摘要： A liquid metal ion source is disclosed, wherein it comprises an ion emitter tip, ion source material holder means holding ion source material for supplying liquid metal ion source material to said ion emitter tip, ion extracting means for extracting ions from said ion emitter tip, when a voltage is applied between the ion extracting means and the ion emitter tip, the pulsing means for pulsing the relative voltage applied between the ion extracting means and the ion emitter tip. A DC voltage corresponding to the threshold voltage V.sub.th for ion beam extraction is applied between the ion emitter tip and the extracting electrode, what permits to extract an ion beam having a high current density by superposing a pulsed voltage on the DC voltage.
摘要翻译： 公开了一种液体金属离子源，其中包括离子发射极尖端，离子源材料保持器装置，其保持用于将液体金属离子源材料供应至所述离子发射极尖端的离子源材料，用于从所述离子发射极尖端提取离子的离子提取装置， 当在离子提取装置和离子发射极尖端之间施加电压时，脉冲装置用于脉冲施加在离子提取装置和离子发射器尖端之间的相对电压。 在离子束尖端与提取电极之间施加与离子束提取的阈值电压Vth对应的DC电压，通过在DC电压上叠加脉冲电压，允许提取具有高电流密度的离子束。
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公开(公告)号：US20120199758A1
公开(公告)日：2012-08-09
申请号：US13501561
申请日：2010-10-12
申请人： Yoshimi Kawanami , Tohru Ishitani
发明人： Yoshimi Kawanami , Tohru Ishitani
CPC分类号： H01J37/08 , H01J27/26 , H01J37/3056 , H01J2237/002 , H01J2237/006 , H01J2237/0807
摘要： Provided is a gas field ionization ion source capable of emitting heavy ions with high brightness which are suitable for processing a sample. The gas field ionization ion source according to the present invention includes a temperature controller individually controlling the temperature of the tip end of an emitter electrode (1) and the temperature of a gas injection port part (3) of a gas supply unit.
摘要翻译： 提供能够发出适合于处理样品的高亮度的重离子的气体电离离子源。 根据本发明的气体电离离子源包括温度控制器，其分别控制发射极电极（1）的末端的温度和气体供给单元的气体注入口部分（3）的温度。
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公开(公告)号：US08809801B2
公开(公告)日：2014-08-19
申请号：US13501561
申请日：2010-10-12
申请人： Yoshimi Kawanami , Tohru Ishitani
发明人： Yoshimi Kawanami , Tohru Ishitani
IPC分类号： H01J27/02
CPC分类号： H01J37/08 , H01J27/26 , H01J37/3056 , H01J2237/002 , H01J2237/006 , H01J2237/0807
摘要： Provided is a gas field ionization ion source capable of emitting heavy ions with high brightness which are suitable for processing a sample. The gas field ionization ion source according to the present invention includes a temperature controller individually controlling the temperature of the tip end of an emitter electrode (1) and the temperature of a gas injection port part (3) of a gas supply unit.
摘要翻译： 提供能够发出适合于处理样品的高亮度的重离子的气体电离离子源。 根据本发明的气体电离离子源包括温度控制器，其分别控制发射极电极（1）的末端的温度和气体供给单元的气体注入口部分（3）的温度。
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公开(公告)号：US20120217391A1
公开(公告)日：2012-08-30
申请号：US13508040
申请日：2010-11-01
申请人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
发明人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
IPC分类号： H01J37/28
CPC分类号： H01J37/08 , H01J27/26 , H01J37/09 , H01J37/28 , H01J2237/062 , H01J2237/0807
摘要： The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.
摘要翻译： 带电粒子束显微镜由气体离子源（1）构成; 聚焦透镜（5），其加速并聚焦已经从离子源放出的离子; 限制已经通过聚焦透镜的离子束的可移动的第一孔（6）; 第一偏转器（35），其扫描或对准已经穿过第一孔的离子束; 第二偏转器（7），其使已经穿过第一孔的离子束偏转; 限制已经通过第一孔的离子束的第二孔（36）; 物镜（8），其在样品上聚焦已经穿过第一孔的离子束; 以及用于测量与已经通过第二孔的离子束的电流基本成比例的信号的装置。
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7.发明授权Specimen or substrate cutting method using focused charged particle beam and secondary ion spectroscopic analysis method utilizing the cutting method 失效使用聚焦带电粒子束的样品或基板切割方法和利用切割方法的二次离子光谱分析方法
公开(公告)号：US4939364A
公开(公告)日：1990-07-03
申请号：US253558
申请日：1988-10-05
IPC分类号： H01J37/08 , C23F4/00 , G01Q30/10 , H01J37/305 , H01L21/30 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/3056
摘要： A specimen or substrate cutting method of cutting or processing a predetermined portion of a specimen or substrate in a direction of depth thereof by generating a focused charged particle beam from a particle beam source and irradiating the predetermined portion of the specimen or substrate with the focused charged particle beam is disclosed in which a particle species of the charged particle beam is selected such that each of the melting point of the particle species itself and the melting point of an alloy or compound of the particle species and constituent atoms of the specimen or substrate is not lower than 3/2 times of the temperature of the specimen or substrate in units of absolute temperature. A secondary ion mass-spectroscopic analysis method is also disclosed in which the charged particle beam is used as a probe to mass-analyze secondary charged ion successively generated from the cut portion of the specimen or substrate.
摘要翻译： 一种样品或基材切割方法，其通过从粒子束源产生聚焦的带电粒子束来在其深度方向上切割或加工样品或基底的预定部分，并用聚焦的带电量照射样品或基底的预定部分 公开了粒子束，其中选择带电粒子束的粒子种类，使得颗粒物质本身的熔点和样品或基底的颗粒物质的合金或化合物的熔点和成分原子的熔点为 不低于样品或基材温度的绝对温度的3/2倍。 还公开了二次离子质谱分析方法，其中使用带电粒子束作为探针，对从样品或基底的切割部分连续产生的二次带电离子进行质量分析。
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公开(公告)号：US4936968A
公开(公告)日：1990-06-26
申请号：US324657
申请日：1989-03-17
IPC分类号： H01J37/305 , H01J37/317 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/3056
摘要： In an ion-beam machining method and apparatus of effecting sputtering by deflecting a focused ion beam and scanning it on a material surface, the relationship between the diameter d of the beam on the material surface and the height h of a stepped portion formed by each beam scan is changed from h.gtoreq.d to h
摘要翻译： 在通过使聚焦离子束偏转并将其扫描在材料表面上来实现溅射的离子束加工方法和装置中，材料表面上的束的直径d与由每个形成的台阶部分的高度h之间的关系 根据正在形成的孔的深度的增加，光束扫描从h> / = d变为h << d，从而控制再次沉积在孔的侧壁上的溅射粒子的数量。 该装置包括用于控制离子束偏转器和消隐电极的偏转控制器，以便改变上述d和h之间的关系。
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公开(公告)号：US5120925A
公开(公告)日：1992-06-09
申请号：US519402
申请日：1990-05-04
IPC分类号： B23K15/00 , B23K26/00 , B23P21/00 , G03F1/72 , G03F1/74 , H01J37/317 , H01L21/00 , H01L21/302 , H01L21/82 , H01L25/04 , H01L25/16 , H01L25/18 , H01L27/01 , H01L41/09 , H05K13/04
CPC分类号： H01L21/67138 , H01L24/24 , H05K13/0486 , H01L2924/12042 , H01L2924/14
摘要： A method for device transplantation includes the conveyance of a microminiature device, which has been premanufactured, to a desired place located on a sample, observation and fabrication of the new device with a focused beam, and repair of passive elements or active elements located on the sample. Additionally, the new microminiature devices may be transplanted based on the observed results.
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公开(公告)号：US5065034A
公开(公告)日：1991-11-12
申请号：US517313
申请日：1990-05-01
CPC分类号： H01J37/09 , H01J2237/0455 , H01J2237/0458
摘要： A charged particle beam apparatus is provided with an aperture device which includes a plurality of slit plates. Each of the slit plates includes a plurality of slits having different widths. The slit plates are superimposed in a direction of the axis of a charged particle beam so that the corresponding slits in the slit plates overlap to define an aperture which controls a beam current.
摘要翻译： 带电粒子束装置设置有包括多个狭缝板的孔装置。 每个狭缝板包括具有不同宽度的多个狭缝。 狭缝板在带电粒子束的轴线的方向上重叠，使得狭缝板中的相应狭缝重叠以限定控制束流的孔。
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