High-power, broad-band, superluminescent diode and method of fabricating the same
    3.
    发明授权
    High-power, broad-band, superluminescent diode and method of fabricating the same 有权
    大功率,宽带,超发光二极管及其制造方法

    公开(公告)号:US07745836B2

    公开(公告)日:2010-06-29

    申请号:US12118543

    申请日:2008-05-09

    IPC分类号: H01L29/16

    CPC分类号: H01L33/0045 H01L33/02

    摘要: Provided are a superluminescent diode with a high optical power and a broad wavelength band, and a method of fabricating the same. The superluminescent diode includes: at least one high optical confinement factor (HOCF) region; and at least one low optical confinement factor (LOCF) region having a lower optical confinement factor than the HOCF region. The method includes obtaining a difference of optical confinement factors in the HOCF region and the LOCF region through a selective area growth method, the selective area growth method using a deposition thicknesses difference of thin layers according to a width difference of openings that expose a substrate.

    摘要翻译: 提供了具有高光功率和宽波长带的超发光二极管及其制造方法。 超发光二极管包括:至少一个高光限制因子(HOCF)区域; 以及具有比HOCF区域更低的光限制因子的至少一个低光限制因子(LOCF)区域。 该方法包括通过选择性区域生长方法获得HOCF区域和LOCF区域中的光限制因子的差异,所述选择性区域生长方法使用根据暴露衬底的开口的宽度差的薄层的沉积厚度差。

    HIGH-POWER, BROAD-BAND, SUPERLUMINESCENT DIODE AND METHOD OF FABRICATING THE SAME
    4.
    发明申请
    HIGH-POWER, BROAD-BAND, SUPERLUMINESCENT DIODE AND METHOD OF FABRICATING THE SAME 有权
    高功率,宽带,超亮度二极管及其制造方法

    公开(公告)号:US20090152528A1

    公开(公告)日:2009-06-18

    申请号:US12118543

    申请日:2008-05-09

    IPC分类号: H01L29/06 H01L21/02

    CPC分类号: H01L33/0045 H01L33/02

    摘要: Provided are a superluminescent diode with a high optical power and a broad wavelength band, and a method of fabricating the same. The superluminescent diode includes: at least one high optical confinement factor (HOCF) region; and at least one low optical confinement factor (LOCF) region having a lower optical confinement factor than the HOCF region. The method includes obtaining a difference of optical confinement factors in the HOCF region and the LOCF region through a selective area growth method, the selective area growth method using a deposition thicknesses difference of thin layers according to a width difference of openings that expose a substrate.

    摘要翻译: 提供了具有高光功率和宽波长带的超发光二极管及其制造方法。 超发光二极管包括:至少一个高光限制因子(HOCF)区域; 以及具有比HOCF区域更低的光限制因子的至少一个低光限制因子(LOCF)区域。 该方法包括通过选择性区域生长方法获得HOCF区域和LOCF区域中的光限制因子的差异,所述选择性区域生长方法使用根据暴露衬底的开口的宽度差的薄层的沉积厚度差。

    Optical device including gate insulating layer having edge effect
    5.
    发明授权
    Optical device including gate insulating layer having edge effect 有权
    光学器件包括具有边缘效应的栅极绝缘层

    公开(公告)号:US07924492B2

    公开(公告)日:2011-04-12

    申请号:US12374261

    申请日:2007-04-24

    IPC分类号: G02F1/07

    摘要: Provided is an optical device having an edge effect with improved phase shift and propagation loss of light without decreasing the dynamic characteristics of the optical device. The optical device includes a first semiconductor layer which is doped with a first type of conductive impurities, and has a recessed groove in an upper portion thereof; a gate insulating layer covering the groove and a portion of the first semiconductor layer; and a second semiconductor layer which covers an upper surface of the gate insulating layer and is doped with a second type of conductive impurities opposite to the first type of conductive impurities.

    摘要翻译: 提供一种具有边缘效应的光学器件,具有改善的相移和光的传播损耗,而不会降低光学器件的动态特性。 光学器件包括掺杂有第一类导电杂质的第一半导体层,并且在其上部具有凹槽; 覆盖所述沟槽和所述第一半导体层的一部分的栅极绝缘层; 以及覆盖所述栅极绝缘层的上表面并且掺杂有与所述第一类型的导电杂质相反的第二类导电杂质的第二半导体层。

    PHOTOELECTRIC DEVICE USING PN DIODE AND SILICON INTEGRATED CIRCUIT (IC) INCLUDING THE PHOTOELECTRIC DEVICE
    6.
    发明申请
    PHOTOELECTRIC DEVICE USING PN DIODE AND SILICON INTEGRATED CIRCUIT (IC) INCLUDING THE PHOTOELECTRIC DEVICE 失效
    使用包括光电装置的PN二极管和硅集成电路(IC)的光电装置

    公开(公告)号:US20100002978A1

    公开(公告)日:2010-01-07

    申请号:US12517802

    申请日:2007-08-07

    IPC分类号: G02F1/035 G02B6/12

    CPC分类号: H01L31/12 H01L27/144

    摘要: Provided are a photoelectric device using a PN diode and a silicon integrated circuit (IC) including the photoelectric device. The photoelectric device includes: a substrate; and an optical waveguide formed as a PN diode on the substrate, wherein a junction interface of the PN diode is formed in a direction in which light advances; and an electrode applying a reverse voltage to the PN diode, wherein N-type and P-type semiconductors of the PN diode are doped at high concentrations and the doping concentration of the N-type semiconductor is higher than or equal to that of the P-type semiconductor.

    摘要翻译: 提供了使用PN二极管的光电装置和包括光电装置的硅集成电路(IC)。 光电装置包括:基板; 以及在所述衬底上形成为PN二极管的光波导,其中所述PN二极管的结界面沿光前进的方向形成; 以及向PN二极管施加反向电压的电极,其中PN二极管的N型和P型半导体以高浓度掺杂,并且N型半导体的掺杂浓度高于或等于P 型半导体。

    Self-mode locked multi-section semiconductor laser diode
    7.
    发明授权
    Self-mode locked multi-section semiconductor laser diode 失效
    自锁式多段半导体激光二极管

    公开(公告)号:US07680169B2

    公开(公告)日:2010-03-16

    申请号:US10726141

    申请日:2003-12-01

    IPC分类号: H01S5/00

    摘要: A multi-section semiconductor laser diode is disclosed. The laser diode includes a complex-coupled DFB laser section that includes a complex-coupled grating and an active structure for controlling the intensity of oscillating laser light, to oscillate laser light in a single mode, and an external cavity including a phase control section and an amplifier section, the phase control section having a passive waveguide that controls a phase variation of feedback laser light, the amplification section having an active structure that controls the strength of the feedback laser light. Currents are separately provided to the three sections to generate optical pulses with tuning range of tens of GHz. Applications include the clock recovery in the 3R regeneration of the optical communication.

    摘要翻译: 公开了一种多段半导体激光二极管。 激光二极管包括复耦DFB激光器部分,其包括复耦合光栅和用于控制振荡激光的强度,以单一模式振荡激光的有源结构,以及包括相位控制部分的外部腔和 放大器部分,相位控制部分具有控制反馈激光的相位变化的无源波导,该放大部分具有控制反馈激光强度的有源结构。 电流分别提供给三个部分,以产生具有几十GHz调谐范围的光脉冲。 应用包括在光通信的3R再生中的时钟恢复。

    OPTICAL DEVICE INCLUDING GATE INSULATING LAYER HAVING EDGE EFFECT
    8.
    发明申请
    OPTICAL DEVICE INCLUDING GATE INSULATING LAYER HAVING EDGE EFFECT 有权
    光学装置,包括具有边缘效应的盖绝缘层

    公开(公告)号:US20090207472A1

    公开(公告)日:2009-08-20

    申请号:US12374261

    申请日:2007-04-24

    IPC分类号: G02F1/015 H01L29/786

    摘要: Provided is an optical device having an edge effect with improved phase shift and propagation loss of light without decreasing the dynamic characteristics of the optical device. The optical device includes a first semiconductor layer which is doped with a first type of conductive impurities, and has a recessed groove in an upper portion thereof; a gate insulating layer covering the groove and a portion of the first semiconductor layer; and a second semiconductor layer which covers an upper surface of the gate insulating layer and is doped with a second type of conductive impurities opposite to the first type of conductive impurities.

    摘要翻译: 提供一种具有边缘效应的光学器件,具有改善的相移和光的传播损耗,而不会降低光学器件的动态特性。 光学器件包括掺杂有第一类导电杂质的第一半导体层,并且在其上部具有凹槽; 覆盖所述沟槽和所述第一半导体层的一部分的栅极绝缘层; 以及覆盖所述栅极绝缘层的上表面并且掺杂有与所述第一类型的导电杂质相反的第二类导电杂质的第二半导体层。

    Photoelectric device using PN diode and silicon integrated circuit (IC) including the photoelectric device
    9.
    发明授权
    Photoelectric device using PN diode and silicon integrated circuit (IC) including the photoelectric device 失效
    光电器件采用PN二极管和硅集成电路(IC),包括光电器件

    公开(公告)号:US08346026B2

    公开(公告)日:2013-01-01

    申请号:US12517802

    申请日:2007-08-07

    IPC分类号: G02F1/035 G02B6/12 G02B6/00

    CPC分类号: H01L31/12 H01L27/144

    摘要: Provided are a photoelectric device using a PN diode and a silicon integrated circuit (IC) including the photoelectric device. The photoelectric device includes: a substrate; and an optical waveguide formed as a PN diode on the substrate, wherein a junction interface of the PN diode is formed in a direction in which light advances; and an electrode applying a reverse voltage to the PN diode, wherein N-type and P-type semiconductors of the PN diode are doped at high concentrations and the doping concentration of the N-type semiconductor is higher than or equal to that of the P-type semiconductor.

    摘要翻译: 提供了使用PN二极管的光电装置和包括光电装置的硅集成电路(IC)。 光电装置包括:基板; 以及在所述衬底上形成为PN二极管的光波导,其中所述PN二极管的结界面沿光前进的方向形成; 以及向PN二极管施加反向电压的电极,其中PN二极管的N型和P型半导体以高浓度掺杂,并且N型半导体的掺杂浓度高于或等于P 型半导体。

    Multi DFB laser diode
    10.
    发明授权
    Multi DFB laser diode 失效
    多DFB激光二极管

    公开(公告)号:US07012945B2

    公开(公告)日:2006-03-14

    申请号:US10725822

    申请日:2003-12-01

    IPC分类号: H01S5/00

    摘要: A multi DFB laser diode for generating spontaneous pulses comprises first and second DFB sections each of which has a substrate including a diffraction grating, an active layer formed on the substrate, a clad layer formed on the active layer and including a refraction varying layer, and an electrode formed on the active layer; and a phase tuning section including a substrate, an active layer formed on the substrate, a clad layer formed on the active layer, and an electrode isolated from the electrode of the first and second DFB sections. The refraction varying layer in the active layer of the first DFB section has a refractive index different from that of the refraction varying layer in the active layer of the second DFB section.

    摘要翻译: 用于产生自发脉冲的多DFB激光二极管包括第一和第二DFB部分,每个DFB部分具有包括衍射光栅的衬底,在衬底上形成的有源层,形成在有源层上并包括折射变化层的覆层,以及 形成在有源层上的电极; 以及相位调谐部,其包括基板,形成在所述基板上的有源层,形成在所述有源层上的覆盖层,以及与所述第一DFB部和所述第二DFB部的电极隔离的电极。 第一DFB部分的有源层中的折射变化层具有与第二DFB部分的有源层中的折射变化层的折射率不同的折射率。