公开(公告)号：US5710598A

公开(公告)日：1998-01-20

申请号：US534032

申请日：1995-09-26

申请人： Yukihiro Ukai ,  Takashi Tsuchitani

发明人： Yukihiro Ukai ,  Takashi Tsuchitani

IPC分类号： G06T9/00 ,  H03M7/30 ,  H03M7/42 ,  H04N1/41 ,  H04N19/102 ,  H04N19/117 ,  H04N19/134 ,  H04N19/136 ,  H04N19/167 ,  H04N19/176 ,  H04N19/196 ,  H04N19/423 ,  H04N19/60 ,  H04N19/625 ,  H04N19/80 ,  H04N19/85 ,  H04N19/91 ,  H04N19/93 ,  H04N7/30

CPC分类号： H03M7/425 ,  H04N19/423 ,  H04N19/44 ,  H04N19/13 ,  H04N19/60 ,  H04N19/91

摘要： A decoding speed is improved. A processing method is changed in variable length decoders depending on whether only one piece of data is to be decoded or two or more pieces of data are to be decoded, thereby suppressing an increase in the size of hardware as much as possible and increasing a processing speed. Although irregular data are created in the first cycle when a large scale decoder having a slow processing speed processes data, a delay apparatus delays data which include the irregular data and data which are supplied from the large scale decoder without a delay are filled in the irregular data portion. As a result, the irregular portion of the data is compensated for and a relative delay of the processing is prevented.

摘要翻译： 解码速度得到提高。 根据是否要对一条数据进行解码或者两条或多条数据进行解码，可变长度解码器的处理方法发生变化，从而尽可能地抑制硬件尺寸的增加，并增加处理 速度。 虽然当具有较慢处理速度的大规模解码器处理数据时，在第一周期中创建不规则数据，但延迟装置将包括不规则数据的数据和从大规模解码器提供的数据不延迟地延迟的数据被填充在不规则 数据部分。 结果，数据的不规则部分被补偿，并且防止了处理的相对延迟。

公开(公告)号：US06677214B1

公开(公告)日：2004-01-13

申请号：US09593657

申请日：2000-06-12

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： H01L21331

CPC分类号： H01J37/32678 ,  B81C1/0038 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  G02F2001/136281 ,  H01H59/0009 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.

摘要翻译： 为了容易且精确地制造包括由单晶材料制成且具有复杂结构的构件的微加工机构，（100）面向上的单晶Si衬底（1102）的最上层（1104） 从多个规定方向对Ne原子电流进行照射，使得最上层（1104）的晶体取向被转换为（111）面向上方向的取向。 采用掩模构件（106）作为屏蔽构件，从其底面各向异性地蚀刻衬底（1102），从而形成V形槽（1112）。 此时，最上层（1104）用作蚀刻停止器。 因此，可以容易地制造具有均匀厚度的单晶隔膜的微加工机。 具有复合构件的微机械，例如由单晶材料制成的图可以容易地通过无接合制造。

公开(公告)号：US6137120A

公开(公告)日：2000-10-24

申请号：US918010

申请日：1997-08-27

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： B81B3/00 ,  C23C16/48 ,  C23C16/511 ,  C23C16/56 ,  G01L9/00 ,  G01P15/08 ,  H01H59/00 ,  H01J37/32 ,  H01L27/12 ,  H01L31/0376 ,  H01L31/078 ,  H01L31/18 ,  H02N1/00 ,  H01L29/04 ,  H01L31/036

CPC分类号： H01J37/32678 ,  B81C1/0038 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C2201/0109 ,  G02F2001/136281 ,  H01H59/0009 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.

摘要翻译： 为了容易且精确地制造包括由单晶材料制成且具有复杂结构的构件的微加工机构，（100）面向上的单晶Si衬底（1102）的最上层（1104） 从多个规定方向对Ne原子电流进行照射，使得最上层（1104）的晶体取向被转换为（111）面向上方向的取向。 采用掩模构件（106）作为屏蔽构件，从其底面各向异性地蚀刻衬底（1102），从而形成V形槽（1112）。 此时，最上层（1104）用作蚀刻停止器。 因此，可以容易地制造具有均匀厚度的单晶隔膜的微加工机。 具有复合构件的微机械，例如由单晶材料制成的图可以容易地通过无接合制造。

公开(公告)号：US6106734A

公开(公告)日：2000-08-22

申请号：US917267

申请日：1997-08-25

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： B81B3/00 ,  C23C16/48 ,  C23C16/511 ,  C23C16/56 ,  G01L9/00 ,  G01P15/08 ,  H01H59/00 ,  H01J37/32 ,  H01L27/12 ,  H01L31/0376 ,  H01L31/078 ,  H01L31/18 ,  H02N1/00 ,  H01L21/302

CPC分类号： H01J37/32678 ,  B81C1/0038 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C2201/0109 ,  G02F2001/136281 ,  H01H59/0009 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diaphragm which is made of a single-crystalline material can be easily manufactured through no junction.

摘要翻译： 为了容易且精确地制造包括由单晶材料制成且具有复杂结构的构件的微加工机构，（100）面向上的单晶Si衬底（1102）的最上层（1104） 从多个规定方向对Ne原子电流进行照射，使得最上层（1104）的晶体取向被转换为（111）面向上方向的取向。 采用掩模构件（106）作为屏蔽构件，从其底面各向异性地蚀刻衬底（1102），从而形成V形槽（1112）。 此时，最上层（1104）用作蚀刻停止器。 因此，可以容易地制造具有均匀厚度的单晶隔膜的微加工机。 具有由单晶材料制成的诸如隔膜的复杂构件的微加工机可以容易地通过无接合制造。

公开(公告)号：US06177706B1

公开(公告)日：2001-01-23

申请号：US08918138

申请日：1997-08-27

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： H01L2701

CPC分类号： H01J37/32678 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C1/0038 ,  B81C2201/0109 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  G02F2001/136281 ,  H01H59/0009 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atoms currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anistropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.

摘要翻译： 为了容易且精确地制造包括由单晶材料制成且具有复杂结构的构件的微加工机构，（100）面向上的单晶Si衬底（1102）的最上层（1104） 从多个规定方向照射Ne原子电流，使得最上层（1104）的晶体取向被转换成使得（111）面向上指向的取向。 采用掩模构件（106）作为屏蔽构件，从其底面对基板（1102）进行静电蚀刻，从而形成V形槽（1112）。 此时，最上层（1104）用作蚀刻停止器。 因此，可以容易地制造具有均匀厚度的单晶隔膜的微加工机。 具有复合构件的微机械，例如由单晶材料制成的图可以容易地通过无接合制造。

公开(公告)号：US09406104B2

公开(公告)日：2016-08-02

申请号：US13885104

申请日：2011-10-13

申请人： Yusuke Nara ,  Takashi Sawada ,  Yukihiro Ukai ,  Motoyasu Tanaka ,  Eizi Kawai ,  Kenichi Mae

发明人： Yusuke Nara ,  Takashi Sawada ,  Yukihiro Ukai ,  Motoyasu Tanaka ,  Eizi Kawai ,  Kenichi Mae

IPC分类号： G06T5/00 ,  G06T15/00 ,  H04N21/442 ,  H04N21/6379 ,  H04N19/149 ,  H04N19/115 ,  H04N19/124 ,  H04N19/17

CPC分类号： G06T5/00 ,  A63F2300/534 ,  A63F2300/535 ,  A63F2300/538 ,  A63F2300/552 ,  G06T15/00 ,  H04N19/115 ,  H04N19/124 ,  H04N19/149 ,  H04N19/17 ,  H04N21/44209 ,  H04N21/6379

摘要： An image processing system includes an image coding device serving as a host device that outputs image data, and an image decoding device serving as a client device and including a display part that displays an image based on image data transmitted from the image coding device. The image coding device includes an image quality controller that controls the image quality of an image displayed on the display part in accordance with an operation status A of the image processing system. When the operation status is a status under which a delay of displaying an image which is caused by transmission of image data from the image coding device to the image decoding device is allowed, the image quality controller increases the image quality of an image displayed on the display part.

摘要翻译： 图像处理系统包括作为输出图像数据的主机装置的图像编码装置，以及作为客户机装置的图像解码装置，包括基于从图像编码装置发送的图像数据显示图像的显示部。 图像编码装置包括图像质量控制器，其根据图像处理系统的操作状态A来控制显示在显示部分上的图像的图像质量。 当操作状态是允许从图像编码装置向图像解码装置发送图像数据的图像显示延迟的状态时，图像质量控制器增加显示在图像编码装置上的图像的图像质量 显示部分。

公开(公告)号：US6025252A

公开(公告)日：2000-02-15

申请号：US917266

申请日：1997-08-25

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： B81B3/00 ,  C23C16/48 ,  C23C16/511 ,  C23C16/56 ,  G01L9/00 ,  G01P15/08 ,  H01H59/00 ,  H01J37/32 ,  H01L27/12 ,  H01L31/0376 ,  H01L31/078 ,  H01L31/18 ,  H02N1/00 ,  H01L31/06

CPC分类号： H01J37/32678 ,  B81C1/0038 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C2201/0109 ,  G02F2001/136281 ,  H01H59/0009 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.

公开(公告)号：US5738731A

公开(公告)日：1998-04-14

申请号：US298800

申请日：1994-08-31

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： B81B3/00 ,  C23C16/48 ,  C23C16/511 ,  C23C16/56 ,  G01L9/00 ,  G01P15/08 ,  H01H59/00 ,  H01J37/32 ,  H01L27/12 ,  H01L31/0376 ,  H01L31/078 ,  H01L31/18 ,  H02N1/00 ,  H01L31/06

CPC分类号： H01J37/32678 ,  B81C1/0038 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C2201/0109 ,  G02F2001/136281 ,  H01H59/0009 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： A solar cell comprising: a first junction part having a first conductivity type first semiconductor film and a second conductivity type second semiconductor film formed on an upper surface of said first semiconductor film; and a second junction part having a first conductivity type third semiconductor film formed on an upper surface of said second semiconductor film and a second conductivity type fourth semiconductor formed on an upper surface of said third semiconductor film, said junction parts arranged from that having a larger forbidden band width along the direction of progress of light through said semiconductor layers, said first, second, third, and fourth semiconductor films being formed of single-crystalline filming; wherein an interlayer conductor prepared from a metal forming ohmic junctions with each of said junction parts and having a thickness capable of transmitting light therethrough is interposed between said first and second junction parts; and wherein said second semiconductor film arranged on one side of said interlayer conductor is different in crystal orientation from said third semiconductor film arranged on the other side of said interlayer conductor.

摘要翻译： 一种太阳能电池，包括：第一接合部，其具有形成在所述第一半导体膜的上表面上的第一导电型第一半导体膜和第二导电型第二半导体膜; 以及第二接合部，其具有形成在所述第二半导体膜的上表面上的第一导电类型的第三半导体膜和形成在所述第三半导体膜的上表面上的第二导电类型的第四半导体，所述接合部的布置具有较大的 沿着通过所述半导体层的光的进行方向的禁带宽度，所述第一，第二，第三和第四半导体膜由单晶成膜形成; 其中由形成欧姆结的金属制成的层间导体与每个所述接合部分并且具有能透过光的厚度的介质插入在所述第一和第二接合部分之间; 并且其中布置在所述层间导体的一侧上的所述第二半导体膜的晶体取向与布置在所述层间导体的另一侧上的所述第三半导体膜不同。

公开(公告)号：US20130235035A1

公开(公告)日：2013-09-12

申请号：US13885104

申请日：2011-10-13

申请人： Yusuke Nara ,  Takashi Sawada ,  Yukihiro Ukai ,  Motoyasu Tanaka ,  Eizi Kawai ,  Kenichi Mae

发明人： Yusuke Nara ,  Takashi Sawada ,  Yukihiro Ukai ,  Motoyasu Tanaka ,  Eizi Kawai ,  Kenichi Mae

IPC分类号： G06T5/00 ,  G06T15/00

CPC分类号： G06T5/00 ,  A63F2300/534 ,  A63F2300/535 ,  A63F2300/538 ,  A63F2300/552 ,  G06T15/00 ,  H04N19/115 ,  H04N19/124 ,  H04N19/149 ,  H04N19/17 ,  H04N21/44209 ,  H04N21/6379

摘要： An image processing system includes an image coding device serving as a host device that outputs image data, and an image decoding device serving as a client device and including a display part that displays an image based on image data transmitted from the image coding device. The image coding device includes an image quality controller that controls the image quality of an image displayed on the display part in accordance with an operation status A of the image processing system. When the operation status is a status under which a delay of displaying an image which is caused by transmission of image data from the image coding device to the image decoding device is allowed, the image quality controller increases the image quality of an image displayed on the display part.

摘要翻译： 图像处理系统包括作为输出图像数据的主机装置的图像编码装置，以及作为客户机装置的图像解码装置，包括基于从图像编码装置发送的图像数据显示图像的显示部。 图像编码装置包括图像质量控制器，其根据图像处理系统的操作状态A来控制显示在显示部分上的图像的图像质量。 当操作状态是允许从图像编码装置向图像解码装置发送图像数据的图像显示延迟的状态时，图像质量控制器增加显示在图像编码装置上的图像的图像质量 显示部分。

公开(公告)号：US06225668B1

公开(公告)日：2001-05-01

申请号：US08917268

申请日：1997-08-25

申请人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

发明人： Masahiro Shindo ,  Daisuke Kosaka ,  Tetsuo Hikawa ,  Akira Takata ,  Yukihiro Ukai ,  Takashi Sawada ,  Toshifumi Asakawa

IPC分类号： H01L2336

CPC分类号： H01J37/32678 ,  B81B2203/0109 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81C1/0038 ,  B81C2201/0109 ,  C23C16/48 ,  C23C16/486 ,  C23C16/511 ,  C23C16/56 ,  G01L9/0042 ,  G01P15/0802 ,  G02F2001/136281 ,  H01H59/0009 ,  H01L27/12 ,  H01L27/1203 ,  H01L31/03762 ,  H01L31/0693 ,  H01L31/0725 ,  H01L31/073 ,  H01L31/078 ,  H01L31/1804 ,  H01L31/1828 ,  H01L31/186 ,  H02N1/002 ,  Y02E10/543 ,  Y02E10/544 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer (1104) is converted to such orientation that the (111) plane is upwardly directed. A masking member (106) is employed as a shielding member to anisotropically etch the substrate (1102) from its bottom surface, thereby forming a V-shaped groove (1112). At this time, the uppermost layer (1104) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.

摘要翻译： 为了容易且精确地制造包括由单晶材料制成且具有复杂结构的构件的微加工机构，（100）面向上的单晶Si衬底（1102）的最上层（1104） 从多个规定方向对Ne原子电流进行照射，使得最上层（1104）的晶体取向被转换为（111）面向上方向的取向。 采用掩模构件（106）作为屏蔽构件，从其底面各向异性地蚀刻衬底（1102），从而形成V形槽（1112）。 此时，最上层（1104）用作蚀刻停止器。 因此，可以容易地制造具有均匀厚度的单晶隔膜的微加工机。 具有复合构件的微机械，例如由单晶材料制成的图可以容易地通过无接合制造。