Method for forming sputter target assemblies
    7.
    发明授权
    Method for forming sputter target assemblies 有权
    用于形成溅射靶组件的方法

    公开(公告)号:US08123107B2

    公开(公告)日:2012-02-28

    申请号:US10852117

    申请日:2004-05-25

    IPC分类号: B23K20/00

    CPC分类号: B23K35/02

    摘要: The method forms a sputter target assembly by attaching a sputter target to an insert and applying a bond metal layer between the insert and a backing plate. Then pressing the insert and backing plate together forms a solid state bond with the bond metal layer, attaches the insert to the backing plate and forms at least one cooling channel between the insert and the backing plate.

    摘要翻译: 该方法通过将溅射靶附接到插入件并且在插入件和背板之间施加粘合金属层来形成溅射靶组件。 然后将插入物和背板压在一起形成与粘合金属层的固态结合,将插入件附接到背板上,并在插入件和背板之间形成至少一个冷却通道。

    Enhanced melt-textured growth
    9.
    发明授权

    公开(公告)号:US07220706B1

    公开(公告)日:2007-05-22

    申请号:US10438119

    申请日:2003-05-14

    申请人: Scott H. Streett

    发明人: Scott H. Streett

    IPC分类号: C30B29/16 C04B101/00

    摘要: A method for the enhanced melt-textured growth of superconducting crystals is disclosed for a sample having a first material capable of exhibiting superconducting properties. The sample is heated above a peritectic temperature of the first material, cooled below the peritectic temperature, and is subsequently subjected to a plurality of temperature spikes in which the sample is rapidly reheated above the peritectic temperature and recooled below the peritectic temperature to produce a superconducting crystalline structure substantially free of secondary nucleations. The resulting crystal is a superconducting crystalline structure comprising a plurality of bands formed in succession around a seed material. Each band has a non-uniform microstructure from an inner portion to an outer portion of the band.

    Integrated gas supply and leak detection system
    10.
    发明授权
    Integrated gas supply and leak detection system 有权
    综合供气和泄漏检测系统

    公开(公告)号:US07107820B2

    公开(公告)日:2006-09-19

    申请号:US10429205

    申请日:2003-05-02

    IPC分类号: G01M3/04

    CPC分类号: G01M3/2815 F17D5/06

    摘要: The invention generally relates to a system and method for integrated gas delivery and leak detection to one or more applications. The system includes at least one application site, a process conduit extending from a process gas source site to the application site, a first and second process flow control at the process conduit, and a first pressure sensor.Also included in the system is a microprocessor that is in electronic communication with the flow controls and the first pressure sensor, wherein the microprocessor is programmed to respond to an application standby request by performing a pressure decay test, including closing the second process flow control and pressurizing a portion of the system by opening the first process flow control. Further included in the pressure test is closing the first process flow control when the pressure at the first pressure sensor is at a minimum pressure, and comparing an empirical pressure decay rate at the first pressure sensor with a maximum pressure decay rate, whereby an empirical pressure decay rate that exceeds the maximum pressure decay rate indicates the presence of a leak.

    摘要翻译: 本发明一般涉及用于对一个或多个应用进行综合气体输送和泄漏检测的系统和方法。 该系统包括至少一个应用场所,从处理气体源站点延伸到应用场所的处理管道,处理导管处的第一和第二处理流程控制以及第一压力传感器。 还包括在系统中的微处理器与流量控制器和第一压力传感器电子通信,其中微处理器被编程为通过执行压力衰减测试来响应应用程序待机请求,包括关闭第二过程流程控制和 通过打开第一工艺流程控制来对系统的一部分进行加压。 进一步包括在压力测试中,当第一压力传感器处的压力处于最小压力时关闭第一工艺流程控制,并将第一压力传感器的经验压力衰减速率与最大压力衰减速率进行比较,由此经验压力 超过最大压力衰减速率的衰减速率表示存在泄漏。