摘要:
A chip package is provided, the chip package including: first encapsulation structure; first passivation layer formed over first encapsulation structure and first electrically conductive layer formed over first passivation layer; at least one chip arranged over first electrically conductive layer and passivation layer wherein at least one chip contact pad contacts first electrically conductive layer; at least one cavity formed in first encapsulation structure, wherein at least one cavity exposes a portion of first passivation layer covering at least one chip contact pad; second encapsulation structure disposed over first encapsulation structure and covering at least one cavity, wherein a chamber region over at least one chip contact pad is defined by at least one cavity and second encapsulation structure; wherein second encapsulation structure includes an inlet and outlet connected to chamber region, wherein inlet and outlet control an inflow and outflow of heat dissipating material to and from chamber region.
摘要:
A semiconductor device package is provided. The semiconductor device package includes a laminate comprising a first metal layer disposed on a dielectric film; a plurality of vias extending through the laminate according to a predetermined pattern; one or more semiconductor devices attached to the dielectric film such that the semiconductor device contacts one or more vias; a patterned interconnect layer disposed on dielectric film, said patterned interconnect layer comprising one or more patterned regions of the first metal layer and an electrically conductive layer, wherein a portion of the patterned interconnect layer extends through one or more vias to form an electrical contact with the semiconductor device. The patterned interconnect layer comprises a top interconnect region and a via interconnect region, wherein the package interconnect region has a thickness greater than a thickness of the via interconnect region.
摘要:
Various embodiments of an integrated circuit package and a method of forming such package are disclosed. The package includes a substrate having a glass core layer, where the glass core layer includes a first major surface, a second major surface, and a cavity disposed between the first major surface and the second major surface of the glass core layer. The package also includes a die disposed in the cavity of the glass core layer, an encapsulant disposed in the cavity between the die and a sidewall of the cavity, a first patterned conductive layer disposed adjacent the first major surface of the glass core layer, and a second patterned conductive layer disposed adjacent the second major surface of the glass core layer. The die is electrically connected to at least one of the first and second patterned conductive layers.
摘要:
An intelligent power module having a snubber capacitor for surge reduction installed therein is disclosed. IPM having a snubber capacitor according to an embodiment of the present invention can prevent a device from malfunctioning or being destroyed by a surge voltage. An embodiment of the present invention can allow for easy design of the IPM and reduction of an area and cost of a PCB
摘要:
Various embodiments of an integrated circuit package and a method of forming such package are disclosed. The package includes a substrate having a glass core layer, where the glass core layer includes a first major surface, a second major surface, and a cavity disposed between the first major surface and the second major surface of the glass core layer. The package also includes a die disposed in the cavity of the glass core layer, an encapsulant disposed in the cavity between the die and a sidewall of the cavity, a first patterned conductive layer disposed adjacent the first major surface of the glass core layer, and a second patterned conductive layer disposed adjacent the second major surface of the glass core layer. The die is electrically connected to at least one of the first and second patterned conductive layers.
摘要:
An improved gated thyristor that utilizes less silicon area than IGBT, BIPOLARs or MOSFETs sized for the same application is provided. Embodiments of the inventive thyristor have a lower gate charge, and a lower forward drop for a given current density. Embodiments of the thyristor once triggered have a latch structure that does not have the same Cgd or Ccb capacitor that must be charged from the gate, and therefore the gated thyristor is cheaper to produce, and requires a smaller gate driver, and takes up less space than standard solutions. Embodiments of the inventive thyristor provide a faster turn off speed than the typical >600 ns using a modified MCT structure which results in the improved tail current turn off profile (
摘要:
A method of fabricating a semiconductor device package is provided. The method includes providing a laminate comprising a dielectric film disposed on a first metal layer, said laminate having a dielectric film outer surface and a first metal layer outer surface; forming a plurality of vias extending through the laminate according to a predetermined pattern; attaching one or more semiconductor device to the dielectric film outer surface such that the semiconductor device contacts one or more vias after attachment; disposing an electrically conductive layer on the first metal layer outer surface and on an inner surface of the plurality of vias to form an interconnect layer comprising the first metal layer and the electrically conductive layer; and patterning the interconnect according to a predetermined circuit configuration to form a patterned interconnect layer, wherein a portion of the patterned interconnect layer extends through one or more vias to form an electrical contact with the semiconductor device. A semiconductor device package is also provided.
摘要:
An improved gated thyristor that utilizes less silicon area than IGBT, BIPOLARs or MOSFETs sized for the same application is provided. Embodiments of the inventive thyristor have a lower gate charge, and a lower forward drop for a given current density. Embodiments of the thyristor once triggered have a latch structure that does not have the same Cgd or Ccb capacitor that must be charged from the gate, and therefore the gated thyristor is cheaper to produce, and requires a smaller gate driver, and takes up less space than standard solutions. Embodiments of the inventive thyristor provide a faster turn off speed than the typical >600 ns using a modified MCT structure which results in the improved tail current turn off profile (
摘要:
An improved gated thyristor that utilizes less silicon area than IGBT, BIPOLARs or MOSFETs sized for the same application is provided. Embodiments of the inventive thyristor have a lower gate charge, and a lower forward drop for a given current density. Embodiments of the thyristor once triggered have a latch structure that does not have the same Cgd or Ccb capacitor that must be charged from the gate, and therefore the gated thyristor is cheaper to produce, and requires a smaller gate driver, and takes up less space than standard solutions. Embodiments of the inventive thyristor provide a faster turn off speed than the typical >600 ns using a modified MCT structure which results in the improved tail current turn off profile (
摘要:
An improved gated thyristor that utilizes less silicon area than IGBT, BIPOLARs or MOSFETs sized for the same application is provided. Embodiments of the inventive thyristor have a lower gate charge, and a lower forward drop for a given current density. Embodiments of the thyristor once triggered have a latch structure that does not have the same Cgd or Ccb capacitor that must be charged from the gate, and therefore the gated thyristor is cheaper to produce, and requires a smaller gate driver, and takes up less space than standard solutions. Embodiments of the inventive thyristor provide a faster turn off speed than the typical >600 ns using a modified MCT structure which results in the improved tail current turn off profile (