公开(公告)号：US20240198380A1

公开(公告)日：2024-06-20

申请号：US18589537

申请日：2024-02-28

申请人： NIHON SPINDLE MANUFACTURING CO., LTD.

发明人： Keiichiro Onishi ,  Keiichi Asami ,  Katsuhiro Masuda ,  Masafumi Yamaguchi

IPC分类号： B05D3/04 ,  B05C15/00 ,  H01M4/04

CPC分类号： B05D3/0406 ,  B05C15/00 ,  H01M4/0404

摘要： Provided is a coating device including a coating portion where coating treatment is performed, a partition portion covering the coating portion, and a humidity controller adjusting an amount of moisture in a work space partitioned by the partition portion.

公开(公告)号：US20230330692A1

公开(公告)日：2023-10-19

申请号：US18296471

申请日：2023-04-06

申请人： Zense-Life Inc.

发明人： Robert James Boock ,  Sai Kit Wu

IPC分类号： B05C3/12 ,  B05C15/00 ,  B05C13/02

CPC分类号： B05C3/125 ,  B05C15/00 ,  B05C13/02

摘要： An apparatus for coating a working wire of a sensor includes a carousel, a robotic arm, and an optical scanner. The carousel includes a first platform, a second platform, and a ring dipping tool. The first platform has a central axis and supports a plurality of stations, all arranged around the central axis. The second platform is positioned above the first platform, with a platform actuator that raises, lowers, and rotates the second platform. The ring dipping tool is coupled to an edge of the second platform and oriented vertically with respect to ground and extending toward the first platform. The robotic arm is configured to transport a fixture, the fixture being configured to hold the wire. The optical scanner is positioned near a wire dipping station of the plurality of stations and configured to scan a position of the wire and a location of the ring dipping tool.

公开(公告)号：US11782348B2

公开(公告)日：2023-10-10

申请号：US17531988

申请日：2021-11-22

申请人： SEMES CO., LTD.

发明人： Ki Sang Eum ,  Gyeong Won Song ,  Yang Yeol Ryu ,  Kyung Jin Seo

IPC分类号： G03F7/16 ,  B05C15/00 ,  B05C11/02

CPC分类号： G03F7/162 ,  B05C11/02 ,  B05C15/00

摘要： The inventive concept provides an apparatus for treating a substrate. The apparatus comprises a processing container having an inner space; a support unit configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply a treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow from the inner space, wherein the exhaust unit includes an air flow guide duct with an inlet provided to introduce the air flow into the air flow guide duct in a tangential direction to a rotating direction of the substrate supported on the support unit.

公开(公告)号：US11731154B2

公开(公告)日：2023-08-22

申请号：US17399522

申请日：2021-08-11

申请人： Arkema Inc.

发明人： Jeremy J. Nihart ,  Ryan C. Smith

IPC分类号： B05B14/40 ,  B05B16/40 ,  B05B16/60 ,  B05C15/00 ,  C03C17/00 ,  B05B16/00 ,  B05B13/04 ,  B05B5/08 ,  B05B12/18 ,  B05B12/36 ,  B05B13/02 ,  C23C16/455 ,  B05D3/04

CPC分类号： B05B14/40 ,  B05B5/08 ,  B05B12/18 ,  B05B12/36 ,  B05B13/0221 ,  B05B13/0447 ,  B05B16/00 ,  B05B16/40 ,  B05B16/60 ,  B05B16/90 ,  B05C15/00 ,  C03C17/005 ,  C23C16/45502 ,  B05D3/04 ,  B05D2203/35 ,  Y10S55/46 ,  Y10S118/07

摘要： A modular apparatus for coating glass articles with a chemical compound includes a coating hood section (10a) including a series of interconnected walls (12) defining an interior chamber (18, 20a, 20b) having an inlet (32) and an outlet (44), a blower (24) positioned at least partially in the interior chamber (18, 20a, 20b) to carry air from the inlet (32) towards the outlet (44); and a connector (50) for connecting the coating hood section (10a) to an identical coating hood section (10b). The connector (50) for connecting being defined on at least one of the interconnected walls (12) of the coating hood section (10a).

公开(公告)号：US11702732B2

公开(公告)日：2023-07-18

申请号：US17668591

申请日：2022-02-10

申请人： Raytheon Technologies Corporation

发明人： Eric Jorzik

IPC分类号： C23C14/04 ,  B05C21/00 ,  C23C14/50 ,  B05C13/02 ,  C23C14/56 ,  H01J37/20 ,  C23C14/24 ,  F01D5/00 ,  C23C10/04 ,  B05B13/02 ,  B05C1/00 ,  B05C17/00 ,  B05C15/00 ,  H01J37/32

CPC分类号： C23C14/505 ,  B05C13/02 ,  B05C21/005 ,  C23C10/04 ,  C23C14/042 ,  C23C14/246 ,  C23C14/56 ,  F01D5/005 ,  H01J37/20 ,  B05B13/0228 ,  B05C1/003 ,  B05C15/00 ,  B05C17/002 ,  F05D2230/313 ,  H01J37/32779 ,  H01J2237/202

摘要： An embodiment of a line-of-sight coating fixture includes a support structure, a spindle, and a shadow structure. The support structure includes a plurality of compartments disposed below a platter, each compartment having an opening on a periphery of the support structure. Each compartment is adapted to receive and secure a base of a workpiece such that a body of each workpiece to be coated is disposed about a periphery of the support structure and extends above the platter. The spindle is disposed through a center of the platter or support structure for rotating the workpieces thereabout. The shadow structure is disposed about the spindle, inside of the periphery, the shadow structure sized and adapted to shield a portion of each workpiece from line-of-sight coating material.

公开(公告)号：US20230031645A1

公开(公告)日：2023-02-02

申请号：US17815655

申请日：2022-07-28

申请人： Memjet Technology Limited

发明人： Mark Profaca

IPC分类号： D06B11/00 ,  B41J3/407 ,  B41J3/60 ,  D06B23/30 ,  B05C11/10 ,  B05C15/00 ,  B05C5/02

摘要： A thread-coating module includes: a base plate having a printhead opening; an inkjet printhead received in the printhead opening; and a chamber unit having a mouth for engagement with the base plate and an ink-collection slot opposing the printhead. The chamber unit and the base plate are movable relative to each other for opening and closing a coating chamber comprising the base plate and the chamber unit, with the ink-collection slot being positioned opposite the printhead in the coating chamber.

公开(公告)号：US20220399499A1

公开(公告)日：2022-12-15

申请号：US17820782

申请日：2022-08-18

申请人： Kateeva, Inc.

发明人： Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Conor F. Madigan ,  Eugene Rabinovich ,  Nahid Harjee ,  Christopher Buchner ,  Gregory Lewis

IPC分类号： H01L51/00 ,  B05B15/60 ,  B05C13/00 ,  B05C15/00 ,  B05D5/00 ,  B41J2/01 ,  B41J3/407 ,  B41J11/00 ,  H01L21/67 ,  H01L21/677 ,  H01L51/52 ,  H01L51/56 ,  H01L21/673 ,  B05D3/06

摘要： A method for providing a substrate coating comprises transferring a substrate to an enclosed ink jet printing system; printing organic material in a deposition region of the substrate using the enclosed ink jet printing system, the deposition region comprising at least a portion of an active region of a light-emitting device on the substrate; loading the substrate with the organic material deposited thereon to an enclosed curing module; supporting the substrate in the enclosed curing module, the supporting the substrate comprising floating the substrate on a gas cushion established by a floatation support apparatus; and while supporting the substrate in the enclosed curing module, curing the organic material deposited on the substrate to form an organic film layer.

公开(公告)号：US11285616B2

公开(公告)日：2022-03-29

申请号：US16127960

申请日：2018-09-11

申请人： Teradyne, Inc.

发明人： Ryan S. Penning ,  Ralph F. Polimeni, Jr. ,  Brett L. Limone ,  James D. English

IPC分类号： B25J11/00 ,  B05B13/04 ,  B25J13/08 ,  B25J19/02 ,  B25J9/16 ,  B05C5/02 ,  B05C9/10 ,  B05C13/02 ,  B05C15/00 ,  B25J13/06 ,  B25J9/00 ,  B25J15/00 ,  G05B19/042

摘要： The specification and drawings present a robotic coating application system and a method for coating at least one part with a robotic coating application system. The robotic coating application system may comprise an enclosure configured to receive at least one part. The robotic coating application system may further comprise at least one robot configured to operate at least partially within the enclosure. The robotic coating application system may also comprise a graphical user interface to display a model of the at least one part and allow a user to select a portion or subportion of the model for application of a coating. The coating may be automatically applied to the at least one part based upon, at least in part, the user-selected portion or subportion.

公开(公告)号：US11230757B2

公开(公告)日：2022-01-25

申请号：US16949412

申请日：2020-10-28

申请人： Kateeva, Inc.

发明人： Sass Somekh ,  Eliyahu Vronsky ,  Conor F. Madigan

IPC分类号： C23C4/137 ,  B41J2/14 ,  B41J11/00 ,  B41J29/393 ,  B41M5/00 ,  H01L21/677 ,  H01L21/67 ,  B05B17/00 ,  H05B33/10 ,  H01L33/00 ,  B41J2/015 ,  B05C5/02 ,  B05C13/02 ,  B41J2/165 ,  B41J2/315 ,  B05D5/00 ,  B05C15/00 ,  H01L51/00 ,  H01L51/56

摘要： The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

公开(公告)号：US20220001414A1

公开(公告)日：2022-01-06

申请号：US17476469

申请日：2021-09-15

申请人： MATRIX SENSORS, INC.

发明人： David K. Britt ,  Paul R. Wilkinson ,  Steven Yamamoto

IPC分类号： B05C5/00 ,  B05C5/02 ,  B05C13/02 ,  B05C11/10 ,  B05C15/00

摘要： A method is provided for coating a surface of a material with a film of porous coordination polymer. A first substrate having a first surface to be coated is positioned in a processing chamber such that the first surface is placed in an opposing relationship to a second surface. The second surface may be provided by a wall of the processing chamber, or in some cases the second surface may be provided by a second substrate to be coated. The first substrate is held such that a gap exists between the first and second surfaces, and the gap is filled with at least one reaction mixture comprising reagents sufficient to form the crystalline film on at least the first surface. A thin gap (e.g., less than 2 mm) between the first and second surfaces is effective for producing a high quality film having a thickness less than 100 μm. Confining the volume of the reaction mixture to a thin layer adjacent the substrate surface significantly reduces problems with sedimentation and concentration control. The size, shape, or average thickness of the gap may be adjusted during formation of the film in response to feedback from at least one film growth monitor.