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公开(公告)号：US11718918B2
公开(公告)日：2023-08-08
申请号：US17840663
申请日：2022-06-15
IPC分类号： C09K8/54 , C09K8/08 , C23F11/173 , C08L5/02 , C08L1/28 , C08L5/06 , C08K3/08 , C23G1/06 , C08L5/04
CPC分类号： C23F11/173 , C08K3/08 , C08L1/286 , C08L5/02 , C08L5/04 , C08L5/06 , C23G1/063 , C08K2003/0806 , C08K2201/003 , C08L2201/08
摘要： A corrosion inhibitor composition, which includes i) an aqueous alcohol base fluid, ii) a mixture of at least three polysaccharides selected from carboxymethyl cellulose, gum arabic, pectin, a salt of alginic acid, chitosan, dextran, hydroxyethyl cellulose, and soluble starch, with each polysaccharide that is present in the mixture being present in an amount of 0.05 to 0.5 wt. %, based on a total weight of the corrosion inhibitor composition, iii) silver nanoparticles, and iv) a pineapple leaves extract. A method of inhibiting corrosion of metal during acid cleaning/pickling whereby the metal is treated with an acidic treatment fluid containing an acid and the corrosion inhibitor composition.
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公开(公告)号：US20230212758A1
公开(公告)日：2023-07-06
申请号：US18000572
申请日：2021-06-28
申请人： David Sevier
发明人： David Sevier
CPC分类号： C23G1/061 , C23G1/36 , C23G3/04 , F24D19/0092
摘要： A process for chemical cleaning and corrosion inhibition of pipework, typically in closed loop systems, that avoids or significantly minimises the requirement for wastewater discharge where the system is first acidified using a mixture of cleaning agents capable of dissolving metal oxides. The method then precipitates any dissolved contaminants and separates the precipitate from the carrying fluid. Further elements of a combined corrosion inhibitor package are then added to any cleaning agent ions that remain in solution to develop a fully functional corrosion inhibition package to protect the metals of the system.
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公开(公告)号：US11597868B2
公开(公告)日：2023-03-07
申请号：US15827466
申请日：2017-11-30
申请人： ChampionX USA Inc.
IPC分类号： C09K8/54 , C23G1/06 , C23G1/08 , C23F11/14 , C23F11/10 , C23F11/16 , C09K8/532 , C23F11/12 , C09K8/524 , C23F11/04 , C11D1/00
摘要： A composition for inhibiting corrosion and/or removing hydrocarbonaceous deposits in oil and gas applications is provided. The composition comprises an iron sulfide dissolver, an organic solvent, and a corrosion inhibitor.
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公开(公告)号：US11591696B2
公开(公告)日：2023-02-28
申请号：US16465665
申请日：2017-11-30
发明人： Clay Purdy , Markus Weissenberger
摘要： An inhibition corrosion package for use with an acidic composition, where the package comprises a terpene component; a propargyl alcohol or derivative thereof; at least one amphoteric surfactant; and a solvent. Also disclosed are acidic compositions combining the corrosion inhibition package according to a preferred embodiment of the present invention for use in various industrial operations including but not limited to oil and gas operations. Also disclosed are methods of use of such compositions.
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公开(公告)号：US11473036B2
公开(公告)日：2022-10-18
申请号：US16624960
申请日：2018-07-04
发明人： Eckart Klusmann , Janos Hantschick
IPC分类号： C11D1/72 , C11D1/722 , C11D1/825 , B08B3/08 , C11D3/04 , C11D3/20 , C11D3/34 , C11D11/00 , C23C18/18 , C23C18/54 , C23G1/06 , C25D5/34 , C25D7/00 , H05K3/26
摘要： Cleaning solution for cleaning and/or wetting metal surfaces, comprising at least one acid, a first surfactant, which is an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≤25° C., a second surfactant, which is selected from the group consisting of i) an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≥30° C., ii) an alkyl-polyethyleneglycol-ether having a cloud point of ≥45° C. wherein the cloud points are determined according to European Standard EN 1890:2006, item 8.2 of German Version, with the modification that 10 wt % H2SO4 is used as solvent and that the concentration of the surfactant is 1000 mg/L.
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公开(公告)号：US20210032759A1
公开(公告)日：2021-02-04
申请号：US16526021
申请日：2019-07-30
摘要： A corrosion inhibitor composition, which includes i) an aqueous alcohol base fluid, ii) a mixture of at least three polysaccharides selected from carboxymethyl cellulose, gum arabic, pectin, a salt of alginic acid, chitosan, dextran, hydroxyethyl cellulose, and soluble starch, with each polysaccharide that is present in the mixture being present in an amount of 0.05 to 0.5 wt. %, based on a total weight of the corrosion inhibitor composition, iii) silver nanoparticles, and iv) a pineapple leaves extract. A method of inhibiting corrosion of metal during acid cleaning/pickling whereby the metal is treated with an acidic treatment fluid containing an acid and the corrosion inhibitor composition.
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公开(公告)号：US20200032400A1
公开(公告)日：2020-01-30
申请号：US16465665
申请日：2017-11-30
发明人： Clay PURDY , Markus WEISSENBERGER
摘要： An inhibition corrosion package for use with an acidic composition, where the package comprises a terpene component; a propargyl alcohol or derivative thereof; at least one amphoteric surfactant; and a solvent. Also disclosed are acidic compositions combining the corrosion inhibition package according to a preferred embodiment of the present invention for use in various industrial operations including but not limited to oil and gas operations. Also disclosed are methods of use of such compositions.
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公开(公告)号：US20190071623A1
公开(公告)日：2019-03-07
申请号：US16180107
申请日：2018-11-05
申请人： FUJIFILM Corporation
IPC分类号： C11D17/08 , C11D7/08 , C11D7/28 , C11D7/50 , C23G1/06 , C23F1/26 , G03F7/42 , H01L21/304 , H01L21/308
摘要： A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10−10 to 1.0×10−4.
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9.发明申请公开(公告)号：US20180074408A1
公开(公告)日：2018-03-15
申请号：US15554578
申请日：2016-03-11
发明人： John Cleaon Moore
CPC分类号： G03F7/426 , C09D5/20 , C11D3/2075 , C11D3/43 , C11D11/0047 , C23G1/06 , C23G1/103 , C23G5/032
摘要： The present invention is a charge complexing chemical composition that protects metal during polymer removal. The polymer coatings include crosslinked systems by chemical-amplification and photoacid generated (PAG) means as in epoxies. The system includes a solvent, a charge complexing additive, and an acid that creates a protective complex for sensitive metals during the dissolving and rinsing practice needed for processing microelectronic parts. The composition can be utilized with a method for removing partial and fully cured crosslinked coatings that originate from chemical amplification or PAG-epoxy photoimageable coatings.
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公开(公告)号：US09443713B2
公开(公告)日：2016-09-13
申请号：US14321180
申请日：2014-07-01
IPC分类号： C11D3/20 , H01L21/02 , C09G1/02 , C23G1/06 , C23G1/10 , C23G1/18 , C23G1/20 , G03F7/42 , H01L21/311 , H01L21/321 , H01L21/3213 , C11D11/00 , C11D7/06 , C11D7/32 , C11D3/33 , C11D3/39 , C23G1/02
CPC分类号： H01L21/02057 , C09G1/02 , C11D3/33 , C11D3/3942 , C11D7/06 , C11D7/3209 , C11D11/0047 , C23G1/02 , C23G1/061 , C23G1/103 , C23G1/106 , C23G1/18 , C23G1/205 , G03F7/425 , G03F7/426 , H01L21/02063 , H01L21/31144 , H01L21/3212 , H01L21/32134
摘要： An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.
摘要翻译： 一种氧化水性清洁组合物和用于从其上具有所述残余物的微电子器件清洁后等离子体蚀刻残余物和/或硬掩模材料的方法。 氧化性水性清洁组合物包括至少一种氧化剂，至少一种氧化剂稳定剂，其包含选自伯胺，仲胺，叔胺和胺-N-氧化物的胺类，任选地至少一种共溶剂 ，任选的至少一种金属螯合剂，任选的至少一种缓冲物质和水。 该组合物可实现对微电子器件的残留物质的高效清洁，同时不损害也存在于其上的层间电介质和金属互连材料。
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