摘要:
(M1Ox) - (M2Oy) - SiO2 wherein Mi is one or more metals and/or metalloids, M2 is one or more metals and/or metalloids, x is a value equal to the valence of M1, and y is a value equal to the valence of M2. The piezoelectric glass ceramic has a total alkali metal concentration of less than about 1000 parts per million by weight (ppmw). A process of preparing a piezoelectric glass ceramic and a piezoelectric glass ceramic body prepared therefrom.
摘要:
L'invention concerne une fibre optique (100) pour la détection et/ou la mesure quantitative d'hydrogène comportant un cœur (110) de fibre et au moins une gaine optique (120) entourant le cœur (110), au moins l'un parmi le cœur (110) et la gaine optique (120) étant réalisé majoritairement en verre de silice. La fibre optique (100) comporte du palladium sous forme métallique inclus dans au moins une partie de fibre réalisée majoritairement en verre de silice sélectionnée parmi le cœur (110) et la gaine optique (120). L'invention concerne également un procédé de fabrication d'une telle fibre optique (100), une utilisation de cette fibre optique (100), et un système de détection et/ou de mesure quantitative d'hydrogène comportant une telle fibre optique (100).
摘要:
The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.
摘要:
The invention relates to fused silica having low compaction under high energy irradation, particularly adaptable for use in photolithography applications.
摘要:
Gegenstand der vorliegenden Erfindung ist ein Verfahren zur Herstellung eines Brandschutzmittels auf Basis homogener Schaumprodukte. Dabei wird zunächst ein Glas mit einer wässrigen Alkalimetallhydroxid-Lösung bei Temperaturen oberhalb von 50 °C reagiert. Das Reaktionsprodukt wird als viskose Masse ausgetragen, granuliert und solange abgekühlt, bis eine feste Granulatkörnung vorliegt. Erfindungsgemäß werden die Granulatkörner mit einer hydrophoben Beschichtung einer Schichtdicke von ca. 20 μm bis 500 μm ausgerüstet und als Brandschutzzusatz in einen Baustoff eingearbeitet.
摘要:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
摘要:
A process for producing a synthetic quartz glass for optical members, which comprises the step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths not longer than 165 nm.
摘要:
The invention relates to process for producing a quartz glass optical body which is greatly resistive to irradiation of a laser having a short wavelength. According to the invention a quartz glass body is doped with hydrogen during and/or after production of the quartz glass body to a concentration in the range of 2 x 10 molecules/cm to 5 x 10 molecules/cm . To eliminate reduction-related defects induced by hydrogen in the bulk, the quartz glass body is irradiated with ultraviolet light of a wavelength in the range 150 nm to 300 nm. By such an irradiation hydrogen-induced defects occurring in production of synthetic quartz glass body by means of an oxyhydrogen flame or formed in a high-temperature hydrogen treatment are eliminated and thereby the quartz glass body is greatly improved in a stability against ultraviolet light. A quartz glass optical body according to the invention is especially suitable for use with an ArF eximer laser of 193 nm in wavelength or a YAG fifth harmonics laser of 213 nm in wavelength.
摘要翻译:本发明涉及对具有短波长的激光的照射极大地抵抗的石英玻璃光学体的制造方法。 根据本发明,在制造石英玻璃体期间和/或之后,在2×10 17分子/ cm 3至5×10 19分子范围内的浓度下,石英玻璃体被掺杂氢 /厘米<3>。 为了消除体内由氢引起的还原相关缺陷,用波长为150nm至300nm的紫外线照射石英玻璃体。 通过这样的照射,消除了通过氢氧焰生产合成石英玻璃体或在高温氢处理中形成的氢诱发缺陷,从而大大提高了对紫外线的稳定性的石英玻璃体。 根据本发明的石英玻璃光学体系特别适用于波长193nm的ArF准分子激光器或波长为213nm的YAG五次谐波激光器。
摘要:
A quartz glass doped with rare earth element, aluminium and further fluorine, and endowed with various characteristics such as practicable luminescent properties, high amplification gain, achievement of wider band, size reduction of elements, fusibility and connectivity of quartz glasses with each other, and so forth. This glass is not accompanied with crystallization inherent in this type of doped quartz glass in the course of its producton, so that it is transparent of course and contains no residual bubbles. Since the production process comprises a combination of a technique for forming a porous glass with a method of solution impregnation, it is possible to produce readily a quartz glass doped with both rare earth element and aluminum, having high purity and excellent transparency, and being useful as an active optical element.
摘要:
A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.