REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME
    3.
    发明申请
    REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME 审中-公开
    减少的低膨胀玻璃和元素,以及制造它们的方法

    公开(公告)号:WO2007143069A2

    公开(公告)日:2007-12-13

    申请号:PCT/US2007012899

    申请日:2007-05-31

    IPC分类号: C03C3/06 C03B19/14

    摘要: The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.

    摘要翻译: 本发明涉及一种具有减少条纹的低膨胀玻璃,通过其厚度,玻璃具有0.1重量%以下的二氧化钛含量的点对点变化,并且在整个温度范围内的CTE为0±3ppb /℃, 35°C。 本发明还涉及一种通过使用在该方法中使用的振荡图案的重复时间为10分钟以下的方法制造低膨胀玻璃的方法。 此外,本发明的低膨胀玻璃可以通过在高于1600℃的温度下热处理玻璃在48 160小时的时间内进一步降低条纹。 本发明还涉及适用于极紫外光刻的光学元件,该元件由二氧化钛含量在5-10重量%范围内的含二氧化钛的二氧化硅玻璃制成,抛光和成形的表面具有峰谷 粗糙度小于10nm,二氧化钛含量的平均变化小于±0.1wt。 通过玻璃的垂直厚度测量,并且在整个温度范围5 35°C时,热膨胀系数为0±3ppb /°C。

    PROCESS FOR PRODUCING QUARTZ GLASS OPTICAL BODY FOR ULTRAVIOLET-EMITTING LASERS AND QUARTZ GLASS BODY PRODUCED ACCORDING TO THE PROCESS
    8.
    发明申请
    PROCESS FOR PRODUCING QUARTZ GLASS OPTICAL BODY FOR ULTRAVIOLET-EMITTING LASERS AND QUARTZ GLASS BODY PRODUCED ACCORDING TO THE PROCESS 审中-公开
    生产超紫外线激光的QUARTZ玻璃光学体系的方法和根据工艺生产的QUARTZ玻璃体

    公开(公告)号:WO1997016382A1

    公开(公告)日:1997-05-09

    申请号:PCT/EP1996004746

    申请日:1996-10-31

    IPC分类号: C03B19/14

    摘要: The invention relates to process for producing a quartz glass optical body which is greatly resistive to irradiation of a laser having a short wavelength. According to the invention a quartz glass body is doped with hydrogen during and/or after production of the quartz glass body to a concentration in the range of 2 x 10 molecules/cm to 5 x 10 molecules/cm . To eliminate reduction-related defects induced by hydrogen in the bulk, the quartz glass body is irradiated with ultraviolet light of a wavelength in the range 150 nm to 300 nm. By such an irradiation hydrogen-induced defects occurring in production of synthetic quartz glass body by means of an oxyhydrogen flame or formed in a high-temperature hydrogen treatment are eliminated and thereby the quartz glass body is greatly improved in a stability against ultraviolet light. A quartz glass optical body according to the invention is especially suitable for use with an ArF eximer laser of 193 nm in wavelength or a YAG fifth harmonics laser of 213 nm in wavelength.

    摘要翻译: 本发明涉及对具有短波长的激光的照射极大地抵抗的石英玻璃光学体的制造方法。 根据本发明,在制造石英玻璃体期间和/或之后,在2×10 17分子/ cm 3至5×10 19分子范围内的浓度下,石英玻璃体被掺杂氢 /厘米<3>。 为了消除体内由氢引起的还原相关缺陷,用波长为150nm至300nm的紫外线照射石英玻璃体。 通过这样的照射,消除了通过氢氧焰生产合成石英玻璃体或在高温氢处理中形成的氢诱发缺陷,从而大大提高了对紫外线的稳定性的石英玻璃体。 根据本发明的石英玻璃光学体系特别适用于波长193nm的ArF准分子激光器或波长为213nm的YAG五次谐波激光器。