Abstract:
Methods and apparatus are described for enabling copper-to-copper (Cu-Cu) bonding at reduced temperatures (e.g., at most 200°C) by significantly reducing Cu oxide formation. These techniques provide for faster cycle time and entail no extraordinary measures (e.g., forming gas). Such techniques may also enable longer queue (Q) or staging times. One example semiconductor structure (100) generally includes a semiconductor layer (102), an adhesion layer (104) disposed above the semiconductor layer (102), an anodic metal layer (106) disposed above the adhesion layer (104), and a cathodic metal layer (108) disposed above the anodic metal layer (106). An oxidation potential of the anodic metal layer (106) may be greater than an oxidation potential of the cathodic metal layer (108). Such a semiconductor structure (100) may be utilized in fabricating IC packages (300, 400) implementing 2.5D or 3D integration.
Abstract:
A method for flip chip stacking includes forming (201) a cavity wafer (301) comprising a plurality of cavities (303) and a pair of corner guides (305), placing (203) a through-silicon-via (TSV) interposer (103) with solder bumps (107) coupled to a surface of the TSV interposer on the cavity wafer, such that the solder bumps are situated in the plurality of cavities and the TSV interposer is situated between the pair of corner guides, placing (205) an integrated circuit (IC) die (109) on another surface of the TSV interposer, such that the IC die, the TSV interposer, and the solder bumps form a stacked interposer unit (113), removing (207) the stacked interposer unit from the cavity wafer, and bonding (209) the solder bumps of the stacked interposer unit to an organic substrate (101) such that the stacked interposer unit and the organic substrate form a flip chip (300).
Abstract:
Some examples described herein provide for a heterogeneous integration module (HIM) that includes a thermal management apparatus. In an example, an apparatus (e.g., a HIM) includes a wiring substrate, a first component, a second component, and a thermal management apparatus. The first component and the second component are communicatively coupled together via the wiring substrate. The thermal management apparatus is in thermal communication with the first component and the second component. The thermal management apparatus has a first thermal energy flow path for dissipating thermal energy generated by the first component and has a second thermal energy flow path for dissipating thermal energy generated by the second component. The first thermal energy flow path has a lower thermal resistivity than the second thermal energy flow path.
Abstract:
A method and apparatus are provided that includes an integrated circuit die 114, 116 having an in-chip heat sink 112, along with an electronic device and a chip package having the same, and methods for fabricating the same. In one example, an integrated circuit die 114, 116 has an in-chip heat sink 112 that separates a high heat generating integrated circuit device from another integrated circuit device disposed within the die 114, 116. The in-chip heat sink 112 provides a highly conductive heat transfer path from interior portions of the die 114, 116 to at least one exposed die surface.
Abstract:
An integrated circuit (IC) structure can include an internal element (110, 415, 410) and a flexible circuitry (140) directly coupled to the internal element. The flexible circuitry can be configured to exchange signals between the internal element and a node external to the IC structure (120, 455, 605, 615, 645).
Abstract:
A chip package assembly and method for fabricating the same are provided that provide a modular chip stack that can be matched with one or more chiplets. The use of chiplets enables the same modular stack to be utilized in a large number of different chip package assembly designs, resulting much faster development times at a fraction of the overall solution cost.
Abstract:
In one example, a semiconductor assembly comprises a first IC die (104A), a second IC die (104B), and a bridge module (110). The first IC die includes, on a top side thereof, first interconnects (108A) of a plurality of interconnects (108) and first inter-die contacts (608A) of a plurality of inter-die contacts (608). The second IC die includes, on a top side thereof, second interconnects (108B) of the plurality of interconnects and second inter-die contacts (608B) of the plurality of inter-die contracts. The bridge module is disposed between the first interconnects and the second interconnects and includes bridge interconnects (112) on a top side thereof, the bridge interconnects mechanically and electrically coupled to the plurality of inter-die contacts, and layer(s) of conductive interconnect (706) disposed on the top side thereof to route signals between the first IC and the second IC. A back side (710) of the bridge module does not extend beyond a height of the plurality of interconnects.
Abstract:
Examples generally provide a stacked silicon interconnect product (109) and method of manufacture. The stacked silicon interconnect product (109) includes a silicon substrate-less interposer (102) comprising a plurality of metallization layers (104), wherein at least one metallization layer (104) includes a plurality of metal segments (106) separated by dielectric material (108). The stacked silicon interconnect product (109) also includes a first die (110) coupled to a first side of the silicon substrate-less interposer (102) via a first plurality of microbumps (114). The stacked silicon interconnect product (109) further includes a second die (112) coupled to a second side of the silicon substrate-less interposer (102) via a second plurality of microbumps (114), the second die (112) communicatively coupled to the first die (110) through a metallization layer (104) of the plurality of metallization layers (104).
Abstract:
An apparatus for placement between a package and an integrated circuit board is provided. The apparatus may include: an insert (112). The insert may have: a substrate having a top side and a bottom side; a first set of pads (114) at the top side of the substrate; a second set of pads (114) at the bottom side of the substrate; and a plurality of vias (116) in the substrate, the vias (116) connecting respective pads (114) in the first set to respective pads (114) in the second set; wherein the insert (112) has a thickness that is less than a spacing between the package and the integrated circuit board.
Abstract:
Examples of the present disclosure provide example Chip Scale Packages (CSPs). In some examples, a structure Includes a first integrated circuit die (24), a shim die (28, 28A) that does not include active circuitry thereon, an encapsulant (40) at least laterally encapsulating the first integrated circuit die (24) and the shim die (28, 28A), and a redistribution structure (50) on the first integrated circuit die (24), the shim die (28, 28A), and the encapsulant (40). The redistribution structure (50) includes one or more metal layers (54) electrically connected to the first integrated circuit die (24).