MEMORY IDDQ-TESTABLE THROUGH CUMULATIVE WORD LINE ACTIVATION
    23.
    发明授权
    MEMORY IDDQ-TESTABLE THROUGH CUMULATIVE WORD LINE ACTIVATION 失效
    可测试我DDQ内存累积一字线启动

    公开(公告)号:EP0698273B1

    公开(公告)日:2000-05-10

    申请号:EP95907132.5

    申请日:1995-02-15

    Inventor: SACHDEV, Manoj

    Abstract: An SRAM has a plurality of respective memory cells coupled to a respective one of a plurality of word lines and to a pair of bit lines. The SRAM comprises IDDQ test means to render the word lines active in parallel by cumulatively increasing a number of active ones among the word lines. This permits the writing of a specific logic state in all cells of a column through the tiny bit line drivers that are progressively assisted by the cells already written, thus avoiding the use of additional heavy write circuitry for IDDQ test purposes only.

    Improvements in or relating to non-volatile memory devices
    26.
    发明公开
    Improvements in or relating to non-volatile memory devices 失效
    在Bezug aufnichtflüchtigeSpeicheranordnungen的Verbesserungen bei oder

    公开(公告)号:EP0836196A2

    公开(公告)日:1998-04-15

    申请号:EP97117402.4

    申请日:1997-10-08

    Abstract: A system for testing and adjusting threshold voltages in flash EEPROMs is disclosed. The system includes a memory cell array (5) comprising a plurality of cell columns. Each cell column includes a plurality of memory cells (10). Each memory cell (10) has a control gate terminal (14), a drain terminal (12) and a source terminal 11. A control system comprising a wordline decoder (16), a column decoder (19) and a microprocessor (21) applies selected voltages to the respective terminals of the memory cells (10), and selects one of the plurality of cell columns for compaction verification. A detector (30) determines whether any one of the memory cells (10) of the selected cell column has a threshold voltage below a predetermined positive voltage, and supplies an output signal to the control system. The control system increases respective threshold voltages of the memory cells (10) of the selected cell column in response to the output signal of the detector (30).

    Abstract translation: 公开了一种用于测试和调整闪速EEPROM中的阈值电压的系统。 该系统包括包括多个单元列的存储单元阵列(5)。 每个单元列包括多个存储单元(10)。 每个存储单元(10)具有控制栅极端子(14),漏极端子(12)和源极端子11.一种包括字线解码器(16),列解码器(19)和微处理器(21)的控制系统, 将选择的电压施加到存储器单元(10)的各个端子,并且选择多个单元格列之一进行压缩验证。 检测器(30)确定所选单元列的存储单元(10)中的任何一个是否具有低于预定正电压的阈值电压,并将输出信号提供给控制系统。 响应于检测器(30)的输出信号,控制系统增加所选单元列的存储单元(10)的相应阈值电压。

    Method for setting the threshold voltage of a reference memory cell
    28.
    发明公开
    Method for setting the threshold voltage of a reference memory cell 失效
    Verfahren zur Einstellung der Schwellspannung einer Referenzspeicherzelle

    公开(公告)号:EP0753859A1

    公开(公告)日:1997-01-15

    申请号:EP95830302.6

    申请日:1995-07-14

    Abstract: A method for setting the threshold voltage of a reference memory cell (RMC) of a memory device is described, the reference memory cell (RMC) being used as a reference current generator for generating a reference current which is compared by a sensing circuit (1,2,3) of the memory device with currents sunk by memory cells to be sensed, belonging to a memory matrix (MM) of the memory device. The method comprises a first step in which the reference memory cell (RMC) is submitted to a change in its threshold voltage, and a second step in which the threshold voltage of the reference memory cell (RMC) is verified. The second step provides for performing a sensing of the reference memory cell (RMC) using a memory cell (MC) with known threshold voltage (V TUV ) belonging to the memory matrix (MM) as a reference current generator for generating a current (IC) which is compared by the sensing circuit (1,2,3) with the current (IR) sunk by the reference memory cell (RMC).

    Abstract translation: 描述了用于设置存储器件的参考存储单元(RMC)的阈值电压的方法,参考存储单元(RMC)用作参考电流发生器,用于产生参考电流,该参考电流由感测电路(1 ,2,3)的存储器件,存储器件的存储器矩阵(MM)属于存储器器件的存储器矩阵(MM)。 该方法包括第一步骤,其中参考存储器单元(RMC)被提交到其阈值电压的改变,以及第二步骤,其中验证参考存储单元(RMC)的阈值电压。 第二步提供使用具有属于存储矩阵(MM)的已知阈值电压(VTUV)的存储单元(MC)作为参考电流发生器来执行对参考存储单元(RMC)的感测作为参考电流发生器,用于产生电流(IC) 其通过感测电路(1,2,3)与由参考存储器单元(RMC)沉没的当前(IR)进行比较。

    Method of evaluating the dielectric layer of nonvolatile EPROM, EEPROM and flash-EEPROM memories
    30.
    发明公开
    Method of evaluating the dielectric layer of nonvolatile EPROM, EEPROM and flash-EEPROM memories 失效
    一种用于评估的非易失性EPROM,EEPROM和快闪EEPROM的存储器中的电介质层的方法。

    公开(公告)号:EP0595775A1

    公开(公告)日:1994-05-04

    申请号:EP93830134.8

    申请日:1993-04-01

    Abstract: A method employing a test structure (10) identical to the memory array whose gate oxide or interpoly dielectric quality is to be determined, except for the fact that the cells are connected electrically (13-15, 17, 18, 19-21) parallel to one another. The test structure is subjected to electrical stress of such a value and polarity as to extract electrons from the floating gate of the defective-gate-oxide or defective-interpoly-dielectric cells and so modify the characteristic of the cell while leaving the charge of the non-defective cells unchanged. In this way, only the threshold of the defective cells is altered. A subthreshold voltage is then applied to the test structure, and the drain current through the cells, which is related to the presence of at least one defective cell in the structure, is measured. Measurement and analysis of the current-voltage characteristic provides for determining the number of defective cells. The method is suitable for in-line quality control of the gate oxide or interpoly dielectric of EPROM, EEPROM and flash-EEPROM memories.

    Abstract translation: 一种方法采用测试结构(10)相同的到所述存储器阵列,其栅氧化物或电介质间(interpoly)质量将被确定,除了在平行所述细胞电连接的factthat(13-15,17,18,19-21) 彼此。 测试结构进行求值和极性,以从有缺陷的栅氧化物或缺陷-间(interpoly)电介质单元的浮置栅提取电子并因此修改该单元的特性,同时使充电的电应力 无缺陷单元不变。 通过这种方式,只有有缺陷的单元的阈值被改变。 然后,低于阈值的电压被施加到测试结构,和通过细胞中的漏电流,所有这是关系到在结构中的至少一个有缺陷的细胞的存在,进行测量。 的电流 - 电压特性的测量和分析用于确定性采矿提供有缺陷的细胞的数目。 该方法适用于栅极氧化物或EPROM,EEPROM和快闪EEPROM存储器间介电的在线质量控制。

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