Abstract:
A multilayer printed circuit board has a metal base (1) with openings (12), the surface of the base and the walls of the openings being covered with an insulation layer (8) obtained by means of applying and mechanical processing, in turn, on both sides, a coating of a powder epoxy composition. An insulation relief (16) of a photo sensitive composition is obtained on the insulation coating, which is then filled with a metal by vacuum deposition. Conductors (4) and contact points (5) of the layer (3) of conducting pattern are obtained by removing the metal from the protruding parts of the relief (16). Then insulation relief (18) is formed corresponding to the location of the contact points (11) and of the commutation bars (10) connecting the layers (3, 6) of the conducting patterns, and is covered with a metal layer. After the removal of the metal from the protruding parts an insulation layer (9) is obtained in which are located the commutation bars (10) and the contact points (11). Then an insulation relief (19) is formed corresponding to the configuration of the layer (6) of the conducting pattern, the metal is applied and mechanically processed so as to obtain conductors (7) with contact points (8) of the layer (6) of the conducting pattern.
Abstract:
Ce film conducteur anisotrope autoporté comporte une couche (46) de polymère partiellement recuit contenant des trous traversants, des éléments conducteurs en forme de clou (51) remplissant ces trous traversants, comportant une partie centrale et des extrémités, et la partie centrale des clous est constituée d'un matériau dur (52) et chaque extrémité respectivement d'un premier et d'un second matériaux fusibles (44, 54).
Abstract:
A method of making an insulated patterned layer of an electrically conductive metal includes the steps of: (i) applying a layer of a radiation-curable material (2) to a substrate (1); (ii) imagewise exposing the layer of radiation-curable material to radiation to thereby cure portions (2a) of the layer exposed to such radiation; and (iii) removing the portions (2b) of the layer not exposed to radiation by means of a suitable solvent to thereby produce upon the substrate a patterned layer of cured radiation-curable material; and subsequently introducing electrically conductive metal (4) into the depressions (tracks) in the patterned relief layer.
Abstract:
The present invention permits solder joints to be made directly to via and through holes without the solder being wicked into the vias or through holes, by filling plated through holes (14) with an epoxy or cyanate fill composition (16). When cured and overplated, the fill composition (16) provides support for the solder joint (22) and provides a flat solderable surface (18) for the inter-connection. In certain embodiments, the cured fill compositions, offer a further advantage of being conductive. The invention also relates to several novel methods for filling through holes with such fill compositions, and to resistors located in through holes and vias.
Abstract:
In accordance with the present invention, a circuit assembly is manufactured in an additive process using at least one layer of a fluoropolymer composite material and a conductive material. The conductive layers are plated, and the fluoropolymer composite layers are laminated. The use of the filled fluoropolymeric composite eliminates the need for a barrier metal layer between the insulation and the conductors. A plurality of these circuit assemblies are stacked, one on top of the other. At least, selected exposed locations of the conductive material comprise a diffusible conductive material (e.g., gold). Once stacked the circuit assemblies are subjected to lamination under heat and pressure to simultaneously fuse adjacent fluoropolymer composite material and diffuse adjacent diffusible conductive material together to form an integral multilayer circuit having solid conductive interconnects.
Abstract:
A method of making a multilayer thin film structure on the surface of a dielectric substrate which includes the steps of: a) forming a multilayer thin film structure including the steps of: applying a first layer of dielectric polymeric material on the surface of a dielectric substrate, applying a second layer of dielectric polymeric material over the first layer of polymeric material wherein the second polymeric material is photosensitive, imagewise exposing and developing the second polymeric material to form a feature therein, the second layer feature in communication with at least one feature formed in the first polymeric material; and b) filling the features in the entire multilayer structure simultaneously with conductive material. Preferably, the first layer feature is a via and the second layer feature is a capture pad or wiring channel. Also disclosed is a multilayer thin film structure made by this method.
Abstract:
In order to provide a multilayer electronic component (10) which can reduce arrangement pitches for external electrodes (12), via holes (19) filled up with conductive materials (18) are provided in a mother laminate (14), which is obtained by stacking a plurality of insulating sheets (16, 17) with interposition of conductor films (23, 24), in positions parted by cutting. The conductive materials (18) define external electrodes (12) of individual multilayer electronic components (10) which are obtained by cutting the mother laminate (14). No specific step is required for forming the external electrodes (12), and characteristics of each multilayer electronic component (10) can be efficiently measured in the state of the mother laminate (14).
Abstract:
Die Mehrlagenleiterplatte besitzt ein metallisches Substrat (1) mit Löchern (12), wobei die Oberfläche des Substrats (1) und die Wände der Löcher (12) mit einer Isolationsschicht (9) bedeckt sind, die durch Auftragung und mechanische Bearbeitung der Reihe nach auf zwei Seiten eines Überzuges aus einer pulverförmigen Epoxidharzkomposition hergestellt wird. Auf dem Isolierstoffüberzug (2) ehrält man ein Isolationsrelief (16) aus einer fotoempfindlichen Komposition, welches Relief mit Metall durch Abscheibung im Vakuum ausgefüllt wird. Durch Entfernung des Metalls von den hervorstehenden Teilen des Reliefs (16) erhält man Leiter (4) und Kontaktflächen (5) einer Leiterbildschicht (5). Dann formiert man ein Isolationsrelief (18), das der Anordnung von Kontaktflächen (11) und Schalthöckern (10) entspricht, welche die Leiterbildschichten (3,6) verbinden, und bedeckt es mit einer Metallschicht. Nach der Entfernung des Metalls von den hervorstehenden Teilen erhält man eine Isolationsschicht (9), in der sich die Schalthöcker (10) und die Kontaktflächen (11) befinden. Des weiteren formiert man ein Isolationsrelief (19), das der Konfiguration einer Leiterbildschicht (6) entspricht, bringt das Metall auf und bearbeitet es mechanisch, indem man die Leiter (7) mit Kontaktflächen (8) der Leiterbildschicht (6) erhält.
Abstract:
This invention relates generally to a structure and process for thin film interconnect, and more particularly to a structure and process for a multilayer thin film interconnect structure (75) with improved dimensional stability and electrical performance. The invention further relates to a process of fabrication of the multilayer thin film structures (75). The individual thin film structure (50) is termed a compensator, and functions as both a ground/reference plane and as a stabilizing entity with regard to dimensional integrity. The compensator (50) is comprised primarily of a metal sheet (17) having a metallized via pattern (41) and high-temperature stable polymer (25) as an insulator.