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    LED light emitting device
    4.
    发明授权
    LED light emitting device 有权
    LED发光装置

    公开(公告)号：US08704244B2

    公开(公告)日：2014-04-22

    申请号：US13146889

    申请日：2010-02-05

    申请人： Hirokazu Suzuki ,  Jun Konishi ,  Yuichiro Tanaka ,  Kenji Yoneda

    发明人： Hirokazu Suzuki ,  Jun Konishi ,  Yuichiro Tanaka ,  Kenji Yoneda

    IPC分类号： H01L29/18

    CPC分类号： H01L25/0753 ,  H01L33/504 ,  H01L33/508 ,  H01L2224/49107 ,  H05B33/0821 ,  H05B33/0857 ,  H01L2224/48091 ,  H01L2924/00014

    摘要： In order to provide an LED light emitting device that can easily control a color temperature of white light, the LED light emitting device is provided with a plurality of types of light emitting parts that: respectively have LED elements that emit ultraviolet radiation or violet color visible light, and phosphors that absorb the ultraviolet radiation or violet color visible light to emit colored light; and emit the colored light, wherein: the colored light emitted by the plurality of types of light emitting parts become white light when all mixed with each other; the LED elements of the plurality of types of light emitting parts are all the same ones, and mounted on a single base material; and two or more light emitting parts overlap with each other in their parts.

    摘要翻译： 为了提供能够容易地控制白光的色温的LED发光装置，LED发光装置具有多种类型的发光部，分别具有发出紫外线或紫色可见的LED元件 光和荧光体，其吸收紫外线或紫色可见光以发出有色光; 并发出着色光，其中：当全部混合时，由多种类型的发光部分发出的着色光成为白光; 多种类型的发光部件的LED元件都是相同的，并且安装在单个基材上; 并且两个或更多个发光部件在它们的部分中彼此重叠。

    HARVESTED SAMPLE PREPARATION PERSONAL BOX AND SYSTEM AND METHOD OF HARVESTED SAMPLE PREPARATION
    5.
    发明申请
    HARVESTED SAMPLE PREPARATION PERSONAL BOX AND SYSTEM AND METHOD OF HARVESTED SAMPLE PREPARATION 有权
    收集的样品制备个人盒和系统以及收集的样品制备方法

    公开(公告)号：US20120077220A1

    公开(公告)日：2012-03-29

    申请号：US13376973

    申请日：2010-06-22

    申请人： Manabu Mizutani ,  Yoshiko Nohmi ,  Kenji Yoneda

    发明人： Manabu Mizutani ,  Yoshiko Nohmi ,  Kenji Yoneda

    IPC分类号： C12Q1/02 ,  C12M3/00

    CPC分类号： C12M45/22 ,  A61B10/0096 ,  C12M37/00

    摘要： A harvested sample preparation system includes an operation isolator 3 in which aseptic manipulation is executed, a harvested sample preparation personal box 4 which can be connected with the operation isolator 3 and storing means 5 that stores a plurality of harvested sample preparation personal boxes 4. The harvested sample preparation personal box 4 includes a first housing chamber 4Aa and a second housing chamber 4Ab, and fluid appropriate for cell culture is supplied to the first housing chamber 4Aa from a fluid supply pipe 16 included by the storing means 5 while cooling fluid is supplied to the second housing chamber 4Ab from a cooling fluid supply pipe 18. The harvested sample preparation system that prevents mix-up and cross-contamination with a simple configuration can be provided.

    摘要翻译： 收集的样品制备系统包括其中执行无菌操作的操作隔离器3，可与操作隔离器3连接的收集的样品制备个人盒4和存储多个收获的样品制备个人盒的存储装置5。 收集的样品制备个人盒4包括第一容纳室4Aa和第二容纳室4Ab，并且适合于细胞培养的流体从包含在存储装置5中的流体供应管16供应到第一容纳室4Aa，同时供应冷却流体 从冷却流体供给管18到第二容纳室4Ab。可以提供防止混合和交叉污染的收集的样品制备系统，其具有简单的构造。

    Impurity-activating thermal process method and thermal process apparatus
    6.
    发明授权
    Impurity-activating thermal process method and thermal process apparatus 有权
    杂质活化热处理方法和热处理装置

    公开(公告)号：US08017528B2

    公开(公告)日：2011-09-13

    申请号：US12352977

    申请日：2009-01-13

    申请人： Kenji Yoneda ,  Kazuma Takahashi

    发明人： Kenji Yoneda ,  Kazuma Takahashi

    IPC分类号： H01L21/00

    CPC分类号： H01L21/26513 ,  H01L21/2686 ,  H01L21/324 ,  H01L29/6659 ,  H01L29/7833

    摘要： A thermal cycle includes: increasing a temperature from an initial temperature to a temperature T1 at an arbitrary rate R1 (° C./sec); holding the temperature at the temperature T1 for an arbitrary period t1 (sec); increasing the temperature from the temperature T1 to a temperature T2 at a rate R2 (° C./sec) of 1.0×107 (° C./sec) or less; and holding the temperature at the temperature T2 for a period t2 (sec) of 50 msec or less. The thermal cycle thereafter includes: decreasing the temperature from the temperature T2 to the temperature T1 at a rate R1′ (° C./sec) of 1.0×107 (° C./sec) or less; holding the temperature T1 for an arbitrary period t3 (sec); and decreasing the temperature from the temperature T1 to a final temperature at an arbitrary rate R2′ (° C./sec). Such a thermal cycle is successively repeated in a plurality of iterations.

    摘要翻译： 热循环包括：以任意速率R1（℃/秒）将温度从初始温度升高到温度T1; 将温度保持在温度T1任意时段t1（秒）; 以1.0×107（℃/秒）以下的速率R2（℃/秒）将温度从温度T1升温至温度T2; 并将温度保持在温度T2，持续时间t2（秒）为50毫秒或更短。 此后的热循环包括：以1.0×10 7（℃/秒）以下的速率R1'（℃/秒）将温度从温度T2降低到温度T1; 保持温度T1任意时间t3（秒）; 并以任意的速率R2'（℃/秒）将温度从温度T1降低到最终温度。 这样的热循环在多次迭代中连续重复。

    Insulating film formation method which exhibits improved thickness uniformity and improved composition uniformity
    7.
    发明授权
    Insulating film formation method which exhibits improved thickness uniformity and improved composition uniformity 有权
    表现出改善的厚度均匀性和改善组合物均匀性的绝缘膜形成方法

    公开(公告)号：US07883746B2

    公开(公告)日：2011-02-08

    申请号：US11826495

    申请日：2007-07-16

    申请人： Jun Suzuki ,  Kenji Yoneda ,  Seiji Matsuyama

    发明人： Jun Suzuki ,  Kenji Yoneda ,  Seiji Matsuyama

    IPC分类号： C23C16/40

    CPC分类号： H01L21/3141 ,  C23C16/405 ,  C23C16/45504 ,  C23C16/45546 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/31608 ,  H01L21/31645 ,  H01L21/3185

    摘要： In an insulating film formation method, a cycle A in which O3 at a low flow rate is supplied onto a substrate and then O3 supplied is allowed to react with Hf on the substrate in a non-equilibrium state to form a hafnium oxide film is carried out M times (M≧1), and a cycle B in which O3 at a high flow rate is supplied onto the substrate and then O3 supplied is allowed to react with Hf on the substrate in an equilibrium state to form a hafnium oxide film is carried out N times (N≧1). These insulating film formation cycles are defined as one sequence. This sequence is repeated until a desired thickness is obtained, thereby forming a target insulating film.

    摘要翻译： 在绝缘膜形成方法中，将以低流量供给O3，然后供给O 3的O 3的循环A在非平衡状态下与基板上的Hf反应，形成氧化铪膜 （M≥1），以及将高流量O 3供给到基板上的循环B，然后供给的O 3以与平衡状态的基板上的Hf反应形成氧化铪膜为 进行N次（N≥1）。 这些绝缘膜形成循环被定义为一个顺序。 重复该顺序，直到获得所需的厚度，从而形成目标绝缘膜。

    Living body growth and therapy promotion condition collection information processing device
    8.
    发明授权
    Living body growth and therapy promotion condition collection information processing device 失效
    活体生长和治疗促进条件收集信息处理装置

    公开(公告)号：US07836072B2

    公开(公告)日：2010-11-16

    申请号：US10529162

    申请日：2003-09-26

    申请人： Kenji Yoneda

    发明人： Kenji Yoneda

    IPC分类号： G06F17/30 ,  G06F7/00

    CPC分类号： G06Q10/06 ,  G06Q30/0217 ,  Y10S707/915 ,  Y10S707/942

    摘要： An information processing system P3 is communicably connected with multiple controlling systems P2 that promote the growth or health of living organisms by controlling at the least the light irradiated on such living organisms by a light irradiating means X1, and the environmental data produced by one controlling system P1 and concerning the beneficial environmental parameters including the light irradiated on the living organisms are transmitted to and administered by the information processing system P3 so that the environmental data from one of the controlling systems P2 is delivered from the information processing system P3 to any of the other controlling systems P2, and royalty data concerning royalties is produced in relationship to a controlling system identifier that uniquely identifies the one controlling system P1 when the information processing system P3 receives or delivers the environmental data.

    摘要翻译： 信息处理系统P3与多个控制系统P2可通信地连接，多个控制系统P2通过利用光照射装置X1至少控制照射在这种活生物体上的光以及由一个控制系统产生的环境数据来促进生物体的生长或健康 P1和涉及包括照射在生物体上的光的有益环境参数被传送到信息处理系统P3并由其管理，使得来自控制系统P2之一的环境数据从信息处理系统P3被传送到任何 与信息处理系统P3接收或传送环境数据时唯一地识别一个控制系统P1的控制系统标识符相关地产生关于特许权使用费的版税数据。

    IMPURITY-ACTIVATING THERMAL PROCESS METHOD AND THERMAL PROCESS APPARATUS
    9.
    发明申请
    IMPURITY-ACTIVATING THERMAL PROCESS METHOD AND THERMAL PROCESS APPARATUS 有权
    热塑性热处理方法和热处理装置

    公开(公告)号：US20090197428A1

    公开(公告)日：2009-08-06

    申请号：US12363225

    申请日：2009-01-30

    申请人： Kazuma Takahashi ,  Kenji Yoneda

    发明人： Kazuma Takahashi ,  Kenji Yoneda

    IPC分类号： H01L21/00 ,  A21B1/06 ,  H01L21/30 ,  H01L21/40

    CPC分类号： H01L21/67115 ,  H01L21/2686 ,  H01L21/324 ,  H01L29/6659 ,  H01L29/7833

    摘要： An impurity-activating thermal process is performed after a target is subjected to an impurity introduction step. In this thermal process, while a spike RTA process including a holding period for holding a temperature at a predetermined temperature is performed, at least one iteration of millisecond annealing at a temperature higher than the predetermined temperature is performed during the holding period of the spike RTA process.

    摘要翻译： 在对靶进行杂质引入步骤之后进行杂质活化热处理。 在该热处理中，虽然进行包括保持温度在预定温度下的保持期的尖峰RTA工艺，但是在尖峰RTA的保持期间内进行至少一次在高于预定温度的温度下进行的毫秒退火 处理。